CA2329412C - Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises - Google Patents

Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises Download PDF

Info

Publication number: CA2329412C
Authority: CA; Canada
Prior art keywords: mask; article; agent; channels; applying
Prior art date: 1998-04-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CA2329412A

Other languages

English (en)

Other versions

CA2329412A1 (fr

Inventor

Rebecca J. Jackman

David C. Duffy

George M. Whitesides

Kathleen M. Vaeth

Klavs F. Jensen

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Massachusetts Institute of Technology

Harvard University

Original Assignee

Massachusetts Institute of Technology

Harvard University

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1998-04-21

Filing date

1999-04-20

Publication date

2010-09-21

1999-04-20 Application filed by Massachusetts Institute of Technology, Harvard University filed Critical Massachusetts Institute of Technology

1999-10-28 Publication of CA2329412A1 publication Critical patent/CA2329412A1/fr

2010-09-21 Application granted granted Critical

2010-09-21 Publication of CA2329412C publication Critical patent/CA2329412C/fr

2019-04-20 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000004519 manufacturing process Methods 0.000 title description 13
238000000034 method Methods 0.000 claims abstract description 180
239000012530 fluid Substances 0.000 claims abstract description 76
239000000463 material Substances 0.000 claims abstract description 72
230000008021 deposition Effects 0.000 claims abstract description 41
239000007788 liquid Substances 0.000 claims abstract description 13
239000003795 chemical substances by application Substances 0.000 claims description 141
230000000873 masking effect Effects 0.000 claims description 54
238000000151 deposition Methods 0.000 claims description 39
239000002243 precursor Substances 0.000 claims description 38
238000007789 sealing Methods 0.000 claims description 16
239000003124 biologic agent Substances 0.000 claims description 13
238000001704 evaporation Methods 0.000 claims description 13
230000008020 evaporation Effects 0.000 claims description 12
239000013543 active substance Substances 0.000 claims description 11
238000005229 chemical vapour deposition Methods 0.000 claims description 7
239000000725 suspension Substances 0.000 claims description 6
230000015556 catabolic process Effects 0.000 claims description 4
238000006731 degradation reaction Methods 0.000 claims description 4
230000000593 degrading effect Effects 0.000 claims description 3
238000004070 electrodeposition Methods 0.000 claims description 3
229910010272 inorganic material Inorganic materials 0.000 claims description 3
230000003100 immobilizing effect Effects 0.000 claims description 2
238000004544 sputter deposition Methods 0.000 claims description 2
150000002484 inorganic compounds Chemical class 0.000 claims 2
239000002245 particle Substances 0.000 claims 2
230000001737 promoting effect Effects 0.000 claims 1
239000000758 substrate Substances 0.000 abstract description 109
239000004205 dimethyl polysiloxane Substances 0.000 description 36
229920000435 poly(dimethylsiloxane) Polymers 0.000 description 36
229920000642 polymer Polymers 0.000 description 24
239000010410 layer Substances 0.000 description 21
229910052751 metal Inorganic materials 0.000 description 21
239000002184 metal Substances 0.000 description 21
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 20
229910052737 gold Inorganic materials 0.000 description 20
239000010931 gold Substances 0.000 description 20
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 19
229910052710 silicon Inorganic materials 0.000 description 19
239000010703 silicon Substances 0.000 description 19
230000003213 activating effect Effects 0.000 description 17
238000000206 photolithography Methods 0.000 description 17
241000894007 species Species 0.000 description 17
-1 poly(p-phenylenevinylene) Polymers 0.000 description 16
239000000243 solution Substances 0.000 description 16
238000000059 patterning Methods 0.000 description 14
229920002120 photoresistant polymer Polymers 0.000 description 14
238000006243 chemical reaction Methods 0.000 description 11
229920001971 elastomer Polymers 0.000 description 11
239000011521 glass Substances 0.000 description 11
230000008569 process Effects 0.000 description 11
238000003491 array Methods 0.000 description 10
230000015572 biosynthetic process Effects 0.000 description 10
239000000806 elastomer Substances 0.000 description 10
239000000203 mixture Substances 0.000 description 10
230000003287 optical effect Effects 0.000 description 10
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 9
239000000499 gel Substances 0.000 description 9
229920000553 poly(phenylenevinylene) Polymers 0.000 description 9
108090000623 proteins and genes Proteins 0.000 description 9
102000004169 proteins and genes Human genes 0.000 description 9
238000004528 spin coating Methods 0.000 description 9
239000010409 thin film Substances 0.000 description 9
239000000919 ceramic Substances 0.000 description 8
238000005401 electroluminescence Methods 0.000 description 8
238000007747 plating Methods 0.000 description 8
239000002904 solvent Substances 0.000 description 8
239000004593 Epoxy Substances 0.000 description 7
