CA2125306C - Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication - Google Patents

Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication

Info

Publication number: CA2125306C
Authority: CA; Canada
Prior art keywords: heater; pits; additional; bypass; array
Prior art date: 1994-06-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CA002125306A

Other languages

English (en)

Other versions

CA2125306A1 (fr

Inventor

Donald J. Drake

Robert P. Altavela

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Xerox Corp

Original Assignee

Xerox Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1994-06-07

Filing date

1994-06-07

Publication date

1999-03-16

1994-06-07 Application filed by Xerox Corp filed Critical Xerox Corp

1994-06-07 Priority to CA002125306A priority Critical patent/CA2125306C/fr

1995-12-08 Publication of CA2125306A1 publication Critical patent/CA2125306A1/fr

1999-03-16 Application granted granted Critical

1999-03-16 Publication of CA2125306C publication Critical patent/CA2125306C/fr

2014-06-07 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

230000015572 biosynthetic process Effects 0.000 title claims description 40
238000005755 formation reaction Methods 0.000 title claims description 40
238000004519 manufacturing process Methods 0.000 title abstract description 15
238000010438 heat treatment Methods 0.000 claims abstract description 45
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 15
229910052710 silicon Inorganic materials 0.000 claims abstract description 15
239000010703 silicon Substances 0.000 claims abstract description 15
239000000758 substrate Substances 0.000 claims description 40
239000004642 Polyimide Substances 0.000 claims description 30
229920001721 polyimide Polymers 0.000 claims description 30
238000003491 array Methods 0.000 claims description 8
238000004891 communication Methods 0.000 claims description 6
230000006872 improvement Effects 0.000 claims description 6
238000000059 patterning Methods 0.000 claims description 6
230000013011 mating Effects 0.000 claims description 2
239000010410 layer Substances 0.000 description 39
239000010408 film Substances 0.000 description 31
235000012431 wafers Nutrition 0.000 description 31
239000000853 adhesive Substances 0.000 description 13
230000001070 adhesive effect Effects 0.000 description 13
238000000034 method Methods 0.000 description 12
239000012790 adhesive layer Substances 0.000 description 8
239000000463 material Substances 0.000 description 8
230000008569 process Effects 0.000 description 7
230000000694 effects Effects 0.000 description 4
238000005530 etching Methods 0.000 description 4
238000000926 separation method Methods 0.000 description 3
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
238000004026 adhesive bonding Methods 0.000 description 2
239000011248 coating agent Substances 0.000 description 2
238000000576 coating method Methods 0.000 description 2
230000001419 dependent effect Effects 0.000 description 2
238000010304 firing Methods 0.000 description 2
230000037406 food intake Effects 0.000 description 2
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238000012986 modification Methods 0.000 description 2
238000011144 upstream manufacturing Methods 0.000 description 2
241001379910 Ephemera danica Species 0.000 description 1
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241000282320 Panthera leo Species 0.000 description 1
229910052581 Si3N4 Inorganic materials 0.000 description 1
230000009471 action Effects 0.000 description 1
230000004888 barrier function Effects 0.000 description 1
230000009286 beneficial effect Effects 0.000 description 1
230000008901 benefit Effects 0.000 description 1
239000006227 byproduct Substances 0.000 description 1
BGTFCAQCKWKTRL-YDEUACAXSA-N chembl1095986 Chemical compound C1[C@@H](N)[C@@H](O)[C@H](C)O[C@H]1O[C@@H]([C@H]1C(N[C@H](C2=CC(O)=CC(O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O)=C2C=2C(O)=CC=C(C=2)[C@@H](NC(=O)[C@@H]2NC(=O)[C@@H]3C=4C=C(C(=C(O)C=4)C)OC=4C(O)=CC=C(C=4)[C@@H](N)C(=O)N[C@@H](C(=O)N3)[C@H](O)C=3C=CC(O4)=CC=3)C(=O)N1)C(O)=O)=O)C(C=C1)=CC=C1OC1=C(O[C@@H]3[C@H]([C@H](O)[C@@H](O)[C@H](CO[C@@H]5[C@H]([C@@H](O)[C@H](O)[C@@H](C)O5)O)O3)O[C@@H]3[C@H]([C@@H](O)[C@H](O)[C@@H](CO)O3)O[C@@H]3[C@H]([C@H](O)[C@@H](CO)O3)O)C4=CC2=C1 BGTFCAQCKWKTRL-YDEUACAXSA-N 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
230000002950 deficient Effects 0.000 description 1
239000012530 fluid Substances 0.000 description 1
-1 for example Substances 0.000 description 1
238000007641 inkjet printing Methods 0.000 description 1
239000012212 insulator Substances 0.000 description 1
238000011835 investigation Methods 0.000 description 1
238000003475 lamination Methods 0.000 description 1
238000002161 passivation Methods 0.000 description 1
238000000206 photolithography Methods 0.000 description 1
230000001737 promoting effect Effects 0.000 description 1
239000011241 protective layer Substances 0.000 description 1
238000007665 sagging Methods 0.000 description 1
235000012239 silicon dioxide Nutrition 0.000 description 1
239000000377 silicon dioxide Substances 0.000 description 1
HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
238000004528 spin coating Methods 0.000 description 1
238000005507 spraying Methods 0.000 description 1
239000010421 standard material Substances 0.000 description 1
229910052715 tantalum Inorganic materials 0.000 description 1
GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
239000010409 thin film Substances 0.000 description 1
238000012876 topography Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles

