CA2320865C - Procede de phosphatation electrolytique et revetement composite forme sur une surface d'acier - Google Patents
Procede de phosphatation electrolytique et revetement composite forme sur une surface d'acier Download PDFInfo
- Publication number
- CA2320865C CA2320865C CA2320865A CA2320865A CA2320865C CA 2320865 C CA2320865 C CA 2320865C CA 2320865 A CA2320865 A CA 2320865A CA 2320865 A CA2320865 A CA 2320865A CA 2320865 C CA2320865 C CA 2320865C
- Authority
- CA
- Canada
- Prior art keywords
- chemical treatment
- phosphate
- ions
- phosphate chemical
- electrolytic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000011282 treatment Methods 0.000 title claims abstract description 702
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 title claims abstract description 572
- 229910019142 PO4 Inorganic materials 0.000 title claims abstract description 485
- 239000010452 phosphate Substances 0.000 title claims abstract description 478
- 239000000126 substance Substances 0.000 title claims abstract description 396
- 238000000034 method Methods 0.000 title claims description 115
- 229910000831 Steel Inorganic materials 0.000 title description 16
- 150000001875 compounds Chemical class 0.000 title description 16
- 239000010959 steel Substances 0.000 title description 16
- 238000006243 chemical reaction Methods 0.000 claims abstract description 171
- 229910052751 metal Inorganic materials 0.000 claims abstract description 168
- 239000002184 metal Substances 0.000 claims abstract description 165
- 229910021645 metal ion Inorganic materials 0.000 claims abstract description 112
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 88
- 238000005755 formation reaction Methods 0.000 claims abstract description 82
- 150000002500 ions Chemical class 0.000 claims abstract description 76
- 229910001868 water Inorganic materials 0.000 claims abstract description 61
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 59
- -1 nitrate ions Chemical class 0.000 claims abstract description 52
- 239000002244 precipitate Substances 0.000 claims abstract description 47
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 39
- 230000002829 reductive effect Effects 0.000 claims abstract description 37
- 239000002904 solvent Substances 0.000 claims abstract description 37
- 239000007787 solid Substances 0.000 claims abstract description 20
- 230000000694 effects Effects 0.000 claims abstract description 19
- 229910002651 NO3 Inorganic materials 0.000 claims abstract description 14
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 128
- 238000005868 electrolysis reaction Methods 0.000 claims description 125
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 121
- 239000011701 zinc Substances 0.000 claims description 84
- 229910052742 iron Inorganic materials 0.000 claims description 68
- 229910052725 zinc Inorganic materials 0.000 claims description 65
- 230000015572 biosynthetic process Effects 0.000 claims description 54
- 239000000463 material Substances 0.000 claims description 48
- 239000007769 metal material Substances 0.000 claims description 43
- 229910052759 nickel Inorganic materials 0.000 claims description 42
- 239000002253 acid Substances 0.000 claims description 41
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 33
- 239000010949 copper Substances 0.000 claims description 32
- 239000000203 mixture Substances 0.000 claims description 31
- 238000010494 dissociation reaction Methods 0.000 claims description 29
- 230000005593 dissociations Effects 0.000 claims description 29
- 229910052802 copper Inorganic materials 0.000 claims description 24
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 23
- 239000013078 crystal Substances 0.000 claims description 23
- 239000001257 hydrogen Substances 0.000 claims description 23
- 229910052739 hydrogen Inorganic materials 0.000 claims description 23
- 229910052748 manganese Inorganic materials 0.000 claims description 22
- 239000011572 manganese Substances 0.000 claims description 22
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 14