239000004005 microsphere Substances 0.000 description 7
239000000523 sample Substances 0.000 description 7
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
239000000126 substance Substances 0.000 description 7
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
239000010408 film Substances 0.000 description 6
230000002209 hydrophobic effect Effects 0.000 description 6
229910052709 silver Inorganic materials 0.000 description 6
239000012703 sol-gel precursor Substances 0.000 description 6
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 5
230000008901 benefit Effects 0.000 description 5
238000005538 encapsulation Methods 0.000 description 5
238000007373 indentation Methods 0.000 description 5
238000001465 metallisation Methods 0.000 description 5
150000002739 metals Chemical class 0.000 description 5
239000000178 monomer Substances 0.000 description 5
238000006116 polymerization reaction Methods 0.000 description 5
238000001878 scanning electron micrograph Methods 0.000 description 5
239000004332 silver Substances 0.000 description 5
238000002207 thermal evaporation Methods 0.000 description 5
239000010936 titanium Substances 0.000 description 5
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
229910052782 aluminium Inorganic materials 0.000 description 4
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
239000003054 catalyst Substances 0.000 description 4
230000003197 catalytic effect Effects 0.000 description 4
230000008859 change Effects 0.000 description 4
229920001577 copolymer Polymers 0.000 description 4
238000009713 electroplating Methods 0.000 description 4
230000003993 interaction Effects 0.000 description 4
238000000608 laser ablation Methods 0.000 description 4
239000007791 liquid phase Substances 0.000 description 4
239000013307 optical fiber Substances 0.000 description 4
238000001020 plasma etching Methods 0.000 description 4
150000003839 salts Chemical class 0.000 description 4
239000000377 silicon dioxide Substances 0.000 description 4
235000012239 silicon dioxide Nutrition 0.000 description 4
239000007787 solid Substances 0.000 description 4
LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 4
229910052719 titanium Inorganic materials 0.000 description 4
229910001868 water Inorganic materials 0.000 description 4
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
108090000790 Enzymes Proteins 0.000 description 3
102000004190 Enzymes Human genes 0.000 description 3
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
239000004793 Polystyrene Substances 0.000 description 3
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
YBJHBAHKTGYVGT-ZKWXMUAHSA-N biotin Natural products N1C(=O)N[C@@H]2[C@H](CCCCC(=O)O)SC[C@@H]21 YBJHBAHKTGYVGT-ZKWXMUAHSA-N 0.000 description 3
229910052802 copper Inorganic materials 0.000 description 3
239000010949 copper Substances 0.000 description 3
239000002638 heterogeneous catalyst Substances 0.000 description 3
239000002815 homogeneous catalyst Substances 0.000 description 3
AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 3
229910044991 metal oxide Inorganic materials 0.000 description 3
150000004706 metal oxides Chemical class 0.000 description 3
238000004377 microelectronic Methods 0.000 description 3
238000005424 photoluminescence Methods 0.000 description 3
229920003023 plastic Polymers 0.000 description 3
239000004033 plastic Substances 0.000 description 3
229910052697 platinum Inorganic materials 0.000 description 3
229920002223 polystyrene Polymers 0.000 description 3
230000002441 reversible effect Effects 0.000 description 3
TVIVIEFSHFOWTE-UHFFFAOYSA-K tri(quinolin-8-yloxy)alumane Chemical compound [Al+3].C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1.C1=CN=C2C([O-])=CC=CC2=C1 TVIVIEFSHFOWTE-UHFFFAOYSA-K 0.000 description 3
229910052726 zirconium Inorganic materials 0.000 description 3
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
108090001008 Avidin Proteins 0.000 description 2
102000014914 Carrier Proteins Human genes 0.000 description 2
241000252506 Characiformes Species 0.000 description 2
HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
108010010803 Gelatin Proteins 0.000 description 2
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
239000005083 Zinc sulfide Substances 0.000 description 2
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
239000002253 acid Substances 0.000 description 2
150000001336 alkenes Chemical class 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
229960002685 biotin Drugs 0.000 description 2
235000020958 biotin Nutrition 0.000 description 2
239000011616 biotin Substances 0.000 description 2
QARVLSVVCXYDNA-UHFFFAOYSA-N bromobenzene Chemical compound BrC1=CC=CC=C1 QARVLSVVCXYDNA-UHFFFAOYSA-N 0.000 description 2
239000007853 buffer solution Substances 0.000 description 2
239000013626 chemical specie Substances 0.000 description 2
229910052681 coesite Inorganic materials 0.000 description 2
239000000084 colloidal system Substances 0.000 description 2
238000004891 communication Methods 0.000 description 2
239000002131 composite material Substances 0.000 description 2
239000002322 conducting polymer Substances 0.000 description 2
229920001940 conductive polymer Polymers 0.000 description 2
238000007334 copolymerization reaction Methods 0.000 description 2
