CH403439A - Verfahren zum Dotieren von Silizium mit Bor - Google Patents
Verfahren zum Dotieren von Silizium mit BorInfo
- Publication number
- CH403439A CH403439A CH8562A CH8562A CH403439A CH 403439 A CH403439 A CH 403439A CH 8562 A CH8562 A CH 8562A CH 8562 A CH8562 A CH 8562A CH 403439 A CH403439 A CH 403439A
- Authority
- CH
- Switzerland
- Prior art keywords
- boron
- doping silicon
- doping
- silicon
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/08—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone
- C30B13/10—Single-crystal growth by zone-melting; Refining by zone-melting adding crystallising materials or reactants forming it in situ to the molten zone with addition of doping materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S252/00—Compositions
- Y10S252/95—Doping agent source material
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DES0073985 | 1961-05-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH403439A true CH403439A (de) | 1965-11-30 |
Family
ID=7504333
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH8562A CH403439A (de) | 1961-05-16 | 1962-01-04 | Verfahren zum Dotieren von Silizium mit Bor |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US3243373A (de) |
| CH (1) | CH403439A (de) |
| DE (1) | DE1419656B2 (de) |
| GB (1) | GB931692A (de) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2624756A1 (de) * | 1976-06-02 | 1977-12-15 | Siemens Ag | Verfahren zum herstellen von aus silicium oder siliciumcarbid bestehenden, direkt beheizbaren rohren |
| JPS62101026A (ja) * | 1985-10-26 | 1987-05-11 | Shin Etsu Chem Co Ltd | 不純物拡散源 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL168491B (de) * | 1951-11-16 | Roussel-Uclaf, Societe Anonyme Te Parijs. | ||
| US3060123A (en) * | 1952-12-17 | 1962-10-23 | Bell Telephone Labor Inc | Method of processing semiconductive materials |
| GB797950A (en) * | 1954-06-10 | 1958-07-09 | Rca Corp | Semi-conductor alloys |
| NL255390A (de) * | 1958-09-20 | 1900-01-01 |
-
1961
- 1961-05-16 DE DE19611419656 patent/DE1419656B2/de active Pending
-
1962
- 1962-01-04 CH CH8562A patent/CH403439A/de unknown
- 1962-05-04 US US192325A patent/US3243373A/en not_active Expired - Lifetime
- 1962-05-14 GB GB18536/62A patent/GB931692A/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE1419656B2 (de) | 1972-04-20 |
| DE1419656A1 (de) | 1969-10-02 |
| GB931692A (en) | 1963-07-17 |
| US3243373A (en) | 1966-03-29 |
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