CA1279155C - Couches de resine photosensible stabilisees thermiquement - Google Patents
Couches de resine photosensible stabilisees thermiquementInfo
- Publication number
- CA1279155C CA1279155C CA000523167A CA523167A CA1279155C CA 1279155 C CA1279155 C CA 1279155C CA 000523167 A CA000523167 A CA 000523167A CA 523167 A CA523167 A CA 523167A CA 1279155 C CA1279155 C CA 1279155C
- Authority
- CA
- Canada
- Prior art keywords
- process according
- photoresist
- image
- image layer
- thermally stabilizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 91
- 238000000034 method Methods 0.000 claims abstract description 97
- 229920005989 resin Polymers 0.000 claims abstract description 16
- 239000011347 resin Substances 0.000 claims abstract description 16
- 229920003986 novolac Polymers 0.000 claims abstract description 14
- 239000000758 substrate Substances 0.000 claims description 42
- 239000004094 surface-active agent Substances 0.000 claims description 38
- 108010010803 Gelatin Proteins 0.000 claims description 37
- 229920000159 gelatin Polymers 0.000 claims description 37
- 235000019322 gelatine Nutrition 0.000 claims description 37
- 235000011852 gelatine desserts Nutrition 0.000 claims description 37
- 239000008273 gelatin Substances 0.000 claims description 36
- 239000000243 solution Substances 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 34
- 230000000087 stabilizing effect Effects 0.000 claims description 28
- 239000011248 coating agent Substances 0.000 claims description 26
- 238000000576 coating method Methods 0.000 claims description 26
- -1 perfluorocarbon phosphonic acids Chemical class 0.000 claims description 21
- 239000000203 mixture Substances 0.000 claims description 20
- 239000000975 dye Substances 0.000 claims description 17
- TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 claims description 15
- 239000000413 hydrolysate Substances 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 12
- 239000002253 acid Substances 0.000 claims description 10
- 239000007864 aqueous solution Substances 0.000 claims description 10
- 102000008186 Collagen Human genes 0.000 claims description 8
- 108010035532 Collagen Proteins 0.000 claims description 8
- 229920001436 collagen Polymers 0.000 claims description 8
- 238000004528 spin coating Methods 0.000 claims description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 claims description 5
- 229910052783 alkali metal Inorganic materials 0.000 claims description 5
- HLVXFWDLRHCZEI-UHFFFAOYSA-N chromotropic acid Chemical compound OS(=O)(=O)C1=CC(O)=C2C(O)=CC(S(O)(=O)=O)=CC2=C1 HLVXFWDLRHCZEI-UHFFFAOYSA-N 0.000 claims description 5
- 230000003287 optical effect Effects 0.000 claims description 5
- 230000001681 protective effect Effects 0.000 claims description 5
- 150000003839 salts Chemical class 0.000 claims description 5
- 229910019142 PO4 Inorganic materials 0.000 claims description 4
- 150000007513 acids Chemical class 0.000 claims description 4
- 150000001340 alkali metals Chemical class 0.000 claims description 4
- 239000010452 phosphate Substances 0.000 claims description 4
- 239000008199 coating composition Substances 0.000 claims description 3
- 239000003504 photosensitizing agent Substances 0.000 claims description 2
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 2
- 108010009736 Protein Hydrolysates Proteins 0.000 claims 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims 1
- 150000001735 carboxylic acids Chemical class 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000015556 catabolic process Effects 0.000 abstract description 4
- 238000006731 degradation reaction Methods 0.000 abstract description 4
- 238000005530 etching Methods 0.000 abstract description 4
- 239000003381 stabilizer Substances 0.000 abstract description 4
- 238000005468 ion implantation Methods 0.000 abstract description 3
- 230000006641 stabilisation Effects 0.000 abstract description 3
- 238000011105 stabilization Methods 0.000 abstract description 3
- 238000004377 microelectronic Methods 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 239000010408 film Substances 0.000 description 12
- 239000010410 layer Substances 0.000 description 9
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
- 238000007689 inspection Methods 0.000 description 8
- 238000009832 plasma treatment Methods 0.000 description 8
- 238000011282 treatment Methods 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 229910052710 silicon Inorganic materials 0.000 description 7
- 239000010703 silicon Substances 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- 229920000642 polymer Polymers 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000003292 glue Substances 0.000 description 4
