CA1159875A - Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium - Google Patents

Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium

Info

Publication number: CA1159875A
Authority: CA; Canada
Prior art keywords: deflector; micro; assembly; bars; silicon
Prior art date: 1978-11-08
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA000413074A

Other languages

English (en)

Inventor

Sterling P. Newberry

John R. Burgess

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Control Data Corp

Original Assignee

Control Data Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1978-11-08

Filing date

1982-10-07

Publication date

1984-01-03

1978-11-08 Priority claimed from US05/958,657 external-priority patent/US4200794A/en

1982-10-07 Application filed by Control Data Corp filed Critical Control Data Corp

1982-10-07 Priority to CA000413074A priority Critical patent/CA1159875A/fr

1984-01-03 Application granted granted Critical

1984-01-03 Publication of CA1159875A publication Critical patent/CA1159875A/fr

Status Expired legal-status Critical Current

Links

XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 177
229910052710 silicon Inorganic materials 0.000 title claims abstract description 177
239000010703 silicon Substances 0.000 title claims abstract description 177
238000010894 electron beam technology Methods 0.000 title claims abstract description 92
239000011521 glass Substances 0.000 claims abstract description 137
230000033001 locomotion Effects 0.000 claims abstract description 10
229910052751 metal Inorganic materials 0.000 claims description 55
239000002184 metal Substances 0.000 claims description 55
238000000429 assembly Methods 0.000 claims description 26
239000011159 matrix material Substances 0.000 claims description 14
229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 13
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 12
229910052721 tungsten Inorganic materials 0.000 claims description 12
239000010937 tungsten Substances 0.000 claims description 12
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 11
229910052750 molybdenum Inorganic materials 0.000 claims description 11
239000011733 molybdenum Substances 0.000 claims description 11
229940020445 flector Drugs 0.000 claims description 5
239000004065 semiconductor Substances 0.000 abstract description 23
238000000034 method Methods 0.000 description 75
235000012431 wafers Nutrition 0.000 description 48
238000004519 manufacturing process Methods 0.000 description 44
229910052594 sapphire Inorganic materials 0.000 description 27
239000010980 sapphire Substances 0.000 description 27
239000004020 conductor Substances 0.000 description 24
239000000463 material Substances 0.000 description 24
238000005530 etching Methods 0.000 description 23
230000002093 peripheral effect Effects 0.000 description 23
238000010276 construction Methods 0.000 description 21
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 20
229910052796 boron Inorganic materials 0.000 description 20
239000010410 layer Substances 0.000 description 19
230000003287 optical effect Effects 0.000 description 17
239000000919 ceramic Substances 0.000 description 15
125000006850 spacer group Chemical group 0.000 description 14
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 12
238000012545 processing Methods 0.000 description 12
230000000875 corresponding effect Effects 0.000 description 10
238000010438 heat treatment Methods 0.000 description 10
230000015654 memory Effects 0.000 description 10
230000009471 action Effects 0.000 description 9
239000012212 insulator Substances 0.000 description 9
241000894007 species Species 0.000 description 9
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 8
230000008901 benefit Effects 0.000 description 8
230000008569 process Effects 0.000 description 8
238000003466 welding Methods 0.000 description 8
238000003491 array Methods 0.000 description 7
230000000712 assembly Effects 0.000 description 7
230000004927 fusion Effects 0.000 description 7
238000001465 metallisation Methods 0.000 description 7
230000002829 reductive effect Effects 0.000 description 7
239000011248 coating agent Substances 0.000 description 6
238000000576 coating method Methods 0.000 description 6
230000006835 compression Effects 0.000 description 6
238000007906 compression Methods 0.000 description 6
230000005684 electric field Effects 0.000 description 6
230000005284 excitation Effects 0.000 description 6
229910052697 platinum Inorganic materials 0.000 description 6
229910052814 silicon oxide Inorganic materials 0.000 description 6
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 5
239000003990 capacitor Substances 0.000 description 5
229910052804 chromium Inorganic materials 0.000 description 5
239000011651 chromium Substances 0.000 description 5
239000013078 crystal Substances 0.000 description 5
238000013461 design Methods 0.000 description 5
239000007789 gas Substances 0.000 description 5
239000000543 intermediate Substances 0.000 description 5
229920002120 photoresistant polymer Polymers 0.000 description 5
230000004075 alteration Effects 0.000 description 4
230000015572 biosynthetic process Effects 0.000 description 4
238000005219 brazing Methods 0.000 description 4
YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 4
238000001816 cooling Methods 0.000 description 4
238000009792 diffusion process Methods 0.000 description 4
238000006073 displacement reaction Methods 0.000 description 4
239000000839 emulsion Substances 0.000 description 4
229910001385 heavy metal Inorganic materials 0.000 description 4
