CA2385675C - Formation de microstructures au moyen d'une feuille preformee de photoresine - Google Patents

Formation de microstructures au moyen d'une feuille preformee de photoresine Download PDF

Info

Publication number: CA2385675C
Authority: CA; Canada
Prior art keywords: photoresist; sheet; layer; substrate; exposed
Prior art date: 1992-12-22
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

CA002385675A

Other languages

English (en)

Other versions

CA2385675A1 (fr

Inventor

Henry Guckel

Todd R. Christenson

Kenneth J. Skrobis

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Wisconsin Alumni Research Foundation

Original Assignee

Wisconsin Alumni Research Foundation

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1992-12-22

Filing date

1993-11-12

Publication date

2003-09-16

1993-05-24 Priority claimed from US08/066,988 external-priority patent/US5378583A/en

1993-11-12 Application filed by Wisconsin Alumni Research Foundation filed Critical Wisconsin Alumni Research Foundation

1994-06-23 Publication of CA2385675A1 publication Critical patent/CA2385675A1/fr

2003-09-16 Application granted granted Critical

2003-09-16 Publication of CA2385675C publication Critical patent/CA2385675C/fr

2013-11-12 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

229920002120 photoresistant polymer Polymers 0.000 title claims abstract description 316
230000015572 biosynthetic process Effects 0.000 title abstract description 16
239000000463 material Substances 0.000 claims abstract description 34
230000005855 radiation Effects 0.000 claims abstract description 23
238000000034 method Methods 0.000 claims description 66
239000000758 substrate Substances 0.000 abstract description 141
229920003229 poly(methyl methacrylate) Polymers 0.000 abstract description 72
239000004926 polymethyl methacrylate Substances 0.000 abstract description 72
229910052751 metal Inorganic materials 0.000 abstract description 46
239000002184 metal Substances 0.000 abstract description 46
238000009713 electroplating Methods 0.000 abstract description 9
239000010410 layer Substances 0.000 description 202
239000010408 film Substances 0.000 description 36
239000007788 liquid Substances 0.000 description 16
239000011800 void material Substances 0.000 description 14
241000364051 Pima Species 0.000 description 11
238000012545 processing Methods 0.000 description 11
238000007747 plating Methods 0.000 description 10
239000002904 solvent Substances 0.000 description 10
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 9
239000000178 monomer Substances 0.000 description 9
238000004070 electrodeposition Methods 0.000 description 8
238000011161 development Methods 0.000 description 7
238000003801 milling Methods 0.000 description 7
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 6
238000005266 casting Methods 0.000 description 6
239000011888 foil Substances 0.000 description 5
238000001015 X-ray lithography Methods 0.000 description 4
239000006096 absorbing agent Substances 0.000 description 4
229910052782 aluminium Inorganic materials 0.000 description 4
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
239000003431 cross linking reagent Substances 0.000 description 4
238000003754 machining Methods 0.000 description 4
230000003287 optical effect Effects 0.000 description 4
239000004065 semiconductor Substances 0.000 description 4
239000004642 Polyimide Substances 0.000 description 3
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
229910000831 Steel Inorganic materials 0.000 description 3
239000002318 adhesion promoter Substances 0.000 description 3
239000000853 adhesive Substances 0.000 description 3
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239000010703 silicon Substances 0.000 description 3
238000009987 spinning Methods 0.000 description 3
239000010959 steel Substances 0.000 description 3
210000002268 wool Anatomy 0.000 description 3
HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
206010073306 Exposure to radiation Diseases 0.000 description 2
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
238000003490 calendering Methods 0.000 description 2
238000012668 chain scission Methods 0.000 description 2
MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
238000005336 cracking Methods 0.000 description 2
238000004132 cross linking Methods 0.000 description 2
239000007789 gas Substances 0.000 description 2
239000011521 glass Substances 0.000 description 2
238000001459 lithography Methods 0.000 description 2
230000000873 masking effect Effects 0.000 description 2
238000003701 mechanical milling Methods 0.000 description 2
229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
239000007787 solid Substances 0.000 description 2
239000010936 titanium Substances 0.000 description 2
229910052719 titanium Inorganic materials 0.000 description 2
OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
101150052147 ALLC gene Proteins 0.000 description 1
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
229910052582 BN Inorganic materials 0.000 description 1
PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
JXVIIQLNUPXOII-UHFFFAOYSA-N Siduron Chemical compound CC1CCCCC1NC(=O)NC1=CC=CC=C1 JXVIIQLNUPXOII-UHFFFAOYSA-N 0.000 description 1
241000282887 Suidae Species 0.000 description 1
239000011358 absorbing material Substances 0.000 description 1
238000004026 adhesive bonding Methods 0.000 description 1
239000012790 adhesive layer Substances 0.000 description 1
239000000908 ammonium hydroxide Substances 0.000 description 1
238000000137 annealing Methods 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
229910010293 ceramic material Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
238000010276 construction Methods 0.000 description 1
238000000151 deposition Methods 0.000 description 1
230000008021 deposition Effects 0.000 description 1
239000010432 diamond Substances 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
238000009792 diffusion process Methods 0.000 description 1
238000004090 dissolution Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
239000012467 final product Substances 0.000 description 1
239000012530 fluid Substances 0.000 description 1
230000004907 flux Effects 0.000 description 1
238000007654 immersion Methods 0.000 description 1
239000003999 initiator Substances 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
238000005304 joining Methods 0.000 description 1
238000000465 moulding Methods 0.000 description 1
230000005658 nuclear physics Effects 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000002245 particle Substances 0.000 description 1
229920003023 plastic Polymers 0.000 description 1
239000004033 plastic Substances 0.000 description 1
239000012985 polymerization agent Substances 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
238000003825 pressing Methods 0.000 description 1
239000000047 product Substances 0.000 description 1
239000010453 quartz Substances 0.000 description 1
101150056906 recJ gene Proteins 0.000 description 1
230000000717 retained effect Effects 0.000 description 1
238000012552 review Methods 0.000 description 1
239000002356 single layer Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
230000008961 swelling Effects 0.000 description 1
230000005469 synchrotron radiation Effects 0.000 description 1
239000010409 thin film Substances 0.000 description 1
239000012780 transparent material Substances 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1

