CN100433105C - display device - Google Patents

display device Download PDF

Info

Publication number
CN100433105C
CN100433105C CNB2005100741599A CN200510074159A CN100433105C CN 100433105 C CN100433105 C CN 100433105C CN B2005100741599 A CNB2005100741599 A CN B2005100741599A CN 200510074159 A CN200510074159 A CN 200510074159A CN 100433105 C CN100433105 C CN 100433105C
Authority
CN
China
Prior art keywords
semiconductor layer
transistor
emission control
display device
length
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CNB2005100741599A
Other languages
Chinese (zh)
Other versions
CN1694150A (en
Inventor
郭源奎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samsung Display Co Ltd
Original Assignee
Samsung SDI Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samsung SDI Co Ltd filed Critical Samsung SDI Co Ltd
Publication of CN1694150A publication Critical patent/CN1694150A/en
Application granted granted Critical
Publication of CN100433105C publication Critical patent/CN100433105C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/22Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources
    • G09G3/30Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels
    • G09G3/32Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED]
    • G09G3/3208Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED]
    • G09G3/3225Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED] using an active matrix
    • G09G3/3233Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters using controlled light sources using electroluminescent panels semiconductive, e.g. using light-emitting diodes [LED] organic, e.g. using organic light-emitting diodes [OLED] using an active matrix with pixel circuitry controlling the current through the light-emitting element
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D86/00Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates
    • H10D86/40Integrated devices formed in or on insulating or conducting substrates, e.g. formed in silicon-on-insulator [SOI] substrates or on stainless steel or glass substrates characterised by multiple TFTs
    • H10D86/441Interconnections, e.g. scanning lines
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays
    • H10K59/121Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements
    • H10K59/1213Active-matrix OLED [AMOLED] displays characterised by the geometry or disposition of pixel elements the pixel elements being TFTs
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/04Structural and physical details of display devices
    • G09G2300/0421Structural details of the set of electrodes
    • G09G2300/0426Layout of electrodes and connections
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • G09G2300/0842Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Electroluminescent Light Sources (AREA)
  • Control Of El Displays (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Control Of Indicators Other Than Cathode Ray Tubes (AREA)

Abstract

A display device has elements efficiently arranged in pixels. The pixel circuit includes a capacitor for charging a voltage corresponding to the data signal transmitted from the data line. The first transistor of the pixel circuit outputs a current corresponding to the voltage charged in the capacitor. The plurality of emission elements emit light corresponding to the current output from the driving transistor. A plurality of emission control transistors are connected between the first transistor and the plurality of emission elements. The emission control transistor includes a plurality of semiconductor layers having substantially the same internal resistance as each other.

Description

显示装置 display device

技术领域 technical field

本发明涉及显示器件。更具体地,本发明涉及使用有机电致发光(electroluminescence)(此后称为“EL”)物质的有机电致发光显示器。The present invention relates to display devices. More specifically, the present invention relates to organic electroluminescence displays using organic electroluminescence (hereinafter referred to as "EL") substances.

背景技术 Background technique

通常,有机电致发光(EL)显示器电激发有机荧光化合物,从而发光。有机发射元件(或者有机发射单元)以n×m的矩阵形式排布构成有机EL显示板,该EL显示板通过电压或者电流驱动显示图像数据。In general, organic electroluminescent (EL) displays electrically excite organic fluorescent compounds, thereby emitting light. The organic emission elements (or organic emission units) are arranged in an n×m matrix to form an organic EL display panel, and the EL display panel is driven by voltage or current to display image data.

有机发射元件具有二极管的特性,因此还称为有机发光二极管(OLED)。有机发射元件包括阳极(ITO)、有机薄膜和阴极层(金属)。有机薄膜具有多层结构,该多层结构包括发射层(EML)、电子传输层(ETL)以及用于保持电子和空穴之间平衡并且提高发射效率的空穴传输层(HTL)。此外,有机发射元件包括电子注入层(EIL)和空穴注入层(HIL)。有机发射元件以n×m矩阵的形式排布构成有机EL显示板。The organic emission element has the characteristics of a diode and is therefore also called an organic light emitting diode (OLED). An organic emissive element includes an anode (ITO), an organic thin film and a cathode layer (metal). The organic thin film has a multilayer structure including an emission layer (EML), an electron transport layer (ETL), and a hole transport layer (HTL) for maintaining a balance between electrons and holes and improving emission efficiency. In addition, the organic emission element includes an electron injection layer (EIL) and a hole injection layer (HIL). The organic emitting elements are arranged in an n×m matrix to form an organic EL display panel.

驱动有机EL显示板的方法包括无源矩阵法和有源矩阵法,有源矩阵法使用薄膜晶体管(TFT)。无源矩阵法包括形成彼此交叉(或者横跨)或者基本上垂直的阳极和阴极、选择线,和驱动有机EL显示板。有源矩阵法包括依次导通多个TFT并驱动有机EL显示板,该多个TFT根据用于选择扫描线的信号分别连接到数据线和扫描线。Methods of driving the organic EL display panel include a passive matrix method and an active matrix method using thin film transistors (TFTs). The passive matrix method includes forming anodes and cathodes that cross (or straddle) each other or are substantially perpendicular, select lines, and drive an organic EL display panel. The active matrix method includes sequentially turning on a plurality of TFTs respectively connected to data lines and scanning lines according to signals for selecting scanning lines and driving the organic EL display panel.

此后,说明通常有源矩阵有机EL显示器的像素电路。Hereinafter, a pixel circuit of a general active matrix organic EL display will be described.

图1示出像素电路,n×m像素之一,其位于第一行第一列。FIG. 1 shows a pixel circuit, one of n×m pixels, which is located in the first row and first column.

如图1所示,一个像素10包括三个子像素10r、10g和10b,该三个子像素10r、10g和10b分别包括分别用于发射红光(R)、绿光(G)和蓝光(B)的有机EL元件OLEDr、OLEDg和OLEDb。此外,在该结构中,子像素排布成条纹形式,而且子像素10r、10g和10b连接到各个数据线D1r、D1g和D1b以及公共扫描线S1。As shown in FIG. 1 , a pixel 10 includes three sub-pixels 10r, 10g and 10b, and the three sub-pixels 10r, 10g and 10b include LEDs for emitting red light (R), green light (G) and blue light (B) respectively. The organic EL elements OLEDr, OLEDg and OLEDb. Further, in this structure, the sub-pixels are arranged in a stripe form, and the sub-pixels 10r, 10g, and 10b are connected to the respective data lines D1r, D1g, and D1b and the common scanning line S1.

红色子像素10r包括两个晶体管M11r和M12r以及用于驱动有机EL元件OLEDr的电容器C1r。同样,绿色子像素10g包括两个晶体管M11g和M12g以及用于驱动有机EL元件OLEDg的电容器C1g,蓝色子像素10b包括两个晶体管M11b和M12b以及用于驱动有机EL元件OLEDb的电容器C1b。由于子像素10r、10g和10b的连接和运行基本相同,所以现在将仅仅以子像素10r的连接和运行为例进行说明。The red sub-pixel 10r includes two transistors M11r and M12r and a capacitor C1r for driving the organic EL element OLEDr. Likewise, the green subpixel 10g includes two transistors M11g and M12g and a capacitor C1g for driving the organic EL element OLEDg, and the blue subpixel 10b includes two transistors M11b and M12b and a capacitor C1b for driving the organic EL element OLEDb. Since the connection and operation of the sub-pixels 10r, 10g, and 10b are substantially the same, only the connection and operation of the sub-pixel 10r will now be described as an example.

驱动晶体管M11r连接在电源电压VDD和有机EL元件OLEDr的阳极之间,而且给有机EL元件OLEDr传送用于发光的电流。有机EL元件OLEDr的阴极连接到电压VSS,电压VSS比电源电压VDD更低。驱动晶体管M11r中流动的电流量由通过开关晶体管M12r施加的数据电压来控制。电容器C1r连接在晶体管M11r的源极和栅极之间,而且在预定的期间内控制施加的电压。用于传输导通/切断选择信号的扫描线S1连接到晶体管M12r的栅极,用于传输与红色子像素10r相应的数据电压的数据线D1r连接到晶体管M12r的源极。The driving transistor M11r is connected between the power supply voltage VDD and the anode of the organic EL element OLEDr, and supplies a current for emitting light to the organic EL element OLEDr. The cathode of the organic EL element OLEDr is connected to a voltage VSS which is lower than the power supply voltage VDD. The amount of current flowing in the driving transistor M11r is controlled by the data voltage applied through the switching transistor M12r. The capacitor C1r is connected between the source and the gate of the transistor M11r, and controls the applied voltage during a predetermined period. The scan line S1 for transmitting the on/off selection signal is connected to the gate of the transistor M12r, and the data line D1r for transmitting the data voltage corresponding to the red sub-pixel 10r is connected to the source of the transistor M12r.

这里,开关晶体管M12r响应施加给栅极的选择信号导通。然后,数据电压VDATA通过晶体管M12r从数据线D1r施加给晶体管M11r的栅极。然后,对应于由电容器Clr在晶体管M11r的栅极和源极之间所充的电压VGS,电流IOLED流到(和/或通过)晶体管M11r。有机EL元件OLEDr发射对应于电流IOLED的红光。流到有机EL元件OLEDr的电流按照以下等式1进行计算。Here, the switching transistor M12r is turned on in response to a selection signal applied to the gate. Then, the data voltage VDATA is applied from the data line D1r to the gate of the transistor M11r through the transistor M12r. Then, a current I OLED flows to (and/or through) transistor M11r corresponding to the voltage V GS charged between the gate and source of transistor M11r by capacitor Clr. The organic EL element OLEDr emits red light corresponding to the current I OLED . The current flowing to the organic EL element OLEDr is calculated according to Equation 1 below.

