CA2695902C - Ensemble cathodique et procede de generation de plasma pulse - Google Patents

Ensemble cathodique et procede de generation de plasma pulse Download PDF

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Publication number
CA2695902C
CA2695902C CA2695902A CA2695902A CA2695902C CA 2695902 C CA2695902 C CA 2695902C CA 2695902 A CA2695902 A CA 2695902A CA 2695902 A CA2695902 A CA 2695902A CA 2695902 C CA2695902 C CA 2695902C
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CA
Canada
Prior art keywords
cathode
cathodes
anode
plasma
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA2695902A
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English (en)
Other versions
CA2695902A1 (fr
Inventor
Nikolay Suslov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasma Surgical Investments Ltd
Original Assignee
Plasma Surgical Investments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Surgical Investments Ltd filed Critical Plasma Surgical Investments Ltd
Publication of CA2695902A1 publication Critical patent/CA2695902A1/fr
Application granted granted Critical
Publication of CA2695902C publication Critical patent/CA2695902C/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/3478—Geometrical details
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc
    • H05H1/34—Details, e.g. electrodes, nozzles
    • H05H1/36—Circuit arrangements

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Geometry (AREA)
  • Plasma Technology (AREA)
  • Radiation-Therapy Devices (AREA)

Abstract

La présente invention concerne un ensemble cathodique et un procédé de génération de plasma pulsé. L'ensemble de cathodique comporte un support de cathodes (2) relié à une pluralité de cathodes alignées dans le sens de la longueur (10, 20, 30), de préférence de même diamètre, et de différentes longueurs. Le procédé se caractérisé par la formation d'un arc électrique entre les cathodes (10, 20, 30) dans l'ensemble et d'une anode (4) en faisant circuler un courant continu de grandeur prédéterminée. Une fois l'arc établi, le courant est réduit à la grandeur suffisante pour maintenir l'arc électrique, ou une grandeur légèrement supérieure, réduisant ainsi la surface de fixation d'arc à une seule cathode. Une fois la surface de fixation réduite, le courant est élevé à un niveau opérationnel de l'impulsion, tandis que la surface de fixation ne s'accroît pas de manière significative.
CA2695902A 2007-08-06 2007-08-06 Ensemble cathodique et procede de generation de plasma pulse Expired - Fee Related CA2695902C (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2007/006940 WO2009018838A1 (fr) 2007-08-06 2007-08-06 Ensemble cathodique et procédé de génération de plasma pulsé

Publications (2)

Publication Number Publication Date
CA2695902A1 CA2695902A1 (fr) 2009-02-12
CA2695902C true CA2695902C (fr) 2016-01-05

Family

ID=39273282

Family Applications (1)

Application Number Title Priority Date Filing Date
CA2695902A Expired - Fee Related CA2695902C (fr) 2007-08-06 2007-08-06 Ensemble cathodique et procede de generation de plasma pulse

Country Status (6)

Country Link
EP (2) EP2177093B1 (fr)
JP (1) JP5154647B2 (fr)
CN (1) CN101828433B (fr)
CA (1) CA2695902C (fr)
ES (1) ES2458515T3 (fr)
WO (1) WO2009018838A1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20100127927A (ko) * 2009-05-27 2010-12-07 고영산 에너지레벨 조절이 가능한 무정전압 아이피엘 기기
WO2012115533A1 (fr) * 2011-02-25 2012-08-30 Nippon Steel Corporation, Torche à plasma
AU2012371647B2 (en) * 2012-02-28 2015-05-07 Sulzer Metco (Us), Inc. Extended cascade plasma gun
US10045432B1 (en) * 2017-10-20 2018-08-07 DM ECO Plasma, Inc. System and method of low-power plasma generation based on high-voltage plasmatron
CN110230082B (zh) * 2019-07-18 2021-06-25 烟台大学 一种集束阴极微弧氧化膜制备装置和方法
US12574443B2 (en) * 2020-04-10 2026-03-10 Oracle International Corporation System and method for use of remote procedure call with a microservices environment
CN115210689A (zh) 2020-04-14 2022-10-18 甲骨文国际公司 用于在微服务环境中使用的反应式消息传递客户端的系统和方法
DE102021111097B4 (de) * 2021-04-29 2023-04-06 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung eingetragener Verein Hohlkathodensystem zum Erzeugen eines Plasmas und Verfahren zum Betreiben eines solchen Hohlkathodensystems

