CA2046862A1 - Dispositif destine a l'exposition de plaques d'impression photopolymeriques - Google Patents

Dispositif destine a l'exposition de plaques d'impression photopolymeriques

Info

Publication number
CA2046862A1
CA2046862A1 CA 2046862 CA2046862A CA2046862A1 CA 2046862 A1 CA2046862 A1 CA 2046862A1 CA 2046862 CA2046862 CA 2046862 CA 2046862 A CA2046862 A CA 2046862A CA 2046862 A1 CA2046862 A1 CA 2046862A1
Authority
CA
Canada
Prior art keywords
support sheet
vacuum
stand
printing plates
lid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA 2046862
Other languages
English (en)
Inventor
Horst Hoffmann
Wolfgang Riebel
Helmut Kaufmann
Norbert Holl
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of CA2046862A1 publication Critical patent/CA2046862A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CA 2046862 1989-02-28 1990-02-21 Dispositif destine a l'exposition de plaques d'impression photopolymeriques Abandoned CA2046862A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DEP3906179.5 1989-02-28
DE19893906179 DE3906179A1 (de) 1989-02-28 1989-02-28 Vorrichtung zum belichten von photopolymeren druckplatten

Publications (1)

Publication Number Publication Date
CA2046862A1 true CA2046862A1 (fr) 1990-08-29

Family

ID=6375084

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 2046862 Abandoned CA2046862A1 (fr) 1989-02-28 1990-02-21 Dispositif destine a l'exposition de plaques d'impression photopolymeriques

Country Status (6)

Country Link
EP (1) EP0461169A1 (fr)
AU (1) AU5182490A (fr)
CA (1) CA2046862A1 (fr)
DE (1) DE3906179A1 (fr)
NZ (1) NZ232688A (fr)
WO (1) WO1990010255A1 (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2735717B1 (fr) * 1995-06-22 1997-08-08 Photomeca Egg Procede de fabrication de plaques photopolymeres par double irradiation par le dessous

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2527300C3 (de) * 1975-06-19 1978-05-18 Technigraf Gmbh, 6394 Graevenwiesbach Kontaktkopiergerät mit einem schwenkbaren Kopierrahmen
DE3144738C2 (de) * 1981-11-11 1984-04-05 Wilhelm Staub Gmbh, 6078 Neu-Isenburg "Anlage zum Belichten von Druckplatten"
DE3207903C2 (de) * 1982-03-05 1985-07-18 Wilhelm Staub Gmbh, 6078 Neu-Isenburg Anlage zum Belichten von fotopolymeren Materialien
EP0141868A1 (fr) * 1982-04-01 1985-05-22 Inc. M & T Chemicals Ensemble photomasque à haut pouvoir résolvant pour l'obtention d'images avec des photopolymères
US4698284A (en) * 1985-10-25 1987-10-06 M&T Chemicals Inc. Device for aligning a photomask onto a printed wiring board
DE3540107A1 (de) * 1985-11-12 1987-05-14 Klimsch & Co Kontaktkopiergeraet fuer uv-empfindliches material
JP2515521B2 (ja) * 1986-11-12 1996-07-10 旭化成工業株式会社 改良されたマスキング露光方法及びそれを用いた製版方法
US4996560A (en) * 1988-10-31 1991-02-26 Dainippon Screen Mfg. Co., Ltd. Apparatus for exposing an image of an original film on a photosensitive material in vacuum contact with the original film, and method therefor

Also Published As

Publication number Publication date
WO1990010255A1 (fr) 1990-09-07
NZ232688A (en) 1991-07-26
EP0461169A1 (fr) 1991-12-18
AU5182490A (en) 1990-09-26
DE3906179A1 (de) 1990-08-30

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Legal Events

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