- 239000004020 conductor Substances 0.000 claims description 12
- 239000011575 calcium Substances 0.000 claims description 11
- 229910052791 calcium Inorganic materials 0.000 claims description 11
- 239000007788 liquid Substances 0.000 claims description 11
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 8
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 claims description 6
- 229910017604 nitric acid Inorganic materials 0.000 claims description 6
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 claims description 5
- 238000006356 dehydrogenation reaction Methods 0.000 claims description 4
- 239000011777 magnesium Substances 0.000 claims description 3
- 229910052749 magnesium Inorganic materials 0.000 claims description 3
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims description 3
- 125000002091 cationic group Chemical group 0.000 claims description 2
- 230000000087 stabilizing effect Effects 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 abstract description 19
- 235000021317 phosphate Nutrition 0.000 description 366
- 239000000243 solution Substances 0.000 description 62
- 230000000052 comparative effect Effects 0.000 description 54
- 239000011248 coating agent Substances 0.000 description 50
- 238000000576 coating method Methods 0.000 description 50
- 238000001556 precipitation Methods 0.000 description 46
- 235000011007 phosphoric acid Nutrition 0.000 description 41
- 238000003487 electrochemical reaction Methods 0.000 description 37
- 238000004458 analytical method Methods 0.000 description 36
- 238000006722 reduction reaction Methods 0.000 description 29
- 238000004090 dissolution Methods 0.000 description 28
- 230000002093 peripheral effect Effects 0.000 description 28
- 238000007254 oxidation reaction Methods 0.000 description 27
- 238000005260 corrosion Methods 0.000 description 26
- 230000007797 corrosion Effects 0.000 description 26
- 229940085991 phosphate ion Drugs 0.000 description 26
- 230000008859 change Effects 0.000 description 25
- 238000009713 electroplating Methods 0.000 description 25
- 238000004070 electrodeposition Methods 0.000 description 23
- 229910001415 sodium ion Inorganic materials 0.000 description 22
- 238000004381 surface treatment Methods 0.000 description 22
- 238000010349 cathodic reaction Methods 0.000 description 21
- 238000011156 evaluation Methods 0.000 description 20
- 150000002739 metals Chemical class 0.000 description 20
- 238000010273 cold forging Methods 0.000 description 19
- 230000003647 oxidation Effects 0.000 description 19
- 230000009467 reduction Effects 0.000 description 19
- 230000008569 process Effects 0.000 description 17
- 125000004429 atom Chemical group 0.000 description 16
- 230000000630 rising effect Effects 0.000 description 16
- 239000010802 sludge Substances 0.000 description 16
- 150000001450 anions Chemical class 0.000 description 15
- 238000002149 energy-dispersive X-ray emission spectroscopy Methods 0.000 description 15
- 229910052782 aluminium Inorganic materials 0.000 description 14
- 238000007747 plating Methods 0.000 description 14
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 12
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 150000001768 cations Chemical class 0.000 description 11
- 239000000758 substrate Substances 0.000 description 11
- 238000000354 decomposition reaction Methods 0.000 description 10
- 229910052698 phosphorus Inorganic materials 0.000 description 10
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 10
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 9
- 239000011574 phosphorus Substances 0.000 description 9
- 229910052731 fluorine Inorganic materials 0.000 description 8
- 239000011737 fluorine Substances 0.000 description 8
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 8
- 230000009471 action Effects 0.000 description 7
- 238000001914 filtration Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- FKNQFGJONOIPTF-UHFFFAOYSA-N Sodium cation Chemical compound [Na+] FKNQFGJONOIPTF-UHFFFAOYSA-N 0.000 description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 229910052801 chlorine Inorganic materials 0.000 description 6
