CA2016529A1 - Methode d'impression d'un motif sur une surface - Google Patents

Methode d'impression d'un motif sur une surface

Info

Publication number
CA2016529A1
CA2016529A1 CA2016529A CA2016529A CA2016529A1 CA 2016529 A1 CA2016529 A1 CA 2016529A1 CA 2016529 A CA2016529 A CA 2016529A CA 2016529 A CA2016529 A CA 2016529A CA 2016529 A1 CA2016529 A1 CA 2016529A1
Authority
CA
Canada
Prior art keywords
substrate
film
pattern
forming
areas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2016529A
Other languages
English (en)
Other versions
CA2016529C (fr
Inventor
Stephen Temple
Stuart Speakman
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Xaar Ltd
Original Assignee
Xaar Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Xaar Ltd filed Critical Xaar Ltd
Publication of CA2016529A1 publication Critical patent/CA2016529A1/fr
Application granted granted Critical
Publication of CA2016529C publication Critical patent/CA2016529C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1628Manufacturing processes etching dry etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1607Production of print heads with piezoelectric elements
    • B41J2/1609Production of print heads with piezoelectric elements of finger type, chamber walls consisting integrally of piezoelectric material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1623Manufacturing processes bonding and adhesion
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1626Manufacturing processes etching
    • B41J2/1629Manufacturing processes etching wet etching
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1631Manufacturing processes photolithography
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/1632Manufacturing processes machining
    • B41J2/1634Manufacturing processes machining laser machining
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1642Manufacturing processes thin film formation thin film formation by CVD [chemical vapor deposition]
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1643Manufacturing processes thin film formation thin film formation by plating
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/16Production of nozzles
    • B41J2/1621Manufacturing processes
    • B41J2/164Manufacturing processes thin film formation
    • B41J2/1646Manufacturing processes thin film formation thin film formation by sputtering
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/36Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using a polymeric layer, which may be particulate and which is deformed or structurally changed with modification of its' properties, e.g. of its' optical hydrophobic-hydrophilic, solubility or permeability properties
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/04Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching
    • H05K3/046Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer
    • H05K3/048Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed mechanically, e.g. by punching by selective transfer or selective detachment of a conductive layer using a lift-off resist pattern or a release layer pattern
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41JTYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
    • B41J2/00Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
    • B41J2/005Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
    • B41J2/01Ink jet
    • B41J2/135Nozzles
    • B41J2/14Structure thereof only for on-demand ink jet heads
    • B41J2002/14379Edge shooter

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Particle Formation And Scattering Control In Inkjet Printers (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Physical Vapour Deposition (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CA002016529A 1989-05-12 1990-05-10 Methode d'impression d'un motif sur une surface Expired - Fee Related CA2016529C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GB898910961A GB8910961D0 (en) 1989-05-12 1989-05-12 Method of forming a pattern on a surface
GB8910961.5 1989-05-12

Publications (2)

Publication Number Publication Date
CA2016529A1 true CA2016529A1 (fr) 1990-11-12
CA2016529C CA2016529C (fr) 2001-01-09

Family

ID=10656647

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002016529A Expired - Fee Related CA2016529C (fr) 1989-05-12 1990-05-10 Methode d'impression d'un motif sur une surface

Country Status (8)

Country Link
US (1) US5185055A (fr)
EP (2) EP0397441A3 (fr)
JP (1) JPH0791629B2 (fr)
AT (1) ATE226891T1 (fr)
CA (1) CA2016529C (fr)
DE (1) DE69034014T2 (fr)
ES (1) ES2185109T3 (fr)
GB (1) GB8910961D0 (fr)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5818719A (en) * 1995-12-29 1998-10-06 Kimberly-Clark, Worldwide, Inc. Apparatus for controlling the registration of two continuously moving layers of material
US5930139A (en) * 1996-11-13 1999-07-27 Kimberly-Clark Worldwide, Inc. Process and apparatus for registration control of material printed at machine product length
US5932039A (en) * 1997-10-14 1999-08-03 Kimberly-Clark Wordwide, Inc. Process and apparatus for registering a continuously moving, treatable layer with another
US5964970A (en) * 1997-10-14 1999-10-12 Kimberly-Clark Worldwide, Inc. Registration process and apparatus for continuously moving elasticized layers having multiple components
US6033502A (en) * 1996-11-13 2000-03-07 Kimberly-Clark Worldwide, Inc. Process and apparatus for registering continuously moving stretchable layers
US6652686B1 (en) 1999-02-08 2003-11-25 Kimberly-Clark Worldwide, Inc. Processes and apparatus for making disposable absorbent articles
US6986820B2 (en) 2000-01-21 2006-01-17 Kimberly-Clark Worldwide, Inc. Processes and apparatus for making disposable absorbent articles

