CH536880A - Verfahren zum Halbglanzvernickeln von Metallen - Google Patents

Verfahren zum Halbglanzvernickeln von Metallen

Info

Publication number: CH536880A
Authority: CH; Switzerland
Prior art keywords: nickel; bath; semi; cathode; gloss
Prior art date: 1967-01-30

Application number

CH129568A

Other languages

German (de)

English (en)

Inventor

Passal Frank

Original Assignee

M & T Chemicals Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1967-01-30

Filing date

1968-01-29

Publication date

1973-05-15

1968-01-29 Application filed by M & T Chemicals Inc filed Critical M & T Chemicals Inc

1973-05-15 Publication of CH536880A publication Critical patent/CH536880A/de

Links

238000004070 electrodeposition Methods 0.000 title claims abstract description 10
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 title claims description 144
229910052759 nickel Inorganic materials 0.000 title claims description 72
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 claims abstract description 57
-1 aliphatic aldehyde Chemical class 0.000 claims abstract description 54
239000000654 additive Substances 0.000 claims abstract description 35
238000000034 method Methods 0.000 claims abstract description 28
230000000996 additive effect Effects 0.000 claims abstract description 18
150000003934 aromatic aldehydes Chemical class 0.000 claims abstract description 18
229910052751 metal Inorganic materials 0.000 claims abstract description 15
239000002184 metal Substances 0.000 claims abstract description 15
238000007747 plating Methods 0.000 claims abstract description 13
KJPRLNWUNMBNBZ-QPJJXVBHSA-N (E)-cinnamaldehyde Chemical compound O=C\C=C\C1=CC=CC=C1 KJPRLNWUNMBNBZ-QPJJXVBHSA-N 0.000 claims abstract description 8
229940117916 cinnamic aldehyde Drugs 0.000 claims abstract description 8
KJPRLNWUNMBNBZ-UHFFFAOYSA-N cinnamic aldehyde Natural products O=CC=CC1=CC=CC=C1 KJPRLNWUNMBNBZ-UHFFFAOYSA-N 0.000 claims abstract description 8
230000002378 acidificating effect Effects 0.000 claims abstract description 5
SATCULPHIDQDRE-UHFFFAOYSA-N piperonal Chemical compound O=CC1=CC=C2OCOC2=C1 SATCULPHIDQDRE-UHFFFAOYSA-N 0.000 claims description 57
HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 claims description 36
229940081310 piperonal Drugs 0.000 claims description 25
KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims description 21
239000004327 boric acid Substances 0.000 claims description 21
238000000151 deposition Methods 0.000 claims description 18
QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 claims description 18
230000008021 deposition Effects 0.000 claims description 17
LAIZPRYFQUWUBN-UHFFFAOYSA-L nickel chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Ni+2] LAIZPRYFQUWUBN-UHFFFAOYSA-L 0.000 claims description 17
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 16
125000000217 alkyl group Chemical group 0.000 claims description 16
239000002244 precipitate Substances 0.000 claims description 16
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 16
150000001299 aldehydes Chemical class 0.000 claims description 15
OGKAGKFVPCOHQW-UHFFFAOYSA-L nickel sulfate heptahydrate Chemical compound O.O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O OGKAGKFVPCOHQW-UHFFFAOYSA-L 0.000 claims description 15
229910001369 Brass Inorganic materials 0.000 claims description 14
239000010951 brass Substances 0.000 claims description 14
125000003118 aryl group Chemical group 0.000 claims description 11
125000003342 alkenyl group Chemical group 0.000 claims description 10
150000001875 compounds Chemical class 0.000 claims description 10
