CA1179581A - Compose decapant et methode d'enlevement des masques - Google Patents

Compose decapant et methode d'enlevement des masques

Info

Publication number: CA1179581A
Authority: CA; Canada
Prior art keywords: stripping; composition; stripping composition; substrate; stripped
Prior art date: 1981-09-23
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA000410275A

Other languages

English (en)

Inventor

Irl E. Ward, Jr.

Lisa G. Hallquist

Thomas J. Hurley

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Avantor Performance Materials LLC

Original Assignee

JT Baker Chemical Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-09-23

Filing date

1982-08-27

Publication date

1984-12-18

1982-08-27 Application filed by JT Baker Chemical Co filed Critical JT Baker Chemical Co

1984-12-18 Application granted granted Critical

1984-12-18 Publication of CA1179581A publication Critical patent/CA1179581A/fr

Status Expired legal-status Critical Current

Links

239000000203 mixture Substances 0.000 title claims abstract description 98
238000000034 method Methods 0.000 title claims abstract description 16
239000000758 substrate Substances 0.000 claims abstract description 25
239000002202 Polyethylene glycol Substances 0.000 claims abstract description 23
229920001223 polyethylene glycol Polymers 0.000 claims abstract description 22
-1 2-pyrrolidinone compound Chemical class 0.000 claims abstract description 14
MTHSVFCYNBDYFN-UHFFFAOYSA-N anhydrous diethylene glycol Natural products OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 claims abstract description 10
229920002120 photoresistant polymer Polymers 0.000 claims description 48
SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 claims description 10
LFQSCWFLJHTTHZ-UHFFFAOYSA-N EtOH Substances CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 7
125000004432 carbon atom Chemical group C* 0.000 claims description 6
XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 claims description 6
125000000217 alkyl group Chemical group 0.000 claims description 4
229910052739 hydrogen Inorganic materials 0.000 claims description 2
239000001257 hydrogen Substances 0.000 claims description 2
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
125000002768 hydroxyalkyl group Chemical group 0.000 claims description 2
239000000463 material Substances 0.000 abstract description 19
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 10
239000003795 chemical substances by application Substances 0.000 description 7
239000000306 component Substances 0.000 description 6
HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 5
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
235000012431 wafers Nutrition 0.000 description 4
ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 3
LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
229910052751 metal Inorganic materials 0.000 description 3
239000002184 metal Substances 0.000 description 3
239000000126 substance Substances 0.000 description 3
OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 2
230000002411 adverse Effects 0.000 description 2
ROOXNKNUYICQNP-UHFFFAOYSA-N ammonium persulfate Chemical compound [NH4+].[NH4+].[O-]S(=O)(=O)OOS([O-])(=O)=O ROOXNKNUYICQNP-UHFFFAOYSA-N 0.000 description 2
JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
239000008367 deionised water Substances 0.000 description 2
229910021641 deionized water Inorganic materials 0.000 description 2
230000002939 deleterious effect Effects 0.000 description 2
230000001627 detrimental effect Effects 0.000 description 2
WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 2
230000008569 process Effects 0.000 description 2
229940032330 sulfuric acid Drugs 0.000 description 2
231100000419 toxicity Toxicity 0.000 description 2
230000001988 toxicity Effects 0.000 description 2
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
RSBHKNDSJJBCMN-UHFFFAOYSA-N 1-(1-hydroxyethyl)pyrrolidin-2-one Chemical compound CC(O)N1CCCC1=O RSBHKNDSJJBCMN-UHFFFAOYSA-N 0.000 description 1
RUECCIUIKFVPPR-UHFFFAOYSA-N 1-(1-hydroxypropyl)pyrrolidin-2-one Chemical compound CCC(O)N1CCCC1=O RUECCIUIKFVPPR-UHFFFAOYSA-N 0.000 description 1
PJEXUIKBGBSHBS-UHFFFAOYSA-N 1-(hydroxymethyl)pyrrolidin-2-one Chemical compound OCN1CCCC1=O PJEXUIKBGBSHBS-UHFFFAOYSA-N 0.000 description 1
ZFPGARUNNKGOBB-UHFFFAOYSA-N 1-Ethyl-2-pyrrolidinone Chemical compound CCN1CCCC1=O ZFPGARUNNKGOBB-UHFFFAOYSA-N 0.000 description 1
DCALJVULAGICIX-UHFFFAOYSA-N 1-propylpyrrolidin-2-one Chemical compound CCCN1CCCC1=O DCALJVULAGICIX-UHFFFAOYSA-N 0.000 description 1
SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 1
POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 description 1
NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
CYTYCFOTNPOANT-UHFFFAOYSA-N Perchloroethylene Chemical group ClC(Cl)=C(Cl)Cl CYTYCFOTNPOANT-UHFFFAOYSA-N 0.000 description 1
239000004698 Polyethylene Substances 0.000 description 1
GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
235000010724 Wisteria floribunda Nutrition 0.000 description 1
150000001242 acetic acid derivatives Chemical class 0.000 description 1
229920006243 acrylic copolymer Polymers 0.000 description 1
238000013019 agitation Methods 0.000 description 1
150000001408 amides Chemical class 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
229910001870 ammonium persulfate Inorganic materials 0.000 description 1
230000003466 anti-cipated effect Effects 0.000 description 1
239000011230 binding agent Substances 0.000 description 1
239000003518 caustics Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
BPAMVBCECDGPHD-UHFFFAOYSA-N ethanol;pyrrolidin-2-one Chemical compound CCO.O=C1CCCN1 BPAMVBCECDGPHD-UHFFFAOYSA-N 0.000 description 1
150000008282 halocarbons Chemical class 0.000 description 1
238000007654 immersion Methods 0.000 description 1
230000003455 independent Effects 0.000 description 1
238000007689 inspection Methods 0.000 description 1
229960004592 isopropanol Drugs 0.000 description 1
150000002576 ketones Chemical class 0.000 description 1
239000007788 liquid Substances 0.000 description 1
238000001465 metallisation Methods 0.000 description 1
229910017604 nitric acid Inorganic materials 0.000 description 1
231100000252 nontoxic Toxicity 0.000 description 1
230000003000 nontoxic effect Effects 0.000 description 1
229920003986 novolac Polymers 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
239000003973 paint Substances 0.000 description 1
150000004968 peroxymonosulfuric acids Chemical class 0.000 description 1
FHHJDRFHHWUPDG-UHFFFAOYSA-N peroxysulfuric acid Chemical compound OOS(O)(=O)=O FHHJDRFHHWUPDG-UHFFFAOYSA-N 0.000 description 1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
150000002989 phenols Chemical class 0.000 description 1
229920002401 polyacrylamide Polymers 0.000 description 1
229920000573 polyethylene Polymers 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
230000005855 radiation Effects 0.000 description 1
229920005989 resin Polymers 0.000 description 1
239000011347 resin Substances 0.000 description 1
229920003987 resole Polymers 0.000 description 1
239000010865 sewage Substances 0.000 description 1
NESLWCLHZZISNB-UHFFFAOYSA-M sodium phenolate Chemical compound [Na+].[O-]C1=CC=CC=C1 NESLWCLHZZISNB-UHFFFAOYSA-M 0.000 description 1
238000005507 spraying Methods 0.000 description 1
229950011008 tetrachloroethylene Drugs 0.000 description 1
239000002966 varnish Substances 0.000 description 1