Landscapes

Photosensitive Polymer And Photoresist Processing (AREA)
Micromachines (AREA)

CA002385675A 1992-12-22 1993-11-12 Formation de microstructures au moyen d'une feuille preformee de photoresine Expired - Lifetime CA2385675C (fr)

Applications Claiming Priority (5)

Application Number	Priority Date	Filing Date	Title
US99495292A	1992-12-22	1992-12-22
US07/994,952		1992-12-22
US08/066,988		1993-05-24
US08/066,988 US5378583A (en)	1992-12-22	1993-05-24	Formation of microstructures using a preformed photoresist sheet
CA 2102987 CA2102987C (fr)	1992-12-22	1993-11-12	Formation de microstructures au moyen d'un tissu de resine photosensible preforme

Related Parent Applications (1)

Application Number	Title	Priority Date	Filing Date
CA 2102987 Division CA2102987C (fr)	1992-12-22	1993-11-12	Formation de microstructures au moyen d'un tissu de resine photosensible preforme

Publications (2)

Publication Number	Publication Date
CA2385675A1 CA2385675A1 (fr)	1994-06-23
CA2385675C true CA2385675C (fr)	2003-09-16

Family

ID=27169543

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA002385675A Expired - Lifetime CA2385675C (fr)	1992-12-22	1993-11-12	Formation de microstructures au moyen d'une feuille preformee de photoresine

Country Status (1)

Country	Link
CA (1)	CA2385675C (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN114904675B (zh) *	2021-02-08	2023-10-10	中国石油化工股份有限公司	雾化发生装置及雾化方法

1993
- 1993-11-12 CA CA002385675A patent/CA2385675C/fr not_active Expired - Lifetime

Also Published As

Publication number	Publication date
CA2385675A1 (fr)	1994-06-23

Legal Events

Date	Code	Title	Description
2002-05-07	EEER	Examination request
2014-01-14	MKEX	Expiry	Effective date: 20131112

Publication	Publication Date	Title
AU666054B2 (en)	1996-01-25	Formation of microstructures using a preformed photoresist sheet
EP0567332B1 (fr)	1996-06-26	Formation de microstructures par lithographie profonde aux rayons X à plusieurs niveaux avec des couches métallique sacrificielles
US5908719A (en)	1999-06-01	Radiation mask adapted to be aligned with a photoresist layer and method of making the same
CN100446192C (zh)	2008-12-24	微米结构和纳米结构的复制和转移
US6458263B1 (en)	2002-10-01	Cantilevered multilevel LIGA devices and methods
JPS5933673B2 (ja)	1984-08-17	薄い自立金属構造の製造方法
AU2001259355A1 (en)	2002-01-31	Multi depth substrate fabrication processes
WO2001084242A1 (fr)	2001-11-08	Procede de fabrication d'un substrat a multiples profondeurs
US4698285A (en)	1987-10-06	Method for producing deep-etch, X-ray lithography masks
TWI226516B (en)	2005-01-11	Process for producing metal microstructure
US6482553B1 (en)	2002-11-19	Graphite mask for x-ray or deep x-ray lithography
US5679502A (en)	1997-10-21	Method and apparatus for micromachining using hard X-rays
EP1428245A1 (fr)	2004-06-16	Structures tridimensionnelles monolithiques
Van Beek et al.	1998	Nanoscale freestanding gratings for ultraviolet blocking filters
Ballandras et al.	1995	Deep etch X-ray lithography using silicon-gold masks fabricated by deep etch UV lithography and electroforming
Jian et al.	2001	Multilevel microstructures and mold inserts fabricated with planar and oblique x-ray lithography of SU-8 negative photoresist
US20050272179A1 (en)	2005-12-08	Three-dimensional lithographic fabrication technique
WO1999061954A1 (fr)	1999-12-02	Adherence renforcee pour microfabrications liga par l'application d'une couche tampon
Shew et al.	1998	High precision, low cost mask for deep x-ray lithography
JPH08127074A (ja)	1996-05-21	微小機構部品の製造方法
Fischer et al.	2000	Large area, cost effective X-ray masks for high energy photons
Glocker et al.	1982	A new method for the batch production of micro‐Fresnel zone plates
Kearns et al.	1972	Fabrication of Elastic Surface Devices by Chemical Etching
NL8100937A (nl)	1981-09-16	Werkwijze voor de continue galvanoplastische vervaardiging van nauwkeurig begrensde oppervlaktedelen.
KR20010057689A (ko)	2001-07-05	마이크로 빔 스플리터 제조 방법