CA2025681C - - Google Patents

Info

Publication number
CA2025681C
CA2025681C CA 2025681 CA2025681A CA2025681C CA 2025681 C CA2025681 C CA 2025681C CA 2025681 CA2025681 CA 2025681 CA 2025681 A CA2025681 A CA 2025681A CA 2025681 C CA2025681 C CA 2025681C
Authority
CA
Canada
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
CA 2025681
Other versions
CA2025681A1 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of CA2025681A1 publication Critical patent/CA2025681A1/en
Application granted granted Critical
Publication of CA2025681C publication Critical patent/CA2025681C/xx
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0387—Polyamides or polyimides

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
CA002025681A 1989-09-22 1990-09-19 Photoreactive resin compositions developable in a semi-aqueous solution Granted CA2025681A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US40948289A 1989-09-22 1989-09-22
US409,482 1989-09-22

Publications (2)

Publication Number Publication Date
CA2025681A1 CA2025681A1 (en) 1991-03-23
CA2025681C true CA2025681C (ja) 1992-03-20

Family

ID=23620678

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002025681A Granted CA2025681A1 (en) 1989-09-22 1990-09-19 Photoreactive resin compositions developable in a semi-aqueous solution

Country Status (3)

Country Link
EP (1) EP0421195A3 (ja)
JP (1) JPH03220558A (ja)
CA (1) CA2025681A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106462057A (zh) * 2014-02-19 2017-02-22 日立化成杜邦微系统股份有限公司 树脂组合物、由其形成的固化膜和图案固化膜、以及它们的制造方法

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0651535A (ja) * 1992-06-19 1994-02-25 Du Pont Japan Ltd 基板上にパターン化されたポリイミド被膜を形成させる方法
EP0718696B1 (en) * 1992-07-22 2002-01-16 Asahi Kasei Kabushiki Kaisha Photosensitive polyimide precursor composition
JPH0680776A (ja) * 1992-09-02 1994-03-22 Asahi Chem Ind Co Ltd ポリイミド前駆体及び組成物
US5446074A (en) * 1993-12-17 1995-08-29 International Business Machines Corporation Photosensitive polyimide precursors
JPH10161311A (ja) * 1996-11-29 1998-06-19 Mitsui Chem Inc 感光性樹脂組成物
US5834581A (en) * 1997-04-15 1998-11-10 Olin Microelectronic Chemicals, Inc. Process for making polyimide-polyamic ester copolymers
US5789525A (en) * 1997-04-15 1998-08-04 Olin Microelectronic Chemicals, Inc. Process for making polyimides from diamines and tetracarboxylic diacid diester
US5789524A (en) * 1997-04-15 1998-08-04 Olin Microelectronic Chemicals, Inc. Chemical imidization reagent for polyimide synthesis
WO1999013381A1 (en) * 1997-09-11 1999-03-18 Arch Specialty Chemicals, Inc. A negatively acting photoresist composition based on polyimide precursors
JP3366859B2 (ja) * 1998-03-05 2003-01-14 日立化成デュポンマイクロシステムズ株式会社 感光性ポリイミド前駆体用現像液及びこれを用いたパターン製造法
CN100555078C (zh) 2003-06-02 2009-10-28 东丽株式会社 感光树脂组合物及用其制备的电子元件和显示装置
JP4666137B2 (ja) * 2004-10-26 2011-04-06 Ｊｓｒ株式会社 液晶配向膜の形成方法、液晶表示素子および光学部材
WO2006098291A1 (ja) 2005-03-15 2006-09-21 Toray Industries, Inc. 感光性樹脂組成物
TWI311142B (en) * 2006-10-18 2009-06-21 Eternal Chemical Co Ltd Amic acid ester oligomer, precursor composition for polyimide resin containing the same, and uses
JP5903164B2 (ja) 2012-08-08 2016-04-13 旭化成イーマテリアルズ株式会社 感光性フィルム積層体、及び、フレキシブルプリント配線の製造方法
JP6244871B2 (ja) * 2013-12-13 2017-12-13 日立化成デュポンマイクロシステムズ株式会社 ポリイミド前駆体樹脂組成物
KR101985215B1 (ko) * 2015-05-29 2019-06-03 후지필름 가부시키가이샤 폴리이미드 전구체 조성물, 감광성 수지 조성물, 경화막, 경화막의 제조 방법, 반도체 디바이스 및 폴리이미드 전구체 조성물의 제조 방법
WO2018154688A1 (ja) * 2017-02-23 2018-08-30 日立化成デュポンマイクロシステムズ株式会社 樹脂組成物、硬化物、パターン硬化物、硬化物の製造方法、層間絶縁膜、表面保護膜及び電子部品

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3021787A1 (de) * 1980-06-10 1981-12-17 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen und deren verwendung
DE3411697A1 (de) * 1984-03-29 1985-10-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von polyimid- und polyisoindolochinazolindion-reliefstrukturen
EP0188205B1 (de) * 1985-01-15 1988-06-22 Ciba-Geigy Ag Polyamidester-Fotoresist-Formulierungen gesteigerter Empfindlichkeit
CA1334466C (en) * 1986-09-04 1995-02-14 Masakazu Uekita Photosensitive amphiphilic high polymers and process for producing them

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106462057A (zh) * 2014-02-19 2017-02-22 日立化成杜邦微系统股份有限公司 树脂组合物、由其形成的固化膜和图案固化膜、以及它们的制造方法

Also Published As

Publication number Publication date
EP0421195A2 (en) 1991-04-10
JPH03220558A (ja) 1991-09-27
CA2025681A1 (en) 1991-03-23
EP0421195A3 (en) 1992-02-12

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