- 239000000460 chlorine Substances 0.000 description 6
- 238000011109 contamination Methods 0.000 description 6
- 125000004093 cyano group Chemical group *C#N 0.000 description 6
- 238000005461 lubrication Methods 0.000 description 6
- 239000000344 soap Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 6
- 238000002441 X-ray diffraction Methods 0.000 description 5
- 238000005345 coagulation Methods 0.000 description 5
- 239000000470 constituent Substances 0.000 description 5
- 230000007423 decrease Effects 0.000 description 5
- 239000007772 electrode material Substances 0.000 description 5
- 238000007654 immersion Methods 0.000 description 5
- 230000002101 lytic effect Effects 0.000 description 5
- 230000033116 oxidation-reduction process Effects 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000004308 accommodation Effects 0.000 description 4
- 230000001419 dependent effect Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 230000002401 inhibitory effect Effects 0.000 description 4
- 229910001453 nickel ion Inorganic materials 0.000 description 4
- 150000003839 salts Chemical class 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 description 3
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 3
- PTFCDOFLOPIGGS-UHFFFAOYSA-N Zinc dication Chemical compound [Zn+2] PTFCDOFLOPIGGS-UHFFFAOYSA-N 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000003638 chemical reducing agent Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 230000003750 conditioning effect Effects 0.000 description 3
- 229910001447 ferric ion Inorganic materials 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000002198 insoluble material Substances 0.000 description 3
- 230000001376 precipitating effect Effects 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 230000001737 promoting effect Effects 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 229910021591 Copper(I) chloride Inorganic materials 0.000 description 2
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910021607 Silver chloride Inorganic materials 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000010405 anode material Substances 0.000 description 2
- 238000013459 approach Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229910001424 calcium ion Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 2
- 238000013329 compounding Methods 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000013527 degreasing agent Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005242 forging Methods 0.000 description 2
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 2
- 230000001976 improved effect Effects 0.000 description 2
- 239000011133 lead Substances 0.000 description 2
- 239000010687 lubricating oil Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 125000002467 phosphate group Chemical group [H]OP(=O)(O[H])O[*] 0.000 description 2
- 238000006479 redox reaction Methods 0.000 description 2
- 239000000523 sample Substances 0.000 description 2
- 238000001878 scanning electron micrograph Methods 0.000 description 2
- HKZLPVFGJNLROG-UHFFFAOYSA-M silver monochloride Chemical compound [Cl-].[Ag+] HKZLPVFGJNLROG-UHFFFAOYSA-M 0.000 description 2
- LPXPTNMVRIOKMN-UHFFFAOYSA-M sodium nitrite Chemical compound [Na+].[O-]N=O LPXPTNMVRIOKMN-UHFFFAOYSA-M 0.000 description 2
- RYYKJJJTJZKILX-UHFFFAOYSA-M sodium octadecanoate Chemical compound [Na+].CCCCCCCCCCCCCCCCCC([O-])=O RYYKJJJTJZKILX-UHFFFAOYSA-M 0.000 description 2
- 230000008685 targeting Effects 0.000 description 2
- 239000011135 tin Substances 0.000 description 2
- 229910052718 tin Inorganic materials 0.000 description 2
- 238000000108 ultra-filtration Methods 0.000 description 2
- 229910000165 zinc phosphate Inorganic materials 0.000 description 2
- XOOUIPVCVHRTMJ-UHFFFAOYSA-L zinc stearate Chemical compound [Zn+2].CCCCCCCCCCCCCCCCCC([O-])=O.CCCCCCCCCCCCCCCCCC([O-])=O XOOUIPVCVHRTMJ-UHFFFAOYSA-L 0.000 description 2