【等式1】[Equation 1]

II OLEDOLED == ββ 22 (( VV GSGS -- VV THTH )) 22 == ββ 22 (( VV DDDD -- VV DATADATA -- || VV THTH || )) 22

这里,VTH是晶体管M11r的阈值电压,β是常数。Here, VTH is the threshold voltage of the transistor M11r, and β is a constant.

如等式1所示,相应于数据电压的电流提供给图1所示像素电路中的有机EL元件OLEDr,而且有机EL元件OLEDr发射对应于提供的电流的亮度的红光。这里,所提供的数据电压具有预定范围内的多级电压值,从而显示特定灰度级。As shown in Equation 1, a current corresponding to the data voltage is supplied to the organic EL element OLEDr in the pixel circuit shown in FIG. 1, and the organic EL element OLEDr emits red light at a brightness corresponding to the supplied current. Here, the data voltages are supplied to have multi-level voltage values within a predetermined range, thereby displaying a specific gray scale.

这样,在有机EL显示器中,一个像素10包括三个子像素10r、10g和10b,而且每个子像素包括驱动晶体管M11r、M11g或者M1 1b,开关晶体管M12r、M12g或者M12b,以及电容器Clr、C1g或者C1b,用于驱动有机EL元件OLEDr、OLEDg或者OLEDb。而且,每个子像素连接到用于传输数据信号的数据线和用于传输电源电压VDD的电源线。Thus, in the organic EL display, one pixel 10 includes three sub-pixels 10r, 10g, and 10b, and each sub-pixel includes a driving transistor M11r, M11g, or M11b, a switching transistor M12r, M12g, or M12b, and a capacitor Clr, C1g, or C1b. , for driving the organic EL element OLEDr, OLEDg or OLEDb. Also, each sub-pixel is connected to a data line for transmitting a data signal and a power line for transmitting a power supply voltage V DD .

因此,需要在每个像素中设置很多用于给晶体管和电容器传输电压和信号的线,在一个像素中布置所有的线存在困难。Therefore, many lines for transmitting voltages and signals to transistors and capacitors need to be provided in each pixel, and it is difficult to arrange all the lines in one pixel.

发明内容 Contents of the invention

在本发明的示例实施例中,提供一种其元件有效地设置在像素中的发光显示器。In an example embodiment of the invention, there is provided a light emitting display whose elements are effectively arranged in pixels.

为了说明上述和其它特点,根据本发明的一个方面,提供一种显示装置,其包括用于传输选择信号的多根扫描线、用于传输数据信号的多根数据线和与该扫描线和数据线连接的多个像素电路。这里,至少一个像素电路包括电容器、驱动晶体管、多个发射元件和多个发射控制晶体管。电容器充电与从对应的一根数据线传输来的一个数据信号相对应的电压。对应于电容器中所充的电压驱动晶体管输出电流。对应于驱动晶体管输出的电流多个发射元件发光。多个发射控制晶体管连接在驱动晶体管和多个发射元件之间。这里,发射控制晶体管包括具有彼此基本上相同的内阻的多个半导体层。In order to illustrate the above and other features, according to one aspect of the present invention, a display device is provided, which includes a plurality of scan lines for transmitting selection signals, a plurality of data lines for transmitting data signals, and the scan lines and data A plurality of pixel circuits connected by lines. Here, at least one pixel circuit includes a capacitor, a driving transistor, a plurality of emission elements, and a plurality of emission control transistors. The capacitor charges a voltage corresponding to a data signal transmitted from a corresponding one of the data lines. The transistor outputs current corresponding to the voltage charged in the capacitor. A plurality of emission elements emit light corresponding to the current output by the drive transistor. A plurality of emission control transistors is connected between the drive transistor and the plurality of emission elements. Here, the emission control transistor includes a plurality of semiconductor layers having substantially the same internal resistance as each other.

此外,每个半导体层的长宽比可以和另一个半导体层的长宽比基本上相同,而且多个发射元件中的两个发射元件可以响应于驱动晶体管输出的电流,分别发射红光、绿光和蓝光中的一种光。In addition, the aspect ratio of each semiconductor layer may be substantially the same as that of another semiconductor layer, and two emitting elements among the plurality of emitting elements may emit red light, green light, respectively, in response to the current output by the driving transistor. One of light and blue light.

每个形成与一个发射控制晶体管相对应的半导体层的长度可以包括对应的一个发射控制晶体管的源区长度、沟道区长度和漏区长度。可以在与测量半导体层长度的方向基本垂直的方向上,测量每个形成对应的一个发射控制晶体管的半导体层的宽度。The length of each semiconductor layer formed corresponding to one emission control transistor may include a source region length, a channel region length and a drain region length of a corresponding one emission control transistor. The width of the semiconductor layers each forming a corresponding one of the emission control transistors may be measured in a direction substantially perpendicular to the direction in which the length of the semiconductor layers is measured.

此外,多个半导体层中的至少两个半导体层可以设置为彼此基本平行。Also, at least two semiconductor layers among the plurality of semiconductor layers may be disposed substantially parallel to each other.

根据本发明的另一个方面,提供一种显示装置,其包括用于传输选择信号的多根扫描线、用于传输数据信号的多根数据线和与该扫描线和数据线连接的多个像素电路。这里,设置在像素区内的至少一个像素电路包括第一、第二和第三发射元件、第一、第二和第三半导体层以及第一、第二和第三控制电极线。第一、第二和第三发射元件包括被施加电流的像素电极,用于对应于所施加的电流发光。第一、第二和第三半导体层分别通过第一、第二和第三接触孔连接到第一、第二和第三发射元件的像素电极。第一、第二和第三控制电极线绝缘并且与第一、第二和第三半导体层交叉,而且彼此基本上平行。第一半导体层、第二半导体层和第三半导体层的长宽比彼此基本上相同。According to another aspect of the present invention, a display device is provided, which includes a plurality of scan lines for transmitting selection signals, a plurality of data lines for transmitting data signals, and a plurality of pixels connected to the scan lines and the data lines circuit. Here, at least one pixel circuit disposed in the pixel region includes first, second and third emitting elements, first, second and third semiconductor layers, and first, second and third control electrode lines. The first, second and third emission elements include pixel electrodes to which a current is applied for emitting light corresponding to the applied current. The first, second and third semiconductor layers are connected to the pixel electrodes of the first, second and third emitting elements through the first, second and third contact holes, respectively. The first, second and third control electrode lines are insulated and cross the first, second and third semiconductor layers and are substantially parallel to each other. Aspect ratios of the first semiconductor layer, the second semiconductor layer, and the third semiconductor layer are substantially the same as each other.

第一半导体层可以形成具有与第一控制电极线交叉的绝缘沟道区的第一发射控制晶体管,第二半导体层可以形成具有与第二控制电极线交叉的绝缘沟道区的第二发射控制晶体管,第三半导体层可以形成具有与第三控制电极线交叉的绝缘沟道区的第三发射控制晶体管。The first semiconductor layer may form a first emission control transistor having an insulated channel region intersecting the first control electrode line, and the second semiconductor layer may form a second emission control transistor having an insulated channel region intersecting the second control electrode line. For the transistor, the third semiconductor layer may form a third emission control transistor having an insulating channel region crossing the third control electrode line.

此外,每个第一、第二和第三半导体层的长度可以包括对应的第一、第二和第三发射控制晶体管之一的源区长度、沟道区长度和漏区长度。可以在与测量对应的第一、第二和第三半导体层之一长度的方向基本垂直的方向上,测量每个第一、第二和第三半导体层的宽度。In addition, the length of each of the first, second and third semiconductor layers may include a source region length, a channel region length and a drain region length of a corresponding one of the first, second and third emission control transistors. The width of each of the first, second and third semiconductor layers may be measured in a direction substantially perpendicular to a direction in which the length of one of the corresponding first, second and third semiconductor layers is measured.

根据本发明另一个方面,提供一种显示装置,包括用于传输选择信号的多根扫描线、用于传输数据信号的多根数据线和与该扫描线和数据线连接的多个像素电路。这里,至少一个像素电路包括第一电容器、第一晶体管、第一、第二和第三发射元件以及第一、第二和第三发射控制晶体管。第一电容器充电与从对应的一根数据线传输来的一个数据信号对应的电压。第一晶体管输出对应于第一电容器中所充电压的电流。对应于从第一晶体管输出的电流第一、第二和第三发射元件发光,并且第一、第二和第三发射控制晶体管分别连接在第一晶体管与第一、第二和第三发射元件之间。这里,形成第一发射控制晶体管的第一半导体层通常与形成第二发射控制晶体管的第二半导体层关于形成第三发射控制晶体管的第三半导体层对称地设置。According to another aspect of the present invention, a display device is provided, including a plurality of scan lines for transmitting selection signals, a plurality of data lines for transmitting data signals, and a plurality of pixel circuits connected to the scan lines and the data lines. Here, at least one pixel circuit includes a first capacitor, a first transistor, first, second and third emission elements, and first, second and third emission control transistors. The first capacitor charges a voltage corresponding to a data signal transmitted from a corresponding one of the data lines. The first transistor outputs a current corresponding to the voltage charged in the first capacitor. The first, second and third emitting elements emit light corresponding to the current output from the first transistor, and the first, second and third emission control transistors are respectively connected between the first transistor and the first, second and third emitting elements between. Here, the first semiconductor layer forming the first emission control transistor is generally disposed symmetrically with the second semiconductor layer forming the second emission control transistor with respect to the third semiconductor layer forming the third emission control transistor.

