CL2016003286A1 - Pasivación de las superficies receptoras de luz de celdas solares con silicio cristalino. - Google Patents

Pasivación de las superficies receptoras de luz de celdas solares con silicio cristalino.

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Publication number
CL2016003286A1
CL2016003286A1 CL2016003286A CL2016003286A CL2016003286A1 CL 2016003286 A1 CL2016003286 A1 CL 2016003286A1 CL 2016003286 A CL2016003286 A CL 2016003286A CL 2016003286 A CL2016003286 A CL 2016003286A CL 2016003286 A1 CL2016003286 A1 CL 2016003286A1
Authority
CL
Chile
Prior art keywords
silicon
layer
solar cell
passivation
light receiving
Prior art date
Application number
CL2016003286A
Other languages
English (en)
Inventor
Michael C Johnson
Kieran Mark Tracy
Princess Carmi Tomada
David D Smith
Seung Bum Rim
Perine Jaffrennou
Original Assignee
Sunpower Corp
Total Marketing Services
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sunpower Corp, Total Marketing Services filed Critical Sunpower Corp
Publication of CL2016003286A1 publication Critical patent/CL2016003286A1/es

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • H10F77/306Coatings for devices having potential barriers
    • H10F77/311Coatings for devices having potential barriers for photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/14Photovoltaic cells having only PN homojunction potential barriers
    • H10F10/146Back-junction photovoltaic cells, e.g. having interdigitated base-emitter regions on the back side
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/164Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
    • H10F10/165Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F10/00Individual photovoltaic cells, e.g. solar cells
    • H10F10/10Individual photovoltaic cells, e.g. solar cells having potential barriers
    • H10F10/16Photovoltaic cells having only PN heterojunction potential barriers
    • H10F10/164Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells
    • H10F10/165Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells
    • H10F10/166Photovoltaic cells having only PN heterojunction potential barriers comprising heterojunctions with Group IV materials, e.g. ITO/Si or GaAs/SiGe photovoltaic cells the heterojunctions being Group IV-IV heterojunctions, e.g. Si/Ge, SiGe/Si or Si/SiC photovoltaic cells the Group IV-IV heterojunctions being heterojunctions of crystalline and amorphous materials, e.g. silicon heterojunction [SHJ] photovoltaic cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/121The active layers comprising only Group IV materials
    • H10F71/1224The active layers comprising only Group IV materials comprising microcrystalline silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass
    • H10F71/129Passivating
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/164Polycrystalline semiconductors
    • H10F77/1642Polycrystalline semiconductors including only Group IV materials
    • H10F77/1645Polycrystalline semiconductors including only Group IV materials including microcrystalline silicon
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/166Amorphous semiconductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/30Coatings
    • H10F77/306Coatings for devices having potential barriers
    • H10F77/311Coatings for devices having potential barriers for photovoltaic cells
    • H10F77/315Coatings for devices having potential barriers for photovoltaic cells the coatings being antireflective or having enhancing optical properties
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/70Surface textures, e.g. pyramid structures
    • H10F77/703Surface textures, e.g. pyramid structures of the semiconductor bodies, e.g. textured active layers
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/545Microcrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/546Polycrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/547Monocrystalline silicon PV cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • Y02E10/548Amorphous silicon PV cells

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  • Photovoltaic Devices (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)

Abstract

<p>SE DESCRIBEN LOS MÉTODOS DE PASIVACIÓN DE LAS SUPERFICIES RECEPTORAS DE LUZ DE CELDAS SOLARES CON SILICIO CRISTALINO Y LAS CELDAS SOLARES RESULTANTES EN UN EJEMPLO, UNA CELDA SOLAR INCLUYE UN SUSTRATO DE SILICIO QUE TIENE UNA SUPERFICIE RECEPTORA DE LUZ. UNA CAPA DE SILICIO INTRÍNSECO SE DISPONE POR ENCIMA DE LA SUPERFICIE RECEPTORA DE LUZ DEL SUSTRATO DE SILICIO. UNA CAPA DE SILICIO DE TIPO N SE DISPONE SOBRE LA CAPA DE SILICIO INTRÍNSECO. UNO O AMBOS DE LA CAPA DE SILICIO INTRÍNSECO Y LA CAPA DE SILICIO DE TIPO N ES UNA CAPA DE SILICIO MICRO A POLICRISTALINO. EN OTRO EJEMPLO, UNA CELDA SOLAR INCLUYE UN SUSTRATO DE SILICIO QUE TIENE UNA SUPERFICIE RECEPTORA DE LUZ. UNA CAPA DIELÉCTRICA PASIVADORA SE DISPONE SOBRE LA SUPERFICIE RECEPTORA DE LUZ DEL SUSTRATO DE SILICIO. UNA CAPA DE SILICIO MICRO O POLICRISTALINO TIPO N DISPUESTA SOBRE LA CAPA DIELÉCTRICA PASIVADORA.</p>
CL2016003286A 2014-06-27 2016-12-21 Pasivación de las superficies receptoras de luz de celdas solares con silicio cristalino. CL2016003286A1 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US14/317,672 US20150380581A1 (en) 2014-06-27 2014-06-27 Passivation of light-receiving surfaces of solar cells with crystalline silicon