- JQMFQLVAJGZSQS-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-N-(2-oxo-3H-1,3-benzoxazol-6-yl)acetamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)NC1=CC2=C(NC(O2)=O)C=C1 JQMFQLVAJGZSQS-UHFFFAOYSA-N 0.000 description 1
- BHPQYMZQTOCNFJ-UHFFFAOYSA-N Calcium cation Chemical compound [Ca+2] BHPQYMZQTOCNFJ-UHFFFAOYSA-N 0.000 description 1
- JPVYNHNXODAKFH-UHFFFAOYSA-N Cu2+ Chemical compound [Cu+2] JPVYNHNXODAKFH-UHFFFAOYSA-N 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- PIEMIPFEDUYGMC-UHFFFAOYSA-N P(=O)(=O)[Zn] Chemical compound P(=O)(=O)[Zn] PIEMIPFEDUYGMC-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 239000002390 adhesive tape Substances 0.000 description 1
- 239000010407 anodic oxide Substances 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000001112 coagulating effect Effects 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 229910001431 copper ion Inorganic materials 0.000 description 1
- OXBLHERUFWYNTN-UHFFFAOYSA-M copper(I) chloride Chemical compound [Cu]Cl OXBLHERUFWYNTN-UHFFFAOYSA-M 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000001962 electrophoresis Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910001448 ferrous ion Inorganic materials 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 150000004715 keto acids Chemical class 0.000 description 1
- 230000001050 lubricating effect Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910001437 manganese ion Inorganic materials 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000001404 mediated effect Effects 0.000 description 1
- 238000004452 microanalysis Methods 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000007800 oxidant agent Substances 0.000 description 1
- 238000010979 pH adjustment Methods 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 125000004437 phosphorous atom Chemical group 0.000 description 1
- 230000026731 phosphorylation Effects 0.000 description 1
- 238000006366 phosphorylation reaction Methods 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 229910001414 potassium ion Inorganic materials 0.000 description 1
- 230000003334 potential effect Effects 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 235000010288 sodium nitrite Nutrition 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- LRXTYHSAJDENHV-UHFFFAOYSA-H zinc phosphate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O LRXTYHSAJDENHV-UHFFFAOYSA-H 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
- C25D11/36—Phosphatising
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Treatment Of Metals (AREA)
Abstract
Cette invention se rapporte à un procédé de phosphatation convenant à un traitement électrolytique, qui utilise un bain de phosphatation contenant un ion phosphate et de l'acide phosphorique, de l'acide nitrique, un ion métallique capable de former un complexe avec le ion phosphate dans le bain de phosphatation et un ion métallique ayant un potentiel électrique auquel l'ion métallique dissous dans le bain de phosphatation est réduit et se dépose sous la forme de métal d'une valeur identique ou supérieure à celle de la réaction par électrolyse anodique de l'eau, ainsi qu'au solvant utilisé dans ce bain. Ce bain contient un ion métallique autre qu'un constituant du revêtement devant être formé selon une quantité comprise entre 0 et 400 ppm et ce bain est sensiblement exempt de particules solides pouvant affecter la réaction de formation du film de revêtement.
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP35925498 | 1998-12-17 | ||
| JP10/359254 | 1998-12-17 | ||
| PCT/JP1999/007124 WO2000036191A1 (fr) | 1998-12-17 | 1999-12-17 | Procede de phosphatation electrolytique et revetement composite forme sur une surface d'acier |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2320865A1 CA2320865A1 (fr) | 2000-06-22 |
| CA2320865C true CA2320865C (fr) | 2010-03-16 |
Family
ID=18463558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA2320865A Expired - Fee Related CA2320865C (fr) | 1998-12-17 | 1999-12-17 | Procede de phosphatation electrolytique et revetement composite forme sur une surface d'acier |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1074640A4 (fr) |
