CA1090485A - Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface - Google Patents

Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Info

Publication number: CA1090485A
Authority: CA; Canada
Prior art keywords: anode; target; sputtering apparatus; accordance; plasma
Prior art date: 1977-07-25
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA283,461A

Other languages

English (en)

Inventor

Ronald W. Moss

Edwin D. Mcclanahan, Jr.

Nils Laegreid

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Battelle Memorial Institute Inc

Original Assignee

Battelle Memorial Institute Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1977-07-25

Filing date

1977-07-25

Publication date

1980-11-25

1977-07-25 Application filed by Battelle Memorial Institute Inc filed Critical Battelle Memorial Institute Inc

1977-07-25 Priority to CA283,461A priority Critical patent/CA1090485A/fr

1980-11-25 Application granted granted Critical

1980-11-25 Publication of CA1090485A publication Critical patent/CA1090485A/fr

Status Expired legal-status Critical Current

Links

238000000151 deposition Methods 0.000 title abstract description 21
230000008021 deposition Effects 0.000 title abstract description 20
238000002294 plasma sputter deposition Methods 0.000 title abstract description 4
238000004544 sputter deposition Methods 0.000 claims abstract description 64
238000007493 shaping process Methods 0.000 claims abstract description 29
239000000758 substrate Substances 0.000 claims abstract description 29
239000000463 material Substances 0.000 claims abstract description 26
238000000576 coating method Methods 0.000 claims abstract description 11
239000011248 coating agent Substances 0.000 claims abstract description 10
230000005684 electric field Effects 0.000 claims abstract description 10
238000010438 heat treatment Methods 0.000 claims abstract description 6
150000002500 ions Chemical class 0.000 claims description 9
239000011810 insulating material Substances 0.000 claims description 5
239000004020 conductor Substances 0.000 claims description 4
239000003870 refractory metal Substances 0.000 claims description 2
230000001846 repelling effect Effects 0.000 claims description 2
239000013077 target material Substances 0.000 claims description 2
239000012212 insulator Substances 0.000 abstract description 13
229910052751 metal Inorganic materials 0.000 abstract description 13
239000002184 metal Substances 0.000 abstract description 13
239000011261 inert gas Substances 0.000 description 8
238000007667 floating Methods 0.000 description 5
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
230000008878 coupling Effects 0.000 description 4
238000010168 coupling process Methods 0.000 description 4
238000005859 coupling reaction Methods 0.000 description 4
239000007789 gas Substances 0.000 description 4
239000004065 semiconductor Substances 0.000 description 4
229910052743 krypton Inorganic materials 0.000 description 3
DNNSSWSSYDEUBZ-UHFFFAOYSA-N krypton atom Chemical compound [Kr] DNNSSWSSYDEUBZ-UHFFFAOYSA-N 0.000 description 3
238000005477 sputtering target Methods 0.000 description 3
229910052786 argon Inorganic materials 0.000 description 2
239000003990 capacitor Substances 0.000 description 2
UOACKFBJUYNSLK-XRKIENNPSA-N Estradiol Cypionate Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H](C4=CC=C(O)C=C4CC3)CC[C@@]21C)C(=O)CCC1CCCC1 UOACKFBJUYNSLK-XRKIENNPSA-N 0.000 description 1
229910052770 Uranium Inorganic materials 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
238000001816 cooling Methods 0.000 description 1
238000010292 electrical insulation Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
239000012530 fluid Substances 0.000 description 1
238000010849 ion bombardment Methods 0.000 description 1
229910001092 metal group alloy Inorganic materials 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
239000000203 mixture Substances 0.000 description 1
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
229920000136 polysorbate Polymers 0.000 description 1
230000003334 potential effect Effects 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
238000001552 radio frequency sputter deposition Methods 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
229910001928 zirconium oxide Inorganic materials 0.000 description 1

Landscapes

Physical Vapour Deposition (AREA)

CA283,461A 1977-07-25 1977-07-25 Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface Expired CA1090485A (fr)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
CA283,461A CA1090485A (fr)	1977-07-25	1977-07-25	Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CA283,461A CA1090485A (fr)	1977-07-25	1977-07-25	Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Publications (1)

Publication Number	Publication Date
CA1090485A true CA1090485A (fr)	1980-11-25

Family

ID=4109206

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA283,461A Expired CA1090485A (fr)	1977-07-25	1977-07-25	Appareil supporte pour la pulverisation de plasma a un taux de deposition eleve sur une grande surface

Country Status (1)

Country	Link
CA (1)	CA1090485A (fr)

1977
- 1977-07-25 CA CA283,461A patent/CA1090485A/fr not_active Expired

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Legal Events

Date	Code	Title	Description
1997-11-25	MKEX	Expiry