230000008878 coupling Effects 0.000 description 2
238000010168 coupling process Methods 0.000 description 2
238000005859 coupling reaction Methods 0.000 description 2
229910052906 cristobalite Inorganic materials 0.000 description 2
HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
238000005137 deposition process Methods 0.000 description 2
238000011161 development Methods 0.000 description 2
239000013536 elastomeric material Substances 0.000 description 2
230000005518 electrochemistry Effects 0.000 description 2
238000005566 electron beam evaporation Methods 0.000 description 2
238000005516 engineering process Methods 0.000 description 2
238000005530 etching Methods 0.000 description 2
238000011049 filling Methods 0.000 description 2
238000002073 fluorescence micrograph Methods 0.000 description 2
239000008273 gelatin Substances 0.000 description 2
229920000159 gelatin Polymers 0.000 description 2
235000019322 gelatine Nutrition 0.000 description 2
235000011852 gelatine desserts Nutrition 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
239000000017 hydrogel Substances 0.000 description 2
238000005984 hydrogenation reaction Methods 0.000 description 2
230000007062 hydrolysis Effects 0.000 description 2
238000006460 hydrolysis reaction Methods 0.000 description 2
238000007641 inkjet printing Methods 0.000 description 2
230000000670 limiting effect Effects 0.000 description 2
238000004020 luminiscence type Methods 0.000 description 2
239000011159 matrix material Substances 0.000 description 2
239000012528 membrane Substances 0.000 description 2
239000002923 metal particle Substances 0.000 description 2
MYWUZJCMWCOHBA-VIFPVBQESA-N methamphetamine Chemical compound CN[C@@H](C)CC1=CC=CC=C1 MYWUZJCMWCOHBA-VIFPVBQESA-N 0.000 description 2
238000001471 micro-filtration Methods 0.000 description 2
238000000813 microcontact printing Methods 0.000 description 2
238000001053 micromoulding Methods 0.000 description 2
VOFUROIFQGPCGE-UHFFFAOYSA-N nile red Chemical compound C1=CC=C2C3=NC4=CC=C(N(CC)CC)C=C4OC3=CC(=O)C2=C1 VOFUROIFQGPCGE-UHFFFAOYSA-N 0.000 description 2
238000000879 optical micrograph Methods 0.000 description 2
239000011368 organic material Substances 0.000 description 2
150000002902 organometallic compounds Chemical class 0.000 description 2
125000002524 organometallic group Chemical group 0.000 description 2
238000006303 photolysis reaction Methods 0.000 description 2
230000015843 photosynthesis, light reaction Effects 0.000 description 2
229920003227 poly(N-vinyl carbazole) Polymers 0.000 description 2
229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
229920000515 polycarbonate Polymers 0.000 description 2
239000004417 polycarbonate Substances 0.000 description 2
238000006068 polycondensation reaction Methods 0.000 description 2
239000004926 polymethyl methacrylate Substances 0.000 description 2
239000000843 powder Substances 0.000 description 2
LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 2
239000001044 red dye Substances 0.000 description 2
229920005989 resin Polymers 0.000 description 2
239000011347 resin Substances 0.000 description 2
238000001179 sorption measurement Methods 0.000 description 2
229910052682 stishovite Inorganic materials 0.000 description 2
238000012360 testing method Methods 0.000 description 2
229910052905 tridymite Inorganic materials 0.000 description 2
ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
229910052984 zinc sulfide Inorganic materials 0.000 description 2
DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 2
OEZWIIUNRMEKGW-UHFFFAOYSA-N (2-bromophenyl) 2-methylprop-2-enoate Chemical class CC(=C)C(=O)OC1=CC=CC=C1Br OEZWIIUNRMEKGW-UHFFFAOYSA-N 0.000 description 1
VNYTWDAWZSFABS-UHFFFAOYSA-N (2-bromophenyl) prop-2-enoate Chemical class BrC1=CC=CC=C1OC(=O)C=C VNYTWDAWZSFABS-UHFFFAOYSA-N 0.000 description 1
FMQPBWHSNCRVQJ-UHFFFAOYSA-N 1,1,1,3,3,3-hexafluoropropan-2-yl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC(C(F)(F)F)C(F)(F)F FMQPBWHSNCRVQJ-UHFFFAOYSA-N 0.000 description 1
KLCLIOISYBHYDZ-UHFFFAOYSA-N 1,4,4-triphenylbuta-1,3-dienylbenzene Chemical compound C=1C=CC=CC=1C(C=1C=CC=CC=1)=CC=C(C=1C=CC=CC=1)C1=CC=CC=C1 KLCLIOISYBHYDZ-UHFFFAOYSA-N 0.000 description 1
ZZHIDJWUJRKHGX-UHFFFAOYSA-N 1,4-bis(chloromethyl)benzene Chemical group ClCC1=CC=C(CCl)C=C1 ZZHIDJWUJRKHGX-UHFFFAOYSA-N 0.000 description 1
UGHIQYNKFXEQPU-UHFFFAOYSA-N 2,3-dichloro-1,4-dimethylbenzene Chemical group CC1=CC=C(C)C(Cl)=C1Cl UGHIQYNKFXEQPU-UHFFFAOYSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
241000283690 Bos taurus Species 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
102000003846 Carbonic anhydrases Human genes 0.000 description 1
108090000209 Carbonic anhydrases Proteins 0.000 description 1
108010078791 Carrier Proteins Proteins 0.000 description 1
238000002965 ELISA Methods 0.000 description 1
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
239000005977 Ethylene Substances 0.000 description 1
238000007341 Heck reaction Methods 0.000 description 1
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
229910003334 KNbO3 Inorganic materials 0.000 description 1
102000004856 Lectins Human genes 0.000 description 1
108090001090 Lectins Proteins 0.000 description 1
229910003327 LiNbO3 Inorganic materials 0.000 description 1
229910012463 LiTaO3 Inorganic materials 0.000 description 1
