CA1237020A - Buse en silicone, et sa fabrication - Google Patents

Buse en silicone, et sa fabrication

Info

Publication number: CA1237020A
Authority: CA; Canada
Prior art keywords: nozzle; silicon; exit; entrance; layer
Prior art date: 1984-10-13
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA000477672A

Other languages

English (en)

Inventor

Herbert A. Waggener

Joseph C. Zuercher

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

NCR Voyix Corp

Original Assignee

AT&T Teletype Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1984-10-13

Filing date

1985-03-27

Publication date

1988-05-24

Family has litigation

First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24651804&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=CA1237020(A) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.

1985-03-27 Application filed by AT&T Teletype Corp filed Critical AT&T Teletype Corp

1988-05-24 Application granted granted Critical

1988-05-24 Publication of CA1237020A publication Critical patent/CA1237020A/fr

Status Expired legal-status Critical Current

Links

238000000034 method Methods 0.000 title claims description 31
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 29
229910052710 silicon Inorganic materials 0.000 title claims description 29
239000010703 silicon Substances 0.000 title claims description 29
238000004519 manufacturing process Methods 0.000 title description 3
239000012528 membrane Substances 0.000 claims abstract description 16
229910021421 monocrystalline silicon Inorganic materials 0.000 claims abstract description 10
238000005530 etching Methods 0.000 claims description 33
239000010410 layer Substances 0.000 claims description 32
239000000463 material Substances 0.000 claims description 10
239000004065 semiconductor Substances 0.000 claims description 6
230000004888 barrier function Effects 0.000 claims description 5
229910052581 Si3N4 Inorganic materials 0.000 claims description 3
150000004767 nitrides Chemical class 0.000 claims description 3
229920002120 photoresistant polymer Polymers 0.000 claims description 3
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 3
239000002344 surface layer Substances 0.000 claims description 3
239000011248 coating agent Substances 0.000 claims 7
238000000576 coating method Methods 0.000 claims 7
239000004020 conductor Substances 0.000 claims 1
238000000151 deposition Methods 0.000 claims 1
239000011253 protective coating Substances 0.000 claims 1
239000011241 protective layer Substances 0.000 claims 1
239000012530 fluid Substances 0.000 description 4
239000003518 caustics Substances 0.000 description 3
230000001681 protective effect Effects 0.000 description 3
238000009792 diffusion process Methods 0.000 description 2
238000005498 polishing Methods 0.000 description 2
239000004809 Teflon Substances 0.000 description 1
229920006362 Teflon® Polymers 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
239000013078 crystal Substances 0.000 description 1
238000002050 diffraction method Methods 0.000 description 1
238000009826 distribution Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
PHTXVQQRWJXYPP-UHFFFAOYSA-N ethyltrifluoromethylaminoindane Chemical compound C1=C(C(F)(F)F)C=C2CC(NCC)CC2=C1 PHTXVQQRWJXYPP-UHFFFAOYSA-N 0.000 description 1
BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
238000007641 inkjet printing Methods 0.000 description 1
238000004518 low pressure chemical vapour deposition Methods 0.000 description 1
229910000000 metal hydroxide Inorganic materials 0.000 description 1
150000004692 metal hydroxides Chemical class 0.000 description 1
239000000203 mixture Substances 0.000 description 1
230000003647 oxidation Effects 0.000 description 1
238000007254 oxidation reaction Methods 0.000 description 1
238000007639 printing Methods 0.000 description 1
239000002210 silicon-based material Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000000758 substrate Substances 0.000 description 1
238000007740 vapor deposition Methods 0.000 description 1
238000009736 wetting Methods 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/162—Manufacturing of the nozzle plates
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/164—Manufacturing processes thin film formation
- B41J2/1642—Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]

Landscapes

Engineering & Computer Science (AREA)
Manufacturing & Machinery (AREA)
Particle Formation And Scattering Control In Inkjet Printers (AREA)
Weting (AREA)
Nozzles (AREA)
Special Spraying Apparatus (AREA)

