CA1176090A - Systeme de focalisation optique - Google Patents

Systeme de focalisation optique

Info

Publication number
CA1176090A
CA1176090A CA000420991A CA420991A CA1176090A CA 1176090 A CA1176090 A CA 1176090A CA 000420991 A CA000420991 A CA 000420991A CA 420991 A CA420991 A CA 420991A CA 1176090 A CA1176090 A CA 1176090A
Authority
CA
Canada
Prior art keywords
coupled
wafer
drive means
kinematic
focus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000420991A
Other languages
English (en)
Inventor
Edward H. Phillips
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Optimetrix Corp
Original Assignee
Optimetrix Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CA000348698A external-priority patent/CA1148392A/fr
Application filed by Optimetrix Corp filed Critical Optimetrix Corp
Priority to CA000420991A priority Critical patent/CA1176090A/fr
Application granted granted Critical
Publication of CA1176090A publication Critical patent/CA1176090A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CA000420991A 1979-04-02 1983-02-04 Systeme de focalisation optique Expired CA1176090A (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA000420991A CA1176090A (fr) 1979-04-02 1983-02-04 Systeme de focalisation optique

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US2591779A 1979-04-02 1979-04-02
US025,917 1979-04-02
CA000348698A CA1148392A (fr) 1979-04-02 1980-03-28 Systeme de mise en foyer optique
CA000420991A CA1176090A (fr) 1979-04-02 1983-02-04 Systeme de focalisation optique

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CA000348698A Division CA1148392A (fr) 1979-04-02 1980-03-28 Systeme de mise en foyer optique

Publications (1)

Publication Number Publication Date
CA1176090A true CA1176090A (fr) 1984-10-16

Family

ID=27166632

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000420991A Expired CA1176090A (fr) 1979-04-02 1983-02-04 Systeme de focalisation optique

Country Status (1)

Country Link
CA (1) CA1176090A (fr)

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Legal Events

Date Code Title Description
MKEX Expiry