CH333693A - Process for removing from a body of fusible material or for redistributing therein at least one ingredient other than the main ingredient of the body - Google Patents

Process for removing from a body of fusible material or for redistributing therein at least one ingredient other than the main ingredient of the body

Info

Publication number
CH333693A
CH333693A CH333693DA CH333693A CH 333693 A CH333693 A CH 333693A CH 333693D A CH333693D A CH 333693DA CH 333693 A CH333693 A CH 333693A
Authority
CH
Switzerland
Prior art keywords
ingredient
redistributing
fusible material
main ingredient
main
Prior art date
Application number
Other languages
French (fr)
Inventor
Charles Theuerer Henry
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Publication of CH333693A publication Critical patent/CH333693A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/40—Crystalline structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08—Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
    • C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
    • C22B9/02—Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C30B11/04—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt
    • C30B11/08—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method adding crystallising materials or reactants forming it in situ to the melt every component of the crystal composition being added during the crystallisation
    • C30B11/10—Solid or liquid components, e.g. Verneuil method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/16—Heating of the molten zone
    • C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B17/00—Furnaces of a kind not covered by any of groups F27B1/00 - F27B15/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/02—Induction heating
    • H05B6/22—Furnaces without an endless core
    • H05B6/30—Arrangements for remelting or zone melting
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/20—Recycling
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00—Technologies related to metal processing
    • Y02P10/25—Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Engineering & Computer Science (AREA)
  • Acoustics & Sound (AREA)
  • Manufacturing & Machinery (AREA)
  • Electromagnetism (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Silicon Compounds (AREA)
CH333693D 1952-12-17 1953-12-17 Process for removing from a body of fusible material or for redistributing therein at least one ingredient other than the main ingredient of the body CH333693A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US333693XA 1952-12-17 1952-12-17

Publications (1)

Publication Number Publication Date
CH333693A true CH333693A (en) 1958-10-31

Family

ID=21870028

Family Applications (1)

Application Number Title Priority Date Filing Date
CH333693D CH333693A (en) 1952-12-17 1953-12-17 Process for removing from a body of fusible material or for redistributing therein at least one ingredient other than the main ingredient of the body

Country Status (6)