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
229920001730 Moisture cure polyurethane Polymers 0.000 description 1
101100192157 Mus musculus Psen2 gene Proteins 0.000 description 1
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
239000004952 Polyamide Substances 0.000 description 1
KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
229910052581 Si3N4 Inorganic materials 0.000 description 1
229910002370 SrTiO3 Inorganic materials 0.000 description 1
PJANXHGTPQOBST-VAWYXSNFSA-N Stilbene Natural products C=1C=CC=CC=1/C=C/C1=CC=CC=C1 PJANXHGTPQOBST-VAWYXSNFSA-N 0.000 description 1
QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 1
229910010252 TiO3 Inorganic materials 0.000 description 1
239000007983 Tris buffer Substances 0.000 description 1
BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
VNSWULZVUKFJHK-UHFFFAOYSA-N [Sr].[Bi] Chemical compound [Sr].[Bi] VNSWULZVUKFJHK-UHFFFAOYSA-N 0.000 description 1
238000010521 absorption reaction Methods 0.000 description 1
150000007513 acids Chemical class 0.000 description 1
229910052768 actinide Inorganic materials 0.000 description 1
150000001255 actinides Chemical class 0.000 description 1
230000004913 activation Effects 0.000 description 1
239000002318 adhesion promoter Substances 0.000 description 1
230000002411 adverse Effects 0.000 description 1
150000004703 alkoxides Chemical class 0.000 description 1
125000005250 alkyl acrylate group Chemical group 0.000 description 1
XYLMUPLGERFSHI-UHFFFAOYSA-N alpha-Methylstyrene Chemical compound CC(=C)C1=CC=CC=C1 XYLMUPLGERFSHI-UHFFFAOYSA-N 0.000 description 1
239000000908 ammonium hydroxide Substances 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
125000000129 anionic group Chemical group 0.000 description 1
239000000427 antigen Substances 0.000 description 1
102000036639 antigens Human genes 0.000 description 1
108091007433 antigens Proteins 0.000 description 1
238000003556 assay Methods 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
239000011324 bead Substances 0.000 description 1
108091008324 binding proteins Proteins 0.000 description 1
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
239000004327 boric acid Substances 0.000 description 1
229910052796 boron Inorganic materials 0.000 description 1
239000008364 bulk solution Substances 0.000 description 1
150000001720 carbohydrates Chemical class 0.000 description 1
150000004649 carbonic acid derivatives Chemical class 0.000 description 1
239000012159 carrier gas Substances 0.000 description 1
238000006555 catalytic reaction Methods 0.000 description 1
239000010406 cathode material Substances 0.000 description 1
125000002091 cationic group Chemical group 0.000 description 1
150000001768 cations Chemical class 0.000 description 1
239000002738 chelating agent Substances 0.000 description 1
238000001311 chemical methods and process Methods 0.000 description 1
238000012993 chemical processing Methods 0.000 description 1
238000000576 coating method Methods 0.000 description 1
230000000295 complement effect Effects 0.000 description 1
150000001875 compounds Chemical class 0.000 description 1
239000000470 constituent Substances 0.000 description 1
238000004132 cross linking Methods 0.000 description 1
239000013078 crystal Substances 0.000 description 1
239000002178 crystalline material Substances 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
230000007547 defect Effects 0.000 description 1
230000002939 deleterious effect Effects 0.000 description 1
230000001066 destructive effect Effects 0.000 description 1
238000007598 dipping method Methods 0.000 description 1
239000012636 effector Substances 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000010411 electrocatalyst Substances 0.000 description 1
238000007772 electroless plating Methods 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000000835 fiber Substances 0.000 description 1
MHMNJMPURVTYEJ-UHFFFAOYSA-N fluorescein-5-isothiocyanate Chemical compound O1C(=O)C2=CC(N=C=S)=CC=C2C21C1=CC=C(O)C=C1OC1=CC(O)=CC=C21 MHMNJMPURVTYEJ-UHFFFAOYSA-N 0.000 description 1
239000000446 fuel Substances 0.000 description 1
239000007789 gas Substances 0.000 description 1
239000010439 graphite Substances 0.000 description 1
229910002804 graphite Inorganic materials 0.000 description 1
230000005484 gravity Effects 0.000 description 1
229910052736 halogen Inorganic materials 0.000 description 1
150000002367 halogens Chemical class 0.000 description 1
ORTRWBYBJVGVQC-UHFFFAOYSA-N hexadecane-1-thiol Chemical compound CCCCCCCCCCCCCCCCS ORTRWBYBJVGVQC-UHFFFAOYSA-N 0.000 description 1
238000012615 high-resolution technique Methods 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
239000005556 hormone Substances 0.000 description 1
229940088597 hormone Drugs 0.000 description 1
150000003949 imides Chemical class 0.000 description 1
239000000411 inducer Substances 0.000 description 1
239000003112 inhibitor Substances 0.000 description 1
239000011147 inorganic material Substances 0.000 description 1
229920000592 inorganic polymer Polymers 0.000 description 1
229910052747 lanthanoid Inorganic materials 0.000 description 1
150000002602 lanthanoids Chemical class 0.000 description 1
229910052746 lanthanum Inorganic materials 0.000 description 1
229910052745 lead Inorganic materials 0.000 description 1
