CA2761126C - Masque holographique en ligne destine au micro-usinage - Google Patents

Masque holographique en ligne destine au micro-usinage Download PDF

Info

Publication number: CA2761126C
Authority: CA; Canada
Prior art keywords: mask; recording medium; hologram; wavefronts; ilhm
Prior art date: 1996-11-15
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Fee Related

Application number

CA2761126A

Other languages

English (en)

Other versions

CA2761126A1 (fr

Inventor

Julie W. Parker

William P. Parker

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Marsupial Holdings Inc

Original Assignee

Marsupial Holdings Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1996-11-15

Filing date

1997-11-14

Publication date

2014-01-28

1997-11-14 Application filed by Marsupial Holdings Inc filed Critical Marsupial Holdings Inc

1997-11-14 Priority claimed from CA2688799A external-priority patent/CA2688799C/fr

1998-05-22 Publication of CA2761126A1 publication Critical patent/CA2761126A1/fr

2014-01-28 Application granted granted Critical

2014-01-28 Publication of CA2761126C publication Critical patent/CA2761126C/fr

2017-11-14 Anticipated expiration legal-status Critical

Status Expired - Fee Related legal-status Critical Current

Links

238000005459 micromachining Methods 0.000 title description 14
238000000034 method Methods 0.000 claims abstract description 99
238000005286 illumination Methods 0.000 claims description 131
230000001427 coherent effect Effects 0.000 claims description 55
239000000758 substrate Substances 0.000 claims description 52
238000007373 indentation Methods 0.000 claims description 16
238000004519 manufacturing process Methods 0.000 claims description 10
239000012780 transparent material Substances 0.000 claims description 3
238000000059 patterning Methods 0.000 abstract description 32
229920002120 photoresistant polymer Polymers 0.000 description 55
230000008569 process Effects 0.000 description 39
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 24
239000000463 material Substances 0.000 description 22
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 21
230000003287 optical effect Effects 0.000 description 20
239000010453 quartz Substances 0.000 description 12
239000011248 coating agent Substances 0.000 description 9
238000000576 coating method Methods 0.000 description 9
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230000005540 biological transmission Effects 0.000 description 7
230000008901 benefit Effects 0.000 description 6
238000000151 deposition Methods 0.000 description 6
238000009826 distribution Methods 0.000 description 6
238000005553 drilling Methods 0.000 description 5
239000005350 fused silica glass Substances 0.000 description 5
229920001721 polyimide Polymers 0.000 description 5
239000004642 Polyimide Substances 0.000 description 4
230000000694 effects Effects 0.000 description 4
238000010438 heat treatment Methods 0.000 description 4
238000001093 holography Methods 0.000 description 4
238000003384 imaging method Methods 0.000 description 4
230000010363 phase shift Effects 0.000 description 4
239000004033 plastic Substances 0.000 description 4
238000001228 spectrum Methods 0.000 description 4
230000004075 alteration Effects 0.000 description 3
238000010276 construction Methods 0.000 description 3
230000005670 electromagnetic radiation Effects 0.000 description 3
230000002452 interceptive effect Effects 0.000 description 3
238000003754 machining Methods 0.000 description 3
238000004806 packaging method and process Methods 0.000 description 3
KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
238000001015 X-ray lithography Methods 0.000 description 2
238000002679 ablation Methods 0.000 description 2
238000003491 array Methods 0.000 description 2
230000002238 attenuated effect Effects 0.000 description 2
TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
238000002508 contact lithography Methods 0.000 description 2
238000012937 correction Methods 0.000 description 2
239000011521 glass Substances 0.000 description 2
238000000608 laser ablation Methods 0.000 description 2
239000007788 liquid Substances 0.000 description 2
238000001459 lithography Methods 0.000 description 2
238000002844 melting Methods 0.000 description 2
230000008018 melting Effects 0.000 description 2
239000012528 membrane Substances 0.000 description 2
229910052751 metal Inorganic materials 0.000 description 2
239000002184 metal Substances 0.000 description 2
238000012986 modification Methods 0.000 description 2
230000004048 modification Effects 0.000 description 2
230000036961 partial effect Effects 0.000 description 2
230000000737 periodic effect Effects 0.000 description 2
238000000206 photolithography Methods 0.000 description 2
238000001020 plasma etching Methods 0.000 description 2
229920000642 polymer Polymers 0.000 description 2
230000002441 reversible effect Effects 0.000 description 2
239000004065 semiconductor Substances 0.000 description 2
229910052710 silicon Inorganic materials 0.000 description 2
