CH373487A - Einrichtung zur Objektbeobachtung an einem Gerät zur Materialbearbeitung mittels Ladungsträgerstrahl - Google Patents

Einrichtung zur Objektbeobachtung an einem Gerät zur Materialbearbeitung mittels Ladungsträgerstrahl

Info

Publication number
CH373487A
CH373487A CH7687159A CH7687159A CH373487A CH 373487 A CH373487 A CH 373487A CH 7687159 A CH7687159 A CH 7687159A CH 7687159 A CH7687159 A CH 7687159A CH 373487 A CH373487 A CH 373487A
Authority
CH
Switzerland
Prior art keywords
material processing
charge carrier
carrier beam
object observation
observation
Prior art date
Application number
CH7687159A
Other languages
English (en)
Inventor
Wolfgang Dr Opitz
Spruck Helmut
Heinz Steigerwald Karl
Original Assignee
Zeiss Carl Fa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Fa filed Critical Zeiss Carl Fa
Publication of CH373487A publication Critical patent/CH373487A/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/301—Arrangements enabling beams to pass between regions of different pressure
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K15/00—Electron-beam welding or cutting
    • B23K15/0013—Positioning or observing workpieces, e.g. with respect to the impact; Aligning, aiming or focusing electron beams
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09—Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/16—Vessels; Containers
    • H01J37/165—Means associated with the vessel for preventing the generation of or for shielding unwanted radiation, e.g. X-rays
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S164/00—Metal founding
    • Y10S164/04—Dental

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Beam Exposure (AREA)
  • Drying Of Semiconductors (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Physical Vapour Deposition (AREA)
  • Microscoopes, Condenser (AREA)
CH7687159A 1958-08-30 1959-08-12 Einrichtung zur Objektbeobachtung an einem Gerät zur Materialbearbeitung mittels Ladungsträgerstrahl CH373487A (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DEZ6833A DE1099659B (de) 1958-08-30 1958-08-30 Abschirmvorrichtung
DEZ6834A DE1119428B (de) 1958-08-30 1958-08-30 Einrichtung zur Objektbeobachtung in Geraeten zur Materialbearbeitung mittels Ladungstraegerstrahl
DE1958Z0006841 DE1073654B (de) 1958-08-30 1958-09-06 Einrichtung in Geräten zur Materialbearbeitung mittels Ladungsträgerstrahl

Publications (1)

Publication Number Publication Date
CH373487A true CH373487A (de) 1963-11-30

Family

ID=27213500

Family Applications (1)

Application Number Title Priority Date Filing Date
CH7687159A CH373487A (de) 1958-08-30 1959-08-12 Einrichtung zur Objektbeobachtung an einem Gerät zur Materialbearbeitung mittels Ladungsträgerstrahl

Country Status (6)