CA000477672A 1984-10-13 1985-03-27 Buse en silicone, et sa fabrication Expired CA1237020A (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US661,005		1984-10-13
US66100584A	1984-10-15	1984-10-15

Publications (1)

Publication Number	Publication Date
CA1237020A true CA1237020A (fr)	1988-05-24

Family

ID=24651804

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000477672A Expired CA1237020A (fr)	1984-10-13	1985-03-27	Buse en silicone, et sa fabrication

Country Status (7)

Country	Link
EP (1)	EP0178596B2 (fr)
JP (1)	JPS6198558A (fr)
KR (1)	KR930009109B1 (fr)
AU (1)	AU582581B2 (fr)
CA (1)	CA1237020A (fr)
DE (1)	DE3581355D1 (fr)
ES (2)	ES8707144A1 (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4791436A (en) *	1987-11-17	1988-12-13	Hewlett-Packard Company	Nozzle plate geometry for ink jet pens and method of manufacture
DE4222140C2 (de) *	1992-07-06	1994-06-16	Heinzl Joachim	Aerostatisches Miniaturlager
US6120131A (en) *	1995-08-28	2000-09-19	Lexmark International, Inc.	Method of forming an inkjet printhead nozzle structure
US6183064B1 (en)	1995-08-28	2001-02-06	Lexmark International, Inc.	Method for singulating and attaching nozzle plates to printheads
WO1998051506A1 (fr) *	1997-05-14	1998-11-19	Seiko Epson Corporation	Procede de formation d'ajutage pour injecteurs et procede de fabrication d'une tete a jet d'encre
JP2000198199A (ja)	1997-12-05	2000-07-18	Canon Inc	液体吐出ヘッドおよびヘッドカートリッジおよび液体吐出装置および液体吐出ヘッドの製造方法
US6491380B2 (en) *	1997-12-05	2002-12-10	Canon Kabushiki Kaisha	Liquid discharging head with common ink chamber positioned over a movable member
EP0921004A3 (fr) *	1997-12-05	2000-04-26	Canon Kabushiki Kaisha	Tête d'éjection de liquide, appareil d'enregistrement et methode de fabrication de têtes d'éjection de liquide
US6463656B1 (en) *	2000-06-29	2002-10-15	Eastman Kodak Company	Laminate and gasket manfold for ink jet delivery systems and similar devices
KR100944884B1 (ko) *	2007-11-01	2010-03-03	주식회사 알파켐	비충격 프린팅을 위한 노즐 및 이를 사용한 인쇄방법
JP5407162B2 (ja) *	2008-04-01	2014-02-05	コニカミノルタ株式会社	インクジェットヘッド、インクジェットヘッドを備えた塗布装置及びインクジェットヘッドの駆動方法
KR101291689B1 (ko) *	2010-08-17	2013-08-01	엔젯 주식회사	정전기력을 이용하는 액적분사장치용 노즐

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
USB789264I5 (fr) *	1969-01-06
JPS5040616B1 (fr) *	1970-03-18	1975-12-25
US3921916A (en) *	1974-12-31	1975-11-25	Ibm	Nozzles formed in monocrystalline silicon
US3958255A (en) *	1974-12-31	1976-05-18	International Business Machines Corporation	Ink jet nozzle structure
US3949410A (en) *	1975-01-23	1976-04-06	International Business Machines Corporation	Jet nozzle structure for electrohydrodynamic droplet formation and ink jet printing system therewith
US4157935A (en) *	1977-12-23	1979-06-12	International Business Machines Corporation	Method for producing nozzle arrays for ink jet printers
JPS5753366A (en) *	1980-09-17	1982-03-30	Ricoh Co Ltd	Nozzle plate for liquid jet apparatus
JPS57116656A (en) *	1981-01-14	1982-07-20	Sharp Corp	Manufacture of orifice for ink jet printer
JPS57182449A (en) *	1981-05-07	1982-11-10	Fuji Xerox Co Ltd	Forming method of ink jet multinozzle

