CA929280A - Method for producing thin film circuits on high purity alumina substrates - Google Patents

Method for producing thin film circuits on high purity alumina substrates

Info

Publication number
CA929280A
CA929280A CA130111A CA130111A CA929280A CA 929280 A CA929280 A CA 929280A CA 130111 A CA130111 A CA 130111A CA 130111 A CA130111 A CA 130111A CA 929280 A CA929280 A CA 929280A
Authority
CA
Canada
Prior art keywords
thin film
high purity
purity alumina
producing thin
film circuits
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA130111A
Other languages
English (en)
Other versions
CA130111S (en
Inventor
Robert C. Sundahl, Jr.
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AT&T Corp
Original Assignee
Western Electric Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co Inc filed Critical Western Electric Co Inc
Application granted granted Critical
Publication of CA929280A publication Critical patent/CA929280A/en
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W99/00—Subject matter not provided for in other groups of this subclass
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N97/00—Electric solid-state thin-film or thick-film devices, not otherwise provided for

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Physical Vapour Deposition (AREA)
  • Inorganic Insulating Materials (AREA)
  • Laminated Bodies (AREA)
CA130111A 1971-04-16 1971-12-14 Method for producing thin film circuits on high purity alumina substrates Expired CA929280A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US13466571A 1971-04-16 1971-04-16

Publications (1)

Publication Number Publication Date
CA929280A true CA929280A (en) 1973-06-26

Family

ID=22464389

Family Applications (1)

Application Number Title Priority Date Filing Date
CA130111A Expired CA929280A (en) 1971-04-16 1971-12-14 Method for producing thin film circuits on high purity alumina substrates

Country Status (11)

Country Link
US (1) US3791861A (fr)
JP (1) JPS5143570B1 (fr)
BE (1) BE782119A (fr)
CA (1) CA929280A (fr)
CH (1) CH584960A5 (fr)
DE (1) DE2217573C3 (fr)
FR (1) FR2133777B1 (fr)
GB (1) GB1389326A (fr)
IT (1) IT954427B (fr)
NL (1) NL7205052A (fr)
SE (1) SE378972B (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2727364A1 (de) * 1977-06-16 1979-01-04 Siemens Ag Verfahren zur herstellung von keramiksubstraten
US5011568A (en) * 1990-06-11 1991-04-30 Iowa State University Research Foundation, Inc. Use of sol-gel derived tantalum oxide as a protective coating for etching silicon
US5425909A (en) * 1992-07-20 1995-06-20 Industrial Technology Research Institute Heat treatment for particle reinforced alumina ceramic composite
US5856235A (en) * 1995-04-12 1999-01-05 Northrop Grumman Corporation Process of vacuum annealing a thin film metallization on high purity alumina
US5691004A (en) * 1996-07-11 1997-11-25 Ford Global Technologies, Inc. Method of treating light metal cylinder bore walls to receive thermal sprayed metal coatings
JPH10167859A (ja) * 1996-12-05 1998-06-23 Ngk Insulators Ltd セラミックス部品およびその製造方法
US6641939B1 (en) 1998-07-01 2003-11-04 The Morgan Crucible Company Plc Transition metal oxide doped alumina and methods of making and using
KR102105639B1 (ko) * 2019-03-28 2020-04-28 주식회사 엘지화학 면역 검사 장치 및 면역 검사 방법

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2885310A (en) * 1954-09-13 1959-05-05 Ohmite Mfg Company Method and apparatus for making film resistors
US2901381A (en) * 1956-10-12 1959-08-25 Bell Telephone Labor Inc Method of making electrical resistors
US3032397A (en) * 1957-01-25 1962-05-01 Du Pont Preparation of metal nitride pigment flakes
US3212918A (en) * 1962-05-28 1965-10-19 Ibm Electroless plating process
GB1247007A (en) * 1968-04-04 1971-09-22 Atomic Energy Authority Uk Improvements in or relating to electroless plating processes
JPS502607B1 (fr) * 1968-08-10 1975-01-28

Also Published As

Publication number Publication date
DE2217573C3 (de) 1978-03-09
JPS4743969A (fr) 1972-12-20
SE378972B (fr) 1975-09-15
JPS5143570B1 (fr) 1976-11-22
DE2217573B2 (de) 1974-02-14
FR2133777B1 (fr) 1974-12-20
US3791861A (en) 1974-02-12
DE2217573A1 (de) 1972-11-02
NL7205052A (fr) 1972-10-18
IT954427B (it) 1973-08-30
FR2133777A1 (fr) 1972-12-01
GB1389326A (en) 1975-04-03
CH584960A5 (fr) 1977-02-15
BE782119A (fr) 1972-07-31

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