239000002523 lectin Substances 0.000 description 1
238000012423 maintenance Methods 0.000 description 1
FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
238000003913 materials processing Methods 0.000 description 1
238000002844 melting Methods 0.000 description 1
229910021645 metal ion Inorganic materials 0.000 description 1
239000005300 metallic glass Substances 0.000 description 1
238000001393 microlithography Methods 0.000 description 1
238000001682 microtransfer moulding Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
238000012986 modification Methods 0.000 description 1
150000007523 nucleic acids Chemical class 0.000 description 1
102000039446 nucleic acids Human genes 0.000 description 1
108020004707 nucleic acids Proteins 0.000 description 1
229920000620 organic polymer Polymers 0.000 description 1
235000006408 oxalic acid Nutrition 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052763 palladium Inorganic materials 0.000 description 1
KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 1
230000036961 partial effect Effects 0.000 description 1
ATGAWOHQWWULNK-UHFFFAOYSA-I pentapotassium;[oxido(phosphonatooxy)phosphoryl] phosphate Chemical compound [K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])(=O)OP([O-])([O-])=O ATGAWOHQWWULNK-UHFFFAOYSA-I 0.000 description 1
229950011087 perflunafene Drugs 0.000 description 1
UWEYRJFJVCLAGH-IJWZVTFUSA-N perfluorodecalin Chemical compound FC1(F)C(F)(F)C(F)(F)C(F)(F)[C@@]2(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)[C@@]21F UWEYRJFJVCLAGH-IJWZVTFUSA-N 0.000 description 1
230000000737 periodic effect Effects 0.000 description 1
239000012071 phase Substances 0.000 description 1
229910052698 phosphorus Inorganic materials 0.000 description 1
239000011574 phosphorus Substances 0.000 description 1
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
229920000233 poly(alkylene oxides) Polymers 0.000 description 1
229920001643 poly(ether ketone) Polymers 0.000 description 1
229920000052 poly(p-xylylene) Polymers 0.000 description 1
229920002627 poly(phosphazenes) Polymers 0.000 description 1
229920000548 poly(silane) polymer Polymers 0.000 description 1
229920001197 polyacetylene Polymers 0.000 description 1
229920002401 polyacrylamide Polymers 0.000 description 1
229920002647 polyamide Polymers 0.000 description 1
229920000015 polydiacetylene Polymers 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
229920000570 polyether Polymers 0.000 description 1
239000005020 polyethylene terephthalate Substances 0.000 description 1
229920000139 polyethylene terephthalate Polymers 0.000 description 1
230000000379 polymerizing effect Effects 0.000 description 1
229920000098 polyolefin Polymers 0.000 description 1
229920001296 polysiloxane Polymers 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
239000011148 porous material Substances 0.000 description 1
238000001556 precipitation Methods 0.000 description 1
238000012545 processing Methods 0.000 description 1
239000012460 protein solution Substances 0.000 description 1
238000010526 radical polymerization reaction Methods 0.000 description 1
230000009467 reduction Effects 0.000 description 1
230000033458 reproduction Effects 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
229910052707 ruthenium Inorganic materials 0.000 description 1
238000012216 screening Methods 0.000 description 1
239000005368 silicate glass Substances 0.000 description 1
150000004760 silicates Chemical class 0.000 description 1
229920002379 silicone rubber Polymers 0.000 description 1
239000010944 silver (metal) Substances 0.000 description 1
239000002356 single layer Substances 0.000 description 1
229910052708 sodium Inorganic materials 0.000 description 1
239000011734 sodium Substances 0.000 description 1
238000003980 solgel method Methods 0.000 description 1
238000007711 solidification Methods 0.000 description 1
230000008023 solidification Effects 0.000 description 1
238000005507 spraying Methods 0.000 description 1
238000003892 spreading Methods 0.000 description 1
230000007480 spreading Effects 0.000 description 1
PJANXHGTPQOBST-UHFFFAOYSA-N stilbene Chemical compound C=1C=CC=CC=1C=CC1=CC=CC=C1 PJANXHGTPQOBST-UHFFFAOYSA-N 0.000 description 1
235000021286 stilbenes Nutrition 0.000 description 1
235000011149 sulphuric acid Nutrition 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
229920001187 thermosetting polymer Polymers 0.000 description 1
230000009466 transformation Effects 0.000 description 1
238000013519 translation Methods 0.000 description 1
ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
238000007039 two-step reaction Methods 0.000 description 1
238000003631 wet chemical etching Methods 0.000 description 1
239000008096 xylene Substances 0.000 description 1
239000010457 zeolite Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/12—Production of screen printing forms or similar printing forms, e.g. stencils
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
- H10K71/166—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using selective deposition, e.g. using a mask
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
- H10K59/30—Devices specially adapted for multicolour light emission
- H10K59/35—Devices specially adapted for multicolour light emission comprising red-green-blue [RGB] subpixels