239000010703 silicon Substances 0.000 description 2
238000010561 standard procedure Methods 0.000 description 2
230000003746 surface roughness Effects 0.000 description 2
238000012360 testing method Methods 0.000 description 2
MIMUSZHMZBJBPO-UHFFFAOYSA-N 6-methoxy-8-nitroquinoline Chemical compound N1=CC=CC2=CC(OC)=CC([N+]([O-])=O)=C21 MIMUSZHMZBJBPO-UHFFFAOYSA-N 0.000 description 1
241001270131 Agaricus moelleri Species 0.000 description 1
229920002799 BoPET Polymers 0.000 description 1
KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
239000004593 Epoxy Substances 0.000 description 1
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
239000005041 Mylar™ Substances 0.000 description 1
235000010627 Phaseolus vulgaris Nutrition 0.000 description 1
244000046052 Phaseolus vulgaris Species 0.000 description 1
206010034972 Photosensitivity reaction Diseases 0.000 description 1
239000004793 Polystyrene Substances 0.000 description 1
101150109831 SIN4 gene Proteins 0.000 description 1
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
239000005083 Zinc sulfide Substances 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
238000013459 approach Methods 0.000 description 1
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
229910052790 beryllium Inorganic materials 0.000 description 1
ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
238000004061 bleaching Methods 0.000 description 1
239000007844 bleaching agent Substances 0.000 description 1
WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 1
229910001634 calcium fluoride Inorganic materials 0.000 description 1
230000001413 cellular effect Effects 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
238000003486 chemical etching Methods 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
230000001684 chronic effect Effects 0.000 description 1
238000005094 computer simulation Methods 0.000 description 1
239000010432 diamond Substances 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
238000007516 diamond turning Methods 0.000 description 1
238000010790 dilution Methods 0.000 description 1
239000012895 dilution Substances 0.000 description 1
238000006073 displacement reaction Methods 0.000 description 1
238000001035 drying Methods 0.000 description 1
238000010894 electron beam technology Methods 0.000 description 1
239000000839 emulsion Substances 0.000 description 1
230000007613 environmental effect Effects 0.000 description 1
230000005284 excitation Effects 0.000 description 1
238000002474 experimental method Methods 0.000 description 1
239000012530 fluid Substances 0.000 description 1
229910052732 germanium Inorganic materials 0.000 description 1
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
CPBQJMYROZQQJC-UHFFFAOYSA-N helium neon Chemical compound [He].[Ne] CPBQJMYROZQQJC-UHFFFAOYSA-N 0.000 description 1
238000001746 injection moulding Methods 0.000 description 1
230000003993 interaction Effects 0.000 description 1
238000010884 ion-beam technique Methods 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
239000004973 liquid crystal related substance Substances 0.000 description 1
229910052744 lithium Inorganic materials 0.000 description 1
238000003913 materials processing Methods 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
238000004377 microelectronic Methods 0.000 description 1
238000001393 microlithography Methods 0.000 description 1
238000003801 milling Methods 0.000 description 1
239000000203 mixture Substances 0.000 description 1
239000003921 oil Substances 0.000 description 1
229910052760 oxygen Inorganic materials 0.000 description 1
239000001301 oxygen Substances 0.000 description 1
230000002093 peripheral effect Effects 0.000 description 1
229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
229920000058 polyacrylate Polymers 0.000 description 1
229920002223 polystyrene Polymers 0.000 description 1
238000012545 processing Methods 0.000 description 1
230000001902 propagating effect Effects 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
230000005855 radiation Effects 0.000 description 1
230000003252 repetitive effect Effects 0.000 description 1
230000035945 sensitivity Effects 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
-1 silver halide Chemical class 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
238000000992 sputter etching Methods 0.000 description 1
TXEYQDLBPFQVAA-UHFFFAOYSA-N tetrafluoromethane Chemical compound FC(F)(F)F TXEYQDLBPFQVAA-UHFFFAOYSA-N 0.000 description 1
238000012546 transfer Methods 0.000 description 1
238000011179 visual inspection Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
229910052984 zinc sulfide Inorganic materials 0.000 description 1
PEUPCBAALXHYHP-UHFFFAOYSA-L zinc;selenite Chemical compound [Zn+2].[O-][Se]([O-])=O PEUPCBAALXHYHP-UHFFFAOYSA-L 0.000 description 1
DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/0005—Adaptation of holography to specific applications
- G03H2001/0094—Adaptation of holography to specific applications for patterning or machining using the holobject as input light distribution

