CA1061161A - Mode de fabrication d'un pochoir resistant au decapage - Google Patents
Mode de fabrication d'un pochoir resistant au decapageInfo
- Publication number
- CA1061161A CA1061161A CA234,436A CA234436A CA1061161A CA 1061161 A CA1061161 A CA 1061161A CA 234436 A CA234436 A CA 234436A CA 1061161 A CA1061161 A CA 1061161A
- Authority
- CA
- Canada
- Prior art keywords
- caseinate
- coating
- alkali
- etch
- coatings
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000000034 method Methods 0.000 title claims abstract description 16
- 239000003513 alkali Substances 0.000 claims abstract description 19
- 229940071162 caseinate Drugs 0.000 claims abstract description 17
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 17
- 239000000203 mixture Substances 0.000 claims abstract description 11
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000003504 photosensitizing agent Substances 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims description 43
- 239000011248 coating agent Substances 0.000 claims description 21
- 102000011632 Caseins Human genes 0.000 claims description 19
- 108010076119 Caseins Proteins 0.000 claims description 18
- 229940080237 sodium caseinate Drugs 0.000 claims description 15
- 229910021538 borax Inorganic materials 0.000 claims description 14
- 235000010339 sodium tetraborate Nutrition 0.000 claims description 14
- JOSWYUNQBRPBDN-UHFFFAOYSA-P ammonium dichromate Chemical group [NH4+].[NH4+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O JOSWYUNQBRPBDN-UHFFFAOYSA-P 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 4
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 2
- 229920000136 polysorbate Polymers 0.000 claims 1
- 239000007788 liquid Substances 0.000 abstract description 5
- 239000008199 coating composition Substances 0.000 description 11
- 239000004328 sodium tetraborate Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- 238000005530 etching Methods 0.000 description 7
- 230000005484 gravity Effects 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 6
- 229910052708 sodium Inorganic materials 0.000 description 6
- 239000011734 sodium Substances 0.000 description 6
- 230000000844 anti-bacterial effect Effects 0.000 description 5
- 239000003899 bactericide agent Substances 0.000 description 5
- 239000012141 concentrate Substances 0.000 description 4
- 239000008367 deionised water Substances 0.000 description 4
- 229910021641 deionized water Inorganic materials 0.000 description 4
- 239000004833 fish glue Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 239000005018 casein Substances 0.000 description 3
- BECPQYXYKAMYBN-UHFFFAOYSA-N casein, tech. Chemical compound NCCCCC(C(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(CC(C)C)N=C(O)C(CCC(O)=O)N=C(O)C(CC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(C(C)O)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=N)N=C(O)C(CCC(O)=O)N=C(O)C(CCC(O)=O)N=C(O)C(COP(O)(O)=O)N=C(O)C(CCC(O)=N)N=C(O)C(N)CC1=CC=CC=C1 BECPQYXYKAMYBN-UHFFFAOYSA-N 0.000 description 3
- 235000021240 caseins Nutrition 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 229910000570 Cupronickel Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 206010034972 Photosensitivity reaction Diseases 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 239000010960 cold rolled steel Substances 0.000 description 2
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000036211 photosensitivity Effects 0.000 description 2
- 230000035945 sensitivity Effects 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- GPRLSGONYQIRFK-MNYXATJNSA-N triton Chemical compound [3H+] GPRLSGONYQIRFK-MNYXATJNSA-N 0.000 description 2
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 241001076939 Artines Species 0.000 description 1
- KZBUYRJDOAKODT-UHFFFAOYSA-N Chlorine Chemical compound ClCl KZBUYRJDOAKODT-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910001374 Invar Inorganic materials 0.000 description 1
- KSQXVLVXUFHGJQ-UHFFFAOYSA-M Sodium ortho-phenylphenate Chemical compound [Na+].[O-]C1=CC=CC=C1C1=CC=CC=C1 KSQXVLVXUFHGJQ-UHFFFAOYSA-M 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 150000004691 decahydrates Chemical class 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- MCWXGJITAZMZEV-UHFFFAOYSA-N dimethoate Chemical compound CNC(=O)CSP(=S)(OC)OC MCWXGJITAZMZEV-UHFFFAOYSA-N 0.000 description 1
- 238000010981 drying operation Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 238000011010 flushing procedure Methods 0.000 description 1
- 229960000443 hydrochloric acid Drugs 0.000 description 1
- 235000011167 hydrochloric acid Nutrition 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- ing And Chemical Polishing (AREA)
- Materials For Photolithography (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US50551174A | 1974-09-12 | 1974-09-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1061161A true CA1061161A (fr) | 1979-08-28 |