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Physics & Mathematics (AREA)
Nanotechnology (AREA)
General Physics & Mathematics (AREA)
Materials Engineering (AREA)
Crystallography & Structural Chemistry (AREA)
Condensed Matter Physics & Semiconductors (AREA)
Organic Chemistry (AREA)
Metallurgy (AREA)
Mechanical Engineering (AREA)
Chemical Kinetics & Catalysis (AREA)
Manufacturing & Machinery (AREA)
Composite Materials (AREA)
Mathematical Physics (AREA)
Theoretical Computer Science (AREA)
Electroluminescent Light Sources (AREA)
Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Manufacture Or Reproduction Of Printing Formes (AREA)

CA2329412A 1998-04-21 1999-04-20 Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises Expired - Fee Related CA2329412C (fr)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US6374298A	1998-04-21	1998-04-21
US09/063,742		1998-04-21
PCT/US1999/008623 WO1999054786A1 (fr)	1998-04-21	1999-04-20	Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises

Publications (2)

Publication Number	Publication Date
CA2329412A1 CA2329412A1 (fr)	1999-10-28
CA2329412C true CA2329412C (fr)	2010-09-21

Family

ID=22051194

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA2329412A Expired - Fee Related CA2329412C (fr)	1998-04-21	1999-04-20	Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises

Country Status (4)

Country	Link
EP (1)	EP1080394A1 (fr)
JP (1)	JP2002512124A (fr)
CA (1)	CA2329412C (fr)
WO (1)	WO1999054786A1 (fr)