Landscapes

Holo Graphy (AREA)
Diffracting Gratings Or Hologram Optical Elements (AREA)

CA2761126A 1996-11-15 1997-11-14 Masque holographique en ligne destine au micro-usinage Expired - Fee Related CA2761126C (fr)

Applications Claiming Priority (4)

Application Number	Priority Date	Filing Date	Title
US3096296P	1996-11-15	1996-11-15
US60/030,962		1996-11-15
CA2688799A CA2688799C (fr)	1996-11-15	1997-11-14	Masque holographique en ligne destine au micro-usinage
CA002271815A CA2271815C (fr)	1996-11-15	1997-11-14	Masque holographique en ligne destine au micro-usinage

Related Parent Applications (1)

Application Number	Title	Priority Date	Filing Date
CA2688799A Division CA2688799C (fr)	1996-11-15	1997-11-14	Masque holographique en ligne destine au micro-usinage

Publications (2)

Publication Number	Publication Date
CA2761126A1 CA2761126A1 (fr)	1998-05-22
CA2761126C true CA2761126C (fr)	2014-01-28

Family

ID=45470132

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA2761126A Expired - Fee Related CA2761126C (fr)	1996-11-15	1997-11-14	Masque holographique en ligne destine au micro-usinage

Country Status (1)

Country	Link
CA (1)	CA2761126C (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CN113238471B (zh) *	2021-05-20	2023-11-17	中国科学技术大学	分叉微管道的快速制备方法
CN118778370B (zh) *	2023-04-07	2025-09-12	光科芯图(北京)科技有限公司	一种全息掩模信息生成方法、装置、曝光设备及计算机可读存储介质
CN118778371B (zh) *	2023-04-07	2025-09-09	光科芯图(北京)科技有限公司	一种全息掩模信息生成优化方法、装置及曝光设备

1997
- 1997-11-14 CA CA2761126A patent/CA2761126C/fr not_active Expired - Fee Related

Also Published As

Publication number	Publication date
CA2761126A1 (fr)	1998-05-22

Legal Events

Date	Code	Title	Description
2011-12-06	EEER	Examination request
2017-12-26	MKLA	Lapsed	Effective date: 20171114

Publication	Publication Date	Title
US7099057B2 (en)	2006-08-29	In-line holographic mask for micromachining
US6278550B1 (en)	2001-08-21	Beam homogenizer
US5920380A (en)	1999-07-06	Apparatus and method for generating partially coherent illumination for photolithography
US7160673B2 (en)	2007-01-09	System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography
Wadle et al.	1994	Holographic diffusers
US11409238B2 (en)	2022-08-09	Systems, devices, and methods for aperture-free hologram recording
CA2761126C (fr)	2014-01-28	Masque holographique en ligne destine au micro-usinage
EP0795803A2 (fr)	1997-09-17	Procédé et dispositif pour l'enregistrement holographique d'un dessin périodique
EP0737902A2 (fr)	1996-10-16	Gravure de microstructures optiques et utilisation
KR19990067888A (ko)	1999-08-25	내부 전반사 홀로그래픽 장치 및 방법과, 그 장치의 광학 어셈블리
JP2803434B2 (ja)	1998-09-24	回折格子プロッター
Prongué et al.	1990	HOE for clock distribution in integrated circuits: experimental results
Parker	2007	High power holographic masks for beam shaping
Solano	2017	Diffractive elements
Buczek et al.	1991	DOE design and manufacture at CSEM
Oren	1990	Interferometric recording of volume computer-generated hologram on polymer material