第一、第二和第三半导体层中的至少两层半导体层可以基本上彼此平行,而且形成第一、第二和第三发射元件的第一、第二和第三半导体层可以掺杂相同类型的杂质。At least two semiconductor layers among the first, second and third semiconductor layers may be substantially parallel to each other, and the first, second and third semiconductor layers forming the first, second and third emitting elements may be doped with the same types of impurities.

这里,至少一个像素电路可以进一步包括第二晶体管、第三晶体管和第二电容器。第二晶体管可以连接在第一晶体管的控制电极和第一晶体管与第一、第二和第三发射控制晶体管之间的节点之间。第三晶体管可以具有连接到第一电容器的第一电极的第一电极和连接到第一电容器的第二电极的第二电极。第二电容器可以具有连接到第三晶体管的第二电极的第一电极和连接到第一晶体管的控制电极的第二电极。Here, at least one pixel circuit may further include a second transistor, a third transistor, and a second capacitor. The second transistor may be connected between the control electrode of the first transistor and a node between the first transistor and the first, second and third emission control transistors. The third transistor may have a first electrode connected to the first electrode of the first capacitor and a second electrode connected to the second electrode of the first capacitor. The second capacitor may have a first electrode connected to the second electrode of the third transistor and a second electrode connected to the control electrode of the first transistor.

根据本发明的另一个方面,提供一种显示装置,包括用于传输选择信号的多根扫描线、用于传输数据信号的多根数据线和与该扫描线和数据线连接并设置成矩阵形式的多个像素电路。这里,设置在像素区内的至少一个像素电路包括第一、第二和第三发射元件、半导体层以及第一、第二和第三控制电极线。第一、第二和第三发射元件包括被施加电流的像素电极,用于对应于所施加的电流发光。半导体层包括通过第一接触孔连接到第一发射元件的像素电极的第一半导体层区、通过第二接触孔连接到第二发射元件的像素电极的第二半导体层区、以及通过第三接触孔连接到第三发射元件的像素电极的第三半导体层区。第一、第二和第三控制电极线绝缘,与半导体层交叉而且基本上彼此平行。这里,第一半导体层通常与第三半导体层关于第二半导体层对称地设置。According to another aspect of the present invention, a display device is provided, including a plurality of scanning lines for transmitting selection signals, a plurality of data lines for transmitting data signals, and connecting the scanning lines and data lines and arranged in a matrix form multiple pixel circuits. Here, at least one pixel circuit disposed in the pixel region includes first, second and third emitting elements, a semiconductor layer and first, second and third control electrode lines. The first, second and third emission elements include pixel electrodes to which a current is applied for emitting light corresponding to the applied current. The semiconductor layer includes a first semiconductor layer region connected to the pixel electrode of the first emission element through the first contact hole, a second semiconductor layer region connected to the pixel electrode of the second emission element through the second contact hole, and a second semiconductor layer region connected to the pixel electrode of the second emission element through the third contact hole. The hole is connected to the third semiconductor layer region of the pixel electrode of the third emissive element. The first, second and third control electrode lines are insulated, cross the semiconductor layer and are substantially parallel to each other. Here, the first semiconductor layer is generally arranged symmetrically with the third semiconductor layer with respect to the second semiconductor layer.

这里,第一、第二和第三半导体层区中的至少一个半导体层区可以基本上平行于至少一根数据线。Here, at least one semiconductor layer region among the first, second and third semiconductor layer regions may be substantially parallel to at least one data line.

第一、第二和第三半导体层区中的至少一个半导体层区可以基本上平行于至少一根扫描线。At least one semiconductor layer region among the first, second and third semiconductor layer regions may be substantially parallel to at least one scan line.

附图说明 Description of drawings

附图以及说明书说明本发明的示例实施例,而且和该说明一起用于解释本发明的原理。The drawings and specification illustrate example embodiments of the invention and, together with the description, serve to explain principles of the invention.

图1示出传统发光显示板的像素电路;Figure 1 shows a pixel circuit of a conventional light-emitting display panel;

图2是根据本发明示例实施例的有机EL显示器的示意图;2 is a schematic diagram of an organic EL display according to an exemplary embodiment of the present invention;

图3示出根据本发明示例实施例的像素电路的等效电路;3 shows an equivalent circuit of a pixel circuit according to an example embodiment of the present invention;

图4是根据本发明第一示例实施例的像素电路的布置图;4 is a layout diagram of a pixel circuit according to a first exemplary embodiment of the present invention;

图5是沿着图4中沿I-I′的横截面图;Fig. 5 is a cross-sectional view along I-I' in Fig. 4;

图6是沿着图4中沿II-II′的横截面图;Fig. 6 is a cross-sectional view along II-II' in Fig. 4;

图7是根据本发明第二示例实施例的像素电路的布置图。FIG. 7 is a layout diagram of a pixel circuit according to a second exemplary embodiment of the present invention.

具体实施方式 Detailed ways

在随后的详细说明中,简单通过示意图示出和说明了本发明的特定典型实施例。正如本领域技术人员应该认识到的,所述示例实施例可以以不同的形式进行调整,而不脱离本发明的要旨或者范围。因此,附图和说明应该看作解释本身,而不是限制性的。In the detailed description that follows, there are shown and described certain exemplary embodiments of the invention, simply by way of illustration. As those skilled in the art would realize, the described example embodiments may be modified in different forms, all without departing from the spirit or scope of the present invention. Accordingly, the drawings and descriptions are to be regarded as explanatory in themselves, and not restrictive.

在说明书中可能没有讨论附图中示出的部分或者附图中没有示出的部分,因为它们对于完全理解本发明不是必要的。相同的附图标记表示相同元件。厚度被放大以更加清楚地示出附图中的几层和几个区。当将层、膜、板等说成是位于另一个部分“上”时,可以认为有其它的部分位于其间。Parts shown in the drawings or parts not shown in the drawings may not be discussed in the specification because they are not necessary for a complete understanding of the invention. The same reference numerals denote the same elements. Thicknesses are exaggerated to more clearly show several layers and several regions in the figures. When a layer, film, panel, etc. is said to be "on" another part, the other parts can be considered to be therebetween.

此外,定义扫描线的几个术语。“当前扫描线”是指传输当前选择信号的扫描线,“之前扫描线”是指传输当前选择信号之前的选择信号的扫描线。Additionally, several terms for scanlines are defined. The "current scanning line" refers to the scanning line transmitting the current selection signal, and the "previous scanning line" refers to the scanning line transmitting the selection signal before the current selection signal.

此外,“当前像素”是指根据当前扫描线的选择信号发光的像素,“之前像素”是指根据之前扫描线的选择信号发光的像素,“下一个像素”是指根据下一根扫描线的选择信号发光的像素。In addition, "current pixel" refers to a pixel that emits light according to the selection signal of the current scanning line, "previous pixel" refers to a pixel that emits light according to the selection signal of the previous scanning line, and "next pixel" refers to a pixel that emits light according to the selection signal of the next scanning line. Select the pixels that emit light from the signal.

如图2所示,根据本发明示例实施例的有机EL显示器包括显示板100、扫描驱动器200、发射控制器300和数据驱动器400。显示板100包括在行方向上设置的多根扫描线S0、S1...Sk...Sn和多根发射控制线E1...Ek...En,在列方向上设置的多根数据线D1...Dk...Dm和用于施加电源电压VDD的多根电源线,以及多个像素110。每个像素110形成在由任何两根扫描线Sk-1和Sk与任何两根相邻的数据线Dk-1和Dk限定或者围绕的像素区处,而且根据从当前扫描线Sk、之前扫描线Sk-1、发射控制线Ek和数据线Dk传输来的信号驱动像素110。而且,每根发射扫描线E1到En由三根发射控制线组成(例如E1包括E1r、E1g和E1b,En包括Enr、Eng和Enb,以及Ek包括Ekr、Ekg和Ekb,如图3所示)。As shown in FIG. 2 , an organic EL display according to an exemplary embodiment of the present invention includes a display panel 100 , a scan driver 200 , an emission controller 300 and a data driver 400 . The display panel 100 includes a plurality of scanning lines S0, S1...Sk...Sn and a plurality of emission control lines E1...Ek...En arranged in the row direction, and a plurality of data lines arranged in the column direction D1 . . . Dk . . . Dm and a plurality of power supply lines for applying a power supply voltage VDD, and a plurality of pixels 110 . Each pixel 110 is formed at the pixel region defined or surrounded by any two scan lines Sk-1 and Sk and any two adjacent data lines Dk-1 and Dk, and according to the current scan line Sk, the previous scan line Signals transmitted by Sk-1, the emission control line Ek and the data line Dk drive the pixel 110 . Moreover, each emission scan line E1 to En is composed of three emission control lines (for example, E1 includes E1r, E1g, and E1b, En includes Enr, Eng, and Enb, and Ek includes Ekr, Ekg, and Ekb, as shown in FIG. 3 ).