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5776748A (en)	1993-10-04	1998-07-07	President And Fellows Of Harvard College	Method of formation of microstamped patterns on plates for adhesion of cells and other biological materials, devices and uses therefor
EP0929658A4 (fr)	1996-08-26	2005-11-02	Univ Princeton	Dispositifs de tri de microstructures pouvant etre scellees de maniere reversible
US7282240B1 (en)	1998-04-21	2007-10-16	President And Fellows Of Harvard College	Elastomeric mask and use in fabrication of devices
EP1236034A4 (fr) *	1999-11-12	2006-05-03	Surromed Inc	Biodetection par resonance plasmonique de surface
IL151701A0 (en) *	2000-03-17	2003-04-10	Harvard College	Cell patterning technique
US6686184B1 (en)	2000-05-25	2004-02-03	President And Fellows Of Harvard College	Patterning of surfaces utilizing microfluidic stamps including three-dimensionally arrayed channel networks
US7323143B2 (en)	2000-05-25	2008-01-29	President And Fellows Of Harvard College	Microfluidic systems including three-dimensionally arrayed channel networks
US6645432B1 (en)	2000-05-25	2003-11-11	President & Fellows Of Harvard College	Microfluidic systems including three-dimensionally arrayed channel networks
GB0013394D0 (en) *	2000-06-01	2000-07-26	Microemissive Displays Ltd	A method of creating a color optoelectronic device
US6770721B1 (en)	2000-11-02	2004-08-03	Surface Logix, Inc.	Polymer gel contact masks and methods and molds for making same
US7033821B2 (en)	2000-11-08	2006-04-25	Surface Logix, Inc.	Device for monitoring cell motility in real-time
US7326563B2 (en)	2000-11-08	2008-02-05	Surface Logix, Inc.	Device and method for monitoring leukocyte migration
US7439056B2 (en)	2000-11-08	2008-10-21	Surface Logix Inc.	Peelable and resealable devices for arraying materials
US6844184B2 (en)	2000-11-08	2005-01-18	Surface Logix, Inc.	Device for arraying biomolecules and for monitoring cell motility in real-time
US6967074B2 (en)	2000-11-08	2005-11-22	Surface Logix, Inc.	Methods of detecting immobilized biomolecules
US7351575B2 (en)	2000-11-08	2008-04-01	Surface Logix, Inc.	Methods for processing biological materials using peelable and resealable devices
US6893851B2 (en)	2000-11-08	2005-05-17	Surface Logix, Inc.	Method for arraying biomolecules and for monitoring cell motility in real-time
US7371563B2 (en)	2000-11-08	2008-05-13	Surface Logix, Inc.	Peelable and resealable devices for biochemical assays
US6864065B2 (en)	2000-11-08	2005-03-08	Surface Logix, Inc.	Assays for monitoring cell motility in real-time
US6803205B2 (en)	2000-11-08	2004-10-12	Surface Logix, Inc.	Methods of measuring enzyme activity using peelable and resealable devices
US7033819B2 (en)	2000-11-08	2006-04-25	Surface Logix, Inc.	System for monitoring cell motility in real-time
US7374906B2 (en)	2000-11-08	2008-05-20	Surface Logix, Inc.	Biological assays using gradients formed in microfluidic systems
US7001740B2 (en)	2000-11-08	2006-02-21	Surface Logix, Inc.	Methods of arraying biological materials using peelable and resealable devices
WO2002086452A2 (fr)	2001-03-23	2002-10-31	President And Fellows Of Harvard College	Depot selectif de materiaux sur des surfaces agencees
JP4522698B2 (ja)	2001-08-30	2010-08-11	シャープ株式会社	有機ｅｌ装置の製造方法
US6833040B2 (en)	2001-12-19	2004-12-21	Surface Logix Inc.	Apparatus and method for handling membranes
US6821348B2 (en)	2002-02-14	2004-11-23	3M Innovative Properties Company	In-line deposition processes for circuit fabrication
US6897164B2 (en)	2002-02-14	2005-05-24	3M Innovative Properties Company	Aperture masks for circuit fabrication
NL1020341C2 (nl) *	2002-04-09	2003-10-13	Stichting Tech Wetenschapp	Werkwijze voor het uitvoeren van een etsbewerking.
US7332369B2 (en)	2002-08-06	2008-02-19	Merck Patent Gmbh	Organic electronic devices
GB0218204D0 (en) *	2002-08-06	2002-09-11	Avecia Ltd	Organic field effect transistors
NL1022269C2 (nl) *	2002-12-24	2004-06-25	Otb Group Bv	Werkwijze voor het vervaardigen van een organic electroluminescent display device, substraat ten gebruike bij een dergelijke werkwijze, alsmede een organic electroluminescent display device verkregen met de werkwijze.
US6926840B2 (en) *	2002-12-31	2005-08-09	Eastman Kodak Company	Flexible frame for mounting a deposition mask
DK1704585T3 (en)	2003-12-19	2017-05-22	Univ North Carolina Chapel Hill	Methods for preparing isolated micro- and nanostructures using soft lithography or printing lithography
DE102004034418B4 (de) *	2004-07-15	2009-06-25	Schott Ag	Verfahren zur Herstellung struktuierter optischer Filterschichten auf Substraten
EP1802177A4 (fr) *	2004-09-08	2010-04-14	Toray Industries	Dispositif electroluminescent organique et procede de fabrication de celui-ci
US20060128165A1 (en) *	2004-12-13	2006-06-15	3M Innovative Properties Company	Method for patterning surface modification
KR20060079957A (ko) *	2005-01-04	2006-07-07	삼성에스디아이 주식회사	포토리소그래피용 연질 포토마스크, 그 제조방법, 이를채용한 패턴 형성 방법
EP1681734A1 (fr) *	2005-01-18	2006-07-19	C.S.E.M. Centre Suisse D'electronique Et De Microtechnique Sa	Dispositif électro-optique et méthode de sa fabrication
EP1897426A2 (fr)	2005-05-18	2008-03-12	President And Fellows Of Harvard College	Fabrication de passages conducteurs, microcircuits et microstructures dans des reseaux microfluidiques
DE102006026981A1 (de) *	2006-06-10	2007-12-13	Leonhard Kurz Gmbh & Co. Kg	Verfahren zur Herstellung einer strukturierten Schicht auf einem Trägersubstrat
DE102007029915B4 (de)	2006-12-20	2017-03-30	Lg Display Co., Ltd.	Organisches Elektrolumineszenzbauteil und Verfahren zum Herstellen desselben
US7662663B2 (en) *	2007-03-28	2010-02-16	Eastman Kodak Company	OLED patterning method
US7635609B2 (en) *	2007-04-16	2009-12-22	Eastman Kodak Company	Patterning method for light-emitting devices
GB0716266D0 (en) *	2007-08-21	2007-09-26	Eastman Kodak Co	Method of patterning vapour deposition by printing
TW200934635A (en)	2008-02-06	2009-08-16	Nano Terra Inc	Stencils with removable backings for forming micron-sized features on surfaces and methods of making and using the same
DE102008048127A1 (de) *	2008-09-20	2010-03-25	Mtu Aero Engines Gmbh	Vorrichtung und Verfahren zum Maskieren einer Bauteilzone
DE102011016453A1 (de) *	2011-04-08	2013-01-17	Universität Stuttgart	Verfahren zur Herstellung einer Siebdruckform und damit hergestellte Solarzelle
DE102013110037B4 (de)	2013-09-12	2018-05-09	Osram Oled Gmbh	Verfahren zum Herstellen eines optoelektronischen Bauelementes
EP4071843A4 (fr) *	2020-01-03	2024-01-03	Hunetplus Co., Ltd.	Masque à motif photographique souple pour affichage électroluminescent organique à haute résolution, et son procédé de fabrication
GB2607115B (en) *	2021-06-25	2023-10-04	Cipherx Tech Ltd	Method of producing a microneedle array
US12600159B2 (en) *	2022-02-25	2026-04-14	Intel Corporation	Reusable composite stencil for spray processes