Landscapes

Photosensitive Polymer And Photoresist Processing (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

CA000410275A 1981-09-23 1982-08-27 Compose decapant et methode d'enlevement des masques Expired CA1179581A (fr)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date
US30478981A	1981-09-23	1981-09-23
US304,789		1981-09-23
US40885282A	1982-08-17	1982-08-17
US408,852		1989-09-18

Publications (1)

Publication Number	Publication Date
CA1179581A true CA1179581A (fr)	1984-12-18

Family

ID=26974227

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000410275A Expired CA1179581A (fr)	1981-09-23	1982-08-27	Compose decapant et methode d'enlevement des masques

Country Status (1)

Country	Link
CA (1)	CA1179581A (fr)

1982
- 1982-08-27 CA CA000410275A patent/CA1179581A/fr not_active Expired

Legal Events

Date	Code	Title	Description
2001-12-19	MKEC	Expiry (correction)
2002-08-27	MKEX	Expiry
2023-05-26	MKEX	Expiry	Effective date: 20020827

Publication	Publication Date	Title
CA1177373A (fr)	1984-11-06	Compositions de decapage et methodes pour decaper des couches protectrices
US4428871A (en)	1984-01-31	Stripping compositions and methods of stripping resists
CA1194765A (fr)	1985-10-08	Composes de decapage et methodes pour enlever les resists
CA1194764A (fr)	1985-10-08	Composes de decapage et methodes pour enlever les resists
EP0103808B1 (fr)	1987-01-28	Composition et procédé d'élimination de couches photorésistantes
EP0267540B1 (fr)	1993-04-14	Compositions pour le dépouillement et leur utilisation pour dépouiller les couches de réserves sur substrat
JPS6026945A (ja)	1985-02-09	ストリツピング組成物及びレジストをストリツピングする方法
CA1179581A (fr)	1984-12-18	Compose decapant et methode d'enlevement des masques
EP0258417A1 (fr)	1988-03-09	Composition de depouillement de photoreserves et procede d'utilisation
JPS6026340A (ja)	1985-02-09	ストリツピング組成物及びレジストをストリツピングする方法