CA999979A - Tailoring reverse recovery time and forward voltage drop characteristics of a diode by irradiation and annealing - Google Patents

Tailoring reverse recovery time and forward voltage drop characteristics of a diode by irradiation and annealing

Info

Publication number
CA999979A
CA999979A CA193,427A CA193427A CA999979A CA 999979 A CA999979 A CA 999979A CA 193427 A CA193427 A CA 193427A CA 999979 A CA999979 A CA 999979A
Authority
CA
Canada
Prior art keywords
tailoring
annealing
irradiation
diode
voltage drop
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA193,427A
Other languages
English (en)
Other versions
CA193427S (en
Inventor
Krishan S. Tarneja
John Bartko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric Corp
Original Assignee
Westinghouse Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric Corp filed Critical Westinghouse Electric Corp
Application granted granted Critical
Publication of CA999979A publication Critical patent/CA999979A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P34/00Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices
    • H10P34/40Irradiation with electromagnetic or particle radiation of wafers, substrates or parts of devices with high-energy radiation
CA193,427A 1973-03-09 1974-02-25 Tailoring reverse recovery time and forward voltage drop characteristics of a diode by irradiation and annealing Expired CA999979A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US339669A US3888701A (en) 1973-03-09 1973-03-09 Tailoring reverse recovery time and forward voltage drop characteristics of a diode by irradiation and annealing

Publications (1)

Publication Number Publication Date
CA999979A true CA999979A (en) 1976-11-16

Family

ID=23330085

Family Applications (1)

Application Number Title Priority Date Filing Date
CA193,427A Expired CA999979A (en) 1973-03-09 1974-02-25 Tailoring reverse recovery time and forward voltage drop characteristics of a diode by irradiation and annealing

Country Status (3)

Country Link
US (1) US3888701A (2)
JP (1) JPS5131190B2 (2)
CA (1) CA999979A (2)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4053925A (en) * 1975-08-07 1977-10-11 Ibm Corporation Method and structure for controllng carrier lifetime in semiconductor devices
JPS52129577U (2) * 1976-03-29 1977-10-01
US4076555A (en) * 1976-05-17 1978-02-28 Westinghouse Electric Corporation Irradiation for rapid turn-off reverse blocking diode thyristor
US4137099A (en) * 1977-07-11 1979-01-30 General Electric Company Method of controlling leakage currents and reverse recovery time of rectifiers by hot electron irradiation and post-annealing treatments
US4134778A (en) * 1977-09-02 1979-01-16 General Electric Company Selective irradiation of thyristors
DE2755418A1 (de) * 1977-12-13 1979-06-21 Bosch Gmbh Robert Verfahren zur herstellung eines halbleiter-bauelements
US4184896A (en) * 1978-06-06 1980-01-22 The United States Of America As Represented By The Secretary Of The Air Force Surface barrier tailoring of semiconductor devices utilizing scanning electron microscope produced ionizing radiation
US4240844A (en) * 1978-12-22 1980-12-23 Westinghouse Electric Corp. Reducing the switching time of semiconductor devices by neutron irradiation
US4291329A (en) * 1979-08-31 1981-09-22 Westinghouse Electric Corp. Thyristor with continuous recombination center shunt across planar emitter-base junction
US4358323A (en) * 1980-04-23 1982-11-09 Rca Corporation Low cost reduced blooming device and method for making the same
US4329702A (en) * 1980-04-23 1982-05-11 Rca Corporation Low cost reduced blooming device and method for making the same
DE59003052D1 (de) * 1989-05-18 1993-11-18 Asea Brown Boveri Halbleiterbauelement.
DE4421529C2 (de) * 1994-06-20 1996-04-18 Semikron Elektronik Gmbh Schnelle Leistungsdiode

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2911533A (en) * 1957-12-24 1959-11-03 Arthur C Damask Electron irradiation of solids
US3272661A (en) * 1962-07-23 1966-09-13 Hitachi Ltd Manufacturing method of a semi-conductor device by controlling the recombination velocity
US3533857A (en) * 1967-11-29 1970-10-13 Hughes Aircraft Co Method of restoring crystals damaged by irradiation
US3532910A (en) * 1968-07-29 1970-10-06 Bell Telephone Labor Inc Increasing the power output of certain diodes
JPS4837232B1 (2) * 1968-12-04 1973-11-09

Also Published As

Publication number Publication date
US3888701A (en) 1975-06-10
JPS5131190B2 (2) 1976-09-04
JPS50111994A (2) 1975-09-03

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