125000000753 cycloalkyl group Chemical group 0.000 claims description 10
150000001491 aromatic compounds Chemical class 0.000 claims description 9
229930040373 Paraformaldehyde Natural products 0.000 claims description 8
125000003710 aryl alkyl group Chemical group 0.000 claims description 8
229920002866 paraformaldehyde Polymers 0.000 claims description 8
125000002877 alkyl aryl group Chemical group 0.000 claims description 7
229910052736 halogen Inorganic materials 0.000 claims description 7
150000002367 halogens Chemical class 0.000 claims description 7
WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 7
KUCOHFSKRZZVRO-UHFFFAOYSA-N terephthalaldehyde Chemical compound O=CC1=CC=C(C=O)C=C1 KUCOHFSKRZZVRO-UHFFFAOYSA-N 0.000 claims description 7
VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 claims description 6
125000004432 carbon atom Chemical group C* 0.000 claims description 6
RNFNDJAIBTYOQL-UHFFFAOYSA-N chloral hydrate Chemical compound OC(O)C(Cl)(Cl)Cl RNFNDJAIBTYOQL-UHFFFAOYSA-N 0.000 claims description 6
229960002327 chloral hydrate Drugs 0.000 claims description 6
239000003792 electrolyte Substances 0.000 claims description 6
150000002816 nickel compounds Chemical class 0.000 claims description 6
229910001453 nickel ion Inorganic materials 0.000 claims description 6
HFFLGKNGCAIQMO-UHFFFAOYSA-N trichloroacetaldehyde Chemical compound ClC(Cl)(Cl)C=O HFFLGKNGCAIQMO-UHFFFAOYSA-N 0.000 claims description 6
YTGSYRVSBPFKMQ-UHFFFAOYSA-N 2,2,2-tribromoacetaldehyde Chemical compound BrC(Br)(Br)C=O YTGSYRVSBPFKMQ-UHFFFAOYSA-N 0.000 claims description 5
229910052739 hydrogen Inorganic materials 0.000 claims description 5
239000001257 hydrogen Substances 0.000 claims description 5
NJHVMXFNIZTTBV-UHFFFAOYSA-N 2,2,2-tribromoethane-1,1-diol Chemical compound OC(O)C(Br)(Br)Br NJHVMXFNIZTTBV-UHFFFAOYSA-N 0.000 claims description 4
230000000052 comparative effect Effects 0.000 claims description 4
125000004185 ester group Chemical group 0.000 claims description 4
150000002739 metals Chemical class 0.000 claims description 4
239000000203 mixture Substances 0.000 claims description 4
229920003023 plastic Polymers 0.000 claims description 4
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
PTECIXPBVVDNOU-UHFFFAOYSA-N molecular bromine;hydrate Chemical compound O.BrBr PTECIXPBVVDNOU-UHFFFAOYSA-N 0.000 claims description 3
SXAMGRAIZSSWIH-UHFFFAOYSA-N 2-[3-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,2,4-oxadiazol-5-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NOC(=N1)CC(=O)N1CC2=C(CC1)NN=N2 SXAMGRAIZSSWIH-UHFFFAOYSA-N 0.000 claims description 2
WWSJZGAPAVMETJ-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-3-ethoxypyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C(=NN(C=1)CC(=O)N1CC2=C(CC1)NN=N2)OCC WWSJZGAPAVMETJ-UHFFFAOYSA-N 0.000 claims description 2
229910001651 emery Inorganic materials 0.000 claims description 2
239000002253 acid Substances 0.000 claims 1
150000007824 aliphatic compounds Chemical class 0.000 claims 1
229940095076 benzaldehyde Drugs 0.000 claims 1
230000001419 dependent effect Effects 0.000 claims 1
238000009713 electroplating Methods 0.000 abstract 1
150000002500 ions Chemical class 0.000 abstract 1
IIACRCGMVDHOTQ-UHFFFAOYSA-M sulfamate Chemical compound NS([O-])(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-M 0.000 description 12
125000001424 substituent group Chemical group 0.000 description 10
WJUFSDZVCOTFON-UHFFFAOYSA-N veratraldehyde Chemical compound COC1=CC=C(C=O)C=C1OC WJUFSDZVCOTFON-UHFFFAOYSA-N 0.000 description 10
239000004215 Carbon black (E152) Substances 0.000 description 8
KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 8
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 8
229930195733 hydrocarbon Natural products 0.000 description 8
JVTZFYYHCGSXJV-UHFFFAOYSA-N isovanillin Chemical compound COC1=CC=C(C=O)C=C1O JVTZFYYHCGSXJV-UHFFFAOYSA-N 0.000 description 8
KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 description 8
239000000243 solution Substances 0.000 description 8
229910052717 sulfur Inorganic materials 0.000 description 8
239000011593 sulfur Substances 0.000 description 8
150000001555 benzenes Chemical class 0.000 description 7
239000000080 wetting agent Substances 0.000 description 7
PKZJLOCLABXVMC-UHFFFAOYSA-N 2-Methoxybenzaldehyde Chemical compound COC1=CC=CC=C1C=O PKZJLOCLABXVMC-UHFFFAOYSA-N 0.000 description 6
238000013019 agitation Methods 0.000 description 6
QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 5
JIVGSHFYXPRRSZ-UHFFFAOYSA-N 2,3-dimethoxybenzaldehyde Chemical compound COC1=CC=CC(C=O)=C1OC JIVGSHFYXPRRSZ-UHFFFAOYSA-N 0.000 description 4
MJKVTPMWOKAVMS-UHFFFAOYSA-N 3-hydroxy-1-benzopyran-2-one Chemical compound C1=CC=C2OC(=O)C(O)=CC2=C1 MJKVTPMWOKAVMS-UHFFFAOYSA-N 0.000 description 4
RGHHSNMVTDWUBI-UHFFFAOYSA-N 4-hydroxybenzaldehyde Chemical compound OC1=CC=C(C=O)C=C1 RGHHSNMVTDWUBI-UHFFFAOYSA-N 0.000 description 4
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 4
CBOQJANXLMLOSS-UHFFFAOYSA-N ethyl vanillin Chemical compound CCOC1=CC(C=O)=CC=C1O CBOQJANXLMLOSS-UHFFFAOYSA-N 0.000 description 4
RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
DBMJMQXJHONAFJ-UHFFFAOYSA-M Sodium laurylsulphate Chemical compound [Na+].CCCCCCCCCCCCOS([O-])(=O)=O DBMJMQXJHONAFJ-UHFFFAOYSA-M 0.000 description 3
125000000129 anionic group Chemical group 0.000 description 3
ZTQSAGDEMFDKMZ-UHFFFAOYSA-N butyric aldehyde Natural products CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 3
229910052802 copper Inorganic materials 0.000 description 3
239000010949 copper Substances 0.000 description 3
125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 3
150000002148 esters Chemical class 0.000 description 3
125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
238000005187 foaming Methods 0.000 description 3
125000000623 heterocyclic group Chemical group 0.000 description 3
125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 3
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
235000019333 sodium laurylsulphate Nutrition 0.000 description 3
125000005017 substituted alkenyl group Chemical group 0.000 description 3
MWOOGOJBHIARFG-UHFFFAOYSA-N vanillin Chemical compound COC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-UHFFFAOYSA-N 0.000 description 3
FGQOOHJZONJGDT-UHFFFAOYSA-N vanillin Natural products COC1=CC(O)=CC(C=O)=C1 FGQOOHJZONJGDT-UHFFFAOYSA-N 0.000 description 3
235000012141 vanillin Nutrition 0.000 description 3
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
229920002554 vinyl polymer Polymers 0.000 description 3
125000006017 1-propenyl group Chemical group 0.000 description 2
125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 2
YGCZTXZTJXYWCO-UHFFFAOYSA-N 3-phenylpropanal Chemical compound O=CCCC1=CC=CC=C1 YGCZTXZTJXYWCO-UHFFFAOYSA-N 0.000 description 2
MWOOGOJBHIARFG-OUBTZVSYSA-N 4-hydroxy-3-methoxybenzaldehyde Chemical group [13CH3]OC1=CC(C=O)=CC=C1O MWOOGOJBHIARFG-OUBTZVSYSA-N 0.000 description 2
VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
SNRUBQQJIBEYMU-UHFFFAOYSA-N Dodecane Natural products CCCCCCCCCCCC SNRUBQQJIBEYMU-UHFFFAOYSA-N 0.000 description 2
DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