扫描驱动器200依次施加用于选择对应线的选择信号给扫描线S0到Sn,从而数据信号可以施加给对应线的像素。发射控制器300依次施加用于控制图3所示有机EL元件OLEDr、OLEDg和OLEDb的发射的发射控制信号给发射控制线E1到En。只要依次施加选择信号,数据驱动器400施加与施加了选择信号的线的像素对应的数据信号给数据线D1到Dm。The scan driver 200 sequentially applies selection signals for selecting corresponding lines to the scan lines S0 to Sn so that data signals may be applied to pixels of the corresponding lines. The emission controller 300 sequentially applies emission control signals for controlling the emission of the organic EL elements OLEDr, OLEDg, and OLEDb shown in FIG. 3 to the emission control lines E1 to En. As long as the selection signal is sequentially applied, the data driver 400 applies the data signal corresponding to the pixels of the line to which the selection signal is applied to the data lines D1 to Dm.

扫描驱动器200、发射控制器300和数据驱动器400可以连接到其上形成显示板100的基板。或者,扫描驱动器200、发射控制器300和/或数据驱动器400可以直接形成在显示板100的玻璃基板上。而且,由扫描线、数据线和晶体管组成的驱动电路可以形成在显示板100的基板上。而且,扫描驱动器200、发射控制器300和/或数据驱动器400可以粘附而且连接到显示板100的基板,如载带封装(TCP)、柔性印刷电路(FPC)或者带自动焊合(tape automatic bonding,TAB)等。The scan driver 200, the emission controller 300, and the data driver 400 may be connected to a substrate on which the display panel 100 is formed. Alternatively, the scan driver 200 , the emission controller 300 and/or the data driver 400 may be directly formed on the glass substrate of the display panel 100 . Also, a driving circuit composed of scan lines, data lines and transistors may be formed on the substrate of the display panel 100 . Also, the scan driver 200, the emission controller 300, and/or the data driver 400 may be adhered and connected to a substrate of the display panel 100, such as a tape carrier package (TCP), a flexible printed circuit (FPC), or a tape automatic bonding (tape automatic) bonding, TAB) and so on.

在本发明的典型实施例中,一个场可以分成将被驱动的三个子场。施加红、绿和蓝色数据,而且在三个子场发射红、绿和蓝光。这里,扫描驱动器200依次施加选择信号给处于每个子场的扫描线S0到Sn。发射控制器300依次施加发射控制信号给发射控制线E1到En,从而每个彩色有机EL元件在每一个子场发射。数据驱动器400施加对应于红、绿和蓝有机EL元件的数据信号给处于三个子场的数据线D1到Dm。In an exemplary embodiment of the present invention, one field can be divided into three subfields to be driven. Red, green and blue data are applied, and red, green and blue light is emitted in three subfields. Here, the scan driver 200 sequentially applies selection signals to the scan lines S0 to Sn in each subfield. The emission controller 300 sequentially applies emission control signals to the emission control lines E1 to En so that each color organic EL element emits at each subfield. The data driver 400 applies data signals corresponding to red, green, and blue organic EL elements to the data lines D1 to Dm in three subfields.

此后,将参考图3详细说明根据本发明示例实施例的有机EL显示器的具体运行。Hereinafter, specific operations of the organic EL display according to an exemplary embodiment of the present invention will be described in detail with reference to FIG. 3 .

图3示出图2的有机EL显示器中一个像素110的等效电路。在图3中,例如,描述了连接到任何扫描线Sk的第kth行和数据线Dk的第kth列的像素Pk,所有晶体管都是p沟道型晶体管。FIG. 3 shows an equivalent circuit of one pixel 110 in the organic EL display of FIG. 2 . In FIG. 3, for example, a pixel Pk connected to the kth row of any scanning line Sk and the kth column of the data line Dk is described, and all transistors are p-channel type transistors.

如图3所示,根据本发明示例实施例的像素电路包括驱动晶体管M1、二极管晶体管M3、电容器晶体管M4、开关晶体管M5、三个有机EL元件OLEDr、OLEDg和OLEDb和用于控制三个有机EL元件OLEDr、OLEDg和OLEDb的发射的三个发射控制晶体管M2r、M2g和M2b以及两个电容器Cst和Cvth。发射控制线Ek由三根发射控制线Ekr、Ekg和Ekb组成。发射控制晶体管M2r、M2g和M2b分别响应通过发射控制线Ekr、Ekg和Ekb传输的发射控制信号,并且选择性地传输从驱动晶体管M1传输来的电流给有机EL元件OLEDr、OLEDg和OLEDb。As shown in FIG. 3, a pixel circuit according to an exemplary embodiment of the present invention includes a driving transistor M1, a diode transistor M3, a capacitor transistor M4, a switching transistor M5, three organic EL elements OLEDr, OLEDg, and OLEDb, and a device for controlling three organic EL elements. Three emission controlling transistors M2r, M2g and M2b and two capacitors Cst and Cvth for the emission of the elements OLEDr, OLEDg and OLEDb. The launch control line Ek is composed of three launch control lines Ekr, Ekg and Ekb. The emission control transistors M2r, M2g, and M2b respond to emission control signals transmitted through the emission control lines Ekr, Ekg, and Ekb, respectively, and selectively transmit current transmitted from the driving transistor M1 to the organic EL elements OLEDr, OLEDg, and OLEDb.

具体而言,其栅极连接到当前扫描线Sk而源极连接到数据线Dk的晶体管M5,响应从扫描线Sk传输来的选择信号,并且传输从数据线Dk施加的数据电压给电容器Cvth的第一电极或者节点B。晶体管M4响应从之前扫描线Sk-1传输来的选择信号,并且将电容器Cvth的节点B连接到电源VDD。晶体管M3连接在电容器Cvth的第二电极或者节点A与晶体管M1的漏极之间。晶体管M3响应于之前扫描线Sk-1传输的选择信号而导通,使得晶体管M1二极管连接。用于驱动有机EL元件OLED(例如OLEDr、OLEDg和/或OLEDb)的驱动晶体管M1的栅极连接到电容器Cvth的节点A,其源极连接到电源VDD。驱动晶体管M1根据施加给栅极的电压控制施加给有机EL元件的OLED的电流。Specifically, the transistor M5 whose gate is connected to the current scan line Sk and whose source is connected to the data line Dk responds to the selection signal transmitted from the scan line Sk, and transmits the data voltage applied from the data line Dk to the capacitor Cvth. The first electrode or node B. The transistor M4 responds to the selection signal transmitted from the previous scan line Sk-1, and connects the node B of the capacitor Cvth to the power supply VDD. The transistor M3 is connected between the second electrode or node A of the capacitor Cvth and the drain of the transistor M1. The transistor M3 is turned on in response to the selection signal transmitted by the previous scan line Sk-1, so that the transistor M1 is diode-connected. The gate of the drive transistor M1 for driving the organic EL element OLED (eg, OLEDr, OLEDg, and/or OLEDb) is connected to node A of the capacitor Cvth, and the source thereof is connected to the power supply VDD. The driving transistor M1 controls the current applied to the OLED of the organic EL element according to the voltage applied to the gate.

而且,电容器Cst的第一电极连接到电源VDD,电容器Cst的第二电极在节点B或者节点B附近连接到晶体管M4的漏极,并且电容器Cvth的第一电极连接到电容器Cst的第二电极,使得两个电容器串联,而且电容器Cvth的第二电极在节点A或者节点A附近连接到驱动晶体管M1的栅极。Also, the first electrode of the capacitor Cst is connected to the power supply VDD, the second electrode of the capacitor Cst is connected to the drain of the transistor M4 at or near the node B, and the first electrode of the capacitor Cvth is connected to the second electrode of the capacitor Cst, Two capacitors are connected in series, and the second electrode of the capacitor Cvth is connected to the gate of the driving transistor M1 at or near the node A.

驱动晶体管M1的漏极连接到发射控制晶体管M2r、M2g和M2b的源极,晶体管M2r、M2g和M2b的栅极分别连接到发射控制线Ekr、Ekg和Ekb。发射控制晶体管M2r、M2g和M2b的漏极分别连接到有机EL元件OLEDr、OLEDg和OLEDb的阳极。将具有低于电源VDD的电压电平的电源VSS施加给有机EL元件OLEDr、OLEDg和OLEDb的阴极。负电压或者接地电压可以用于电源VSSThe drain of the driving transistor M1 is connected to the sources of the emission control transistors M2r, M2g and M2b, and the gates of the transistors M2r, M2g and M2b are connected to the emission control lines Ekr, Ekg and Ekb, respectively. Drains of the emission control transistors M2r, M2g, and M2b are connected to anodes of the organic EL elements OLEDr, OLEDg, and OLEDb, respectively. A power source V SS having a lower voltage level than the power source V DD is applied to the cathodes of the organic EL elements OLEDr, OLEDg, and OLEDb. A negative voltage or a ground voltage can be used for the power supply V SS .

