CA2523896A1 - Methode d'impression par nanocontact - Google Patents

Methode d'impression par nanocontact Download PDF

Info

Publication number
CA2523896A1
CA2523896A1 CA002523896A CA2523896A CA2523896A1 CA 2523896 A1 CA2523896 A1 CA 2523896A1 CA 002523896 A CA002523896 A CA 002523896A CA 2523896 A CA2523896 A CA 2523896A CA 2523896 A1 CA2523896 A1 CA 2523896A1
Authority
CA
Canada
Prior art keywords
molecules
substrate
functional group
composition
molecule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
CA002523896A
Other languages
English (en)
Inventor
Francesco Stellacci
Arum Amy Yu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Massachusetts Institute of Technology
Original Assignee
Massachusetts Institute of Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Institute of Technology filed Critical Massachusetts Institute of Technology
Priority to CA002523896A priority Critical patent/CA2523896A1/fr
Publication of CA2523896A1 publication Critical patent/CA2523896A1/fr
Abandoned legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
CA002523896A 2005-10-19 2005-10-19 Methode d'impression par nanocontact Abandoned CA2523896A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CA002523896A CA2523896A1 (fr) 2005-10-19 2005-10-19 Methode d'impression par nanocontact

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002523896A CA2523896A1 (fr) 2005-10-19 2005-10-19 Methode d'impression par nanocontact

Publications (1)

Publication Number Publication Date
CA2523896A1 true CA2523896A1 (fr) 2007-04-19

Family

ID=37951539

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002523896A Abandoned CA2523896A1 (fr) 2005-10-19 2005-10-19 Methode d'impression par nanocontact

Country Status (1)

Country Link
CA (1) CA2523896A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008042079A3 (fr) * 2006-09-28 2008-05-22 Du Pont Procédé de formation d'un motif de matériau fonctionnel sur un substrat

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008042079A3 (fr) * 2006-09-28 2008-05-22 Du Pont Procédé de formation d'un motif de matériau fonctionnel sur un substrat

Similar Documents

Publication Publication Date Title
US7862849B2 (en) Nanocontact printing
IL186468A (en) Method of forming a complement image of a master
Sotomayor Torres Alternative lithography
Ginger et al. The evolution of dip‐pen nanolithography
Michel et al. Printing meets lithography: Soft approaches to high-resolution patterning
Xia et al. Surface patterning and its application in wetting/dewetting studies
JP3951141B2 (ja) 有機超分子の自己集合及び金属化合物のステイニングを用いたカーボンナノチューブアレイ及びバイオチップの製作方法
US20080182079A1 (en) Etching and hole arrays
US20080038542A1 (en) Method for high resolution patterning using soft X-ray, process for preparing nano device using the method
Xu et al. Polymer-pen chemical lift-off lithography
Woodson et al. Functional nanostructures from surface chemistry patterning
Tseng et al. Nanoscale fabrication by nonconventional approaches
Kwak et al. Pattern formation of cytochrome c by microcontact printing and dip-pen nanolithography
US20080272516A1 (en) Successive Shrinking of Elastomers - a Simple Miniaturization Protocol to Produce Micro- and Nano-Structures
EP2059854A1 (fr) Nano-estampage supramoleculaire liquide (lisuns)
CA2523896A1 (fr) Methode d'impression par nanocontact
WO2007008507A2 (fr) Separation de phase dans des structures a motifs
HK1121719B (en) Nanocontact printing
Ouyang et al. A Simple Miniaturization Protocol to Produce Multicomponent Micro‐and Nanostructures
Carter An age-old printing process goes nano
JP2012029694A (ja) ナノコンタクト・プリント
Wang et al. Delicate Junction Meniscus Manipulation for Three-Dimensional Nanostructures Using Partially Molten Interfaces: Implications for Plasmonic Sensing
Xie et al. Microcontact printing
Sotomayor Torres Alternative lithography: An introduction
US20120171431A1 (en) Method for the creation of complex structures on a micrometric or nanometric scale, and the complex structure thus obtained

Legal Events

Date Code Title Description
EEER Examination request
FZDE Dead

Effective date: 20140507