NBBJYMSMWIIQGU-UHFFFAOYSA-N Propionic aldehyde Chemical compound CCC=O NBBJYMSMWIIQGU-UHFFFAOYSA-N 0.000 description 2
244000290333 Vanilla fragrans Species 0.000 description 2
235000009499 Vanilla fragrans Nutrition 0.000 description 2
235000012036 Vanilla tahitensis Nutrition 0.000 description 2
125000003172 aldehyde group Chemical group 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
239000010953 base metal Substances 0.000 description 2
125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 2
125000002837 carbocyclic group Chemical group 0.000 description 2
229960000956 coumarin Drugs 0.000 description 2
238000000354 decomposition reaction Methods 0.000 description 2
125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical compound C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
238000002474 experimental method Methods 0.000 description 2
125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
JARKCYVAAOWBJS-UHFFFAOYSA-N hexanal Chemical compound CCCCCC=O JARKCYVAAOWBJS-UHFFFAOYSA-N 0.000 description 2
150000002430 hydrocarbons Chemical group 0.000 description 2
125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 2
125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 2
125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 2
125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
238000004519 manufacturing process Methods 0.000 description 2
125000005394 methallyl group Chemical group 0.000 description 2
125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 2
125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
ZRSNZINYAWTAHE-UHFFFAOYSA-N p-methoxybenzaldehyde Chemical compound COC1=CC=C(C=O)C=C1 ZRSNZINYAWTAHE-UHFFFAOYSA-N 0.000 description 2
DTUQWGWMVIHBKE-UHFFFAOYSA-N phenylacetaldehyde Chemical compound O=CCC1=CC=CC=C1 DTUQWGWMVIHBKE-UHFFFAOYSA-N 0.000 description 2
ZWLUXSQADUDCSB-UHFFFAOYSA-N phthalaldehyde Chemical compound O=CC1=CC=CC=C1C=O ZWLUXSQADUDCSB-UHFFFAOYSA-N 0.000 description 2
239000000047 product Substances 0.000 description 2
230000001737 promoting effect Effects 0.000 description 2
238000007670 refining Methods 0.000 description 2
SMQUZDBALVYZAC-UHFFFAOYSA-N salicylaldehyde Chemical compound OC1=CC=CC=C1C=O SMQUZDBALVYZAC-UHFFFAOYSA-N 0.000 description 2
125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
239000011734 sodium Substances 0.000 description 2
229910052708 sodium Inorganic materials 0.000 description 2
230000003381 solubilizing effect Effects 0.000 description 2
239000002904 solvent Substances 0.000 description 2
125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
239000011550 stock solution Substances 0.000 description 2
125000005346 substituted cycloalkyl group Chemical group 0.000 description 2
229910021653 sulphate ion Inorganic materials 0.000 description 2
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
125000003944 tolyl group Chemical group 0.000 description 2
DKZBBWMURDFHNE-UHFFFAOYSA-N trans-coniferylaldehyde Natural products COC1=CC(C=CC=O)=CC=C1O DKZBBWMURDFHNE-UHFFFAOYSA-N 0.000 description 2
HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
OITQDWKMIPXGFL-UHFFFAOYSA-N 1-hydroxy-2-naphthaldehyde Chemical compound C1=CC=C2C(O)=C(C=O)C=CC2=C1 OITQDWKMIPXGFL-UHFFFAOYSA-N 0.000 description 1
VZSRBBMJRBPUNF-UHFFFAOYSA-N 2-(2,3-dihydro-1H-inden-2-ylamino)-N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]pyrimidine-5-carboxamide Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C(=O)NCCC(N1CC2=C(CC1)NN=N2)=O VZSRBBMJRBPUNF-UHFFFAOYSA-N 0.000 description 1
WZFUQSJFWNHZHM-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)N1CC2=C(CC1)NN=N2 WZFUQSJFWNHZHM-UHFFFAOYSA-N 0.000 description 1