Families Citing this family (35)

* Cited by examiner, † Cited by third party
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IL107120A (en) 1992-09-29 1997-09-30 Boehringer Ingelheim Int Atomising nozzle and filter and spray generating device
US6007676A (en) * 1992-09-29 1999-12-28 Boehringer Ingelheim International Gmbh Atomizing nozzle and filter and spray generating device
KR960016007B1 (ko) * 1993-02-08 1996-11-25 삼성전자 주식회사 반도체 칩 범프의 제조방법
GB9400036D0 (en) * 1994-01-04 1994-03-02 Xaar Ltd Manufacture of ink jet printheads
DE19536429A1 (de) * 1995-09-29 1997-04-10 Siemens Ag Tintenstrahldruckkopf und Verfahren zum Herstellen eines solchen Tintenstrahldruckkopfes
US5645963A (en) * 1995-11-20 1997-07-08 Minnesota Mining And Manufacturing Company Method for making color filter elements using laminable colored photosensitive materials
US5766389A (en) * 1995-12-29 1998-06-16 Kimberly-Clark Worldwide, Inc. Disposable absorbent article having a registered graphic and process for making
US6092002A (en) * 1996-11-13 2000-07-18 Kimberly-Clark Worldwide, Inc. Variable tension process and apparatus for continuously moving layers
JP3257960B2 (ja) * 1996-12-17 2002-02-18 富士通株式会社 インクジェットヘッド
JPH10202874A (ja) * 1997-01-24 1998-08-04 Seiko Epson Corp インクジェットプリンタヘッド及びその製造方法
DE19742439C1 (de) 1997-09-26 1998-10-22 Boehringer Ingelheim Int Mikrostrukturiertes Filter
US6209203B1 (en) * 1998-01-08 2001-04-03 Lexmark International, Inc. Method for making nozzle array for printhead
TW411726B (en) * 1998-06-18 2000-11-11 Siemens Ag Manufacture of structurized electrodes
CN1245291C (zh) 1998-11-14 2006-03-15 萨尔技术有限公司 液滴沉积装置
US6617098B1 (en) * 1999-07-13 2003-09-09 Input/Output, Inc. Merged-mask micro-machining process
JP4467860B2 (ja) 1999-08-14 2010-05-26 ザール テクノロジー リミテッド 小滴堆積装置
US6402823B1 (en) 2000-01-07 2002-06-11 Ferro Corporation Individual inks and an ink set for use in the color ink jet printing of glazed ceramic tiles and surfaces
US20020074897A1 (en) * 2000-12-15 2002-06-20 Qing Ma Micro-electromechanical structure resonator frequency adjustment using radient energy trimming and laser/focused ion beam assisted deposition
US20020073544A1 (en) * 2000-12-18 2002-06-20 Konica Corporation Manufacturing method of ink-jet haead
SG98017A1 (en) * 2000-12-19 2003-08-20 Inst Materials Research & Eng Method of forming selective electronics plating on polymer surfaces
US6629756B2 (en) 2001-02-20 2003-10-07 Lexmark International, Inc. Ink jet printheads and methods therefor
US6804388B2 (en) * 2001-03-14 2004-10-12 Maniabarco, Inc. Method and apparatus of registering a printed circuit board
US6613687B2 (en) 2001-03-28 2003-09-02 Lexmark International, Inc. Reverse reactive ion patterning of metal oxide films
US20020139472A1 (en) * 2001-03-29 2002-10-03 Albert Wojewnik Method of forming an electrical circuit on a substrate
US20070128905A1 (en) * 2003-06-12 2007-06-07 Stuart Speakman Transparent conducting structures and methods of production thereof
WO2005045911A1 (fr) * 2003-11-11 2005-05-19 Asahi Glass Company, Limited Procede pour former un motif, circuit electronique fabrique selon le procede et dispositif electronique utilisant celui-ci
US7553426B2 (en) * 2005-03-01 2009-06-30 Hitachi Global Storage Technologies Netherlands B.V. Apparatus, system, and method for increasing data storage density in patterned media
US7667929B2 (en) * 2005-04-04 2010-02-23 Hitachi Global Storage Technologies Netherlands B.V. Apparatus, method and system for fabricating a patterned media imprint master
US7236324B2 (en) * 2005-10-18 2007-06-26 Hitachi Global Storage Technologies Apparatus, method and system for fabricating servo patterns on high density patterned media
US20080259134A1 (en) * 2007-04-20 2008-10-23 Hewlett-Packard Development Company Lp Print head laminate
JP5012257B2 (ja) * 2007-06-29 2012-08-29 コニカミノルタIj株式会社 インクジェットヘッド
JP6105204B2 (ja) * 2012-02-10 2017-03-29 株式会社日立ハイテクサイエンス Tem観察用試料作製方法
CN107533286B (zh) * 2015-04-29 2022-02-08 3M创新有限公司 溶胀性成膜组合物及采用所述溶胀性成膜组合物进行纳米压印光刻的方法
US12487520B2 (en) * 2023-08-03 2025-12-02 Fabric8Labs, Inc. Multi-layer photoresist systems and methods for manufacturing electrochemical deposition printheads
CN118024762A (zh) * 2024-03-14 2024-05-14 紫金矿业集团黄金珠宝有限公司 一种在珠宝首饰表面加工图案的加工工艺

