CA1299069C - Procede pour l'obtention d'un article renfermant une couche profonde de sio ; article ainsi obtenu - Google Patents

Procede pour l'obtention d'un article renfermant une couche profonde de sio ; article ainsi obtenu

Info

Publication number: CA1299069C
Authority: CA; Canada
Prior art keywords: implant; randomizing; oxygen; temperature; overlayer
Prior art date: 1986-11-26
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CA000550575A

Other languages

English (en)

Inventor

Alice Elizabeth White

Kenneth Thomas Short

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AT&T Corp

Original Assignee

American Telephone and Telegraph Co Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1986-11-26

Filing date

1987-10-29

Publication date

1992-04-21

1987-10-29 Application filed by American Telephone and Telegraph Co Inc filed Critical American Telephone and Telegraph Co Inc

1992-04-21 Application granted granted Critical

1992-04-21 Publication of CA1299069C publication Critical patent/CA1299069C/fr

2009-04-21 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000004519 manufacturing process Methods 0.000 title claims abstract description 9
239000007943 implant Substances 0.000 claims abstract description 59
238000000034 method Methods 0.000 claims abstract description 43
239000001301 oxygen Substances 0.000 claims abstract description 37
229910052760 oxygen Inorganic materials 0.000 claims abstract description 37
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 35
238000010438 heat treatment Methods 0.000 claims abstract description 19
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract 12
229910052681 coesite Inorganic materials 0.000 claims abstract 6
229910052906 cristobalite Inorganic materials 0.000 claims abstract 6
239000000377 silicon dioxide Substances 0.000 claims abstract 6
235000012239 silicon dioxide Nutrition 0.000 claims abstract 6
229910052682 stishovite Inorganic materials 0.000 claims abstract 6
229910052905 tridymite Inorganic materials 0.000 claims abstract 6
238000000137 annealing Methods 0.000 claims description 15
239000013078 crystal Substances 0.000 claims description 8
238000002513 implantation Methods 0.000 claims description 8
150000002500 ions Chemical class 0.000 claims description 6
230000007547 defect Effects 0.000 claims description 5
229910021421 monocrystalline silicon Inorganic materials 0.000 claims description 4
239000011261 inert gas Substances 0.000 claims description 3
-1 oxygen ions Chemical class 0.000 claims description 2
FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 claims 1
235000012431 wafers Nutrition 0.000 abstract description 25
239000012212 insulator Substances 0.000 abstract description 2
239000010410 layer Substances 0.000 description 37
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 17
229910052710 silicon Inorganic materials 0.000 description 17
239000010703 silicon Substances 0.000 description 15
239000000758 substrate Substances 0.000 description 13
230000015572 biosynthetic process Effects 0.000 description 7
238000005001 rutherford backscattering spectroscopy Methods 0.000 description 7
239000000463 material Substances 0.000 description 6
238000001228 spectrum Methods 0.000 description 4
230000001590 oxidative effect Effects 0.000 description 3
125000004430 oxygen atom Chemical group O* 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
229910052786 argon Inorganic materials 0.000 description 2
239000000470 constituent Substances 0.000 description 2
230000002950 deficient Effects 0.000 description 2
238000001493 electron microscopy Methods 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
239000007788 liquid Substances 0.000 description 2
239000002244 precipitate Substances 0.000 description 2
229910001220 stainless steel Inorganic materials 0.000 description 2
239000010935 stainless steel Substances 0.000 description 2
238000011282 treatment Methods 0.000 description 2
229910000831 Steel Inorganic materials 0.000 description 1
238000005280 amorphization Methods 0.000 description 1
229910021417 amorphous silicon Inorganic materials 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
238000009826 distribution Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
230000035876 healing Effects 0.000 description 1
238000009413 insulation Methods 0.000 description 1
238000002955 isolation Methods 0.000 description 1
239000002184 metal Substances 0.000 description 1
229910052757 nitrogen Inorganic materials 0.000 description 1
229910052756 noble gas Inorganic materials 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
230000005855 radiation Effects 0.000 description 1
238000001953 recrystallisation Methods 0.000 description 1
239000004065 semiconductor Substances 0.000 description 1
238000000926 separation method Methods 0.000 description 1
239000010959 steel Substances 0.000 description 1

Landscapes

Element Separation (AREA)

CA000550575A 1986-11-26 1987-10-29 Procede pour l'obtention d'un article renfermant une couche profonde de sio ; article ainsi obtenu Expired - Fee Related CA1299069C (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US93327386A	1986-11-26	1986-11-26
US933,273		1986-11-26

Publications (1)

Publication Number	Publication Date
CA1299069C true CA1299069C (fr)	1992-04-21

Family

ID=25463661

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000550575A Expired - Fee Related CA1299069C (fr)	1986-11-26	1987-10-29	Procede pour l'obtention d'un article renfermant une couche profonde de sio ; article ainsi obtenu

Country Status (1)

Country	Link
CA (1)	CA1299069C (fr)

1987
- 1987-10-29 CA CA000550575A patent/CA1299069C/fr not_active Expired - Fee Related

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Legal Events

Date	Code	Title	Description
2003-04-22	MKLA	Lapsed