YJLUBHOZZTYQIP-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=N2 YJLUBHOZZTYQIP-UHFFFAOYSA-N 0.000 description 1
NTCCNERMXRIPTR-UHFFFAOYSA-N 2-hydroxy-1-naphthaldehyde Chemical compound C1=CC=CC2=C(C=O)C(O)=CC=C21 NTCCNERMXRIPTR-UHFFFAOYSA-N 0.000 description 1
PJKVFARRVXDXAD-UHFFFAOYSA-N 2-naphthaldehyde Chemical compound C1=CC=CC2=CC(C=O)=CC=C21 PJKVFARRVXDXAD-UHFFFAOYSA-N 0.000 description 1
YUJRQSUIQASWHJ-UHFFFAOYSA-N 2-oxochromene-3-sulfonic acid Chemical class C1=CC=C2OC(=O)C(S(=O)(=O)O)=CC2=C1 YUJRQSUIQASWHJ-UHFFFAOYSA-N 0.000 description 1
DIBSCKQIZZVKMG-UHFFFAOYSA-N 2-phenylbutanal Chemical compound CCC(C=O)C1=CC=CC=C1 DIBSCKQIZZVKMG-UHFFFAOYSA-N 0.000 description 1
IQVAERDLDAZARL-UHFFFAOYSA-N 2-phenylpropanal Chemical compound O=CC(C)C1=CC=CC=C1 IQVAERDLDAZARL-UHFFFAOYSA-N 0.000 description 1
MYHGOWDLVRDUFA-UHFFFAOYSA-N 3-phenylbutanal Chemical compound O=CCC(C)C1=CC=CC=C1 MYHGOWDLVRDUFA-UHFFFAOYSA-N 0.000 description 1
KUHNCPCUPOPMDY-UHFFFAOYSA-N 4-cyclohexylbenzaldehyde Chemical compound C1=CC(C=O)=CC=C1C1CCCCC1 KUHNCPCUPOPMDY-UHFFFAOYSA-N 0.000 description 1
BFAUDJHQXKMZFR-UHFFFAOYSA-N 4-hydroxynaphthalene-2-carbaldehyde Chemical compound C1=CC=C2C(O)=CC(C=O)=CC2=C1 BFAUDJHQXKMZFR-UHFFFAOYSA-N 0.000 description 1
MVXMNHYVCLMLDD-UHFFFAOYSA-N 4-methoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=C2C(OC)=CC=C(C=O)C2=C1 MVXMNHYVCLMLDD-UHFFFAOYSA-N 0.000 description 1
NHFRGTVSKOPUBK-UHFFFAOYSA-N 4-phenylbutanal Chemical compound O=CCCCC1=CC=CC=C1 NHFRGTVSKOPUBK-UHFFFAOYSA-N 0.000 description 1
GZQNWVZECIRJHP-UHFFFAOYSA-N 5-methoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=C2C(OC)=CC=CC2=C1C=O GZQNWVZECIRJHP-UHFFFAOYSA-N 0.000 description 1
CONKBQPVFMXDOV-QHCPKHFHSA-N 6-[(5S)-5-[[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]methyl]-2-oxo-1,3-oxazolidin-3-yl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C[C@H]1CN(C(O1)=O)C1=CC2=C(NC(O2)=O)C=C1 CONKBQPVFMXDOV-QHCPKHFHSA-N 0.000 description 1
RQSRLHYBIGCTIS-UHFFFAOYSA-N 6-methoxynaphthalene-1-carbaldehyde Chemical compound O=CC1=CC=CC2=CC(OC)=CC=C21 RQSRLHYBIGCTIS-UHFFFAOYSA-N 0.000 description 1
WYDUFXRPFJPXGH-UHFFFAOYSA-N 7-methoxynaphthalene-1-carbaldehyde Chemical compound C1=CC=C(C=O)C2=CC(OC)=CC=C21 WYDUFXRPFJPXGH-UHFFFAOYSA-N 0.000 description 1
WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
229910000906 Bronze Inorganic materials 0.000 description 1
BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
OBRBQQWIWWPOPM-UHFFFAOYSA-N NS(O)(=O)=O.OS(O)(=O)=O Chemical compound NS(O)(=O)=O.OS(O)(=O)=O OBRBQQWIWWPOPM-UHFFFAOYSA-N 0.000 description 1
229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
229910001229 Pot metal Inorganic materials 0.000 description 1
ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
239000004141 Sodium laurylsulphate Substances 0.000 description 1
229910000831 Steel Inorganic materials 0.000 description 1
ULUAUXLGCMPNKK-UHFFFAOYSA-N Sulfobutanedioic acid Chemical class OC(=O)CC(C(O)=O)S(O)(=O)=O ULUAUXLGCMPNKK-UHFFFAOYSA-N 0.000 description 1
HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
238000009825 accumulation Methods 0.000 description 1
IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
238000007792 addition Methods 0.000 description 1
230000002411 adverse Effects 0.000 description 1
125000001931 aliphatic group Chemical group 0.000 description 1
150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
150000003935 benzaldehydes Chemical class 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
239000004305 biphenyl Substances 0.000 description 1