当低电平扫描电压施加给之前扫描线Sk-1时,晶体管M3和M4导通。当晶体管M3导通时,晶体管M1变为二极管连接状态。因此,晶体管M1的栅极和源极之间的电压差改变,直到该电压差变为晶体管M1的阈值电压Vth。这时,由于晶体管M1的源极连接到电源VDD,电源电压VDD和阈值电压Vth的总和施加给晶体管M1的栅极,即,在电容器Cvth的节点A处或者其附近。而且,当晶体管M4导通而且电源电压VDD施加给节点B时,电容器Cvth所充的电压VCvth可以按照以下等式2进行计算。When the low-level scan voltage is applied to the previous scan line Sk-1, the transistors M3 and M4 are turned on. When the transistor M3 is turned on, the transistor M1 becomes a diode-connected state. Therefore, the voltage difference between the gate and the source of the transistor M1 changes until the voltage difference becomes the threshold voltage Vth of the transistor M1. At this time, since the source of the transistor M1 is connected to the power supply VDD , the sum of the power supply voltage VDD and the threshold voltage Vth is applied to the gate of the transistor M1, ie, at or near the node A of the capacitor Cvth. Also, when the transistor M4 is turned on and the power supply voltage VDD is applied to the node B, the voltage V Cvth charged by the capacitor Cvth can be calculated according to Equation 2 below.

【等式2】[Equation 2]

VCvth=VCvthA-VCvthB=(VDD+Vth)-VDD=Vth VCvth = VCvthA - VCvthB = (VDD+Vth) - VDD = Vth

这里,VCvth是指电容器Cvth所充的电压,VCvthA是指施加给电容器Cvth的节点A的电压,VCvthB是指施加给电容器Cvth的节点B的电压。Here, VCvth refers to the voltage charged to the capacitor Cvth, VCvthA refers to the voltage applied to the node A of the capacitor Cvth, and VCvthB refers to the voltage applied to the node B of the capacitor Cvth.

当低电平扫描电压施加给当前扫描线Sk时,晶体管M5导通,数据电压Vdata施加给节点B。而且,由于充电对应于晶体管M1的阈值电压Vth的电压给电容器Cvth,所以给晶体管M1的栅极施加与数据电压Vdata和阈值电压Vth的总和对应的电压。也就是说,晶体管M1的栅极和源极之间的电压Vgs可以按照以下等式3进行计算。这里,高电平信号施加给发射控制线Ek(例如Ekr、Ekg和/或Ekb),而且将晶体管M2(例如M2r、M2g和/或M2b)切断以阻断电流。When the low-level scan voltage is applied to the current scan line Sk, the transistor M5 is turned on, and the data voltage Vdata is applied to the node B. Also, since the capacitor Cvth is charged with a voltage corresponding to the threshold voltage Vth of the transistor M1, a voltage corresponding to the sum of the data voltage Vdata and the threshold voltage Vth is applied to the gate of the transistor M1. That is, the voltage Vgs between the gate and source of the transistor M1 can be calculated according to Equation 3 below. Here, a high-level signal is applied to the emission control line Ek (eg, Ekr, Ekg, and/or Ekb), and the transistor M2 (eg, M2r, M2g, and/or M2b ) is turned off to block current.

【等式3】[Equation 3]

Vgs=(Vdata+Vth)-VDDVgs=(Vdata+Vth)-VDD

然后,响应来自发射控制线Ek的低电平信号将晶体管M2导通。因此,对应于晶体管M1的栅源极电压Vgs的电流IOLED通过晶体管M2施加给有机EL元件,而且发射有机EL元件OLED(例如OLEDr、OLEDg和/或OLEDb)。该电流IOLED可以按照以下等式4进行计算。Then, the transistor M2 is turned on in response to a low-level signal from the emission control line Ek. Accordingly, a current I OLED corresponding to the gate-source voltage Vgs of the transistor M1 is applied to the organic EL element through the transistor M2, and the organic EL element OLED (for example, OLEDr, OLEDg, and/or OLEDb) is emitted. The current I OLED can be calculated according to Equation 4 below.

【等式4】[Equation 4]

II OLEDOLED == ββ 22 (( VgsVgs -- VthVth )) 22 == ββ 22 (( (( VdataVdata ++ VthVth -- VDDVDD )) -- VthVth )) 22 == ββ 22 (( VDDVDD -- VdataVdata )) 22

这里,IOLED表示流进有机EL元件OLED的电流,VGS表示晶体管M1的源极和栅极之间的电压,Vth表示晶体管M1的阈值电压,Vdata表示数据电压,β表示常数。Here, IOLED denotes a current flowing into the organic EL element OLED, VGS denotes a voltage between the source and gate of the transistor M1, Vth denotes a threshold voltage of the transistor M1, Vdata denotes a data voltage, and β denotes a constant.

当数据电压Vdata是红数据信号而且发射控制晶体管M2r响应从发射控制线Ekr传输来的低电平发射控制信号而导通时,电流IOLED传输给红有机EL元件OLEDr而且发射红光发生。When the data voltage Vdata is a red data signal and the emission control transistor M2r is turned on in response to the low-level emission control signal transmitted from the emission control line Ekr, the current IOLED is transmitted to the red organic EL element OLEDr and red light emission occurs.

同样,当数据电压Vdata是绿数据信号而且发射控制晶体管M2g响应从发射控制线Ekg传输的低电平发射控制信号而导通时,电流IOLED传输给绿有机EL元件OLEDg而且发射绿光发生。此外,当数据电压Vdata是蓝数据信号而且发射控制晶体管M2b响应从发射控制线Ekb传输的低电平发射控制信号而导通时,电流IOLED传输给蓝有机EL元件OLEDb而且发射蓝光发生。分别施加给三种发射控制线的三种发射控制信号具有在一个场内彼此不重叠低电平周期,其,因此一个像素可以显示红、绿和蓝色。Also, when the data voltage Vdata is a green data signal and the emission control transistor M2g is turned on in response to the low-level emission control signal transmitted from the emission control line Ekg, the current IOLED is transmitted to the green organic EL element OLEDg and green light emission occurs. Also, when the data voltage Vdata is a blue data signal and the emission control transistor M2b is turned on in response to the low-level emission control signal transmitted from the emission control line Ekb, the current IOLED is transmitted to the blue organic EL element OLEDb and blue light emission occurs. The three emission control signals respectively applied to the three emission control lines have low-level periods that do not overlap with each other within one field, so one pixel can display red, green, and blue.

然后,在根据本发明第一示例实施例的有机EL显示器中,参考图4、图5和图6详细说明了在设置有像素电路的像素区内的排布结构。这里,给当前像素Pk的元件分配附图标记,而且给之前像素Pk-1的元件分配相同的附图标记,除了在附图标记上添加撇号(“′”)。撇号(“′”)用于将当前像素的元件与之前像素的元件进行区分。Then, in the organic EL display according to the first exemplary embodiment of the present invention, the arrangement structure in the pixel region where the pixel circuit is provided is described in detail with reference to FIGS. 4 , 5 and 6 . Here, elements of the current pixel Pk are assigned reference numerals, and elements of the previous pixel Pk-1 are assigned the same reference numerals except for adding an apostrophe ("'") to the reference numerals. A prime ("'") is used to distinguish elements of the current pixel from elements of the previous pixel.

图4是根据本发明第一示例实施例,其中设置了图3所示的像素电路的像素区的布置图。图5是图4中沿着I-I′的横截面图。图6是图4中沿着II-II′的横截面图。FIG. 4 is a layout diagram of a pixel region in which the pixel circuit shown in FIG. 3 is provided according to a first exemplary embodiment of the present invention. Fig. 5 is a cross-sectional view along I-I' in Fig. 4 . Fig. 6 is a cross-sectional view along II-II' in Fig. 4 .

首先,如图4、图5和图6所示,在绝缘基板1上形成切断(cut off)层3。切断层3由例如氧化硅或类似的材料组成。多晶硅层21、22、23、24、25、26、27、28和29,是在切断层3上形成的半导体层。First, as shown in FIGS. 4 , 5 and 6 , a cut-off layer 3 is formed on an insulating substrate 1 . The cut-off layer 3 is composed of, for example, silicon oxide or the like. The polysilicon layers 21 , 22 , 23 , 24 , 25 , 26 , 27 , 28 , and 29 are semiconductor layers formed on the cutting layer 3 .

多晶硅层21形成包括在当前像素Pk中晶体管M5的源区、漏区和沟道区的半导体层,该多晶硅层21的形状类似于字母“U”。多晶硅层22形成包括在当前像素Pk中晶体管M2r的源区、漏区和沟道区的半导体层,该多晶硅层22的形状类似于形状

Figure C20051007415900121
。多晶硅层23形成包括在当前像素Pk中晶体管M2g的源区、漏区和沟道区的半导体层,在列方向上设置该多晶硅层23。多晶硅层24形成包括在当前像素Pk中晶体管M2b的源区、漏区和沟道区的半导体层,该多晶硅层24的形状类似于形状
Figure C20051007415900122
。连接多晶硅层22、23和24以形成字母‘m’的形状。多晶硅层22位于多晶硅层23的左侧,多晶硅层24位于多晶硅层23的右侧。多晶硅层22通常与多晶硅层24关于多晶硅层23对称。The polysilicon layer 21 forms a semiconductor layer including a source region, a drain region and a channel region of the transistor M5 in the current pixel Pk, and the polysilicon layer 21 is shaped like a letter "U". The polysilicon layer 22 forms a semiconductor layer including a source region, a drain region and a channel region of the transistor M2r in the current pixel Pk, and the shape of the polysilicon layer 22 is similar to that of
Figure C20051007415900121
. The polysilicon layer 23 forms a semiconductor layer including a source region, a drain region, and a channel region of the transistor M2g in the current pixel Pk, and is arranged in the column direction. The polysilicon layer 24 forms a semiconductor layer including a source region, a drain region and a channel region of the transistor M2b in the current pixel Pk, and the shape of the polysilicon layer 24 is similar to that of
Figure C20051007415900122
. The polysilicon layers 22, 23 and 24 are connected to form the shape of the letter 'm'. The polysilicon layer 22 is located on the left side of the polysilicon layer 23 , and the polysilicon layer 24 is located on the right side of the polysilicon layer 23 . Polysilicon layer 22 is generally symmetrical with polysilicon layer 24 about polysilicon layer 23 .