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US4672020A (en) * 1982-09-29 1987-06-09 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting o-quinone diazide photoresist with integral laminable layer, photoresist layer, and strippable carrier layer
DE3340154A1 (de) * 1983-11-07 1985-05-15 Basf Ag, 6700 Ludwigshafen Verfahren zur herstellung von bildmaessig strukturierten resistschichten und fuer dieses verfahren geeigneter trockenfilmresist
DE3342844A1 (de) * 1983-11-26 1985-06-05 Philips Patentverwaltung Gmbh, 2000 Hamburg Mikroplanarer tintenstrahldruckkopf
DE3447357A1 (de) * 1984-12-24 1986-07-03 Basf Ag, 6700 Ludwigshafen Trockenfilmresist und verfahren zur herstellung von resistmustern
US4571374A (en) * 1984-12-27 1986-02-18 Minnesota Mining And Manufacturing Company Multilayer dry-film positive-acting laminable photoresist with two photoresist layers wherein one layer includes thermal adhesive
DE3645017C2 (fr) * 1985-09-06 1990-07-12 Fuji Electric Co., Ltd., Kawasaki, Kanagawa, Jp
US4726877A (en) * 1986-01-22 1988-02-23 E. I. Du Pont De Nemours And Company Methods of using photosensitive compositions containing microgels
US4933042A (en) * 1986-09-26 1990-06-12 General Electric Company Method for packaging integrated circuit chips employing a polymer film overlay layer
US4780177A (en) * 1988-02-05 1988-10-25 General Electric Company Excimer laser patterning of a novel resist
US4853080A (en) * 1988-12-14 1989-08-01 Hewlett-Packard Lift-off process for patterning shields in thin magnetic recording heads

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5818719A (en) * 1995-12-29 1998-10-06 Kimberly-Clark, Worldwide, Inc. Apparatus for controlling the registration of two continuously moving layers of material
US5980087A (en) * 1995-12-29 1999-11-09 Kimberly-Clark Worldwide, Inc. Apparatus for controlling the registration of two continuously moving layers of material and an article made thereby
US5930139A (en) * 1996-11-13 1999-07-27 Kimberly-Clark Worldwide, Inc. Process and apparatus for registration control of material printed at machine product length
US6033502A (en) * 1996-11-13 2000-03-07 Kimberly-Clark Worldwide, Inc. Process and apparatus for registering continuously moving stretchable layers
US6245168B1 (en) 1996-11-13 2001-06-12 Kimberly-Clark Worldwide, Inc. Process and apparatus for registering continuously moving stretchable layers
US5932039A (en) * 1997-10-14 1999-08-03 Kimberly-Clark Wordwide, Inc. Process and apparatus for registering a continuously moving, treatable layer with another
US5964970A (en) * 1997-10-14 1999-10-12 Kimberly-Clark Worldwide, Inc. Registration process and apparatus for continuously moving elasticized layers having multiple components
US6652686B1 (en) 1999-02-08 2003-11-25 Kimberly-Clark Worldwide, Inc. Processes and apparatus for making disposable absorbent articles
US6986820B2 (en) 2000-01-21 2006-01-17 Kimberly-Clark Worldwide, Inc. Processes and apparatus for making disposable absorbent articles

Also Published As

Publication number Publication date
GB8910961D0 (en) 1989-06-28
JPH03150348A (ja) 1991-06-26
EP0397441A2 (fr) 1990-11-14
EP0397441A3 (fr) 1992-09-30
DE69034014D1 (de) 2002-12-05
EP0844090A2 (fr) 1998-05-27
JPH0791629B2 (ja) 1995-10-04
ATE226891T1 (de) 2002-11-15
EP0844090A3 (fr) 1999-03-17
CA2016529C (fr) 2001-01-09
EP0844090B1 (fr) 2002-10-30
ES2185109T3 (es) 2003-04-16
US5185055A (en) 1993-02-09
DE69034014T2 (de) 2003-08-14

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