235000010290 biphenyl Nutrition 0.000 description 1
GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
229910052794 bromium Inorganic materials 0.000 description 1
239000010974 bronze Substances 0.000 description 1
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
239000003638 chemical reducing agent Substances 0.000 description 1
125000000068 chlorophenyl group Chemical group 0.000 description 1
239000011248 coating agent Substances 0.000 description 1
238000000576 coating method Methods 0.000 description 1
239000000470 constituent Substances 0.000 description 1
KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
125000000582 cycloheptyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
125000000640 cyclooctyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
230000007547 defect Effects 0.000 description 1
238000005137 deposition process Methods 0.000 description 1
239000012895 dilution Substances 0.000 description 1
238000010790 dilution Methods 0.000 description 1
239000006185 dispersion Substances 0.000 description 1
125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000000454 electroless metal deposition Methods 0.000 description 1
125000001033 ether group Chemical group 0.000 description 1
NSHIYIMHYBAIEY-UHFFFAOYSA-N ethyl hypochlorite Chemical compound CCOCl NSHIYIMHYBAIEY-UHFFFAOYSA-N 0.000 description 1
125000006038 hexenyl group Chemical group 0.000 description 1
150000002431 hydrogen Chemical group 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
125000004356 hydroxy functional group Chemical group O* 0.000 description 1
239000004615 ingredient Substances 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
125000001624 naphthyl group Chemical group 0.000 description 1
QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
125000005064 octadecenyl group Chemical group C(=CCCCCCCCCCCCCCCCC)* 0.000 description 1
125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
229940100595 phenylacetaldehyde Drugs 0.000 description 1
230000010287 polarization Effects 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
239000011591 potassium Substances 0.000 description 1
229910052700 potassium Inorganic materials 0.000 description 1
125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
238000005086 pumping Methods 0.000 description 1
238000006722 reduction reaction Methods 0.000 description 1
230000008929 regeneration Effects 0.000 description 1
238000011069 regeneration method Methods 0.000 description 1
150000003839 salts Chemical class 0.000 description 1
229910052709 silver Inorganic materials 0.000 description 1
239000004332 silver Substances 0.000 description 1
239000010959 steel Substances 0.000 description 1
125000000547 substituted alkyl group Chemical group 0.000 description 1
125000003107 substituted aryl group Chemical group 0.000 description 1
WWNBZGLDODTKEM-UHFFFAOYSA-N sulfanylidenenickel Chemical compound [Ni]=S WWNBZGLDODTKEM-UHFFFAOYSA-N 0.000 description 1
BDHFUVZGWQCTTF-UHFFFAOYSA-M sulfonate Chemical compound [O-]S(=O)=O BDHFUVZGWQCTTF-UHFFFAOYSA-M 0.000 description 1
125000005063 tetradecenyl group Chemical group C(=CCCCCCCCCCCCC)* 0.000 description 1
229940029273 trichloroacetaldehyde Drugs 0.000 description 1
HGBOYTHUEUWSSQ-UHFFFAOYSA-N valeric aldehyde Natural products CCCCC=O HGBOYTHUEUWSSQ-UHFFFAOYSA-N 0.000 description 1
125000005023 xylyl group Chemical group 0.000 description 1
229910052725 zinc Inorganic materials 0.000 description 1
239000011701 zinc Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/12—Electroplating: Baths therefor from solutions of nickel or cobalt

