CH390653A - Verfahren zur elektrolytischen Abscheidung dünner Schichten - Google Patents

Verfahren zur elektrolytischen Abscheidung dünner Schichten

Info

Publication number
CH390653A
CH390653A CH715261A CH715261A CH390653A CH 390653 A CH390653 A CH 390653A CH 715261 A CH715261 A CH 715261A CH 715261 A CH715261 A CH 715261A CH 390653 A CH390653 A CH 390653A
Authority
CH
Switzerland
Prior art keywords
thin layers
electrolytic deposition
electrolytic
deposition
layers
Prior art date
Application number
CH715261A
Other languages
English (en)
Inventor
Heywang Walter Dr Dipl-Phys
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH390653A publication Critical patent/CH390653A/de

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/188—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by direct electroplating
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D1/00—Electroforming
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/02—Electroplating of selected surface areas
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
    • G11C11/21—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements
    • G11C11/44—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using electric elements using super-conductive elements, e.g. cryotron
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/002—Inhomogeneous material in general
    • H01B3/004—Inhomogeneous material in general with conductive additives or conductive layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0128—Manufacture or treatment of composite superconductor filaments
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/40—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials
    • H10P14/46—Formation of materials, e.g. in the shape of layers or pillars of conductive or resistive materials using a liquid
    • H10P14/47—Electrolytic deposition, i.e. electroplating; Electroless plating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Thermal Transfer Or Thermal Recording In General (AREA)
CH715261A 1960-07-05 1961-06-19 Verfahren zur elektrolytischen Abscheidung dünner Schichten CH390653A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DES69238A DE1223222B (de) 1960-07-05 1960-07-05 Verfahren zur elektrolytischen Abscheidung duenner Schichten

Publications (1)

Publication Number Publication Date
CH390653A true CH390653A (de) 1965-04-15

Family

ID=7500844

Family Applications (1)

Application Number Title Priority Date Filing Date
CH715261A CH390653A (de) 1960-07-05 1961-06-19 Verfahren zur elektrolytischen Abscheidung dünner Schichten

Country Status (5)

Country Link
BE (1) BE605785A (de)
CH (1) CH390653A (de)
DE (1) DE1223222B (de)
GB (1) GB933296A (de)
NL (1) NL266616A (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116634851B (zh) * 2023-04-25 2026-02-24 本源量子计算科技(合肥)股份有限公司 超导电路及其保护方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE837633C (de) * 1950-10-07 1952-04-28 Richard Blasberg Verfahren zum Leitendmachen nichtmetallischer Oberflaechen, insbesondere von Kunststoffen
GB847927A (en) * 1955-10-11 1960-09-14 Philco Corp A method and apparatus for the electrolytic treatment of semiconductive bodies

Also Published As

Publication number Publication date
BE605785A (fr) 1961-11-03
GB933296A (en) 1963-08-08
NL266616A (de)
DE1223222B (de) 1966-08-18

Similar Documents

Publication Publication Date Title
AT240495B (de) Verfahren zur Herstellung von Überzügen
CH411512A (de) Bad zur Erzeugung metallischer Überzüge
CH429673A (de) Verfahren zur Abscheidung von Halbleitermaterial
CH383768A (de) Verfahren zur Herstellung photographischer Schichten
CH415598A (de) Verfahren zur Gewinnung von reinisophoron
CH410392A (de) Verfahren zur Herstellung von Zwischenschichten aufweisenden Filmen
CH449611A (de) Verfahren zur Herstellung von Organozinnverbindungen
CH409892A (de) Verfahren zur Herstellung von Peroxo-monosulfaten
CH432841A (de) Verfahren zur Herstellung von Polycarbonaten
CH415632A (de) Verfahren zur Herstellung neuer 3-Pyrrolidylmethylamine
CH396846A (de) Verfahren zur Verminderung der Durchlässigkeit von Überzügen
CH401357A (de) Verfahren zur Herstellung von Rufomycin
CH387209A (de) Verfahren zur Herstellung von Schmiermitteln
CH394758A (de) Verfahren zur Regenerierung von Chromatierungslösungen
CH429135A (de) Verfahren zur Herstellung von beschichteten Folien
CH380601A (de) Verfahren zur Herstellung von Überzügen
CH390234A (de) Verfahren zur Herstellung von Vinylthioäthylthiolphosph3r- bzw, -phosphonsäureestern
CH415228A (de) Verfahren zur Abscheidung von Überzügen von Metallen der Platingruppe
CH407970A (de) Verfahren zur Herstellung neuer Telomerisate
CH375362A (de) Verfahren zur Herstellung von 4-Chinazolonen
CH397672A (de) Verfahren zur Herstellung von Tetraorganodiphosphinen
CH403435A (de) Verfahren zur galvanischen Abscheidung von Gold-Kupfer-Cadmium-Legierungen
CH398554A (de) Verfahren zur Herstellung von Phosphordithioaten
CH397674A (de) Verfahren zur Herstellung von Dialkoxyvinylboran
CH404670A (de) Verfahren zur Herstellung von w-Lactamen