| KR (1) | KR100400522B1 (fr) |
| CN (1) | CN1221687C (fr) |
| BR (1) | BR9907916B1 (fr) |
| CA (1) | CA2320865C (fr) |
| WO (1) | WO2000036191A1 (fr) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3479609B2 (ja) * | 1999-03-02 | 2003-12-15 | 日本パーカライジング株式会社 | スラッジ発生のないリン酸亜鉛処理液およびリン酸亜鉛処理方法 |
| JP4019723B2 (ja) * | 2001-02-23 | 2007-12-12 | 株式会社デンソー | 電解リン酸塩化成処理方法 |
| CA2574115A1 (fr) * | 2004-07-21 | 2006-01-26 | The University Of British Columbia | Implants osseux et procedes d'enrobage de ces implants |
| DE102005023023B4 (de) * | 2005-05-19 | 2017-02-09 | Chemetall Gmbh | Verfahren zur Vorbereitung von metallischen Werkstücken zum Kaltumformen, mit dem Verfahren beschichtete Werkstücke und ihre Verwendung |
| EP2186928A1 (fr) * | 2008-11-14 | 2010-05-19 | Enthone, Inc. | Procédé pour le post-traitement des couches métalliques |
| CN113073371A (zh) * | 2021-03-22 | 2021-07-06 | 领润(南京)绿色化学有限公司 | 一种清洁型对阳极板友好型电解磷化液及其磷化工艺 |
| CN115652392A (zh) * | 2022-10-31 | 2023-01-31 | 武汉钢铁有限公司 | 在热轧工件氧化层上直接涂装的前处理方法 |
| CN119589305B (zh) * | 2024-12-04 | 2025-09-26 | 东莞市志兴电子五金有限公司 | 一种汽车标识贴牌的制备方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4111186A1 (de) * | 1991-04-06 | 1992-10-08 | Henkel Kgaa | Verfahren zum phosphatieren von metalloberflaechen |
| JPH05306497A (ja) * | 1992-04-30 | 1993-11-19 | Nippondenso Co Ltd | リン酸塩化成処理方法 |
-
1999
- 1999-12-17 CA CA2320865A patent/CA2320865C/fr not_active Expired - Fee Related
- 1999-12-17 CN CNB998041718A patent/CN1221687C/zh not_active Expired - Lifetime
- 1999-12-17 KR KR10-2000-7008710A patent/KR100400522B1/ko not_active Expired - Lifetime
- 1999-12-17 EP EP99959898A patent/EP1074640A4/fr not_active Ceased
- 1999-12-17 WO PCT/JP1999/007124 patent/WO2000036191A1/fr not_active Ceased
- 1999-12-17 BR BRPI9907916-0A patent/BR9907916B1/pt not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR100400522B1 (ko) | 2003-10-10 |
| WO2000036191A1 (fr) | 2000-06-22 |
| EP1074640A1 (fr) | 2001-02-07 |
| CN1221687C (zh) | 2005-10-05 |
| CA2320865A1 (fr) | 2000-06-22 |
| BR9907916A (pt) | 2002-04-30 |
| KR20010040816A (ko) | 2001-05-15 |
| CN1293720A (zh) | 2001-05-02 |
| BR9907916B1 (pt) | 2011-07-26 |
| EP1074640A4 (fr) | 2006-06-21 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP2054539B1 (fr) | Procédé de dépôt de couches de chrome sous forme de placage au chrome dur, bain galvanoplastique et surfaces à base de chrome dur | |
| JP4419905B2 (ja) | 電解リン酸塩化成処理方法 | |
| CA2320865C (fr) | Procede de phosphatation electrolytique et revetement composite forme sur une surface d'acier | |
| CA2372730C (fr) | Methode de phosphatation electrolytique | |
| US4363708A (en) | Process for exposing silicon crystals on the surface of a component of an aluminum alloy of high silicon content | |
| CN1867704B (zh) | 用于磷酸盐化金属表面的电解方法和由此磷酸盐化的金属层 | |
| JP3678096B2 (ja) | 電解リン酸塩化成処理方法及び鉄鋼表面に形成される複合皮膜の形成方法 | |
| CZ134094A3 (en) | Process of electrochemical reduction of nitrates | |
| US5645706A (en) | Phosphate chemical treatment method | |
| Warwick et al. | The autocatalytic deposition of tin | |
| Snyder | Decorative chromium plating | |
| JPS63270478A (ja) | リン酸塩化成処理方法 | |
| AU663599B2 (en) | Phosphating process | |
| JP2640933B2 (ja) | 化学メッキ廃液の電解処理方法 | |
| JP2014224280A (ja) | リン酸塩化成処理浴組成物及びリン酸塩皮膜形成方法 | |
| WO2005014890A1 (fr) | Solution electrolytique | |
| JPH02153098A (ja) | リン酸塩化成処理法 | |
| KR20020061542A (ko) | 금속 표면-처리 방법 | |
| JP4517177B2 (ja) | 無電解ニッケルめっき液の処理方法 | |
| JP2007321219A (ja) | 電解リン酸塩化成処理を用いた潤滑処理方法 | |
| JPH11262641A (ja) | 無電解ニッケルめっき液再生用分離膜及び無電解ニッケルめっき液再生法 | |
| Kakareka et al. | Peculiarities of electroless deposition of Ni-WP alloy on aluminum | |
| PL176842B1 (pl) | Kąpiel do galwanicznego chromowania | |
| UA5672U (uk) | Спосіб нікелювання алюмінієвих сплавів | |
| HK1136010A (en) | Method for deposition of chromium layers as hard-chrome plating, electroplating bath and hard-chrome surfaces |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |
Effective date: 20131217 |