CA567633A - Source thermionique d'ions - Google Patents

Source thermionique d'ions

Info

Publication number
CA567633A
CA567633A CA567633A CA567633DA CA567633A CA 567633 A CA567633 A CA 567633A CA 567633 A CA567633 A CA 567633A CA 567633D A CA567633D A CA 567633DA CA 567633 A CA567633 A CA 567633A
Authority
CA
Canada
Prior art keywords
ion source
thermionic ion
thermionic
source
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA567633A
Other languages
English (en)
Inventor
Pietri Georges
A. Boutry Georges
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Publication date
Application granted granted Critical
Publication of CA567633A publication Critical patent/CA567633A/fr
Expired legal-status Critical Current

Links

CA567633A Source thermionique d'ions Expired CA567633A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CA567633T

Publications (1)

Publication Number Publication Date
CA567633A true CA567633A (fr) 1958-12-16

Family

ID=35740155

Family Applications (1)

Application Number Title Priority Date Filing Date
CA567633A Expired CA567633A (fr) Source thermionique d'ions

Country Status (1)

Country Link
CA (1) CA567633A (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3404084A (en) * 1965-10-20 1968-10-01 Gen Precision Systems Inc Apparatus for depositing ionized electron beam evaporated material on a negatively biased substrate
US3428546A (en) * 1966-09-27 1969-02-18 Atomic Energy Commission Apparatus for vacuum deposition on a negatively biased substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3329601A (en) * 1964-09-15 1967-07-04 Donald M Mattox Apparatus for coating a cathodically biased substrate from plasma of ionized coatingmaterial
US3404084A (en) * 1965-10-20 1968-10-01 Gen Precision Systems Inc Apparatus for depositing ionized electron beam evaporated material on a negatively biased substrate
US3428546A (en) * 1966-09-27 1969-02-18 Atomic Energy Commission Apparatus for vacuum deposition on a negatively biased substrate

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