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Filing date
Publication date
Application filed by Markowitz MorrisfiledCriticalMarkowitz Morris
Publication of CH302175ApublicationCriticalpatent/CH302175A/fr
G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
G03F1/90—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared by montage processes
Landscapes
Physics & Mathematics
(AREA)
General Physics & Mathematics
(AREA)
Preparing Plates And Mask In Photomechanical Process
(AREA)
CH302175D1952-02-291952-03-31Procédé de composition de clichés graphiques, et cliché obtenu par ce procédé.
CH302175A
(fr)