CA2506690A1 - Appareil et methode de depot par evaporation sous vide de metal carbonyle - Google Patents

Appareil et methode de depot par evaporation sous vide de metal carbonyle Download PDF

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Publication number
CA2506690A1
CA2506690A1 CA002506690A CA2506690A CA2506690A1 CA 2506690 A1 CA2506690 A1 CA 2506690A1 CA 002506690 A CA002506690 A CA 002506690A CA 2506690 A CA2506690 A CA 2506690A CA 2506690 A1 CA2506690 A1 CA 2506690A1
Authority
CA
Canada
Prior art keywords
window
radiation
metal
metal carbonyl
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002506690A
Other languages
English (en)
Inventor
Dmitri S. Terekhov
Mohammad Al Quayyum
Kamran M. Khozan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chemical Vapour Metal Refining Inc
Original Assignee
Chemical Vapour Metal Refining Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemical Vapour Metal Refining Inc filed Critical Chemical Vapour Metal Refining Inc
Priority to CA002506690A priority Critical patent/CA2506690A1/fr
Publication of CA2506690A1 publication Critical patent/CA2506690A1/fr
Abandoned legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/06—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material
    • C23C16/16—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
CA002506690A 2005-06-01 2005-06-01 Appareil et methode de depot par evaporation sous vide de metal carbonyle Abandoned CA2506690A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA002506690A CA2506690A1 (fr) 2005-06-01 2005-06-01 Appareil et methode de depot par evaporation sous vide de metal carbonyle

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002506690A CA2506690A1 (fr) 2005-06-01 2005-06-01 Appareil et methode de depot par evaporation sous vide de metal carbonyle

Publications (1)

Publication Number Publication Date
CA2506690A1 true CA2506690A1 (fr) 2005-08-14

Family

ID=34866012

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002506690A Abandoned CA2506690A1 (fr) 2005-06-01 2005-06-01 Appareil et methode de depot par evaporation sous vide de metal carbonyle

Country Status (1)

Country Link
CA (1) CA2506690A1 (fr)

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Legal Events

Date Code Title Description
EEER Examination request
FZDE Discontinued