CH534744A - Verfahren zum Beschichten einer Unterlage mit einer amorphen, borhaltigen Ablagerung - Google Patents
Verfahren zum Beschichten einer Unterlage mit einer amorphen, borhaltigen AblagerungInfo
- Publication number
- CH534744A CH534744A CH1000167A CH1000167A CH534744A CH 534744 A CH534744 A CH 534744A CH 1000167 A CH1000167 A CH 1000167A CH 1000167 A CH1000167 A CH 1000167A CH 534744 A CH534744 A CH 534744A
- Authority
- CH
- Switzerland
- Prior art keywords
- substrate
- coating
- base material
- acetylene
- carbon
- Prior art date
Links
- PPWPWBNSKBDSPK-UHFFFAOYSA-N [B].[C] Chemical compound [B].[C] PPWPWBNSKBDSPK-UHFFFAOYSA-N 0.000 title description 8
- 238000004519 manufacturing process Methods 0.000 title description 4
- 238000000034 method Methods 0.000 claims abstract description 20
- 239000000758 substrate Substances 0.000 claims abstract description 12
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims abstract description 8
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 claims abstract description 8
- 239000007789 gas Substances 0.000 claims abstract description 8
- 229910052739 hydrogen Inorganic materials 0.000 claims abstract description 8
- 239000001257 hydrogen Substances 0.000 claims abstract description 8
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims abstract description 7
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims abstract description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 239000011521 glass Substances 0.000 claims abstract description 4
- 239000000463 material Substances 0.000 claims description 14
- 239000011248 coating agent Substances 0.000 claims description 13
- 238000000576 coating method Methods 0.000 claims description 13
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 claims description 5
- 229910052796 boron Inorganic materials 0.000 claims description 5
- 229910000085 borane Inorganic materials 0.000 claims description 4
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims description 3
- 229910052753 mercury Inorganic materials 0.000 claims description 3
- UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical class [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 claims description 2
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 230000001419 dependent effect Effects 0.000 claims 4
- 239000000203 mixture Substances 0.000 abstract description 5
- 238000010438 heat treatment Methods 0.000 abstract description 4
- 239000008246 gaseous mixture Substances 0.000 abstract description 2
- 229910010277 boron hydride Inorganic materials 0.000 abstract 1
- 150000002431 hydrogen Chemical class 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 11
- 238000000354 decomposition reaction Methods 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000376 reactant Substances 0.000 description 3
- 229910052580 B4C Inorganic materials 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000000543 intermediate Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US58248366A | 1966-09-28 | 1966-09-28 | |
| US58779866A | 1966-10-19 | 1966-10-19 | |
| US58893666A | 1966-10-24 | 1966-10-24 | |
| US60378166A | 1966-12-22 | 1966-12-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CH534744A true CH534744A (de) | 1973-03-15 |
Family
ID=27504960
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CH1000167A CH534744A (de) | 1966-09-28 | 1967-07-13 | Verfahren zum Beschichten einer Unterlage mit einer amorphen, borhaltigen Ablagerung |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3537877A (fr) |
| CH (1) | CH534744A (fr) |
| DE (1) | DE1621248A1 (fr) |
| FR (1) | FR93676E (fr) |
| GB (1) | GB1190824A (fr) |
| SE (1) | SE353354B (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0136161A1 (fr) * | 1983-09-23 | 1985-04-03 | Ovonic Synthetic Materials Company, Inc. | Revêtement en désordre et procédé |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3861953A (en) * | 1969-03-27 | 1975-01-21 | United Aircraft Corp | Node-free boron composite filament |
| US4225355A (en) * | 1979-02-16 | 1980-09-30 | United Technologies Corporation | Amorphous boron-carbon alloy in bulk form and methods of making the same |
| US4287259A (en) * | 1979-12-05 | 1981-09-01 | The United States Of America As Represented By The United States Department Of Energy | Preparation and uses of amorphous boron carbide coated substrates |
| FR2566806B1 (fr) * | 1984-06-27 | 1986-12-05 | Diamant Boart Sa | Procede de realisation de revetements de carbures de bore et revetements obtenus |
| US5088202A (en) * | 1988-07-13 | 1992-02-18 | Warner-Lambert Company | Shaving razors |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3125428A (en) * | 1964-03-17 | Uethod for coating silica rods | ||
| US2671735A (en) * | 1950-07-07 | 1954-03-09 | Bell Telephone Labor Inc | Electrical resistors and methods of making them |
| US2810365A (en) * | 1952-12-31 | 1957-10-22 | Shallcross Mfg Company | Apparatus for resistor film deposition |
| GB760328A (en) * | 1953-06-10 | 1956-10-31 | Erie Resistor Ltd | Improvements in and relating to a process and apparatus for the production of thin deposits upon a support by decomposition of a gaseous material |
| US3365330A (en) * | 1964-05-28 | 1968-01-23 | Air Force Usa | Continuous vapor deposition |
-
1966
- 1966-12-22 US US603781A patent/US3537877A/en not_active Expired - Lifetime
-
1967
- 1967-06-29 SE SE09689/67*A patent/SE353354B/xx unknown
- 1967-07-13 CH CH1000167A patent/CH534744A/de unknown
- 1967-07-27 DE DE19671621248 patent/DE1621248A1/de active Pending
- 1967-08-14 GB GB37185/67A patent/GB1190824A/en not_active Expired
- 1967-12-13 FR FR132082A patent/FR93676E/fr not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0136161A1 (fr) * | 1983-09-23 | 1985-04-03 | Ovonic Synthetic Materials Company, Inc. | Revêtement en désordre et procédé |
Also Published As
| Publication number | Publication date |
|---|---|
| GB1190824A (en) | 1970-05-06 |
| DE1621248A1 (de) | 1971-12-23 |
| FR93676E (fr) | 1969-05-02 |
| US3537877A (en) | 1970-11-03 |
| SE353354B (fr) | 1973-01-29 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PLZ | Patent of addition ceased |