CA2400852C - Substrat en ceramique - Google Patents
Substrat en ceramique Download PDFInfo
- Publication number
- CA2400852C CA2400852C CA002400852A CA2400852A CA2400852C CA 2400852 C CA2400852 C CA 2400852C CA 002400852 A CA002400852 A CA 002400852A CA 2400852 A CA2400852 A CA 2400852A CA 2400852 C CA2400852 C CA 2400852C
- Authority
- CA
- Canada
- Prior art keywords
- ceramic substrate
- polishing
- ceramic
- polished
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 132
- 239000000919 ceramic Substances 0.000 title claims abstract description 100
- 238000005498 polishing Methods 0.000 claims abstract description 85
- 230000003746 surface roughness Effects 0.000 claims description 27
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 12
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 4
- 229910017083 AlN Inorganic materials 0.000 claims description 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 claims description 2
- 239000006061 abrasive grain Substances 0.000 abstract description 28
- 238000000034 method Methods 0.000 abstract description 21
- 238000007517 polishing process Methods 0.000 abstract description 10
- 239000000463 material Substances 0.000 description 13
- 235000019592 roughness Nutrition 0.000 description 12
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 11
- 229910010293 ceramic material Inorganic materials 0.000 description 9
- 239000011347 resin Substances 0.000 description 9
- 229920005989 resin Polymers 0.000 description 9
- 238000000227 grinding Methods 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 238000005245 sintering Methods 0.000 description 4
- 239000004677 Nylon Substances 0.000 description 3
- 239000012298 atmosphere Substances 0.000 description 3
- 229920001778 nylon Polymers 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000001513 hot isostatic pressing Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000004745 nonwoven fabric Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 238000007650 screen-printing Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 229920001821 foam rubber Polymers 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000002984 plastic foam Substances 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 238000009877 rendering Methods 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Ceramic Products (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7520898 | 1998-03-24 | ||
| JP10-075208 | 1998-03-24 | ||
| JP11-019727 | 1999-01-28 | ||
| JP11019727A JPH11335158A (ja) | 1998-03-24 | 1999-01-28 | セラミックス基板及びその研磨方法 |
| CA002266145A CA2266145C (fr) | 1998-03-24 | 1999-03-18 | Methode de polissage d'un substrat en ceramique |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002266145A Division CA2266145C (fr) | 1998-03-24 | 1999-03-18 | Methode de polissage d'un substrat en ceramique |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CA2400852A1 CA2400852A1 (fr) | 1999-09-24 |
| CA2400852C true CA2400852C (fr) | 2007-08-28 |
Family
ID=27170951
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CA002400852A Expired - Fee Related CA2400852C (fr) | 1998-03-24 | 1999-03-18 | Substrat en ceramique |
Country Status (1)
| Country | Link |
|---|---|
| CA (1) | CA2400852C (fr) |
-
1999
- 1999-03-18 CA CA002400852A patent/CA2400852C/fr not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| CA2400852A1 (fr) | 1999-09-24 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0945215B1 (fr) | Substrat céramique et son procédé de polissage | |
| FI118180B (fi) | Optisille pinnoille soveltuva kiillotusformulaatio | |
| TW567109B (en) | Method and apparatus for polishing outer peripheral chamfered part of wafer | |
| TW406293B (en) | Ceramic parts and a producing process thereof | |
| KR20150038331A (ko) | 정밀하게 형상화된 특징부를 갖는 연마 물품 및 그의 제조 방법 | |
| KR20150039795A (ko) | 정밀하게 형상화된 특징부를 갖는 연마 요소, 그로부터 제작되는 연마 물품, 및 그의 제조 방법 | |
| US6402594B1 (en) | Polishing method for wafer and holding plate | |
| TW201213048A (en) | Edge finishing apparatus | |
| EP1722926B1 (fr) | Conditionneur de plaquettes et son procede d'utilisation | |
| JP2015096294A (ja) | Cmpパッドのコンディショニングのための平坦かつ一貫した表面トポグラフィーを有する研磨工具及びその製造方法 | |
| JP2025026921A (ja) | 精密に成形された特徴部を有する研磨要素、同研磨要素から製造された研磨物品、及び同研磨物品の製造方法 | |
| CA2400852C (fr) | Substrat en ceramique | |
| GB2335591A (en) | Polishing pad, method and apparatus for treating polishing pad, and polishing method | |
| US5817245A (en) | Method of and apparatus for tribochemically finishing ceramic workpiece | |
| KR100465389B1 (ko) | SiC질 열처리용 지그 | |
| JP4210134B2 (ja) | ウエーハ研磨治具及びその製造方法 | |
| ASM Thermal Spray Society et al. | Accepted Practice for Metallographic Preparation of Thermal Spray Coating Samples | |
| JP4159029B2 (ja) | セラミックス製プレート | |
| CN117564818B (zh) | 内端面高精密度磨削方法及磨削用标准块、标准块制备方法 | |
| JP3467483B2 (ja) | 精密研磨のための固定砥粒構造体 | |
| JPH09180389A (ja) | 磁気ヘッドスライダ製造装置及び磁気ヘッドスライダ製造方法 | |
| JPS5814543A (ja) | 半導体素子用基板 | |
| JPH0569312A (ja) | 光デバイス用研磨治具および光デバイスの研磨方法 | |
| JP3849580B2 (ja) | ワーク保持盤の製造方法及びワーク保持盤並びにそれを用いたワークの研磨方法 | |
| RU1779570C (ru) | Способ изготовлени гибкого абразивного инструмента |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EEER | Examination request | ||
| MKLA | Lapsed |