Publications (1)

Publication Number Publication Date
CL2016003286A1 true CL2016003286A1 (es) 2017-11-10

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CL2016003286A CL2016003286A1 (es) 2014-06-27 2016-12-21 Pasivación de las superficies receptoras de luz de celdas solares con silicio cristalino.

Country Status (15)

Country Link
US (1) US20150380581A1 (es)
EP (1) EP3161874B1 (es)
JP (1) JP6722117B2 (es)
KR (1) KR102449540B1 (es)
CN (2) CN106471625A (es)
AU (1) AU2015279725B2 (es)
BR (1) BR112016025280A2 (es)
CL (1) CL2016003286A1 (es)
MX (1) MX377084B (es)
MY (1) MY183477A (es)
PH (1) PH12016502441B1 (es)
SG (1) SG11201610742UA (es)
TW (1) TWI685117B (es)
WO (1) WO2015200715A1 (es)
ZA (1) ZA201608608B (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6785477B2 (ja) * 2016-09-27 2020-11-18 パナソニックIpマネジメント株式会社 太陽電池セルおよび太陽電池セルの製造方法
US20180138328A1 (en) * 2016-11-11 2018-05-17 Sunpower Corporation Uv-curing of light-receiving surfaces of solar cells
CN110199376A (zh) * 2016-12-06 2019-09-03 澳大利亚国立大学 太阳能电池制造
KR102514785B1 (ko) * 2017-05-19 2023-03-29 상라오 징코 솔라 테크놀러지 디벨롭먼트 컴퍼니, 리미티드 태양 전지 및 이의 제조 방법
EP3404724B1 (en) * 2017-05-19 2022-08-03 LG Electronics Inc. Solar cell and method for manufacturing the same
CN107658348A (zh) * 2017-09-20 2018-02-02 贵州大学 硅基微纳光伏结构及其光子制备方法
JP2021520056A (ja) * 2018-04-16 2021-08-12 サンパワー コーポレイション クリーブ加工された縁部から後退した接合部を有する太陽電池
DE102020001980A1 (de) * 2020-03-26 2021-09-30 Singulus Technologies Ag Verfahren und Anlage zur Herstellung eines Ausgangsmaterials für eine Siliziumsolarzelle mit passivierten Kontakten
CN114078987A (zh) * 2020-08-18 2022-02-22 泰州中来光电科技有限公司 钝化接触电池及制备方法和钝化接触结构制备方法及装置
CN114914328B (zh) * 2022-05-11 2023-09-05 通威太阳能(眉山)有限公司 一种双面太阳能电池及其制备方法