238000007733 ion plating Methods 0.000 description 4
150000002500 ions Chemical class 0.000 description 4
230000000873 masking effect Effects 0.000 description 4
150000002739 metals Chemical class 0.000 description 4
229910021421 monocrystalline silicon Inorganic materials 0.000 description 4
238000000926 separation method Methods 0.000 description 4
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
238000013459 approach Methods 0.000 description 3
230000008859 change Effects 0.000 description 3
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
229910052737 gold Inorganic materials 0.000 description 3
239000010931 gold Substances 0.000 description 3
238000005304 joining Methods 0.000 description 3
238000011068 loading method Methods 0.000 description 3
238000002844 melting Methods 0.000 description 3
230000008018 melting Effects 0.000 description 3
229910001120 nichrome Inorganic materials 0.000 description 3
TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
230000036961 partial effect Effects 0.000 description 3
238000001259 photo etching Methods 0.000 description 3
239000007787 solid Substances 0.000 description 3
239000007858 starting material Substances 0.000 description 3
239000002344 surface layer Substances 0.000 description 3
PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
229910045601 alloy Inorganic materials 0.000 description 2
239000000956 alloy Substances 0.000 description 2
239000012298 atmosphere Substances 0.000 description 2
230000015556 catabolic process Effects 0.000 description 2
238000012937 correction Methods 0.000 description 2
229910021419 crystalline silicon Inorganic materials 0.000 description 2
230000001419 dependent effect Effects 0.000 description 2
238000000151 deposition Methods 0.000 description 2
230000008021 deposition Effects 0.000 description 2
239000002019 doping agent Substances 0.000 description 2
230000000694 effects Effects 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
238000003780 insertion Methods 0.000 description 2
230000037431 insertion Effects 0.000 description 2
230000000670 limiting effect Effects 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
230000000737 periodic effect Effects 0.000 description 2
238000000206 photolithography Methods 0.000 description 2
238000004080 punching Methods 0.000 description 2
230000009467 reduction Effects 0.000 description 2
238000003860 storage Methods 0.000 description 2
229920006384 Airco Polymers 0.000 description 1
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
239000005977 Ethylene Substances 0.000 description 1
241001071864 Lethrinus laticaudis Species 0.000 description 1
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
230000002411 adverse Effects 0.000 description 1
230000006399 behavior Effects 0.000 description 1
238000005513 bias potential Methods 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
238000004140 cleaning Methods 0.000 description 1
230000003749 cleanliness Effects 0.000 description 1
239000002131 composite material Substances 0.000 description 1
238000011960 computer-aided design Methods 0.000 description 1
239000004035 construction material Substances 0.000 description 1
238000005336 cracking Methods 0.000 description 1
230000001186 cumulative effect Effects 0.000 description 1
230000001351 cycling effect Effects 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
238000011161 development Methods 0.000 description 1
238000011982 device technology Methods 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
239000010432 diamond Substances 0.000 description 1
238000005553 drilling Methods 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
238000010304 firing Methods 0.000 description 1
230000004907 flux Effects 0.000 description 1
230000006870 function Effects 0.000 description 1
229910021397 glassy carbon Inorganic materials 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
150000002367 halogens Chemical class 0.000 description 1
238000003384 imaging method Methods 0.000 description 1
238000002513 implantation Methods 0.000 description 1
229910001026 inconel Inorganic materials 0.000 description 1
238000007641 inkjet printing Methods 0.000 description 1
239000011810 insulating material Substances 0.000 description 1
230000003993 interaction Effects 0.000 description 1
238000011835 investigation Methods 0.000 description 1
238000005468 ion implantation Methods 0.000 description 1
239000007769 metal material Substances 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
238000002156 mixing Methods 0.000 description 1
239000012299 nitrogen atmosphere Substances 0.000 description 1
VIKNJXKGJWUCNN-XGXHKTLJSA-N norethisterone Chemical compound O=C1CC[C@@H]2[C@H]3CC[C@](C)([C@](CC4)(O)C#C)[C@@H]4[C@@H]3CCC2=C1 VIKNJXKGJWUCNN-XGXHKTLJSA-N 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
239000011224 oxide ceramic Substances 0.000 description 1
229910052574 oxide ceramic Inorganic materials 0.000 description 1
238000007747 plating Methods 0.000 description 1
230000003334 potential effect Effects 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
238000003825 pressing Methods 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
238000004064 recycling Methods 0.000 description 1
238000011160 research Methods 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
235000012239 silicon dioxide Nutrition 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
239000010959 steel Substances 0.000 description 1
239000000758 substrate Substances 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1