多晶硅层25位于像素区中间或者中间附近,而且在列的方向上设置,而且多晶硅层25的底端连接到多晶硅层22、23和24。多晶硅层26位于多晶硅层25的左侧,多晶硅层27位于多晶硅层25的右侧。多晶硅层26通常与多晶硅层27关于多晶硅层25对称。多晶硅层26通常为正方形,而且形成电容器Cvth的第二电极(节点A),通常为矩形的多晶硅层27形成电容器Cst的第一电极。多晶硅层28为字母‘n’形,而且多晶硅层28的一端连接到多晶硅层26,多晶硅层28的另一端连接到多晶硅层25,而且形成晶体管M3的源、漏和沟道区。多晶硅层29为字母‘n’形,而且多晶硅层29的一端连接到多晶硅层28,而且形成晶体管M1的沟道区和漏区以及晶体管M4的源区、沟道区和漏区。The polysilicon layer 25 is located at or near the center of the pixel area and is arranged in the column direction, and the bottom end of the polysilicon layer 25 is connected to the polysilicon layers 22 , 23 and 24 . The polysilicon layer 26 is located on the left side of the polysilicon layer 25 , and the polysilicon layer 27 is located on the right side of the polysilicon layer 25 . Polysilicon layer 26 is generally symmetrical with polysilicon layer 27 about polysilicon layer 25 . Polysilicon layer 26 is generally square and forms the second electrode (node A) of capacitor Cvth, and generally rectangular polysilicon layer 27 forms the first electrode of capacitor Cst. The polysilicon layer 28 is letter 'n' shape, and one end of the polysilicon layer 28 is connected to the polysilicon layer 26, and the other end of the polysilicon layer 28 is connected to the polysilicon layer 25, and forms the source, drain and channel regions of the transistor M3. Polysilicon layer 29 is letter 'n' shape, and one end of polysilicon layer 29 is connected to polysilicon layer 28, and forms channel region and drain region of transistor M1 and source region, channel region and drain region of transistor M4.

栅绝缘膜30形成在多晶硅层21到19上。Gate insulating film 30 is formed on polysilicon layers 21 to 19 .

栅极41、42、43、44、45、46和47形成在栅绝缘膜30上。具体而言,栅极线41设置在行方向上,而且对应于当前像素Pk的当前扫描线Sk,而且栅极线41绝缘并且与多晶硅层21交叉,以形成当前像素Pk中的晶体管M5的栅极。栅极线42设置在行方向上,而且对应于当前像素Pk中的发射控制线Ekb,以形成晶体管M2b的栅极。栅极线43设置在行方向上,而且对应于当前像素Pk的发射控制线Ekg,以形成晶体管M2g的栅极。栅极线44设置在行方向上,而且对应于当前像素Pk的发射控制线Ekr,以形成晶体管M2r的栅极。栅极线45绝缘并且与多晶硅层26交叉,以形成晶体管M1的栅极。通常为正方形的栅极46设置在多晶硅层26上以形成电容器Cvth的第一电极(节点B)。通常为矩形的栅极47设置在多晶硅层27上以形成电容器Cst的第二电极(节点B)。Gate electrodes 41 , 42 , 43 , 44 , 45 , 46 , and 47 are formed on gate insulating film 30 . Specifically, the gate line 41 is arranged in the row direction and corresponds to the current scan line Sk of the current pixel Pk, and the gate line 41 is insulated and crosses the polysilicon layer 21 to form the gate of the transistor M5 in the current pixel Pk. . The gate line 42 is arranged in the row direction and corresponds to the emission control line Ekb in the current pixel Pk to form the gate of the transistor M2b. The gate line 43 is arranged in the row direction and corresponds to the emission control line Ekg of the current pixel Pk to form the gate of the transistor M2g. The gate line 44 is arranged in the row direction and corresponds to the emission control line Ekr of the current pixel Pk to form the gate of the transistor M2r. The gate line 45 is insulated and crosses the polysilicon layer 26 to form the gate of the transistor M1. A generally square gate 46 is disposed on polysilicon layer 26 to form a first electrode (node B) of capacitor Cvth. A generally rectangular gate 47 is disposed on polysilicon layer 27 to form a second electrode (node B) of capacitor Cst.

栅极线41′设置在行方向上,其对应之前像素Pk-1的之前扫描线Sk-1,而且绝缘并与多晶硅层21′交叉,以形成之前像素Pk-1的晶体管M5的栅极。此外,栅极线41′绝缘并与多晶硅层28和29交叉,以形成当前像素Pk的晶体管M3和M4的栅极。The gate line 41' is arranged in the row direction, which corresponds to the previous scan line Sk-1 of the previous pixel Pk-1, and is insulated and crosses the polysilicon layer 21' to form the gate of the transistor M5 of the previous pixel Pk-1. In addition, the gate line 41' is insulated and crosses the polysilicon layers 28 and 29 to form the gates of the transistors M3 and M4 of the current pixel Pk.

层绝缘膜50形成在栅极41、42、43、44、45、46和47上。数据线61、电源线62和电极63、64、65、66r、66g和66b形成在层绝缘膜50上,使得数据线61、电源线62和电极63、64、65、66r、66g和66b通过接触孔51a、51b、53、54a、54b、55、56a、56b、57r、57g和57b与对应的电极接触。A layer insulating film 50 is formed on the gate electrodes 41 , 42 , 43 , 44 , 45 , 46 and 47 . The data line 61, the power line 62, and the electrodes 63, 64, 65, 66r, 66g, and 66b are formed on the layer insulating film 50 so that the data line 61, the power line 62, and the electrodes 63, 64, 65, 66r, 66g, and 66b pass through The contact holes 51a, 51b, 53, 54a, 54b, 55, 56a, 56b, 57r, 57g, and 57b are in contact with corresponding electrodes.

数据线61在列方向上设置在两个像素区之间,而且通过接触孔51a连接到多晶硅层21,使得数据线61连接到晶体管M5的源极。接触孔51a穿过层绝缘膜50和栅绝缘膜30。The data line 61 is disposed between two pixel regions in the column direction, and is connected to the polysilicon layer 21 through the contact hole 51a, so that the data line 61 is connected to the source of the transistor M5. The contact hole 51 a penetrates the layer insulating film 50 and the gate insulating film 30 .

电源线62设置在列方向上,而且通过接触孔55连接到多晶硅层27和29,使得电源线62给电容器Cst的第一电极和晶体管M1的源极供电。接触孔55穿过层绝缘膜50和栅绝缘膜30。The power supply line 62 is arranged in the column direction, and is connected to the polysilicon layers 27 and 29 through the contact hole 55, so that the power supply line 62 supplies power to the first electrode of the capacitor Cst and the source of the transistor M1. The contact hole 55 penetrates the layer insulating film 50 and the gate insulating film 30 .

电极63靠近数据线61,与数据线61基本上平行,而且将多晶硅层21的漏区通过贯穿层绝缘膜50和栅绝缘膜30的接触孔51b、以及穿过层绝缘膜50的接触孔53,连接到栅极46。电极63变为节点B。The electrode 63 is close to the data line 61, is substantially parallel to the data line 61, and passes the drain region of the polysilicon layer 21 through the contact hole 51b of the layer insulating film 50 and the gate insulating film 30, and the contact hole 53 of the layer insulating film 50. , connected to gate 46. Electrode 63 becomes node B.

电极64靠近栅极41′,与栅极41′基本上平行,而且将漏区通过贯穿层绝缘膜50和栅绝缘膜30的接触孔54a和贯穿层绝缘膜50的接触孔54b连接到在多晶硅层28中的晶体管M3的栅极45。电极64变为节点A。The electrode 64 is close to the gate 41', is substantially parallel to the gate 41', and connects the drain region to the polysilicon through the contact hole 54a penetrating the insulating film 50 and the gate insulating film 30 and the contact hole 54b penetrating the insulating film 50. Gate 45 of transistor M3 in layer 28 . Electrode 64 becomes node A.

基本上为矩形的电极65靠近栅极41′,而且将漏区通过贯穿层绝缘膜50和栅绝缘膜30的接触孔56a和贯穿层绝缘膜50的接触孔56b连接到在多晶硅层29中晶体管M4的栅极47。电极65变为节点B。The substantially rectangular electrode 65 is close to the gate 41', and the drain region is connected to the transistor in the polysilicon layer 29 through the contact hole 56a penetrating the layer insulating film 50 and the gate insulating film 30 and the contact hole 56b penetrating the layer insulating film 50. Gate 47 of M4. Electrode 65 becomes node B.

