CA2111010A1 - Methode utilisee pour polir finement des elements optiques planaires - Google Patents

Methode utilisee pour polir finement des elements optiques planaires

Info

Publication number
CA2111010A1
CA2111010A1 CA 2111010 CA2111010A CA2111010A1 CA 2111010 A1 CA2111010 A1 CA 2111010A1 CA 2111010 CA2111010 CA 2111010 CA 2111010 A CA2111010 A CA 2111010A CA 2111010 A1 CA2111010 A1 CA 2111010A1
Authority
CA
Canada
Prior art keywords
optically transparent
polishing
transparent surface
cavity
planar optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA 2111010
Other languages
English (en)
Inventor
Robert James Hagerty
Clinton Raymond Jones
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Corning Inc
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Corning Inc filed Critical Corning Inc
Publication of CA2111010A1 publication Critical patent/CA2111010A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B13/00—Machines or devices designed for grinding or polishing optical surfaces on lenses or surfaces of similar shape on other work; Accessories therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B19/00—Single-purpose machines or devices for particular grinding operations not covered by any other main group
    • B24B19/22—Single-purpose machines or devices for particular grinding operations not covered by any other main group characterised by a special design with respect to properties of the material of non-metallic articles to be ground
    • B24B19/226—Single-purpose machines or devices for particular grinding operations not covered by any other main group characterised by a special design with respect to properties of the material of non-metallic articles to be ground of the ends of optical fibres
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
CA 2111010 1993-01-29 1993-12-09 Methode utilisee pour polir finement des elements optiques planaires Abandoned CA2111010A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/011,343 1993-01-29
US1134393A 1993-08-02 1993-08-02

Publications (1)

Publication Number Publication Date
CA2111010A1 true CA2111010A1 (fr) 1994-07-30

Family

ID=21749978

Family Applications (1)

Application Number Title Priority Date Filing Date
CA 2111010 Abandoned CA2111010A1 (fr) 1993-01-29 1993-12-09 Methode utilisee pour polir finement des elements optiques planaires

Country Status (5)

Country Link
EP (1) EP0608730B1 (fr)
JP (1) JPH0752031A (fr)
AU (1) AU673389B2 (fr)
CA (1) CA2111010A1 (fr)
DE (1) DE69411403T2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110948334A (zh) * 2019-12-18 2020-04-03 肖杰 一种磁环加工用表面打磨装置

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0749805A1 (fr) * 1995-06-20 1996-12-27 Valentinas Snitka Procédé et appareil de polissage pour diamant
WO1997000756A2 (fr) * 1995-06-20 1997-01-09 Valentinas Snitka Procede et appareil de polissage de diamants
KR100567982B1 (ko) 1997-12-08 2006-04-05 가부시키가이샤 에바라 세이사꾸쇼 연마액 공급장치
US5989301A (en) * 1998-02-18 1999-11-23 Saint-Gobain Industrial Ceramics, Inc. Optical polishing formulation
WO2000027586A1 (fr) * 1998-11-06 2000-05-18 Shaochien Tseng Procede de polissage plastique par pression uniforme
CN102794698B (zh) * 2012-08-16 2015-10-21 中国科学院西安光学精密机械研究所 辐射温度场加速腐蚀的研抛装置
CN102785145B (zh) * 2012-08-16 2015-07-29 中国科学院西安光学精密机械研究所 基于控制腐蚀的气囊式研抛装置
BR112015022067A2 (pt) 2013-03-14 2017-07-18 Ekos Corp método e aparato para a administração de droga a um sítio alvo
US9793613B2 (en) 2013-10-09 2017-10-17 The Boeing Company Additive manufacturing for radio frequency hardware
CN115042022B (zh) * 2022-07-05 2023-08-18 湖南锐健科技有限公司 基于超声空化液态镓浸润增补的机械手视觉透镜磨削装置

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3061422A (en) * 1960-11-25 1962-10-30 Nippon Electric Co Method of maching semiconductors
SE383784B (sv) * 1970-01-28 1976-03-29 France Etat Armement Forfarande for framstellning av en optisk del med liten vikt av ett monolitiskt emne

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110948334A (zh) * 2019-12-18 2020-04-03 肖杰 一种磁环加工用表面打磨装置

Also Published As

Publication number Publication date
EP0608730A1 (fr) 1994-08-03
JPH0752031A (ja) 1995-02-28
DE69411403D1 (de) 1998-08-13
AU673389B2 (en) 1996-11-07
DE69411403T2 (de) 1999-03-04
AU5384894A (en) 1994-08-04
EP0608730B1 (fr) 1998-07-08

Similar Documents

Publication Publication Date Title
EP0608730B1 (fr) Procédé de polissage fin d'éléments optiques plan
US4989226A (en) Layered devices having surface curvature
US5136818A (en) Method of polishing optical fiber
Foresi et al. Losses in polycrystalline silicon waveguides
US20080037944A1 (en) Optical element and method for producing the same
WO2006041172A1 (fr) Substrat de guide d’onde optique et dispositif générateur d’harmoniques
EP0294650A2 (fr) Procédé et dispositif pour positionner avec précision des microlentilles sur des fibres optiques
US4885055A (en) Layered devices having surface curvature and method of constructing same
CN108766876B (zh) 一种片上高品质薄膜微光学结构的制备方法
US5667426A (en) Method of polishing the end face of a ferrule on an optical connector
Kosaka et al. Photonic-crystal spot-size converter
US5059763A (en) Formation of optical quality surfaces in optical material
Wang et al. Fabrication and packaging for high-Q CaF_2 crystalline resonators with modal modification
US7120326B2 (en) Optical element, optical integrated device, optical information transmission system, and manufacturing methods thereof
US5313543A (en) Second-harmonic generation device and method of producing the same and second-harmonic generation apparatus and method of producing the same
CN1223891C (zh) 光波导器件、使用了光波导器件的相干光源及光学装置
Hinkov et al. Acoustic properties of proton exchanged LiNbO3 investigated by Brillouin scattering
JP4558886B2 (ja) プローブの製造方法及びプローブアレイの製造方法
JP2001208672A6 (ja) プローブ及びプローブの製造方法、プローブアレイ及びプローブアレイの製造方法
JP2005292245A (ja) 光学素子およびその製造方法
Jetté-Charbonneau et al. End-facet polishing of surface plasmon waveguides in lithium niobate
CN118024036B (zh) 厚度渐变的薄膜及其制备方法
Bonnet et al. High resonant reflection of a confined free space beam by a high contrast segmented waveguide
JP2005114788A (ja) 光ファイバの液中研磨方法
KR100315477B1 (ko) 광도파로 소자의 단면처리 방법

Legal Events

Date Code Title Description
EEER Examination request
FZDE Dead