CA1134214A - Deposition method - Google Patents

Deposition method

Info

Publication number: CA1134214A
Authority: CA; Canada
Prior art keywords: coating; product; glass; zone; substrate
Prior art date: 1978-03-08
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA320,878A

Other languages

English (en)

French (fr)

Inventor

Roy G. Gordon

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Individual

Original Assignee

Individual

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-03-08

Filing date

1979-02-06

Publication date

1982-10-26

1978-03-08 Priority claimed from US05/884,432 external-priority patent/US4206252A/en

1979-02-06 Application filed by Individual filed Critical Individual

1982-10-26 Application granted granted Critical

1982-10-26 Publication of CA1134214A publication Critical patent/CA1134214A/en

Status Expired legal-status Critical Current

Links

238000000151 deposition Methods 0.000 title claims description 19
238000000576 coating method Methods 0.000 claims abstract description 138
239000011248 coating agent Substances 0.000 claims abstract description 125
239000011521 glass Substances 0.000 claims abstract description 118
238000000034 method Methods 0.000 claims abstract description 52
230000008569 process Effects 0.000 claims abstract description 47
239000000463 material Substances 0.000 claims abstract description 30
239000000203 mixture Substances 0.000 claims description 79
239000007789 gas Substances 0.000 claims description 78
239000000758 substrate Substances 0.000 claims description 67
239000000047 product Substances 0.000 claims description 65
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 59
229910001887 tin oxide Inorganic materials 0.000 claims description 40
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 36
238000006243 chemical reaction Methods 0.000 claims description 20
150000001875 compounds Chemical class 0.000 claims description 18
239000000377 silicon dioxide Substances 0.000 claims description 18
235000012239 silicon dioxide Nutrition 0.000 claims description 17
239000000376 reactant Substances 0.000 claims description 16
VXKWYPOMXBVZSJ-UHFFFAOYSA-N tetramethyltin Chemical compound C[Sn](C)(C)C VXKWYPOMXBVZSJ-UHFFFAOYSA-N 0.000 claims description 15
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 14
238000002310 reflectometry Methods 0.000 claims description 11
229910052710 silicon Inorganic materials 0.000 claims description 11
239000007795 chemical reaction product Substances 0.000 claims description 10
239000008199 coating composition Substances 0.000 claims description 10
PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims description 10
239000010703 silicon Substances 0.000 claims description 10
230000008859 change Effects 0.000 claims description 9
230000007935 neutral effect Effects 0.000 claims description 9
229910052581 Si3N4 Inorganic materials 0.000 claims description 7
230000002401 inhibitory effect Effects 0.000 claims description 7
229910052681 coesite Inorganic materials 0.000 claims description 6
229910052906 cristobalite Inorganic materials 0.000 claims description 6
229910052682 stishovite Inorganic materials 0.000 claims description 6
150000003606 tin compounds Chemical class 0.000 claims description 6
229910052905 tridymite Inorganic materials 0.000 claims description 6
UTUAUBOPWUPBCH-UHFFFAOYSA-N dimethylsilylidene(dimethyl)silane Chemical compound C[Si](C)=[Si](C)C UTUAUBOPWUPBCH-UHFFFAOYSA-N 0.000 claims description 5
230000001590 oxidative effect Effects 0.000 claims description 5
229920000548 poly(silane) polymer Polymers 0.000 claims description 4
230000009257 reactivity Effects 0.000 claims description 3
239000000306 component Substances 0.000 claims 18
JDTCYQUMKGXSMX-UHFFFAOYSA-N dimethyl(methylsilyl)silane Chemical compound C[SiH2][SiH](C)C JDTCYQUMKGXSMX-UHFFFAOYSA-N 0.000 claims 2
