CH547357A - Entladungsgefaess zum ionisieren und anregen von gasen. - Google Patents

Entladungsgefaess zum ionisieren und anregen von gasen.

Info

Publication number
CH547357A
CH547357A CH1894371A CH547357DA CH547357A CH 547357 A CH547357 A CH 547357A CH 1894371 A CH1894371 A CH 1894371A CH 547357D A CH547357D A CH 547357DA CH 547357 A CH547357 A CH 547357A
Authority
CH
Switzerland
Prior art keywords
ionizing
discharge vessel
exciting gases
exciting
gases
Prior art date
Application number
CH1894371A
Other languages
English (en)
Original Assignee
Balzers Hochvakuum
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE19712100262 external-priority patent/DE2100262C3/de
Application filed by Balzers Hochvakuum filed Critical Balzers Hochvakuum
Publication of CH547357A publication Critical patent/CH547357A/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Vapour Deposition (AREA)
CH1894371A 1971-01-05 1971-12-24 Entladungsgefaess zum ionisieren und anregen von gasen. CH547357A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712100262 DE2100262C3 (de) 1971-01-05 Entladungsgefäß zum Ionisieren und Anregen von Gasen in Vakuum-Aufdampfanlagen

Publications (1)

Publication Number Publication Date
CH547357A true CH547357A (de) 1974-03-29

Family

ID=5795212

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1894371A CH547357A (de) 1971-01-05 1971-12-24 Entladungsgefaess zum ionisieren und anregen von gasen.

Country Status (1)

Country Link
CH (1) CH547357A (de)

Also Published As

Publication number Publication date
DE2100262A1 (en) 1972-07-27
DE2100262B2 (de) 1976-04-08

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Legal Events

Date Code Title Description
PL Patent ceased