CA1165851A - Dispositifs epitaxiaux a nombre de dislocations reduit - Google Patents

Dispositifs epitaxiaux a nombre de dislocations reduit

Info

Publication number
CA1165851A
CA1165851A CA000378574A CA378574A CA1165851A CA 1165851 A CA1165851 A CA 1165851A CA 000378574 A CA000378574 A CA 000378574A CA 378574 A CA378574 A CA 378574A CA 1165851 A CA1165851 A CA 1165851A
Authority
CA
Canada
Prior art keywords
layer
substrate
epitaxial
buffer layer
equal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000378574A
Other languages
English (en)
Inventor
Subhash Mahajan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA1165851A publication Critical patent/CA1165851A/fr
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/854Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs further characterised by the dopants
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • H10H20/011Manufacture or treatment of bodies, e.g. forming semiconductor layers
    • H10H20/013Manufacture or treatment of bodies, e.g. forming semiconductor layers having light-emitting regions comprising only Group III-V materials

Landscapes

  • Semiconductor Lasers (AREA)
  • Recrystallisation Techniques (AREA)
  • Led Devices (AREA)
  • Light Receiving Elements (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
CA000378574A 1980-06-16 1981-05-28 Dispositifs epitaxiaux a nombre de dislocations reduit Expired CA1165851A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US16002880A 1980-06-16 1980-06-16
US160,028 1980-06-16

Publications (1)

Publication Number Publication Date
CA1165851A true CA1165851A (fr) 1984-04-17

Family

ID=22575182

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000378574A Expired CA1165851A (fr) 1980-06-16 1981-05-28 Dispositifs epitaxiaux a nombre de dislocations reduit

Country Status (7)

Country Link
JP (1) JPS5727025A (fr)
CA (1) CA1165851A (fr)
DE (1) DE3123228A1 (fr)
FR (1) FR2484706B1 (fr)
GB (1) GB2080619B (fr)
IT (1) IT1138389B (fr)
NL (1) NL8102870A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5863183A (ja) * 1981-10-09 1983-04-14 Semiconductor Res Found 2−6族間化合物の結晶成長法
US4596626A (en) * 1983-02-10 1986-06-24 The United States Of America As Represented By The United States National Aeronautics And Space Administration Method of making macrocrystalline or single crystal semiconductor material
FR2555811B1 (fr) * 1983-11-30 1986-09-05 Radiotechnique Compelec Procede de realisation de diodes electroluminescentes a faible largeur spectrale, et diodes obtenues par ce procede
DE3421215A1 (de) * 1984-06-07 1985-12-12 Aeg-Telefunken Ag, 1000 Berlin Und 6000 Frankfurt Verfahren zur erzeugung von ingaasp und ingaas - doppelheterostrukturlasern und -led's mittels fluessigphasenepitaxie fuer einen wellenlaengenbereich von (lambda) = 1,2 (my)m bis 1,7 (my)m

Also Published As

Publication number Publication date
IT8122301A0 (it) 1981-06-12
IT1138389B (it) 1986-09-17
GB2080619B (en) 1984-09-12
GB2080619A (en) 1982-02-03
FR2484706B1 (fr) 1985-12-06
NL8102870A (nl) 1982-01-18
DE3123228A1 (de) 1982-03-25
JPS5727025A (en) 1982-02-13
FR2484706A1 (fr) 1981-12-18

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Legal Events

Date Code Title Description
MKEX Expiry
MKEX Expiry

Effective date: 20010417