UPARUZSLIVQDTG-UHFFFAOYSA-N methyl(methylsilyl)silane Chemical compound C[SiH2][SiH2]C UPARUZSLIVQDTG-UHFFFAOYSA-N 0.000 claims 2
IQCYANORSDPPDT-UHFFFAOYSA-N methyl(silyl)silane Chemical compound C[SiH2][SiH3] IQCYANORSDPPDT-UHFFFAOYSA-N 0.000 claims 2
239000010408 film Substances 0.000 description 36
239000010410 layer Substances 0.000 description 29
239000003086 colorant Substances 0.000 description 15
239000004065 semiconductor Substances 0.000 description 12
230000008021 deposition Effects 0.000 description 11
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
UOACKFBJUYNSLK-XRKIENNPSA-N Estradiol Cypionate Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H](C4=CC=C(O)C=C4CC3)CC[C@@]21C)C(=O)CCC1CCCC1 UOACKFBJUYNSLK-XRKIENNPSA-N 0.000 description 7
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
239000000543 intermediate Substances 0.000 description 7
150000003377 silicon compounds Chemical class 0.000 description 7
BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 5
230000003647 oxidation Effects 0.000 description 5
238000007254 oxidation reaction Methods 0.000 description 5
229910000077 silane Inorganic materials 0.000 description 5
239000010409 thin film Substances 0.000 description 5
238000004364 calculation method Methods 0.000 description 4
235000019642 color hue Nutrition 0.000 description 4
230000006870 function Effects 0.000 description 4
-1 hydroxyl (OH~ Chemical class 0.000 description 4
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
239000011541 reaction mixture Substances 0.000 description 4
239000000126 substance Substances 0.000 description 4
230000007704 transition Effects 0.000 description 4
238000005286 illumination Methods 0.000 description 3
229910003437 indium oxide Inorganic materials 0.000 description 3
150000002500 ions Chemical class 0.000 description 3
238000004519 manufacturing process Methods 0.000 description 3
230000003287 optical effect Effects 0.000 description 3
230000003595 spectral effect Effects 0.000 description 3
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
229910000681 Silicon-tin Inorganic materials 0.000 description 2
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
230000005540 biological transmission Effects 0.000 description 2
230000015572 biosynthetic process Effects 0.000 description 2
RJCQBQGAPKAMLL-UHFFFAOYSA-N bromotrifluoromethane Chemical compound FC(F)(F)Br RJCQBQGAPKAMLL-UHFFFAOYSA-N 0.000 description 2
229910052793 cadmium Inorganic materials 0.000 description 2
230000004456 color vision Effects 0.000 description 2
238000000354 decomposition reaction Methods 0.000 description 2
230000007423 decrease Effects 0.000 description 2
JZZIHCLFHIXETF-UHFFFAOYSA-N dimethylsilicon Chemical compound C[Si]C JZZIHCLFHIXETF-UHFFFAOYSA-N 0.000 description 2
238000009826 distribution Methods 0.000 description 2
230000000694 effects Effects 0.000 description 2
230000005611 electricity Effects 0.000 description 2
239000005357 flat glass Substances 0.000 description 2
239000012530 fluid Substances 0.000 description 2
229910052731 fluorine Inorganic materials 0.000 description 2
239000011737 fluorine Substances 0.000 description 2
238000005755 formation reaction Methods 0.000 description 2
239000001257 hydrogen Substances 0.000 description 2
229910052739 hydrogen Inorganic materials 0.000 description 2
239000011229 interlayer Substances 0.000 description 2
239000007788 liquid Substances 0.000 description 2
239000001301 oxygen Substances 0.000 description 2
229910052760 oxygen Inorganic materials 0.000 description 2
238000012545 processing Methods 0.000 description 2
230000005855 radiation Effects 0.000 description 2
238000001228 spectrum Methods 0.000 description 2
229940071182 stannate Drugs 0.000 description 2
229910000851 Alloy steel Inorganic materials 0.000 description 1
239000004215 Carbon black (E152) Substances 0.000 description 1
LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 1
101100130497 Drosophila melanogaster Mical gene Proteins 0.000 description 1
OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
AYFVYJQAPQTCCC-GBXIJSLDSA-N L-threonine Chemical class C[C@@H](O)[C@H](N)C(O)=O AYFVYJQAPQTCCC-GBXIJSLDSA-N 0.000 description 1
101100345589 Mus musculus Mical1 gene Proteins 0.000 description 1
229910008045 Si-Si Inorganic materials 0.000 description 1
229910020387 SiO2 SnO2 Inorganic materials 0.000 description 1
229910020412 SiO2-SnO2 Inorganic materials 0.000 description 1
229910006411 Si—Si Inorganic materials 0.000 description 1
XMIJDTGORVPYLW-UHFFFAOYSA-N [SiH2] Chemical compound [SiH2] XMIJDTGORVPYLW-UHFFFAOYSA-N 0.000 description 1
238000005299 abrasion Methods 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
238000000149 argon plasma sintering Methods 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
238000007664 blowing Methods 0.000 description 1
238000011088 calibration curve Methods 0.000 description 1
238000005229 chemical vapour deposition Methods 0.000 description 1
230000002844 continuous effect Effects 0.000 description 1
125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
UCMVNBCLTOOHMN-UHFFFAOYSA-N dimethyl(silyl)silane Chemical compound C[SiH](C)[SiH3] UCMVNBCLTOOHMN-UHFFFAOYSA-N 0.000 description 1
UBHZUDXTHNMNLD-UHFFFAOYSA-N dimethylsilane Chemical compound C[SiH2]C UBHZUDXTHNMNLD-UHFFFAOYSA-N 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
238000009501 film coating Methods 0.000 description 1
239000005329 float glass Substances 0.000 description 1
NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 description 1
229930195733 hydrocarbon Natural products 0.000 description 1
125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
230000006872 improvement Effects 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
238000009413 insulation Methods 0.000 description 1
LQJIDIOGYJAQMF-UHFFFAOYSA-N lambda2-silanylidenetin Chemical compound [Si].[Sn] LQJIDIOGYJAQMF-UHFFFAOYSA-N 0.000 description 1
238000005259 measurement Methods 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
238000002156 mixing Methods 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
150000004767 nitrides Chemical class 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
230000010355 oscillation Effects 0.000 description 1
239000012071 phase Substances 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
238000011158 quantitative evaluation Methods 0.000 description 1
239000012495 reaction gas Substances 0.000 description 1
238000012552 review Methods 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
241000894007 species Species 0.000 description 1
238000000992 sputter etching Methods 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
230000001629 suppression Effects 0.000 description 1
CZDYPVPMEAXLPK-UHFFFAOYSA-N tetramethylsilane Chemical compound C[Si](C)(C)C CZDYPVPMEAXLPK-UHFFFAOYSA-N 0.000 description 1
230000008646 thermal stress Effects 0.000 description 1
238000002834 transmittance Methods 0.000 description 1
239000012780 transparent material Substances 0.000 description 1
VIPCDVWYAADTGR-UHFFFAOYSA-N trimethyl(methylsilyl)silane Chemical compound C[SiH2][Si](C)(C)C VIPCDVWYAADTGR-UHFFFAOYSA-N 0.000 description 1
238000011144 upstream manufacturing Methods 0.000 description 1
238000007738 vacuum evaporation Methods 0.000 description 1
239000012808 vapor phase Substances 0.000 description 1
230000000007 visual effect Effects 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
- C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/211—SnO2
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/229—Non-specific enumeration
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/30—Aspects of methods for coating glass not covered above
- C03C2218/36—Underside coating of a glass sheet

