CH457142A - Lichtempfindliches Material und dessen Verwendung - Google Patents

Lichtempfindliches Material und dessen Verwendung

Info

Publication number
CH457142A
CH457142A CH1402965A CH1402965A CH457142A CH 457142 A CH457142 A CH 457142A CH 1402965 A CH1402965 A CH 1402965A CH 1402965 A CH1402965 A CH 1402965A CH 457142 A CH457142 A CH 457142A
Authority
CH
Switzerland
Prior art keywords
photosensitive material
photosensitive
Prior art date
Application number
CH1402965A
Other languages
English (en)
Inventor
Heinz Dr Herrmann
Original Assignee
Kalle Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kalle Ag filed Critical Kalle Ag
Publication of CH457142A publication Critical patent/CH457142A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Phenolic Resins Or Amino Resins (AREA)
CH1402965A 1964-10-15 1965-10-12 Lichtempfindliches Material und dessen Verwendung CH457142A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE1447913A DE1447913C3 (de) 1964-10-15 1964-10-15 Verfahren zur Herstellung von Druckformen

Publications (1)

Publication Number Publication Date
CH457142A true CH457142A (de) 1968-05-31

Family

ID=7227042

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1402965A CH457142A (de) 1964-10-15 1965-10-12 Lichtempfindliches Material und dessen Verwendung

Country Status (9)

Country Link
US (1) US3697274A (de)
AT (1) AT260957B (de)
BE (1) BE670886A (de)
CH (1) CH457142A (de)
DE (1) DE1447913C3 (de)
FR (1) FR1450181A (de)
GB (1) GB1074904A (de)
NL (1) NL6512894A (de)
SE (1) SE338715B (de)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH587507A5 (de) * 1974-12-23 1977-05-13 Mitsubishi Plastics Ind
US4111692A (en) * 1976-06-04 1978-09-05 Toyo Boseki Kabushiki Kaisha Electrostatic printing plate
DE3038605A1 (de) * 1980-10-13 1982-06-03 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3045149A1 (de) * 1980-11-29 1982-07-01 Hoechst Ag, 6000 Frankfurt Verfahren zur herstellung von reliefkopien
DE3442756A1 (de) * 1984-11-23 1986-05-28 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
CA1308596C (en) * 1986-01-13 1992-10-13 Rohm And Haas Company Microplastic structures and method of manufacture
EP0462391B1 (de) * 1990-06-19 1999-10-06 Shipley Company Inc. Säuregehärtete Photoresiste
JP3006873B2 (ja) * 1990-11-14 2000-02-07 大日本印刷株式会社 Ｐｓ版用またはホログラム記録材料用光硬化性組成物
US5206116A (en) * 1991-03-04 1993-04-27 Shipley Company Inc. Light-sensitive composition for use as a soldermask and process
DE4112965A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Negativ arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial
DE4112966A1 (de) * 1991-04-20 1992-10-22 Hoechst Ag Positiv arbeitendes strahlungsempfindliches gemisch und damit hergestelltes strahlungsempfindliches aufzeichnungsmaterial

Also Published As

Publication number Publication date
DE1447913A1 (de) 1968-11-14
AT260957B (de) 1968-04-10
DE1447913C3 (de) 1979-08-09
FR1450181A (fr) 1966-05-06
GB1074904A (en) 1967-07-05
DE1447913B2 (de) 1978-11-30
US3697274A (en) 1972-10-10
SE338715B (de) 1971-09-13
NL6512894A (de) 1966-04-18
BE670886A (de) 1966-04-13

Similar Documents

Publication Publication Date Title
AT259366B (de) Photographisches Material
AT270378B (de) Lichtempfindliches Material
CH454617A (de) Photographisches Material
AT268530B (de) Verbandstoff
AT255255B (de) Lichtempfindliches Kopiermaterial
CH450911A (fr) Matériel photosensible
CH457142A (de) Lichtempfindliches Material und dessen Verwendung
CH453070A (de) Diazotypiematerial
CH458072A (de) Lichtvernetzbares Material
CH533318A (de) Diazotypiematerial und Verwendung desselben
FR1475705A (fr) Matière photosensible thermodéveloppable
CH451701A (de) Diazotypiematerial
CH477708A (fr) Matériel photosensible
AT264289B (de) Lichtempfindliches Material
CH456344A (de) Photographisches Material
AT275317B (de) Lichtempfindliches Material
AT265860B (de) Diazotypiematerial
CH474780A (de) Lichtempfindliches Material
CH476326A (de) Diazotypiematerial und Verwendung desselben
CH454614A (de) Lichtempfindliches Material
CH451697A (de) Photographisches Material
CH450165A (de) Photographisches Material
CH453888A (de) Verbessertes photographisches Material
CH443901A (de) Diazotypie-Material
AT288859B (de) Photoelektrostatisches Kopiermaterial