Family
ID=24010605
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA234,436A Expired CA1061161A (fr) | 1974-09-12 | 1975-08-28 | Mode de fabrication d'un pochoir resistant au decapage |
Country Status (11)
| Country | Link |
|---|---|
| JP (1) | JPS5154766A (fr) |
| BE (1) | BE833387A (fr) |
| CA (1) | CA1061161A (fr) |
| DE (1) | DE2540562C2 (fr) |
| ES (1) | ES440747A1 (fr) |
| FR (1) | FR2284901A1 (fr) |
| GB (1) | GB1483307A (fr) |
| IT (1) | IT1042491B (fr) |
| NL (1) | NL7510713A (fr) |
| SU (1) | SU1175370A3 (fr) |
| ZA (1) | ZA755685B (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4061529A (en) * | 1977-02-28 | 1977-12-06 | Rca Corporation | Method for making etch-resistant stencil with dichromate-sensitized casein coating |
| DE3601632A1 (de) * | 1986-01-21 | 1987-07-23 | Leybold Heraeus Gmbh & Co Kg | Verfahren zum herstellen von extraktionsgittern fuer ionenquellen und durch das verfahren hergestellte extraktionsgitter |
| JP4949539B2 (ja) * | 2010-06-25 | 2012-06-13 | 新日本製鐵株式会社 | 一方向性電磁鋼板の製造方法 |
| MX2013002627A (es) * | 2010-09-10 | 2013-04-24 | Jfe Steel Corp | Lamina de acero magnetica de grano orientado y proceso para producir la misma. |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2387056A (en) * | 1943-04-12 | 1945-10-16 | Buck X Ograph Company | Surface plate coatings |
| US2677611A (en) * | 1950-11-10 | 1954-05-04 | Gregory & Falk | Composition for lithographic plate coatings |
| US2750524A (en) * | 1951-11-15 | 1956-06-12 | Mergenthaler Linotype Gmbh | Perforate mask for multicolor television apparatus and method of producting same |
-
1975
- 1975-08-28 CA CA234,436A patent/CA1061161A/fr not_active Expired
- 1975-09-05 ES ES440747A patent/ES440747A1/es not_active Expired
- 1975-09-05 ZA ZA00755685A patent/ZA755685B/xx unknown
- 1975-09-11 SU SU752174820A patent/SU1175370A3/ru active
- 1975-09-11 IT IT27166/75A patent/IT1042491B/it active
- 1975-09-11 DE DE2540562A patent/DE2540562C2/de not_active Expired
- 1975-09-11 FR FR7527848A patent/FR2284901A1/fr active Granted
- 1975-09-11 JP JP50110816A patent/JPS5154766A/ja active Granted
- 1975-09-11 NL NL7510713A patent/NL7510713A/xx not_active Application Discontinuation
- 1975-09-12 GB GB37658/75A patent/GB1483307A/en not_active Expired
- 1975-09-12 BE BE160021A patent/BE833387A/fr unknown
Also Published As
| Publication number | Publication date |
|---|---|
| FR2284901A1 (fr) | 1976-04-09 |
| JPS5154766A (en) | 1976-05-14 |
| JPS5429297B2 (fr) | 1979-09-21 |
| IT1042491B (it) | 1980-01-30 |
| DE2540562C2 (de) | 1986-05-15 |
| SU1175370A3 (ru) | 1985-08-23 |
| FR2284901B1 (fr) | 1981-09-25 |
| ZA755685B (en) | 1976-08-25 |
| GB1483307A (en) | 1977-08-17 |
| DE2540562A1 (de) | 1976-04-01 |
| ES440747A1 (es) | 1977-04-01 |
| AU8433575A (en) | 1977-03-24 |
| NL7510713A (nl) | 1976-03-16 |
| BE833387A (fr) | 1975-12-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4339528A (en) | Etching method using a hardened PVA stencil | |
| US4061529A (en) | Method for making etch-resistant stencil with dichromate-sensitized casein coating | |
| JPS58114031A (ja) | レリ−フ像の製造法 | |
| EP0520437A1 (fr) | Procédé pour imprimer une image sur un substrat convenant, notamment pour la fabrication de platines de circuit imprimés | |
| US3035990A (en) | Chemical blanking of aluminum sheet metal | |
| CA1061161A (fr) | Mode de fabrication d'un pochoir resistant au decapage | |
| CA1052673A (fr) | Methode de production d'une piece ajouree | |
| US3656951A (en) | Photoresist compositions | |
| US5567555A (en) | Method for manufacturing shadow mask and shadow mask manufactured by said method | |
| US4230781A (en) | Method for making etch-resistant stencil with dichromate-sensitized alkali-caseinate coating | |
| KR910000839B1 (ko) | 정작용 감광성 내식막 조성물 및 칼라 crt 구조안에서의 광-흡수 매트릭스 형성방법 | |
| US3529961A (en) | Formation of thin films of gold,nickel or copper by photolytic deposition | |
| EP0057268A3 (fr) | Méthode pour la fabrication de masques lithographiques opaques aux rayons X | |
| US3330682A (en) | Method of making a cathode ray tube | |
| JPS52119172A (en) | Forming method of fine pattern | |
| US4339529A (en) | Etching method using a PVA stencil containing N-methylol acrylamide | |
| US3520687A (en) | Etching of silicon dioxide by photosensitive solutions | |
| US4158566A (en) | Aqueous photoresist comprising casein and methylol acrylamide | |
| JPH04502521A (ja) | コバルト(3)化合物および酸化還元移行性配位子を含有するフォトレジスト組成物 | |
| JPS52139374A (en) | Alignment pattern forming method for mask alignment | |
| US2696435A (en) | Lithographic material and process | |
| EP0268553B1 (fr) | Mélanges photosensibles | |
| US4865953A (en) | Method for making a stencil with a borax-free, low-dichromate, casein photoresist composition | |
| US3701659A (en) | Photolithographic masks of semiconductor material | |
| US6103432A (en) | Method for forming black matrix |