- 238000003384 imaging method Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000010409 thin film Substances 0.000 description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003795 chemical substances by application Substances 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910052700 potassium Inorganic materials 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 235000012239 silicon dioxide Nutrition 0.000 description 3
- 238000009987 spinning Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 125000000129 anionic group Chemical group 0.000 description 2
- 125000002091 cationic group Chemical group 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 239000012467 final product Substances 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 150000004767 nitrides Chemical class 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 238000001020 plasma etching Methods 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 2
- 229940068984 polyvinyl alcohol Drugs 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 229940043267 rhodamine b Drugs 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- TVDHGOWPFDZGCY-UHFFFAOYSA-N 2-chloro-5,5,5-trifluoropent-2-enoic acid Chemical compound C(C=C(C(=O)O)Cl)C(F)(F)F TVDHGOWPFDZGCY-UHFFFAOYSA-N 0.000 description 1
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical compound [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 1
- GJCOSYZMQJWQCA-UHFFFAOYSA-N 9H-xanthene Chemical compound C1=CC=C2CC3=CC=CC=C3OC2=C1 GJCOSYZMQJWQCA-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- 241000416162 Astragalus gummifer Species 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 239000001856 Ethyl cellulose Substances 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- XPDWGBQVDMORPB-UHFFFAOYSA-N Fluoroform Chemical compound FC(F)F XPDWGBQVDMORPB-UHFFFAOYSA-N 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 241000978776 Senegalia senegal Species 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 229920001615 Tragacanth Polymers 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 238000005904 alkaline hydrolysis reaction Methods 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 230000002238 attenuated effect Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 210000000988 bone and bone Anatomy 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 125000002843 carboxylic acid group Chemical group 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 150000001768 cations Chemical group 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 150000008049 diazo compounds Chemical class 0.000 description 1
- 238000007865 diluting Methods 0.000 description 1
- 238000003618 dip coating Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920001249 ethyl cellulose Polymers 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- QDLAGTHXVHQKRE-UHFFFAOYSA-N lichenxanthone Natural products COC1=CC(O)=C2C(=O)C3=C(C)C=C(OC)C=C3OC2=C1 QDLAGTHXVHQKRE-UHFFFAOYSA-N 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910003002 lithium salt Inorganic materials 0.000 description 1
- 159000000002 lithium salts Chemical class 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000001393 microlithography Methods 0.000 description 1
- 231100000989 no adverse effect Toxicity 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 150000004812 organic fluorine compounds Chemical class 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- 125000005010 perfluoroalkyl group Chemical group 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- ABLZXFCXXLZCGV-UHFFFAOYSA-N phosphonic acid group Chemical group P(O)(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- XTUSEBKMEQERQV-UHFFFAOYSA-N propan-2-ol;hydrate Chemical compound O.CC(C)O XTUSEBKMEQERQV-UHFFFAOYSA-N 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 125000001453 quaternary ammonium group Chemical group 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000000542 sulfonic acid group Chemical group 0.000 description 1
- 239000000979 synthetic dye Substances 0.000 description 1
- 238000001029 thermal curing Methods 0.000 description 1
- 239000003017 thermal stabilizer Substances 0.000 description 1
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 1
- 238000011179 visual inspection Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Materials For Photolithography (AREA)
- Holo Graphy (AREA)
Applications Claiming Priority (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US802,514 | 1985-11-27 | ||
| US06/802,514 US4701390A (en) | 1985-11-27 | 1985-11-27 | Thermally stabilized photoresist images |
| US82394286A | 1986-01-29 | 1986-01-29 | |
| US823,942 | 1986-01-29 | ||
| US879,385 | 1986-06-27 | ||
| US06/879,385 US4762768A (en) | 1986-01-29 | 1986-06-27 | Thermally stabilized photoresist images |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CA1279155C true CA1279155C (fr) | 1991-01-22 |
Family
ID=27419987
