CH684000A5 - Vorrichtung zum Beschichten eines Substrats, vorzugsweise zum Beschichten von Flachglas, mit einer Indium-Zinn-Oxid-Schicht. - Google Patents

Vorrichtung zum Beschichten eines Substrats, vorzugsweise zum Beschichten von Flachglas, mit einer Indium-Zinn-Oxid-Schicht. Download PDF

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Publication number
CH684000A5
CH684000A5 CH3112/91A CH311291A CH684000A5 CH 684000 A5 CH684000 A5 CH 684000A5 CH 3112/91 A CH3112/91 A CH 3112/91A CH 311291 A CH311291 A CH 311291A CH 684000 A5 CH684000 A5 CH 684000A5
Authority
CH
Switzerland
Prior art keywords
coating
target
substrate
cathode
atomized
Prior art date
Application number
CH3112/91A
Other languages
German (de)
English (en)
Inventor
Michael Dr Schanz
Rudolf Dr Latz
Michael Dr Scherer
Original Assignee
Leybold Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Ag filed Critical Leybold Ag
Publication of CH684000A5 publication Critical patent/CH684000A5/de

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3421—Cathode assembly for sputtering apparatus, e.g. Target using heated targets
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3435—Target holders (includes backing plates and endblocks)

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
CH3112/91A 1991-03-04 1991-10-24 Vorrichtung zum Beschichten eines Substrats, vorzugsweise zum Beschichten von Flachglas, mit einer Indium-Zinn-Oxid-Schicht. CH684000A5 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE4106771A DE4106771A1 (de) 1991-03-04 1991-03-04 Vorrichtung zum beschichten eines substrats, vorzugsweise zum beschichten von flachglas, mit einer indium-zinn-oxid-schicht

Publications (1)

Publication Number Publication Date
CH684000A5 true CH684000A5 (de) 1994-06-30

Family

ID=6426381

Family Applications (1)

Application Number Title Priority Date Filing Date
CH3112/91A CH684000A5 (de) 1991-03-04 1991-10-24 Vorrichtung zum Beschichten eines Substrats, vorzugsweise zum Beschichten von Flachglas, mit einer Indium-Zinn-Oxid-Schicht.

Country Status (5)

Country Link
JP (1) JPH0565632A (ja)
BE (1) BE1006649A3 (ja)
CH (1) CH684000A5 (ja)
DE (1) DE4106771A1 (ja)
FI (1) FI920457A7 (ja)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10018842C2 (de) * 2000-04-14 2002-03-21 Ardenne Anlagentech Gmbh Verfahren zum Aufbringen von TCO-Schichten auf Substrate
EP2360290A1 (en) * 2010-02-11 2011-08-24 Applied Materials, Inc. Method for producing an ITO layer and sputtering system

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1365492A (en) * 1971-02-05 1974-09-04 Triplex Safety Glass Co Metal oxide films
US4318796A (en) * 1980-07-15 1982-03-09 Murata Manufacturing Co., Ltd. Sputtering apparatus
DE3210351A1 (de) * 1982-03-20 1983-09-22 Leybold-Heraeus GmbH, 5000 Köln Verfahren und vorrichtung zum herstellen von magnetischen aufzeichnungsschichten

Also Published As

Publication number Publication date
FI920457A7 (fi) 1992-09-05
BE1006649A3 (fr) 1994-11-08
DE4106771A1 (de) 1992-09-10
FI920457A0 (fi) 1992-02-03
JPH0565632A (ja) 1993-03-19

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Legal Events

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PL Patent ceased
PL Patent ceased