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Chemical Kinetics & Catalysis (AREA)
Electrochemistry (AREA)
Materials Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Electroplating And Plating Baths Therefor (AREA)
Chemically Coating (AREA)

CH129568A 1967-01-30 1968-01-29 Verfahren zum Halbglanzvernickeln von Metallen CH536880A (de)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US61236267A	1967-01-30	1967-01-30

Publications (1)

Publication Number	Publication Date
CH536880A true CH536880A (de)	1973-05-15

Family

ID=24452840

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CH129568A CH536880A (de)	1967-01-30	1968-01-29	Verfahren zum Halbglanzvernickeln von Metallen

Country Status (8)

Country	Link
US (1)	US3486989A (fr)
CH (1)	CH536880A (fr)
DE (1)	DE1696082B2 (fr)
ES (1)	ES349930A1 (fr)
FR (1)	FR1553326A (fr)
GB (1)	GB1168225A (fr)
NL (1)	NL6801370A (fr)
SE (1)	SE341649B (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE2450527C2 (de) *	1974-10-24	1982-09-16	Henkel KGaA, 4000 Düsseldorf	Wäßriges, saures Bad zur galvanischen Abscheidung von halbglänzenden Nickelüberzügen
NZ235983A (en) *	1989-11-08	1993-01-27	Novo Nordisk As	Process for hydrolysis of resins in lignocellulosic pulp using enzymes simultaneously with peroxy bleaching; ctmp fluff-pulp and absorbent articles produced therefrom
TWI291322B (en) *	2003-05-20	2007-12-11	Laird Technologies Inc	Method for manufacturing an EMI shielding element

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
CA476452A (fr) *		1951-08-28	Alan Hoffman Raymond	Revetement electrolytique
US2085754A (en) *	1934-07-30	1937-07-06	Du Pont	Addition agents for nickel plating
GB525847A (en) *	1939-03-02	1940-09-05	Udylite Corp	Improvements in or relating to the electro-deposition of nickel
US2795540A (en) *	1954-04-05	1957-06-11	Udylite Res Corp	Electrodeposition of nickel

1967
- 1967-01-30 US US612362A patent/US3486989A/en not_active Expired - Lifetime
1968
- 1968-01-26 GB GB4224/68A patent/GB1168225A/en not_active Expired
- 1968-01-29 SE SE1139/68A patent/SE341649B/xx unknown
- 1968-01-29 CH CH129568A patent/CH536880A/de not_active IP Right Cessation
- 1968-01-29 DE DE1968M0077082 patent/DE1696082B2/de active Granted
- 1968-01-30 NL NL6801370A patent/NL6801370A/xx not_active Application Discontinuation
- 1968-01-30 ES ES349930A patent/ES349930A1/es not_active Expired
- 1968-01-30 FR FR1553326D patent/FR1553326A/fr not_active Expired