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4093754A (en) *	1976-04-15	1978-06-06	Parsons Robert C	Method of making decorative panels
US4527988A (en) *	1982-09-20	1985-07-09	Lutz Peter L	Porous contraceptive device with an interstitial liquid
DE3331377A1 (de) *	1983-08-31	1985-03-07	Elmar Dr. 8000 München Messerschmitt	Siebdrucksieb
JPS62108206A (ja) *	1985-11-06	1987-05-19	Canon Inc	カラ−フィルタ−の製造方法
GB8703107D0 (en) *	1987-02-11	1987-03-18	Era Patents Ltd	Screen for printing electrical circuits
DE3841317C2 (de) *	1988-12-08	1996-12-05	Nokia Deutschland Gmbh	Druckform für den Siebdruck
JPH02232238A (ja) *	1989-03-04	1990-09-14	Tokuyama Soda Co Ltd	シートの製造方法
US5665496A (en) *	1994-06-24	1997-09-09	Nippon Oil Co., Ltd.	Method for producing color filter

1999
- 1999-04-20 CA CA2329412A patent/CA2329412C/fr not_active Expired - Fee Related
- 1999-04-20 WO PCT/US1999/008623 patent/WO1999054786A1/fr not_active Ceased
- 1999-04-20 EP EP99918698A patent/EP1080394A1/fr not_active Withdrawn
- 1999-04-20 JP JP2000545072A patent/JP2002512124A/ja active Pending

Also Published As

Publication number	Publication date
WO1999054786A9 (fr)	2000-02-03
WO1999054786A1 (fr)	1999-10-28
JP2002512124A (ja)	2002-04-23
EP1080394A1 (fr)	2001-03-07
CA2329412A1 (fr)	1999-10-28

Legal Events

Date	Code	Title	Description
2003-12-02	EEER	Examination request
2016-06-01	MKLA	Lapsed	Effective date: 20160420

Publication	Publication Date	Title
CA2329412C (fr)	2010-09-21	Masque elastomere et son utilisation dans la fabrication de dispositifs, dont des afficheurs electroluminescents pixelises
US7282240B1 (en)	2007-10-16	Elastomeric mask and use in fabrication of devices
JP3415850B2 (ja)	2003-06-09	リソグラフィによる表面または薄層の改変
US7615179B2 (en)	2009-11-10	Method of imprinting shadow mask nanostructures for display pixel segregation
US6492096B1 (en)	2002-12-10	Patterned molecular self-assembly
US6966997B1 (en)	2005-11-22	Methods for patterning polymer films, and use of the methods
JP4316677B2 (ja)	2009-08-19	単一分子種の構造化された自己組織型単分子膜、特に物質ライブラリの作製方法
US6660192B1 (en)	2003-12-09	Molded waveguides
US6180239B1 (en)	2001-01-30	Microcontact printing on surfaces and derivative articles
CN101627336B (zh)	2012-12-12	使用具有表面改性材料的印模在基底上形成功能性材料的图案的方法
US20060116001A1 (en)	2006-06-01	Patterning method
EP1760527B1 (fr)	2012-06-06	Méthode photochimique pour fabriquer des substrats surface-décorés à l'échelle nanométrique
JP2010525961A (ja)	2010-07-29	スタンプの表面を処理することにより、基板上に機能材料のパターンを形成する方法
KR20020073329A (ko)	2002-09-23	액체 엠보싱에 의해 정밀하게 형성되는 장치의 제조
CN1633523A (zh)	2005-06-29	利用毛细作用力在基体上形成微型图案的方法
GB2297647A (en)	1996-08-07	Organic electroluminescent device
JP4201175B2 (ja)	2008-12-24	パターン形成体の製造方法
CN114695745A (zh)	2022-07-01	一种量子点发光二极管及其制备方法
JP3989380B2 (ja)	2007-10-10	単一ステップによる多色カラーの印刷方法
JP4788750B2 (ja)	2011-10-05	パターン形成体の製造方法