Landscapes

Electron Beam Exposure (AREA)

CA000413074A 1978-11-08 1982-10-07 Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium Expired CA1159875A (fr)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
CA000413074A CA1159875A (fr)	1978-11-08	1982-10-07	Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
US958,657		1978-11-08
US05/958,657 US4200794A (en)	1978-11-08	1978-11-08	Micro lens array and micro deflector assembly for fly's eye electron beam tubes using silicon components and techniques of fabrication and assembly
CA000337887A CA1147010A (fr)	1978-11-08	1979-10-18	Ensembles de micro-lentilles et de micro-deflecteurs pour tube a faisceau electronique du type oeil de mouche utilisant des composants de silicium
CA000413074A CA1159875A (fr)	1978-11-08	1982-10-07	Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium

Publications (1)

Publication Number	Publication Date
CA1159875A true CA1159875A (fr)	1984-01-03

Family

ID=27166445

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000413074A Expired CA1159875A (fr)	1978-11-08	1982-10-07	Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium

Country Status (1)

Country	Link
CA (1)	CA1159875A (fr)

1982
- 1982-10-07 CA CA000413074A patent/CA1159875A/fr not_active Expired

Legal Events

Date	Code	Title	Description
2001-01-03	MKEX	Expiry

Publication	Publication Date	Title
CA1147010A (fr)	1983-05-24	Ensembles de micro-lentilles et de micro-deflecteurs pour tube a faisceau electronique du type oeil de mouche utilisant des composants de silicium
KR100628014B1 (ko)	2006-09-26	플라즈마 반응기용 가스 분배판 전극
JP2653008B2 (ja)	1997-09-10	冷陰極素子およびその製造方法
EP0068600B1 (fr)	1986-06-11	Procédé pour former un assemblage aligné d'une pluralité d'éléments planaires et assemblage aligné ainsi réalisé
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TWI755544B (zh)	2022-02-21	多行掃描式電子顯微鏡系統
CA1157511A (fr)	1983-11-22	Microlentilles et microdeflecteurs pour tubes cathodiques du type "oeil de mouche" utilisant des composants au silicium
US5444256A (en)	1995-08-22	Electrostatic lens and method for producing the same
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US5731228A (en)	1998-03-24	Method for making micro electron beam source
CA1159875A (fr)	1984-01-03	Groupe micro-lentille et micro-deflecteur pour tubes cathodiques du type oeil de mouche a composants de silicium
EP0772218B1 (fr)	2003-03-19	Tube à micro-ondes à faisceau rectiligne avec une cathode froide plane comme source de faisceau électronique
US6586746B1 (en)	2003-07-01	Multipole electrostatic e-beam deflector
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WO2000024030A2 (fr)	2000-04-27	Reglage ameliore de l'emission d'un champ thermique
US5003216A (en)	1991-03-26	Electron amplifier and method of manufacture therefor
US5923956A (en)	1999-07-13	Method of securing a semiconductor chip on a base plate and structure thereof
WO2002070401A2 (fr)	2002-09-12	Procede de fabrication de deflecteurs octupoles de silicium et colonne d'electrons utilisant lesdits deflecteurs
WO1992015111A1 (fr)	1992-09-03	Amplificateur d'electrons et son procede de fabrication
JPH05275192A (ja)	1993-10-22	マイクロ・プラズマジェット形成装置およびその製造方法
AU7341491A (en)	1992-09-15	Electron amplifier and method of manufacture therefor
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