Landscapes

Particle Formation And Scattering Control In Inkjet Printers (AREA)

CA002125306A 1994-06-07 1994-06-07 Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication Expired - Fee Related CA2125306C (fr)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
CA002125306A CA2125306C (fr)	1994-06-07	1994-06-07	Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
CA002125306A CA2125306C (fr)	1994-06-07	1994-06-07	Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication

Publications (2)

Publication Number	Publication Date
CA2125306A1 CA2125306A1 (fr)	1995-12-08
CA2125306C true CA2125306C (fr)	1999-03-16

Family

ID=4153749

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA002125306A Expired - Fee Related CA2125306C (fr)	1994-06-07	1994-06-07	Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication

Country Status (1)

Country	Link
CA (1)	CA2125306C (fr)

1994
- 1994-06-07 CA CA002125306A patent/CA2125306C/fr not_active Expired - Fee Related

Also Published As

Publication number	Publication date
CA2125306A1 (fr)	1995-12-08

Legal Events

Date	Code	Title	Description
1994-06-07	EEER	Examination request
2003-06-09	MKLA	Lapsed

Publication	Publication Date	Title
US5132707A (en)	1992-07-21	Ink jet printhead
US4786357A (en)	1988-11-22	Thermal ink jet printhead and fabrication method therefor
US4899181A (en)	1990-02-06	Large monolithic thermal ink jet printhead
US4774530A (en)	1988-09-27	Ink jet printhead
EP0210848B1 (fr)	1992-03-04	Tête d'impression thermique à jet d'encre
EP1923219B1 (fr)	2014-02-26	Tête à jet d'encre
EP0322228B1 (fr)	1993-11-24	Grand ensemble de tête d'impression à jet d'encre thermique
EP0624472B1 (fr)	1997-07-23	Tête à jet d'encre
US4899178A (en)	1990-02-06	Thermal ink jet printhead with internally fed ink reservoir
GB2156741A (en)	1985-10-16	Ink-jet printers
JPH0717064B2 (ja)	1995-03-01	インキジェットプリントヘッド及びその製造方法
EP0863005B1 (fr)	2002-07-24	Structure pour effectuer d'adhésion entre le substrat et la barrière d'encre dans une tête d'impression à jet d'encre
US5412412A (en)	1995-05-02	Ink jet printhead having compensation for topographical formations developed during fabrication
US6910272B2 (en)	2005-06-28	Method of manufacturing an ink jet recording head
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CN1754701B (zh)	2010-06-16	喷墨头和制造喷墨头的方法
US5450108A (en)	1995-09-12	Ink jet printhead which avoids effects of unwanted formations developed during fabrication
CA2125306C (fr)	1999-03-16	Tete d'impression a jet d'encre a correction des variations de geometrie introduites au cours de sa fabrication
US6491383B2 (en)	2002-12-10	Head chip and head unit
US8100508B2 (en)	2012-01-24	Ink jet printing head
US20020126184A1 (en)	2002-09-12	Ink jet printhead with large size silicon wafer and relative manufacturing process
CN110884257B (zh)	2022-01-11	液体喷射头和液体喷射头的制造方法
US8152278B2 (en)	2012-04-10	Liquid jet head chip and manufacturing method therefor
JP2001232794A (ja)	2001-08-28	インクジェットヘッド、その製造方法、インクジェット記録装置、及び、アクチュエータ
JP2003053967A (ja)	2003-02-26	インクジェット式記録ヘッド及びインクジェット式記録装置