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1661579A (en) 1922-07-28 1928-03-06 Cooper Hewitt Electric Co Bulb rectifier
US2615137A (en) 1946-01-05 1952-10-21 Stephen M Duke High-power vacuum tube
GB1112935A (en) * 1965-09-24 1968-05-08 Nat Res Dev Improvements in plasma arc devices
US3566185A (en) 1969-03-12 1971-02-23 Atomic Energy Commission Sputter-type penning discharge for metallic ions
CH578622A5 (fr) * 1972-03-16 1976-08-13 Bbc Brown Boveri & Cie
JPS52117255A (en) * 1976-03-29 1977-10-01 Kobe Steel Ltd Welding wire of consumable electrode
JPS60130472A (ja) * 1983-12-16 1985-07-11 ウセソユズニ　ナウチノ‐イスレドヴアテルスキー　プロエクトノー　コンストルクトルスキー　イ　テクノロギチエスキ　インスチチユート　エレクトロスヴアロチノゴ　オボルドヴアニア ア−ク溶接方法及び装置
US4785220A (en) 1985-01-30 1988-11-15 Brown Ian G Multi-cathode metal vapor arc ion source
US4713170A (en) 1986-03-31 1987-12-15 Florida Development And Manufacturing, Inc. Swimming pool water purifier
US5008511C1 (en) * 1990-06-26 2001-03-20 Univ British Columbia Plasma torch with axial reactant feed
FR2664687B1 (fr) 1990-07-12 1992-09-25 Giat Ind Sa Dispositif de securite pour arme automatique.
US5089707A (en) 1990-11-14 1992-02-18 Ism Technologies, Inc. Ion beam generating apparatus with electronic switching between multiple cathodes
DE4105408C1 (fr) * 1991-02-21 1992-09-17 Plasma-Technik Ag, Wohlen, Ch
DE4105407A1 (de) * 1991-02-21 1992-08-27 Plasma Technik Ag Plasmaspritzgeraet zum verspruehen von festem, pulverfoermigem oder gasfoermigem material
JPH06126449A (ja) * 1992-10-23 1994-05-10 Matsushita Electric Works Ltd アーク溶接方法
DE9215133U1 (de) * 1992-11-06 1993-01-28 Plasma-Technik Ag, Wohlen Plasmaspritzgerät
KR20010101137A (ko) * 1998-12-07 2001-11-14 메리 이. 보울러 플라즈마 생성을 위한 중공 음극 어레이
US6528947B1 (en) * 1999-12-06 2003-03-04 E. I. Du Pont De Nemours And Company Hollow cathode array for plasma generation
US6629974B2 (en) 2000-02-22 2003-10-07 Gyrus Medical Limited Tissue treatment method
US6475215B1 (en) 2000-10-12 2002-11-05 Naim Erturk Tanrisever Quantum energy surgical device and method
WO2003017317A1 (fr) * 2001-08-13 2003-02-27 Mapper Lithography Ip B.V. Systeme lithographique comprenant une plaque de convertisseur protegee
GB2407050A (en) * 2003-10-01 2005-04-20 C A Technology Ltd Rotary ring cathode for plasma spraying
CN100490052C (zh) * 2006-06-30 2009-05-20 哈尔滨工业大学 多阴极脉冲弧等离子体源装置
JP2008284580A (ja) * 2007-05-16 2008-11-27 Fuji Heavy Ind Ltd プラズマトーチ

Also Published As

Publication number Publication date
CN101828433A (zh) 2010-09-08
CA2695902A1 (fr) 2009-02-12
EP2177093A1 (fr) 2010-04-21
EP2177093B1 (fr) 2014-01-22
JP2010536124A (ja) 2010-11-25
WO2009018838A1 (fr) 2009-02-12
CN101828433B (zh) 2013-04-24
EP2557902A3 (fr) 2014-10-29
HK1136738A1 (en) 2010-07-02
EP2557902B1 (fr) 2016-11-23
EP2557902A2 (fr) 2013-02-13
JP5154647B2 (ja) 2013-02-27
ES2458515T3 (es) 2014-05-05

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Effective date: 20170807