CA2601295C - Procede et dispositif servant a ameliorer la gravure aux electrons basse energie et le nettoyage de substrats - Google Patents

Procede et dispositif servant a ameliorer la gravure aux electrons basse energie et le nettoyage de substrats Download PDF

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Publication number
CA2601295C
CA2601295C CA002601295A CA2601295A CA2601295C CA 2601295 C CA2601295 C CA 2601295C CA 002601295 A CA002601295 A CA 002601295A CA 2601295 A CA2601295 A CA 2601295A CA 2601295 C CA2601295 C CA 2601295C
Authority
CA
Canada
Prior art keywords
plasma
substrate
mechanical support
electrons
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA002601295A
Other languages
English (en)
Other versions
CA2601295A1 (fr
Inventor
Kevin P. Martin
Harry P. Gillis
Dimitri A. Choutov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Georgia Tech Research Corp
Original Assignee
Georgia Tech Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Georgia Tech Research Corp filed Critical Georgia Tech Research Corp
Priority claimed from CA002353479A external-priority patent/CA2353479C/fr
Publication of CA2601295A1 publication Critical patent/CA2601295A1/fr
Application granted granted Critical
Publication of CA2601295C publication Critical patent/CA2601295C/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P70/00—Cleaning of wafers, substrates or parts of devices
    • H10P70/10—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H10P70/12—Cleaning before device manufacture, i.e. Begin-Of-Line process by dry cleaning only

Landscapes

  • Drying Of Semiconductors (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
CA002601295A 1998-12-03 1998-12-03 Procede et dispositif servant a ameliorer la gravure aux electrons basse energie et le nettoyage de substrats Expired - Fee Related CA2601295C (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA002353479A CA2353479C (fr) 1998-12-03 1998-12-03 Procede et dispositif servant a ameliorer la gravure aux electrons basse energie et le nettoyage de substrats

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
CA002353479A Division CA2353479C (fr) 1998-12-03 1998-12-03 Procede et dispositif servant a ameliorer la gravure aux electrons basse energie et le nettoyage de substrats

Publications (2)

Publication Number Publication Date
CA2601295A1 CA2601295A1 (fr) 2000-06-08
CA2601295C true CA2601295C (fr) 2009-09-01

Family

ID=38792369

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002601295A Expired - Fee Related CA2601295C (fr) 1998-12-03 1998-12-03 Procede et dispositif servant a ameliorer la gravure aux electrons basse energie et le nettoyage de substrats

Country Status (1)

Country Link
CA (1) CA2601295C (fr)

Also Published As

Publication number Publication date
CA2601295A1 (fr) 2000-06-08

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Effective date: 20171204