CH528149A - Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner Herstellung - Google Patents
Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner HerstellungInfo
- Publication number
- CH528149A CH528149A CH1295670A CH1295670A CH528149A CH 528149 A CH528149 A CH 528149A CH 1295670 A CH1295670 A CH 1295670A CH 1295670 A CH1295670 A CH 1295670A CH 528149 A CH528149 A CH 528149A
- Authority
- CH
- Switzerland
- Prior art keywords
- manufacture
- semiconductor device
- heterogeneous transition
- heterogeneous
- transition
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/01—Manufacture or treatment
- H10D48/04—Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
- H10D48/043—Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
- H10D48/046—Provision of discrete insulating layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/01—Manufacture or treatment
- H10D48/04—Manufacture or treatment of devices having bodies comprising selenium or tellurium in uncombined form
- H10D48/043—Preliminary treatment of the selenium or tellurium, its application to foundation plates or the subsequent treatment of the combination
- H10D48/0431—Application of the selenium or tellurium to the foundation plate
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/22—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials using physical deposition, e.g. vacuum deposition or sputtering
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/29—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by the substrates
- H10P14/2901—Materials
- H10P14/2922—Materials being non-crystalline insulating materials, e.g. glass or polymers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/32—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by intermediate layers between substrates and deposited layers
- H10P14/3202—Materials thereof
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/32—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by intermediate layers between substrates and deposited layers
- H10P14/3202—Materials thereof
- H10P14/3241—Materials thereof being conductive materials
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/32—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by intermediate layers between substrates and deposited layers
- H10P14/3242—Structure
- H10P14/3244—Layer structure
- H10P14/3248—Layer structure consisting of two layers
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/34—Deposited materials, e.g. layers
- H10P14/3402—Deposited materials, e.g. layers characterised by the chemical composition
- H10P14/3424—Deposited materials, e.g. layers characterised by the chemical composition being Group IIB-VIA materials
- H10P14/3431—Selenides
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/20—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials
- H10P14/38—Formation of materials, e.g. in the shape of layers or pillars of semiconductor materials characterised by treatments done after the formation of the materials
- H10P14/3802—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
- H10P14/3806—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using crystallisation-enhancing elements
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US85416369A | 1969-08-29 | 1969-08-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH528149A true CH528149A (de) | 1972-09-15 |
Family
ID=25317906
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1295670A CH528149A (de) | 1969-08-29 | 1970-08-28 | Halbleiterbauelement mit heterogenem Übergang und Verfahren zu seiner Herstellung |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US3622712A (de) |
| BE (1) | BE753246A (de) |
| CH (1) | CH528149A (de) |
| DE (1) | DE2042883A1 (de) |
| FR (1) | FR2059740B1 (de) |
| GB (1) | GB1315316A (de) |
| NL (1) | NL7012787A (de) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3911162A (en) * | 1972-04-17 | 1975-10-07 | Xerox Corp | System for vapor deposition of thin films |
| US3990095A (en) * | 1975-09-15 | 1976-11-02 | Rca Corporation | Selenium rectifier having hexagonal polycrystalline selenium layer |
| US4064522A (en) * | 1976-02-04 | 1977-12-20 | Exxon Research & Engineering Co. | High efficiency selenium heterojunction solar cells |
| US4213798A (en) * | 1979-04-27 | 1980-07-22 | Rca Corporation | Tellurium schottky barrier contact for amorphous silicon solar cells |
| US4440803A (en) * | 1979-11-01 | 1984-04-03 | Xerox Corporation | Process for preparing arsenic-selenium photoreceptors |
| JPS56108286A (en) * | 1979-11-01 | 1981-08-27 | Xerox Corp | Method of manufacturing photoreceptor |
| US5179035A (en) * | 1989-09-15 | 1993-01-12 | U.S. Philips Corporation | Method of fabricating two-terminal non-linear devices |
| US6275137B1 (en) * | 2000-02-08 | 2001-08-14 | Boston Microsystems, Inc. | Semiconductor piezoresistor |
| DE112010004279T5 (de) * | 2009-11-05 | 2013-02-07 | Kake Educational Institution | Gasempfindliches Material mit mikrokristallinem Selen und dieses verwendenden Gassensor |
| US9264833B2 (en) * | 2013-03-14 | 2016-02-16 | Taiwan Semiconductor Manufacturing Company, Ltd. | Structure and method for integrated microphone |
| US10651408B2 (en) * | 2017-02-14 | 2020-05-12 | International Business Machines Corporation | Selenium-fullerene heterojunction solar cell |
| CN115101610B (zh) * | 2022-07-22 | 2024-05-28 | 中国科学院化学研究所 | 一种硒薄膜/碲薄膜室内光伏器件及其制备方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL93669C (de) * | 1939-01-22 | |||
| US3409464A (en) * | 1964-04-29 | 1968-11-05 | Clevite Corp | Piezoelectric materials |
| US3427410A (en) * | 1964-10-08 | 1969-02-11 | Electro Voice | Electromechanical transducer |
| GB1115933A (en) * | 1965-08-27 | 1968-06-06 | Noranda Mines Ltd | Single crystal selenium rectifier |
| FR1490483A (fr) * | 1965-12-17 | 1967-08-04 | Thomson Houston Comp Francaise | Système de filtre électrique à bande passante étroite utilisant un cristal |
| US3624465A (en) * | 1968-06-26 | 1971-11-30 | Rca Corp | Heterojunction semiconductor transducer having a region which is piezoelectric |
-
1969
- 1969-08-29 US US854163A patent/US3622712A/en not_active Expired - Lifetime
-
1970
- 1970-07-09 BE BE753246D patent/BE753246A/xx unknown
- 1970-08-21 GB GB4037970A patent/GB1315316A/en not_active Expired
- 1970-08-27 FR FR7031293A patent/FR2059740B1/fr not_active Expired
- 1970-08-28 DE DE19702042883 patent/DE2042883A1/de active Pending
- 1970-08-28 NL NL7012787A patent/NL7012787A/xx unknown
- 1970-08-28 CH CH1295670A patent/CH528149A/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| FR2059740B1 (de) | 1974-09-06 |
| NL7012787A (de) | 1971-03-02 |
| BE753246A (fr) | 1970-12-16 |
| DE2042883A1 (de) | 1971-03-11 |
| FR2059740A1 (de) | 1971-06-04 |
| GB1315316A (en) | 1973-05-02 |
| US3622712A (en) | 1971-11-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PL | Patent ceased |