Also Published As

Publication number	Publication date
US3486989A (en)	1969-12-30
GB1168225A (en)	1969-10-22
FR1553326A (fr)	1969-01-10
DE1696082B2 (de)	1976-06-24
DE1696082A1 (de)	1971-11-18
SE341649B (fr)	1972-01-10
ES349930A1 (es)	1969-11-16
NL6801370A (fr)	1968-07-31

Legal Events

Date	Code	Title	Description
1979-11-15	PL	Patent ceased

Publication	Publication Date	Title
DE69127394T2 (de)	1998-01-15	Zinn-Elektroplattierung bei hoher Geschwindigkeit
DE2152785C2 (de)	1982-07-01	Wäßriges saures galvanisches Bad für die Abscheidung von Zinn, Blei und Legierungen davon
DE2255584C2 (de)	1983-02-17	Saures Kupfergalvanisierbad
DE3428345A1 (de)	1985-02-14	Waessriges bad zur galvanischen abscheidung von zink und zinklegierungen
DE3001879C2 (de)	1983-01-13	Wäßriges saures Bad und Verfahren zur galvanischen Abscheidung von glänzenden und eingeebneten Nickel-Eisen-Schichten
DE2417952A1 (de)	1974-10-31	Verfahren zur galvanischen abscheidung von nickel und/oder kobalt
DE2134457C2 (de)	1982-06-03	Wäßriges galvanisches Bad für die Abscheidung von Nickel und/oder Kobalt
DE3856429T2 (de)	2001-03-08	Zinn, Blei- oder Zinn-Blei-Legierungselektrolyten für Elektroplattieren bei hoher Geschwindigkeit
DE3710368A1 (de)	1987-10-22	Waessriges saures bad und verfahren fuer die galvanische abscheidung einer zink-nickel-legierung
DE2630980C2 (fr)	1989-05-03
DE2537065C2 (fr)	1989-07-13
DE2835539C2 (fr)	1989-02-23
DE2215737C3 (de)	1983-12-08	Wäßriges saures galvanisches Halbglanznickelbad
DE3212118A1 (de)	1982-12-30	Bad zur galvanischen abscheidung von glaenzendem metallischem zinn oder legierungen des zinns
CH536880A (de)	1973-05-15	Verfahren zum Halbglanzvernickeln von Metallen
DE2450133A1 (de)	1975-05-07	Verfahren und galvanisches bad zur abscheidung von nickel/eisen- und nickel/ kobalt/eisen-legierungen
DE2541304A1 (de)	1976-03-25	Verfahren und bad zur galvanischen abscheidung von eisenlegierungen
DE2333096C3 (de)	1979-01-11	Galvanisch aufgebrachter mehrschichtiger Metallüberzug und Verfahren zu seiner Herstellung
CH626122A5 (en)	1981-10-30	Process for producing a deposit by electroplating, and an electroplating bath for implementing the process
DE2815786A1 (de)	1979-01-25	Waessriges bad zur edektrochemischen abscheidung von glaenzenden eisen-nickel- ueberzuegen
DE2634128C2 (de)	1985-01-17	Bad und Verfahren zum galvanischen Abscheiden von Nickel-Graphit-Dispersionsüberzügen
DE1916118A1 (de)	1969-10-16	Verfahren zur elektrolytischen Abscheidung einer halbglaenzenden,schwefelfreien Nickelauflage sowie Nickelbaeder hierfuer
DE2060120A1 (de)	1971-06-16	Verfahren zur elektrolytischen Abscheidung von Kobaltbelaegen oder kobalthaltigen Belaegen
DE1496830B1 (de)	1970-10-15	Verfahren zum galvanischen Abscheiden von duktilen halbglaenzenden Nickelschichten aus Cumarin und Cumarinderivate enthaltenden Nic
DE2943028C2 (fr)	1989-02-23