CH514156A - Photoempfindliche Masse - Google Patents

Photoempfindliche Masse

Info

Publication number
CH514156A
CH514156A CH543469A CH543469A CH514156A CH 514156 A CH514156 A CH 514156A CH 543469 A CH543469 A CH 543469A CH 543469 A CH543469 A CH 543469A CH 514156 A CH514156 A CH 514156A
Authority
CH
Switzerland
Prior art keywords
photosensitive mass
photosensitive
mass
Prior art date
Application number
CH543469A
Other languages
English (en)
Inventor
Henry Smith George
Original Assignee
Minnesota Mining & Mfg
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Minnesota Mining & Mfg filed Critical Minnesota Mining & Mfg
Publication of CH514156A publication Critical patent/CH514156A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/28—Processing photosensitive materials; Apparatus therefor for obtaining powder images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/675—Compositions containing polyhalogenated compounds as photosensitive substances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G03F7/0295—Photolytic halogen compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02—Charge-receiving layers
    • G03G5/026—Layers in which during the irradiation a chemical reaction occurs whereby electrically conductive patterns are formed in the layers, e.g. for chemixerography
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photoreceptors In Electrophotography (AREA)
CH543469A 1968-04-10 1969-04-09 Photoempfindliche Masse CH514156A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US72037768A 1968-04-10 1968-04-10

Publications (1)

Publication Number Publication Date
CH514156A true CH514156A (de) 1971-10-15

Family

ID=24893797

Family Applications (1)

Application Number Title Priority Date Filing Date
CH543469A CH514156A (de) 1968-04-10 1969-04-09 Photoempfindliche Masse

Country Status (7)

Country Link
US (1) US3640718A (de)
JP (1) JPS4936260B1 (de)
CH (1) CH514156A (de)
DE (1) DE1917543C3 (de)
FR (1) FR2007425A1 (de)
GB (1) GB1261938A (de)
NL (1) NL6904928A (de)

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
US3935012A (en) * 1973-07-12 1976-01-27 Minnesota Mining And Manufacturing Company Photosensitive sheet materials
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
JPS5495687A (en) * 1978-01-11 1979-07-28 Fuji Photo Film Co Ltd Photopolymerizable composition
JPS6053300B2 (ja) * 1978-08-29 1985-11-25 富士写真フイルム株式会社 感光性樹脂組成物
US4460677A (en) * 1981-03-26 1984-07-17 Minnesota Mining And Manufacturing Company Visible light sensitive, thermally developable imaging systems
US4515886A (en) * 1983-02-16 1985-05-07 Toyo Soda Manufacturing Co., Ltd. Photosensitive compositions
US4698286A (en) * 1985-06-03 1987-10-06 Hercules Incorporated Plasma developable photoresist compositions containing perylene coumarin photosensitizer
CA1315591C (en) * 1986-02-20 1993-04-06 Takeshi Ishitsuka Visible ray-recording hologram material
US5387682A (en) * 1988-09-07 1995-02-07 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a monomeric moiety
US4985562A (en) * 1988-09-07 1991-01-15 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
US5034526A (en) * 1988-09-07 1991-07-23 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a sensitizer moiety
US5187045A (en) * 1988-09-07 1993-02-16 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a sensitizer moiety
US5153323A (en) * 1988-09-07 1992-10-06 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing a photoinitiator moiety
US5116977A (en) * 1988-09-07 1992-05-26 Minnesota Mining And Manufacturing Company Halomethyl-1,3,5-triazines containing an amine-containing moiety
US5011762A (en) * 1990-08-14 1991-04-30 Industrial Technology Research Institute Photosensitive compositions having enhanced photopolymerization rate
US5422204A (en) * 1991-07-19 1995-06-06 Canon Kabushiki Kaisha Photo-crosslinkable resin composition and hologram recording medium
US5374501A (en) * 1992-08-17 1994-12-20 Minnesota Mining And Manufacturing Company Alkali soluble photopolymer in color proofing constructions
US5460918A (en) * 1994-10-11 1995-10-24 Minnesota Mining And Manufacturing Company Thermal transfer donor and receptor with silicated surface for lithographic printing applications
US5856373A (en) * 1994-10-31 1999-01-05 Minnesota Mining And Manufacturing Company Dental visible light curable epoxy system with enhanced depth of cure
US5707780A (en) 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
TW439016B (en) * 1996-09-20 2001-06-07 Sumitomo Chemical Co Positive resist composition
US5847133A (en) * 1997-05-23 1998-12-08 Minnesota Mining And Manufacturing Company Ionic halomethyl-1,3,5-triazine photoinitiators
US6010821A (en) 1997-05-23 2000-01-04 Minnesota Mining And Manufacturing Company Aqueous developable color proofing elements
DE60321641D1 (de) * 2002-11-12 2008-07-31 Tokuyama Corp Photopolymerisierbare Initiatorkombination und photopolymerisierbare Zusammensetzung
WO2004059389A2 (en) * 2002-12-23 2004-07-15 Aprilis, Inc. Sensitizer dyes for photoacid generating systems
JP5861955B1 (ja) * 2014-05-08 2016-02-16 三菱瓦斯化学株式会社 レジスト材料、レジスト組成物及びレジストパターン形成方法
JP6447884B2 (ja) * 2014-05-08 2019-01-09 三菱瓦斯化学株式会社 リソグラフィー用膜形成材料、リソグラフィー用膜形成用組成物、リソグラフィー用膜、パターン形成方法及び精製方法
US10268117B2 (en) * 2014-05-21 2019-04-23 Az Electronic Materials (Luxembourg) S.A.R.L. Top-layer membrane formation composition and method for forming resist pattern using same

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3526506A (en) * 1966-06-13 1970-09-01 Minnesota Mining & Mfg Heat reactive,light desensitizing compositions

Also Published As

Publication number Publication date
GB1261938A (en) 1972-01-26
DE1917543B2 (de) 1973-06-28
FR2007425A1 (de) 1970-01-09
DE1917543C3 (de) 1974-01-24
US3640718A (en) 1972-02-08
NL6904928A (de) 1969-10-14
JPS4936260B1 (de) 1974-09-28
DE1917543A1 (de) 1969-10-23

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Legal Events

Date Code Title Description
PL Patent ceased