Landscapes

Chemical & Material Sciences (AREA)
Materials Engineering (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
General Chemical & Material Sciences (AREA)
Organic Chemistry (AREA)
Geochemistry & Mineralogy (AREA)
Life Sciences & Earth Sciences (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Inorganic Chemistry (AREA)
Surface Treatment Of Glass (AREA)
Chemical Vapour Deposition (AREA)
Laminated Bodies (AREA)

CA320,878A 1978-03-08 1979-02-06 Deposition method Expired CA1134214A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US884,432		1978-03-08
US05/884,432 US4206252A (en)	1977-04-04	1978-03-08	Deposition method for coating glass and the like

Publications (1)

Publication Number	Publication Date
CA1134214A true CA1134214A (en)	1982-10-26

Family

ID=25384616

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA320,878A Expired CA1134214A (en)	1978-03-08	1979-02-06	Deposition method

Country Status (19)

Country	Link
JP (2)	JPS54127424A (da)
AR (1)	AR216975A1 (da)
AU (1)	AU526605B2 (da)
BE (1)	BE874614A (da)
BR (1)	BR7901379A (da)
CA (1)	CA1134214A (da)
CH (1)	CH638762A5 (da)
DE (1)	DE2908412C2 (da)
DK (1)	DK94879A (da)
ES (2)	ES478393A1 (da)
FI (1)	FI790781A7 (da)
FR (1)	FR2419335A1 (da)
GB (1)	GB2015983B (da)
IE (1)	IE48228B1 (da)
IT (1)	IT1119685B (da)
MX (1)	MX151883A (da)
NL (1)	NL7901875A (da)
NO (1)	NO145947C (da)
SE (1)	SE445449B (da)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4291167A (en)	1980-07-28	1981-09-22	Nalco Chemical Company	Preparation of tetramethyldisilane from 1,2-tetramethyldichlorodisilane
JPS57100942A (en) *	1980-12-10	1982-06-23	Asahi Glass Co Ltd	Substrate coated with silicon oxide
US4386117A (en) *	1981-11-20	1983-05-31	Gordon Roy G	Coating process using alkoxy substituted silicon-bearing reactant
JPS58112375A (ja) *	1981-12-25	1983-07-04	Fuji Electric Corp Res & Dev Ltd	光起電力装置の製造方法
JPS58112374A (ja) *	1981-12-25	1983-07-04	Fuji Electric Corp Res & Dev Ltd	光起電力装置の製造方法
US4595634A (en) *	1983-08-01	1986-06-17	Gordon Roy G	Coating process for making non-iridescent glass
GB8624825D0 (en) *	1986-10-16	1986-11-19	Glaverbel	Vehicle windows
US5221352A (en) *	1989-06-19	1993-06-22	Glaverbel	Apparatus for pyrolytically forming an oxide coating on a hot glass substrate
US5122391A (en) *	1991-03-13	1992-06-16	Watkins-Johnson Company	Method for producing highly conductive and transparent films of tin and fluorine doped indium oxide by APCVD
CH690511A5 (de) *	1994-09-01	2000-09-29	Balzers Hochvakuum	Optisches Bauteil und Verfahren zum Herstellen eines solchen.
DE4433206A1 (de) *	1994-09-17	1996-03-21	Goldschmidt Ag Th	Verfahren zur pyrolytischen Beschichtung von Glas-, Glaskeramik- und Emailprodukten
FR2736632B1 (fr)	1995-07-12	1997-10-24	Saint Gobain Vitrage	Vitrage muni d'une couche conductrice et/ou bas-emissive
TW328971B (en) *	1995-10-30	1998-04-01	Dow Corning	Method for depositing Si-O containing coatings
US5698262A (en)	1996-05-06	1997-12-16	Libbey-Owens-Ford Co.	Method for forming tin oxide coating on glass
DE19624838A1 (de) *	1996-06-21	1998-01-08	Schueller Glasbeschichtung Gmb	Wärmedämmende Anti-Reflex-Beschichtung und Verfahren zu deren Herstellung
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1979
- 1979-02-06 CA CA320,878A patent/CA1134214A/en not_active Expired
- 1979-02-07 AU AU44014/79A patent/AU526605B2/en not_active Expired
- 1979-02-07 IE IE235/79A patent/IE48228B1/en unknown
- 1979-02-19 MX MX176653A patent/MX151883A/es unknown
- 1979-02-28 AR AR275647A patent/AR216975A1/es active
- 1979-03-02 FR FR7905492A patent/FR2419335A1/fr active Granted
- 1979-03-03 DE DE2908412A patent/DE2908412C2/de not_active Expired - Fee Related
- 1979-03-05 CH CH213079A patent/CH638762A5/fr not_active IP Right Cessation
- 1979-03-05 BE BE0/193835A patent/BE874614A/xx not_active IP Right Cessation
- 1979-03-07 BR BR7901379A patent/BR7901379A/pt unknown
- 1979-03-07 NO NO790762A patent/NO145947C/no unknown
- 1979-03-07 FI FI790781A patent/FI790781A7/fi not_active Application Discontinuation
- 1979-03-07 ES ES478393A patent/ES478393A1/es not_active Expired
- 1979-03-07 DK DK94879A patent/DK94879A/da not_active Application Discontinuation
- 1979-03-07 GB GB7908105A patent/GB2015983B/en not_active Expired
- 1979-03-07 IT IT67488/79A patent/IT1119685B/it active
- 1979-03-07 SE SE7902052A patent/SE445449B/sv not_active IP Right Cessation
- 1979-03-08 JP JP2723879A patent/JPS54127424A/ja active Granted
- 1979-03-08 NL NL7901875A patent/NL7901875A/xx not_active Application Discontinuation
- 1979-07-12 ES ES482440A patent/ES482440A1/es not_active Expired
1986
- 1986-12-09 JP JP61293328A patent/JPS62191448A/ja active Granted