电极66r、66g和66b分别将每个发射元件的像素电极81r、81g和81b连接到晶体管M2r、M2g和M2b的漏极。在电极66r、66g和66b中,每个都基本上为矩形,它们的行方向比它们的列方向更长。这里,数据线62设置在列方向上,而且栅极42到44设置在行方向上。电极66r、66g和66b通过贯穿栅绝缘膜30和层绝缘膜50的接触孔57r、57g和57b分别连接到多晶硅层22、23和24,而且连接到晶体管M2r、M2g和M2b的漏极。Electrodes 66r, 66g and 66b connect the pixel electrodes 81r, 81g and 81b of each emissive element to the drains of transistors M2r, M2g and M2b, respectively. Of the electrodes 66r, 66g, and 66b, each is substantially rectangular, and their row direction is longer than their column direction. Here, the data lines 62 are arranged in the column direction, and the gate electrodes 42 to 44 are arranged in the row direction. Electrodes 66r, 66g, and 66b are connected to polysilicon layers 22, 23, and 24 through contact holes 57r, 57g, and 57b penetrating gate insulating film 30 and layer insulating film 50, respectively, and to drains of transistors M2r, M2g, and M2b.

平整(flatting)膜70形成在电极63、64、65、66r、66g和66b上。像素电极81r、81g和81b分别通过接触孔71r、71g和71b连接到电极66r、66g和66b。在图5和图6中,在像素电极81r、81g和81b上形成包括发射层(EML)、电子传输层(ETL)和空穴传输层(HTL)的红、绿和蓝有机膜85r、85g和85b的多层。A flatting film 70 is formed on the electrodes 63, 64, 65, 66r, 66g, and 66b. The pixel electrodes 81r, 81g, and 81b are connected to the electrodes 66r, 66g, and 66b through the contact holes 71r, 71g, and 71b, respectively. In FIGS. 5 and 6, red, green, and blue organic films 85r, 85g including an emission layer (EML), an electron transport layer (ETL) and a hole transport layer (HTL) are formed on the pixel electrodes 81r, 81g, and 81b. and 85b's multilayer.

这样,形成发射控制晶体管的多晶硅层22、23和24彼此连接。多晶硅层23形成位于三个有机EL元件中间的有机EL元件的发射控制晶体管M2g。多晶硅层22形成位于三个有机EL元件左侧的有机EL元件的发射控制晶体管M2r。多晶硅层24形成位于三个有机EL元件右侧的有机EL元件的发射控制晶体管M2b。多晶硅层22通常设置成与多晶硅层24关于多晶硅层23对称。因此,包括驱动晶体管M1和n沟道发射控制晶体管M2r、M2g和M2b的元件可以高效地设置在像素区,同时多晶硅层的内阻基本上保持不变。Thus, the polysilicon layers 22, 23 and 24 forming the emission control transistors are connected to each other. The polysilicon layer 23 forms the emission control transistor M2g of the organic EL element located in the middle of the three organic EL elements. The polysilicon layer 22 forms the emission control transistor M2r of the organic EL element located on the left side of the three organic EL elements. The polysilicon layer 24 forms the emission control transistor M2b of the organic EL element located on the right side of the three organic EL elements. Polysilicon layer 22 is generally disposed symmetrically with polysilicon layer 24 about polysilicon layer 23 . Therefore, elements including the driving transistor M1 and the n-channel emission control transistors M2r, M2g, and M2b can be efficiently disposed in the pixel region while the internal resistance of the polysilicon layer remains substantially unchanged.

下面,将参考图7详细说明根据本发明第二示例实施例像素区的排布结构。Next, an arrangement structure of a pixel region according to a second exemplary embodiment of the present invention will be described in detail with reference to FIG. 7 .

本发明的第二示例实施例与第一示例实施例的不同之处在于分别用于形成发射控制晶体管M2r、M2g和M2b的每个多晶硅层122、123和124具有基本上恒定的长宽比,因此发射控制晶体管M2r、M2g和M2b具有类似或者基本上相同的内阻。此后,将说明图7的第二示例实施例与图4的第一示例实施例的相应元件不同的元件。The second exemplary embodiment of the present invention differs from the first exemplary embodiment in that each of the polysilicon layers 122, 123, and 124 for respectively forming the emission control transistors M2r, M2g, and M2b has a substantially constant aspect ratio, Therefore emission control transistors M2r, M2g and M2b have similar or substantially the same internal resistance. Hereinafter, elements of the second exemplary embodiment of FIG. 7 that differ from corresponding elements of the first exemplary embodiment of FIG. 4 will be described.

如图7所示,多晶硅层122的长度是Lr,宽度是Wr,多晶硅层123的长度是Lg,宽度是Wg,多晶硅层124的长度是Lb,宽度是Wb。As shown in FIG. 7 , the polysilicon layer 122 has a length Lr and a width Wr, the polysilicon layer 123 has a length Lg and a width Wg, and the polysilicon layer 124 has a length Lb and a width Wb.

通常,可以按照下面的等式5计算多晶硅层的内阻。In general, the internal resistance of the polysilicon layer can be calculated according to Equation 5 below.

【等式5】[Equation 5]

RR == RR SS ×× LL WW

这里,R是多晶硅层的内阻,L是多晶硅层的长度,也就是说源区、沟道区和漏区的总长度,W是多晶硅在与测量长度的方向基本上垂直的方向上的宽度。此外,RS是平面电阻,其是具有单位宽度W和单位长度L的多晶硅层的电阻。作为例子,平面电阻可以具有5Ω/平面的值。Here, R is the internal resistance of the polysilicon layer, L is the length of the polysilicon layer, that is to say the total length of the source region, channel region and drain region, and W is the width of the polysilicon in a direction substantially perpendicular to the direction in which the length is measured . In addition, R S is a planar resistance, which is the resistance of a polysilicon layer having a unit width W and a unit length L. As an example, the plane resistance may have a value of 5Ω/plane.

在这种情况下,每个多晶硅层122、123和124的各个内阻决定于各个Lr/Wr、Lg/Wg和Lb/Wb。因此,多晶硅层122、123和124具有如下面的等式6给出的关系,因此每个多晶硅层122、123和124的内阻R具有相似或者基本上相同的值。In this case, the respective internal resistances of each of the polysilicon layers 122, 123 and 124 are determined by respective Lr/Wr, Lg/Wg and Lb/Wb. Accordingly, the polysilicon layers 122, 123, and 124 have a relationship as given in Equation 6 below, and thus the internal resistance R of each of the polysilicon layers 122, 123, and 124 has a similar or substantially the same value.

【等式6】[Equation 6]

LrLr WrWr == LgLG Wgw == LbLb Wbwb

这样,通过使用具有长宽比基本上相同的多晶硅层122、123和124使得发射控制晶体管M2r、M2g和M2b的特性可以基本上保持恒定。In this way, the characteristics of the emission control transistors M2r, M2g, and M2b can be kept substantially constant by using the polysilicon layers 122, 123, and 124 having substantially the same aspect ratio.

这样,通过使用具有长宽比基本上相同的多晶硅层122、123和124使得发射控制晶体管M2r、M2g和M2b的特性可以设置成基本上相同,因此通过发射控制晶体管M2r、M2g和M2b传输的电流IOLED可以基本上保持恒定。Thus, by using the polysilicon layers 122, 123, and 124 having substantially the same aspect ratio so that the characteristics of the emission control transistors M2r, M2g, and M2b can be set to be substantially the same, the currents transmitted through the emission control transistors M2r, M2g, and M2b I OLED can be kept substantially constant.

根据本发明的示例实施例,当一个像素区包括三个有机EL元件,而且每个发射控制晶体管连接在驱动晶体管的源极和对应的有机EL元件之间时,形成发射控制晶体管的多晶硅层可以连接为一体。而且,当形成位于三个有机EL元件中间的有机EL元件的发射控制晶体管的多晶硅层位于中间时,位于三个有机EL元件左侧的多晶硅层通常与位于三个有机EL元件右侧的多晶硅层关于位于中间的多晶硅层对称。此外,通过使用具有长宽比基本上相同的多晶硅层使得发射控制晶体管可以具有基本上相同的特性。According to an exemplary embodiment of the present invention, when one pixel region includes three organic EL elements, and each emission control transistor is connected between the source of the driving transistor and the corresponding organic EL element, the polysilicon layer forming the emission control transistor may be Connect as one. Also, when the polysilicon layer forming the emission control transistor of the organic EL element located in the middle of the three organic EL elements is located in the middle, the polysilicon layer located on the left side of the three organic EL elements is usually separated from the polysilicon layer located on the right side of the three organic EL elements. Symmetrical about the polysilicon layer located in the middle. In addition, the emission control transistors can have substantially the same characteristics by using polysilicon layers having substantially the same aspect ratio.

这样,更加有效地在小像素区上设置每个元件,而形成发射控制晶体管的多晶硅层的内阻基本上保持不变。此外,发射控制晶体管具有基本上相同的电流传输特性,因此从驱动晶体管输出的电流可以基本上稳定地传输到对应的发射元件。In this way, each element is more efficiently disposed on a small pixel area, while the internal resistance of the polysilicon layer forming the emission control transistor remains substantially unchanged. In addition, the emission control transistors have substantially the same current transfer characteristics, so the current output from the driving transistors can be substantially stably transferred to the corresponding emission elements.

尽管结合特定的示例实施例说明了本发明,但是本领域技术人员应当理解本发明不局限于公开的实施例,相反,本发明将覆盖包含在附加的权利要求要旨和范围内的各种修改和等效设置。Although the invention has been described in connection with specific exemplary embodiments, it will be understood by those skilled in the art that the invention is not limited to the disclosed embodiments, but that the invention is to cover various modifications and modifications included within the spirit and scope of the appended claims. Equivalent setting.