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3420887A1 (de) * 1984-06-05 1985-12-05 Telefunken electronic GmbH, 7100 Heilbronn Solarzelle
JP2740284B2 (ja) * 1989-08-09 1998-04-15 三洋電機株式会社 光起電力素子
US5030295A (en) * 1990-02-12 1991-07-09 Electric Power Research Institut Radiation resistant passivation of silicon solar cells
JPH04226084A (ja) * 1990-05-23 1992-08-14 Mitsubishi Electric Corp 太陽電池およびその製造方法
US6657194B2 (en) * 2001-04-13 2003-12-02 Epir Technologies, Inc. Multispectral monolithic infrared focal plane array detectors
US7375378B2 (en) * 2005-05-12 2008-05-20 General Electric Company Surface passivated photovoltaic devices
US7468485B1 (en) * 2005-08-11 2008-12-23 Sunpower Corporation Back side contact solar cell with doped polysilicon regions
US20090293948A1 (en) * 2008-05-28 2009-12-03 Stichting Energieonderzoek Centrum Nederland Method of manufacturing an amorphous/crystalline silicon heterojunction solar cell
US8283559B2 (en) * 2009-04-09 2012-10-09 Silevo, Inc. Silicon-based dielectric stack passivation of Si-epitaxial thin-film solar cells
EP4350782A3 (en) * 2009-04-21 2024-07-10 Tetrasun, Inc. High-efficiency solar cell structures and methods of manufacture
WO2011035306A2 (en) * 2009-09-21 2011-03-24 Nanogram Corporation Silicon inks for thin film solar solar cell formation, corresponding methods and solar cell structures
FR2955702B1 (fr) * 2010-01-27 2012-01-27 Commissariat Energie Atomique Cellule photovoltaique comprenant un film mince de passivation en oxyde cristallin de silicium et procede de realisation
JP2012049156A (ja) * 2010-08-24 2012-03-08 Osaka Univ 太陽電池およびその製造方法
JP2012060080A (ja) * 2010-09-13 2012-03-22 Ulvac Japan Ltd 結晶太陽電池及びその製造方法
US8815635B2 (en) * 2010-11-05 2014-08-26 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of photoelectric conversion device
US8492253B2 (en) * 2010-12-02 2013-07-23 Sunpower Corporation Method of forming contacts for a back-contact solar cell
KR20120090449A (ko) * 2011-02-08 2012-08-17 삼성전자주식회사 태양 전지 및 이의 제조 방법
TWI463682B (zh) * 2011-03-02 2014-12-01 Nat Univ Tsing Hua 異質接面太陽能電池
US8658458B2 (en) * 2011-06-15 2014-02-25 Varian Semiconductor Equipment Associates, Inc. Patterned doping for polysilicon emitter solar cells
CN202134565U (zh) * 2011-06-21 2012-02-01 中国科学院上海技术物理研究所 一种带有本征层的异质结结构的晶体硅太阳电池
JP5773194B2 (ja) * 2011-07-11 2015-09-02 国立大学法人東京農工大学 太陽電池の製造方法
US8692111B2 (en) * 2011-08-23 2014-04-08 Sunpower Corporation High throughput laser ablation processes and structures for forming contact holes in solar cells
KR20130050721A (ko) * 2011-11-08 2013-05-16 삼성에스디아이 주식회사 태양 전지
CN102569478A (zh) * 2012-02-23 2012-07-11 常州天合光能有限公司 薄膜非晶硅-n型晶体硅异质结叠层太阳能电池
CN102569479A (zh) * 2012-02-28 2012-07-11 常州天合光能有限公司 叠层硅基异质结太阳能电池
CN202651132U (zh) * 2012-03-19 2013-01-02 湖南师范大学 一种硅薄膜太阳电池
JP5726377B2 (ja) * 2012-04-27 2015-05-27 三菱電機株式会社 太陽電池及びその製造方法
CN104137269B (zh) * 2012-05-14 2016-12-28 三菱电机株式会社 光电变换装置及其制造方法、光电变换模块
JP6103867B2 (ja) * 2012-09-12 2017-03-29 シャープ株式会社 光電変換素子および光電変換素子の製造方法
JP2014216334A (ja) * 2013-04-22 2014-11-17 長州産業株式会社 光発電素子
CN103346211B (zh) * 2013-06-26 2015-12-23 英利集团有限公司 一种背接触太阳能电池及其制作方法

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Publication number Publication date
PH12016502441B1 (en) 2020-12-04
EP3161874A1 (en) 2017-05-03
EP3161874A4 (en) 2017-05-24
US20150380581A1 (en) 2015-12-31
JP2017525136A (ja) 2017-08-31
AU2015279725B2 (en) 2020-10-15
AU2015279725A1 (en) 2016-09-29
MX2016013691A (es) 2017-04-27
CN113571590A (zh) 2021-10-29
ZA201608608B (en) 2018-11-28
MY183477A (en) 2021-02-19
JP6722117B2 (ja) 2020-07-15
KR102449540B1 (ko) 2022-10-04
MX377084B (es) 2025-03-07
CN106471625A (zh) 2017-03-01
WO2015200715A1 (en) 2015-12-30
SG11201610742UA (en) 2017-01-27
BR112016025280A2 (pt) 2017-12-12
KR20170023152A (ko) 2017-03-02
TW201618314A (zh) 2016-05-16
PH12016502441A1 (en) 2017-03-06
TWI685117B (zh) 2020-02-11
EP3161874B1 (en) 2019-04-10

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