CH540349A - Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut - Google Patents

Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut

Info

Publication number
CH540349A
CH540349A CH377771A CH377771A CH540349A CH 540349 A CH540349 A CH 540349A CH 377771 A CH377771 A CH 377771A CH 377771 A CH377771 A CH 377771A CH 540349 A CH540349 A CH 540349A
Authority
CH
Switzerland
Prior art keywords
chambers
vacuum system
evacuated separately
treating goods
goods
Prior art date
Application number
CH377771A
Other languages
English (en)
Inventor
Wossner Hermann
Original Assignee
Balzers Patent Beteilig Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers Patent Beteilig Ag filed Critical Balzers Patent Beteilig Ag
Priority to CH377771A priority Critical patent/CH540349A/de
Priority to NL7106818A priority patent/NL7106818A/xx
Priority to GB757572A priority patent/GB1329397A/en
Priority to DE19722207957 priority patent/DE2207957A1/de
Priority to FR7207018A priority patent/FR2131987A1/fr
Publication of CH540349A publication Critical patent/CH540349A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH377771A 1971-03-15 1971-03-15 Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut CH540349A (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CH377771A CH540349A (de) 1971-03-15 1971-03-15 Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut
NL7106818A NL7106818A (de) 1971-03-15 1971-05-18
GB757572A GB1329397A (en) 1971-03-15 1972-02-18 Vacuum treatment plant
DE19722207957 DE2207957A1 (de) 1971-03-15 1972-02-21 Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut
FR7207018A FR2131987A1 (de) 1971-03-15 1972-03-01

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH377771A CH540349A (de) 1971-03-15 1971-03-15 Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut

Publications (1)

Publication Number Publication Date
CH540349A true CH540349A (de) 1973-08-15

Family

ID=4263258

Family Applications (1)

Application Number Title Priority Date Filing Date
CH377771A CH540349A (de) 1971-03-15 1971-03-15 Vakuumanlage mit zwei getrennt evakuierbaren Kammern zum Behandeln von Gut

Country Status (5)

Country Link
CH (1) CH540349A (de)
DE (1) DE2207957A1 (de)
FR (1) FR2131987A1 (de)
GB (1) GB1329397A (de)
NL (1) NL7106818A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4002141A (en) * 1975-11-26 1977-01-11 Airco, Inc. System for handling substrate holders for vacuum coating
US4226208A (en) * 1977-08-04 1980-10-07 Canon Kabushiki Kaisha Vapor deposition apparatus
US4274936A (en) 1979-04-30 1981-06-23 Advanced Coating Technology, Inc. Vacuum deposition system and method
DE2940064A1 (de) * 1979-10-03 1981-04-16 Leybold-Heraeus GmbH, 5000 Köln Vakuumaufdampfanlage mir einer ventilkammer, einer bedampfungskammer und einer verdampferkammer
GB8413776D0 (en) * 1984-05-30 1984-07-04 Dowty Electronics Ltd Sputtering process
JPS61291032A (ja) * 1985-06-17 1986-12-20 Fujitsu Ltd 真空装置
CN113862631A (zh) * 2021-09-13 2021-12-31 江苏瑞尔光学有限公司 一种带缓存仓的真空镀膜机

Also Published As

Publication number Publication date
NL7106818A (de) 1972-09-19
DE2207957A1 (de) 1972-09-28
GB1329397A (en) 1973-09-05
FR2131987A1 (de) 1972-11-17

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Legal Events

Date Code Title Description
PL Patent ceased