1985
- 1985-03-27 CA CA000477672A patent/CA1237020A/fr not_active Expired
- 1985-10-02 AU AU48190/85A patent/AU582581B2/en not_active Expired
- 1985-10-11 EP EP85112882A patent/EP0178596B2/fr not_active Expired - Lifetime
- 1985-10-11 DE DE8585112882T patent/DE3581355D1/de not_active Expired - Lifetime
- 1985-10-14 KR KR1019850007532A patent/KR930009109B1/ko not_active Expired - Fee Related
- 1985-10-14 ES ES547845A patent/ES8707144A1/es not_active Expired
- 1985-10-15 JP JP60227956A patent/JPS6198558A/ja active Pending
1987
- 1987-04-13 ES ES1987296483U patent/ES296483Y/es not_active Expired

Also Published As

Publication number	Publication date
EP0178596B2 (fr)	1994-06-01
KR930009109B1 (ko)	1993-09-23
ES547845A0 (es)	1987-08-16
KR860003109A (ko)	1986-05-19
JPS6198558A (ja)	1986-05-16
ES296483Y (es)	1988-04-16
EP0178596A2 (fr)	1986-04-23
EP0178596B1 (fr)	1991-01-16
AU4819085A (en)	1986-04-24
ES296483U (es)	1987-10-16
ES8707144A1 (es)	1987-08-16
AU582581B2 (en)	1989-04-06
DE3581355D1 (de)	1991-02-21
EP0178596A3 (en)	1987-09-16

Legal Events

Date	Code	Title	Description
2005-05-24	MKEX	Expiry

Publication	Publication Date	Title
US4733823A (en)	1988-03-29	Silicon nozzle structures and method of manufacture
CA1237020A (fr)	1988-05-24	Buse en silicone, et sa fabrication
CA1037519A (fr)	1978-08-29	Mode de fabrication de gicleurs sur plaque de silicium monocristallin
JP3127002B2 (ja)	2001-01-22	大型および小型の構造体を製作するための低温、片面、複数ステップによるエッチング工程
US5711891A (en)	1998-01-27	Wafer processing using thermal nitride etch mask
US5286671A (en)	1994-02-15	Fusion bonding technique for use in fabricating semiconductor devices
DE68918982T2 (de)	1995-04-27	Verfahren zur Trennung integrierter Schaltkreise auf einem Substrat.
US5006202A (en)	1991-04-09	Fabricating method for silicon devices using a two step silicon etching process
US4957592A (en)	1990-09-18	Method of using erodable masks to produce partially etched structures in ODE wafer structures
US4961821A (en)	1990-10-09	Ode through holes and butt edges without edge dicing
US4863560A (en)	1989-09-05	Fabrication of silicon structures by single side, multiple step etching process
US7169669B2 (en)	2007-01-30	Method of making thin silicon sheets for solar cells
US6743654B2 (en)	2004-06-01	Method of fabricating pressure sensor monolithically integrated
US5277755A (en)	1994-01-11	Fabrication of three dimensional silicon devices by single side, two-step etching process
US5096535A (en)	1992-03-17	Process for manufacturing segmented channel structures
JPH02196420A (ja)	1990-08-03	半導体装置の製造方法
US5716533A (en)	1998-02-10	Method of fabricating ink jet printheads
EP0129915B1 (fr)	1987-10-28	Procédé de fabrication d'un dispositif à circuit intégré
JPS6043309B2 (ja)	1985-09-27	マルチノズルオリフイス板
US6033489A (en)	2000-03-07	Semiconductor substrate and method of making same
US4334348A (en)	1982-06-15	Retro-etch process for forming gate electrodes of MOS integrated circuits
GB2081187A (en)	1982-02-17	Retro-etch process for integrated circuits
JPH06134994A (ja)	1994-05-17	インクジェットヘッドの製造方法
US4380481A (en)	1983-04-19	Method for fabricating semiconductor devices
JPS6258541B2 (fr)	1987-12-07