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA000523167A Expired - Lifetime CA1279155C (fr) | 1985-11-27 | 1986-11-17 | Couches de resine photosensible stabilisees thermiquement |
Country Status (4)
| Country | Link |
|---|---|
| EP (1) | EP0247153A4 (fr) |
| AU (1) | AU6629286A (fr) |
| CA (1) | CA1279155C (fr) |
| WO (1) | WO1987003387A1 (fr) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3087726B2 (ja) * | 1998-05-25 | 2000-09-11 | 日本電気株式会社 | 半導体装置の製造プロセスにおけるパターニング方法 |
| US7348300B2 (en) | 1999-05-04 | 2008-03-25 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and processes for their manufacture |
| US7129199B2 (en) | 2002-08-12 | 2006-10-31 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| US7521405B2 (en) | 2002-08-12 | 2009-04-21 | Air Products And Chemicals, Inc. | Process solutions containing surfactants |
| DE10101734C2 (de) * | 2001-01-16 | 2003-04-24 | Osram Opto Semiconductors Gmbh | Verfahren zum Ausbilden einer Ätzmaske auf einem Substrat |
| JP3476082B2 (ja) * | 2001-11-05 | 2003-12-10 | 東京応化工業株式会社 | パターン微細化用被覆形成剤およびそれを用いた微細パターンの形成方法 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3244569A (en) * | 1961-12-29 | 1966-04-05 | Harris Intertype Corp | Etched letterpress plate and process of preparing same |
| GB1225754A (fr) * | 1967-06-09 | 1971-03-24 | ||
| JPS5011286B1 (fr) * | 1971-07-15 | 1975-04-30 | ||
| JPS5218021B2 (fr) * | 1972-05-31 | 1977-05-19 | ||
| GB1513368A (en) * | 1974-07-08 | 1978-06-07 | Vickers Ltd | Processing of radiation-sensitive members |
| GB1575200A (en) * | 1977-02-21 | 1980-09-17 | Vickers Ltd | Printing plates |
| US4125650A (en) * | 1977-08-08 | 1978-11-14 | International Business Machines Corporation | Resist image hardening process |
| US4187331A (en) * | 1978-08-24 | 1980-02-05 | International Business Machines Corp. | Fluorine plasma resist image hardening |
| US4259369A (en) * | 1979-12-13 | 1981-03-31 | International Business Machines Corporation | Image hardening process |
| GB2099371B (en) * | 1981-06-01 | 1984-12-19 | Polychrome Corp | Finisher for lithographic printing plates |
| GB2121197A (en) * | 1982-05-26 | 1983-12-14 | Philips Electronic Associated | Plasma-etch resistant mask formation |
| DE3231144A1 (de) * | 1982-08-21 | 1984-02-23 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von tiefdruckformen mit kunststoff-druckschichten |
| GB8314918D0 (en) * | 1983-05-31 | 1983-07-06 | Vickers Plc | Radiation sensitive compositions |
| DE3410522A1 (de) * | 1984-03-22 | 1985-10-03 | Hoechst Ag, 6230 Frankfurt | Einbrenngummierung fuer offsetdruckplatten und verfahren zur herstellung einer offsetdruckform |
-
1986
- 1986-11-12 AU AU66292/86A patent/AU6629286A/en not_active Abandoned
- 1986-11-12 WO PCT/US1986/002441 patent/WO1987003387A1/fr not_active Ceased
- 1986-11-12 EP EP19860907168 patent/EP0247153A4/fr not_active Withdrawn
- 1986-11-17 CA CA000523167A patent/CA1279155C/fr not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| WO1987003387A1 (fr) | 1987-06-04 |
| EP0247153A1 (fr) | 1987-12-02 |
| EP0247153A4 (fr) | 1988-05-19 |
| AU6629286A (en) | 1987-07-01 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4701390A (en) | Thermally stabilized photoresist images | |
| US6057080A (en) | Top antireflective coating film | |
| TWI448517B (zh) | 含有內醯胺供塗覆光阻圖案之組合物 | |
| US4777119A (en) | Method for developing poly(methacrylic anhydride) resists | |
| CA1132832A (fr) | Utilisation d'un plasma contenant de l'oxygene pour developper une matiere de protection a la phenol-formaldehyde/diazocetone, traitee au magnesium | |
| US4808511A (en) | Vapor phase photoresist silylation process | |
| US4125650A (en) | Resist image hardening process | |
| TWI397773B (zh) | 效能改善的含浸式頂部塗料 | |
| US4826564A (en) | Method of selective reactive ion etching of substrates | |
| TW469521B (en) | A method of forming a photoresist pattern | |
| JP5306755B2 (ja) | 基板処理液およびそれを用いたレジスト基板処理方法 | |
| US5554489A (en) | Method of forming a fine resist pattern using an alkaline film covered photoresist | |
| JP3694703B2 (ja) | 反射防止コーティング用組成物 | |
| JP3320402B2 (ja) | 現像欠陥防止プロセス及び材料 | |
| CA1279155C (fr) | Couches de resine photosensible stabilisees thermiquement | |
| JP3965740B2 (ja) | コーティング組成物 | |
| US4762768A (en) | Thermally stabilized photoresist images | |
| JPH0815859A (ja) | レジスト用塗布液およびこれを用いたレジスト材料 | |
| JPH1165125A (ja) | パターン形成方法 | |
| JP2004505319A (ja) | 微細電子デバイスの製造方法 | |
| JP3827762B2 (ja) | 反射防止組成物及びレジストパターン形成方法 | |
| JPH0950129A (ja) | 反射防止膜材料及びパターン形成方法 | |
| US4208242A (en) | Method for color television picture tube aperture mask production employing PVA and removing the PVA by partial carmelizing and washing | |
| Toriumi et al. | Alkali‐Developable Silicon Containing Positive Photoresist (ASTRO) for a Two‐Layer Resist System: Preparation and Processing | |
| KR100932085B1 (ko) | 현상 결함 방지 공정 및 여기에 사용하는 조성물 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MKLA | Lapsed |