Country Link
US (1) US2944172A (de)
CH (1) CH373487A (de)
DE (3) DE1099659B (de)
FR (1) FR1232874A (de)
GB (1) GB854276A (de)
NL (2) NL121256C (de)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3036213A (en) * 1959-12-30 1962-05-22 Lockheed Aircraft Corp Apparatus for accelerating micron-size particles to meteoric velocities
US3107297A (en) * 1960-08-29 1963-10-15 Applied Res Lab Inc Electron probe X-ray analyzer wherein the emitted X-radiation passes through the objective lens
US3054896A (en) * 1961-01-12 1962-09-18 William H Jones Apparatus for electron beam heating control
CH394629A (de) * 1961-03-20 1965-06-30 Trueb Taeuber & Co Ag Verfahren und Vorrichtung zur Aufnahme und Eichung von Elektronenbeugungsdiagrammen
NL276412A (de) * 1961-03-30
US3197669A (en) * 1961-05-12 1965-07-27 Welding Research Inc Electron emitting element for electron gun
US3209146A (en) * 1961-12-09 1965-09-28 Akashi Seisakusho Kk Apparatus for adjusting position of a sample for electron probe x-ray microanalyzer
DE1266608B (de) * 1962-03-23 1968-04-18 Siemens Ag Verfahren zum Vakuumaufdampfen von Isolierstoffschichten mittels gebuendelter Elektronenstrahlen
US3152238A (en) * 1962-05-11 1964-10-06 United Aircraft Corp Electron beam centering apparatus
US3355568A (en) * 1962-07-28 1967-11-28 Hitachi Ltd Electron-beam machining of specimens and its control by X-ray radiation measurements
US3169183A (en) * 1962-10-17 1965-02-09 United Aircraft Corp Optical viewing system for electron beam machine
US3221133A (en) * 1963-04-02 1965-11-30 Japan Electron Optics Lab Co L Electron microscope with means for treating and observing specimens
US3396262A (en) * 1963-11-28 1968-08-06 Nippon Electric Co Means for observing electron beams
US3300618A (en) * 1963-12-26 1967-01-24 Welding Research Inc Optical viewing system for electron beam welders
US3316801A (en) * 1964-01-17 1967-05-02 Raymond S Vogel Microscope in combination with a microspark probe including an unshielded electrode of small tip radius
US3346736A (en) * 1964-09-22 1967-10-10 Applied Res Lab Inc Electron probe apparatus having an objective lens with an aperture for restricting fluid flow
US3371185A (en) * 1964-10-05 1968-02-27 United Aircraft Corp Electron beam maintenance device
US3374386A (en) * 1964-11-02 1968-03-19 Field Emission Corp Field emission cathode having tungsten miller indices 100 plane coated with zirconium, hafnium or magnesium on oxygen binder
US3548189A (en) * 1965-06-16 1970-12-15 Aden B Meinel Method employing ion beams for polishing and figuring refractory dielectrics
US3420978A (en) * 1965-06-30 1969-01-07 Nasa Pretreatment method for antiwettable materials
US3374349A (en) * 1966-11-14 1968-03-19 Victor G. Macres Electron probe having a specific shortfocal length magnetic lens and light microscope
GB1291221A (en) * 1968-07-07 1972-10-04 Smith Kenneth C A Electron probe forming system
US3903421A (en) * 1972-12-18 1975-09-02 Siemens Ag Device for irradiation with energy rich electrons
DE3240653A1 (de) * 1982-11-04 1984-05-10 Dr.-Ing. Rudolf Hell Gmbh, 2300 Kiel Verfahren zur kontrolle von mittels elektronenstrahlgravierten druckformoberflaechen
US4587432A (en) * 1984-08-03 1986-05-06 Applied Materials, Inc. Apparatus for ion implantation
US4663511A (en) * 1986-05-02 1987-05-05 The United States Of America As Represented By The United States Department Of Energy Stereoscopic optical viewing system
DE3930400A1 (de) * 1989-09-12 1991-03-21 Ptr Praezisionstech Gmbh Beobachtungseinrichtung fuer elektronenstrahlgeraete
DE102008001812B4 (de) 2008-05-15 2013-05-29 Carl Zeiss Microscopy Gmbh Positioniereinrichtung für ein Teilchenstrahlgerät
DE102009041993B4 (de) * 2009-09-18 2020-02-13 Carl Zeiss Microscopy Gmbh Beobachtungs- und Analysegerät
DE102010011898A1 (de) 2010-03-18 2011-09-22 Carl Zeiss Nts Gmbh Inspektionssystem
US9310596B2 (en) * 2010-04-06 2016-04-12 Inter-University Research Institute Corporation National Institute Of Natural Sciences Compound microscope device
DE102010026169B4 (de) 2010-07-06 2014-09-04 Carl Zeiss Microscopy Gmbh Partikelstrahlsystem
DE102010053475B4 (de) * 2010-12-04 2022-03-24 Carl Zeiss Microscopy Gmbh Vorrichtung zum lichtdichten Abschluss eines Probenraums und Mikroskop
US10443447B2 (en) 2016-03-14 2019-10-15 General Electric Company Doubler attachment system
CN106938368B (zh) * 2017-05-03 2023-09-19 桂林实创真空数控设备有限公司 一种带x射线防护的直线局部动密封运动机构

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE903017C (de) * 1951-01-31 1954-02-01 Sueddeutsche Lab G M B H Herstellung kleiner Kugeln aus hochschmelzbaren Materialien
US2719456A (en) * 1952-02-02 1955-10-04 Gen Electric Image scanning and magnifying micrometer
DE1032442B (de) * 1952-12-06 1958-06-19 Licentia Gmbh Vorrichtung zum Einstellen eines Geraetes, das zur Bearbeitung fester Koerper mit Ladungstraegerstrahlen dient

Also Published As

Publication number Publication date
GB854276A (en) 1960-11-16
FR1232874A (fr) 1960-10-12
NL121256C (de) 1966-09-15
DE1073654B (de) 1960-01-21
DE1099659B (de) 1961-02-16
US2944172A (en) 1960-07-05
DE1119428B (de) 1961-12-14
NL242744A (de) 1964-01-27

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