Also Published As

Publication number	Publication date
FI790781A7 (fi)	1979-09-09
DE2908412C2 (de)	1994-01-27
NO790762L (no)	1979-09-11
GB2015983A (en)	1979-09-19
JPH0157061B2 (da)	1989-12-04
ES478393A1 (es)	1980-01-16
BE874614A (fr)	1979-09-05
ES482440A1 (es)	1980-02-16
JPS635343B2 (da)	1988-02-03
JPS54127424A (en)	1979-10-03
NO145947C (no)	1982-06-30
IE48228B1 (en)	1984-11-14
MX151883A (es)	1985-04-23
SE445449B (sv)	1986-06-23
BR7901379A (pt)	1979-10-02
DK94879A (da)	1979-09-09
FR2419335A1 (fr)	1979-10-05
IT1119685B (it)	1986-03-10
IT7967488A0 (it)	1979-03-07
JPS62191448A (ja)	1987-08-21
GB2015983B (en)	1983-02-02
FR2419335B1 (da)	1985-03-22
SE7902052L (sv)	1979-09-09
AU526605B2 (en)	1983-01-20
DE2908412A1 (de)	1979-09-20
AR216975A1 (es)	1980-02-15
CH638762A5 (fr)	1983-10-14
IE790235L (en)	1979-09-08
NO145947B (no)	1982-03-22
NL7901875A (nl)	1979-09-11
AU4401479A (en)	1979-09-20

Legal Events

Date	Code	Title	Description
1999-10-26	MKEX	Expiry

Publication	Publication Date	Title
US4206252A (en)	1980-06-03	Deposition method for coating glass and the like
US4440822A (en)	1984-04-03	Non-iridescent glass structures
US4419386A (en)	1983-12-06	Non-iridescent glass structures
US4377613A (en)	1983-03-22	Non-iridescent glass structures
IE48228B1 (en)	1984-11-14	Process for manufacturing coated transparent substrates
US4187336A (en)	1980-02-05	Non-iridescent glass structures
US4308316A (en)	1981-12-29	Non-iridescent glass structures
KR960010823B1 (ko)	1996-08-09	구배단(Step Gradient) 무진주 광택 코팅
US5776603A (en)	1998-07-07	Glazing pane equipped with at least one thin film and method of manufacturing the same
GB2031756A (en)	1980-04-30	Non-iridescent glass structures and processes for their production
RU2120919C1 (ru)	1998-10-27	Способ получения зеркал и зеркало
RU2342335C2 (ru)	2008-12-27	Подложка с теплорегулирующим покрытием для изоляционного стеклянного блока
RU2179537C2 (ru)	2002-02-20	Стеклопанель, содержащая прозрачную функциональную пленку, сопло для осаждения пленки из газовой фазы и способ формирования пленки с помощью этого сопла
EA025167B1 (ru)	2016-11-30	Тонкопленочное покрытие и способ его изготовления
JP2004526650A (ja)	2004-09-02	窓ペイン用の圧縮応力を加えることのできる低ｅ多層系
RU2447032C2 (ru)	2012-04-10	Стеклоизделие с покрытием из оксида цинка и способ его изготовления
Lane et al.	1992	Optical properties and structure of thermally evaporated tin oxide films
US4965093A (en)	1990-10-23	Chemical vapor deposition of bismuth oxide
US4294193A (en)	1981-10-13	Apparatus for vapor coating a moving glass substrate
CA1147139A (en)	1983-05-31	Deposition method
CA1264996A (en)	1990-01-30	Non-iridescent infrared-reflecting coated glass
JPS6339535B2 (da)	1988-08-05
Caccavale et al.	1997	Characterisation of SnOx films on architectural glass by neutron reflectometry, SIMS, CEMS and spectrophotometry
CA1132012A (en)	1982-09-21	Non-iridescent glass structures
IE47982B1 (en)	1984-08-22	Non-iridescent glass structures and processes for their production