Country Link
BE (1) BE525102A (en)
CH (1) CH333693A (en)
DE (1) DE1014332B (en)
FR (1) FR1087946A (en)
GB (1) GB774270A (en)
NL (1) NL89230C (en)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1061527B (en) * 1953-02-14 1959-07-16 Siemens Ag Process for zone-wise remelting of rods and other elongated workpieces
DE1056840B (en) 1953-02-14 1959-05-06 Siemens Ag Method for distributing foreign matter components in semiconductor rods by a crucible-free zone melting method
DE1062431B (en) 1953-02-14 1959-07-30 Siemens Ag Method and device for remelting elongated bodies by zone melting
DE971413C (en) * 1953-10-02 1959-01-22 Siemens Ag Device for crucible zone melting
DE1151245B (en) * 1953-11-03 1963-07-11 Siemens Ag Process for the zone-wise remelting of materials in the form of an elongated body
DE1175447B (en) 1954-01-29 1964-08-06 Licentia Gmbh Process for the production of semiconductor crystals by crucible-free zone melting
DE1188042B (en) 1954-01-29 1965-03-04 Siemens Ag Device for crucible zone melting of a rod-shaped crystalline semiconductor body
NL113118C (en) * 1954-05-18 1900-01-01
US2964396A (en) * 1954-05-24 1960-12-13 Siemens Ag Producing semiconductor substances of highest purity
DE1253235B (en) * 1954-05-25 1967-11-02 Siemens Ag Process for producing rod-shaped semiconductor crystals
DE1017795B (en) * 1954-05-25 1957-10-17 Siemens Ag Process for the production of the purest crystalline substances, preferably semiconductor substances
DE1221611B (en) 1954-06-24 1966-07-28 Siemens Ag Method and device for the production of artificial gemstones or semi-precious stones or of hard materials suitable for machining
DE1179382B (en) * 1954-06-30 1964-10-08 Siemens Ag Process for producing an extremely pure, rod-shaped semiconductor crystal for the production of electrical semiconductor components such as directional conductors, transistors, etc.
DE1201073B (en) * 1954-07-30 1965-09-16 Siemens Ag Process for producing a semiconducting alloy
NL105554C (en) 1955-01-13
NL203438A (en) * 1955-01-14
FR109723A (en) * 1955-01-14
DE1196046B (en) * 1955-03-28 1965-07-01 Siemens Ag Process for producing a highly pure, crystalline rod from a conductive or semiconductive element
DE1141255B (en) * 1958-03-05 1962-12-20 Siemens Ag Process for producing highly purified single-crystalline semiconductor rods
US2835614A (en) * 1955-11-30 1958-05-20 Raulaud Corp Method of manufacturing crystalline material
DE1063870B (en) * 1956-06-28 1959-08-20 Gustav Weissenberg Method and device for crucible-free growing of single crystals from high-purity silicon or germanium
DE1136308B (en) * 1956-10-17 1962-09-13 Siemens Ag Process for the production of crystal rods from highly pure semiconducting materials
DE1181668B (en) * 1956-10-17 1964-11-19 Siemens Ag Method for producing high-purity, rod-shaped semiconductor crystals by depositing the semiconductor from a gaseous compound of the semiconductor by means of an electrical gas discharge
NL104388C (en) * 1956-11-28
DE1207922B (en) * 1957-04-30 1965-12-30 Standard Elektrik Lorenz Ag Process for producing high-purity semiconductor substances, in particular silicon
DE1169683B (en) * 1957-05-31 1964-05-06 Siemens Ag Method for crucible-free zone melting of a semiconductor rod
DE1092576B (en) * 1957-11-15 1960-11-10 Siemens Ag Power supply for the movable heating coil of a crucible-free zone pulling device inside a vessel
DE1076623B (en) * 1957-11-15 1960-03-03 Siemens Ag Device for crucible-free zone drawing of rod-shaped semiconductor material
NL234451A (en) * 1957-12-27
NL235481A (en) * 1958-02-19
NL237618A (en) * 1958-04-03
BE581195A (en) * 1958-07-30
US3093456A (en) * 1958-09-02 1963-06-11 Texas Instruments Inc Method for recovery and reuse of quartz containers
DE1216040B (en) * 1958-09-12 1966-05-05 Eternit Sa Female connector for smooth insert pipes
DE1164681B (en) 1958-12-24 1964-03-05 Siemens Ag Process for the production of a uniformly doped rod made of semiconductor material by crucible-free zone melting
US3053639A (en) * 1959-02-11 1962-09-11 Union Carbide Corp Method and apparatus for growing crystals
NL250835A (en) * 1959-04-30
CH354429A (en) * 1959-06-05 1961-05-31 Ind De Pierres Scient Hrand Dj Process for manufacturing a tubular body in synthetic stone, at installation for the implementation of this process
CH354427A (en) * 1959-06-05 1961-05-31 Ind De Pierres Scient Hrand Dj Process for manufacturing a body of revolution, in particular a synthetic stone disc and installation for implementing this process
US3086850A (en) * 1959-06-17 1963-04-23 Itt Method and means for growing and treating crystals
US3115469A (en) * 1959-06-22 1963-12-24 Monsanto Chemicals Production of single crystals of ferrites
DE1128412B (en) * 1959-12-17 1962-04-26 Metallgesellschaft Ag Process for the production of hyperpure silicon by the thermal decomposition of gaseous silicon compounds
NL133150C (en) * 1959-12-23
DE1114171B (en) * 1959-12-31 1961-09-28 Siemens Ag Holder for rod-shaped semiconductor material in devices for crucible-free zone melting
NL262164A (en) * 1960-03-11
US3156533A (en) * 1960-07-26 1964-11-10 Imber Oscar Crystal growth apparatus
DE1216257B (en) * 1960-08-18 1966-05-12 Kempten Elektroschmelz Gmbh Process for the production of single crystals
DE1163559B (en) * 1960-08-20 1964-02-20 Siemens Ag Method and device for the production of single-crystal rods, in particular for semiconductor arrangements, by means of crucible-free zone melting
US3232745A (en) * 1960-12-05 1966-02-01 Siemens Ag Producing rod-shaped semiconductor crystals
DE1227424B (en) * 1961-03-01 1966-10-27 Philips Nv Method and device for zone melting a rod-shaped body consisting of a metal compound
NL122355C (en) * 1961-03-14
FR1315934A (en) * 1961-12-15 1963-01-25 Radiotechnique Horizontal apparatus for purification and extraction of semiconductor crystals
DE1182207B (en) * 1962-07-20 1964-11-26 Siemens Ag Method for producing a low-dislocation semiconductor single crystal by crucible-free zone melting
US3245761A (en) * 1962-10-11 1966-04-12 Norton Co Apparatus for making magnesium oxide crystals
US3314769A (en) * 1963-05-08 1967-04-18 Union Carbide Corp Arc process and apparatus for growing crystals
DE1284942B (en) * 1964-06-30 1968-12-12 Halbleiterwerk Frankfurt Oder Device for the thermal treatment of crystals and melts, in particular made of semiconductor material
US4379733A (en) * 1981-10-02 1983-04-12 Hughes Aircraft Company Bicameral mode crystal growth apparatus and process
CN113337725A (en) * 2021-06-29 2021-09-03 红河学院 Method for enriching germanium from smelting slag
CN115198356B (en) * 2022-07-15 2023-07-21 郑州大学 A large-scale metal single crystal with a specific orientation and its preparation method

Also Published As

Publication number Publication date
FR1087946A (en) 1955-03-01
BE525102A (en) 1900-01-01
GB774270A (en) 1957-05-08
DE1014332B (en) 1957-08-22
NL89230C (en) 1900-01-01

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