Claims (10)

1, a kind of display device comprises being used to transmit many sweep traces selecting signal, being used for many data lines of transmission of data signals and being connected to a plurality of image element circuits of this sweep trace and data line, wherein
At least one image element circuit comprises:
Capacitor is used to charge and the corresponding voltage of data-signal that comes from corresponding data lines transmission;
Driving transistors is used for exporting the electric current of the voltage that fills corresponding to capacitor;
A plurality of radiated elements are used for the galvanoluminescence corresponding to driving transistors output; With
Be connected a plurality of emission control transistors between this driving transistors and this a plurality of radiated elements,
Wherein these a plurality of emission control transistors comprise that each all has a plurality of semiconductor layers of substantially the same each other internal resistance.
2, the display device of claim 1, wherein the length breadth ratio of each semiconductor layer is substantially the same.
3, the display device of claim 2, the electric current of two the radiated element response driving transistorss output in wherein a plurality of radiated elements, a kind of light in red-emitting, green glow and the blue light respectively.
4, the display device of claim 3, wherein the length of a transistorized semiconductor layer of emission control of each formation correspondence comprises the corresponding transistorized source region of emission control length, channel region length and a drain region length.
5, the display device of claim 4, wherein with the vertical substantially direction of the direction of measuring semiconductor layer length on measure the width that each forms a corresponding transistorized semiconductor layer of emission control.
6, the display device of claim 2, at least two semiconductor layers in wherein a plurality of semiconductor layers are substantially parallel to each other.
7, a kind of display device comprises being used to transmit many sweep traces selecting signal, being used for many data lines of transmission of data signals and being connected to a plurality of image element circuits of this sweep trace and data line, wherein
At least one image element circuit that is arranged in the pixel region comprises:
First, second and the 3rd radiated element, they all comprise the pixel electrode that is applied in electric current, are used for corresponding to the galvanoluminescence that is applied; With
First, second and the 3rd semiconductor layer, they are connected to the pixel electrode of first, second and the 3rd radiated element respectively by first, second and the 3rd contact hole; With
First, second and the 3rd control electrode line, they are insulated and intersect with first, second and the 3rd semiconductor layer, and substantially parallel each other,
Wherein the length breadth ratio of first semiconductor layer, second semiconductor layer and the 3rd semiconductor layer is substantially the same each other.
8, the display device of claim 7, wherein this first semiconductor layer forms the first emission control transistor with the insulated trenches district that intersects with the first control electrode line;
This second semiconductor layer forms the second emission control transistor with the insulated trenches district that intersects with the second control electrode line; With
The 3rd semiconductor layer forms the 3rd emission control transistor with the insulated trenches district that intersects with the 3rd control electrode line.
9, the display device of claim 8, wherein each first, second and the length of the 3rd semiconductor layer comprise source region length, channel region length and the drain region length of one of corresponding first, second and the 3rd emission control transistor.
10, the display device of claim 9, the wherein width of measurement each first, second and the 3rd semiconductor layer on the direction vertical substantially with measuring corresponding first, second and the direction of one of the 3rd semiconductor layer length.
CNB2005100741599A 2004-04-29 2005-04-29 display device Expired - Fee Related CN100433105C (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR29944/04 2004-04-29
KR29945/04 2004-04-29
KR1020040029944A KR100658615B1 (en) 2004-04-29 2004-04-29 Light emitting display panel and light emitting display device

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2008100049987A Division CN101221978B (en) 2004-04-29 2005-04-29 Display device

Publications (2)

Publication Number Publication Date
CN1694150A CN1694150A (en) 2005-11-09
CN100433105C true CN100433105C (en) 2008-11-12

Family

ID=35353092

Family Applications (2)

Application Number Title Priority Date Filing Date
CNB2005100741599A Expired - Fee Related CN100433105C (en) 2004-04-29 2005-04-29 display device
CN2008100049987A Expired - Fee Related CN101221978B (en) 2004-04-29 2005-04-29 Display device

Family Applications After (1)

Application Number Title Priority Date Filing Date
CN2008100049987A Expired - Fee Related CN101221978B (en) 2004-04-29 2005-04-29 Display device

Country Status (2)

Country Link
KR (1) KR100658615B1 (en)
CN (2) CN100433105C (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101970783B1 (en) 2012-05-07 2019-04-23 삼성디스플레이 주식회사 Semiconductor Device
KR102054849B1 (en) * 2013-06-03 2019-12-12 삼성디스플레이 주식회사 Organic Light Emitting Display Panel
KR102126535B1 (en) * 2013-11-01 2020-06-24 엘지디스플레이 주식회사 Organic Light Emitting Display Device
JP6083407B2 (en) * 2014-03-20 2017-02-22 コニカミノルタ株式会社 Optical writing apparatus and image forming apparatus
CN108288439B (en) 2017-01-10 2020-06-30 陈扬证 display device
FR3065117B1 (en) * 2017-04-05 2019-07-05 Commissariat A L'energie Atomique Et Aux Energies Alternatives IMAGE EMISSIF IMAGE DISPLAY DEVICE

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0762374A1 (en) * 1995-08-21 1997-03-12 Motorola, Inc. Active driven led matrices
US20010045944A1 (en) * 2000-03-31 2001-11-29 Ricoh Company, Ltd. Display device, image forming apparatus, recording medium and display method
US6421033B1 (en) * 1999-09-30 2002-07-16 Innovative Technology Licensing, Llc Current-driven emissive display addressing and fabrication scheme
US6618031B1 (en) * 1999-02-26 2003-09-09 Three-Five Systems, Inc. Method and apparatus for independent control of brightness and color balance in display and illumination systems
US20040070557A1 (en) * 2002-10-11 2004-04-15 Mitsuru Asano Active-matrix display device and method of driving the same

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6297070B1 (en) * 1996-12-20 2001-10-02 Eastman Kodak Company Active pixel sensor integrated with a pinned photodiode
US6950134B2 (en) * 2000-02-22 2005-09-27 Innotech Corporation Method of preventing transfer and storage of non-optically generated charges in solid state imaging device
JP4822590B2 (en) 2001-02-08 2011-11-24 三洋電機株式会社 Organic EL circuit
JP2002318395A (en) 2001-04-23 2002-10-31 Canon Inc Display device
JP2004109991A (en) 2002-08-30 2004-04-08 Sanyo Electric Co Ltd Display driving circuit
JP3949040B2 (en) 2002-09-25 2007-07-25 東北パイオニア株式会社 Driving device for light emitting display panel

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0762374A1 (en) * 1995-08-21 1997-03-12 Motorola, Inc. Active driven led matrices
US6618031B1 (en) * 1999-02-26 2003-09-09 Three-Five Systems, Inc. Method and apparatus for independent control of brightness and color balance in display and illumination systems
US6421033B1 (en) * 1999-09-30 2002-07-16 Innovative Technology Licensing, Llc Current-driven emissive display addressing and fabrication scheme
US20010045944A1 (en) * 2000-03-31 2001-11-29 Ricoh Company, Ltd. Display device, image forming apparatus, recording medium and display method
US20040070557A1 (en) * 2002-10-11 2004-04-15 Mitsuru Asano Active-matrix display device and method of driving the same

Also Published As

Publication number Publication date
CN1694150A (en) 2005-11-09
KR20050104603A (en) 2005-11-03
CN101221978B (en) 2010-06-09
KR100658615B1 (en) 2006-12-15
CN101221978A (en) 2008-07-16

Similar Documents

Publication Publication Date Title
EP1594118B1 (en) Pixel drive circuit for driving sub-pixels in OLED colour display in time multiplexing mode
KR100637433B1 (en) Light emitting display
CN100547638C (en) Light-emitting displays and light-emitting display panels
CN100369095C (en) Light emitting display, display panel and driving method thereof
KR100560450B1 (en) Light emitting display panel and light emitting display device
KR100560452B1 (en) Light emitting display panel and light emitting display device
KR100560449B1 (en) Light emitting display panel and light emitting display device
CN100433105C (en) display device
KR100570763B1 (en) Light emitting display panel and light emitting display device
KR100637432B1 (en) Light emitting display
KR100599606B1 (en) Light emitting display
KR100627267B1 (en) Light emitting display
KR100570762B1 (en) Light emitting display
KR100599791B1 (en) Light emitting display
KR100627266B1 (en) Light emitting display panel and light emitting display device
KR100560451B1 (en) Light emitting display

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20090109

Address after: Gyeonggi Do, South Korea

Patentee after: Samsung Mobile Display Co., Ltd.

Address before: Gyeonggi Do, South Korea

Patentee before: Samsung SDI Co., Ltd.

ASS Succession or assignment of patent right

Owner name: SAMSUNG MOBILE DISPLAY CO., LTD.

Free format text: FORMER OWNER: SAMSUNG SDI CO., LTD.

Effective date: 20090109

ASS Succession or assignment of patent right

Owner name: SAMSUNG MONITOR CO., LTD.

Free format text: FORMER OWNER: SAMSUNG MOBILE DISPLAY CO., LTD.

Effective date: 20121024

C41 Transfer of patent application or patent right or utility model
TR01 Transfer of patent right

Effective date of registration: 20121024

Address after: Gyeonggi Do, South Korea

Patentee after: Samsung Display Co., Ltd.

Address before: Gyeonggi Do, South Korea

Patentee before: Samsung Mobile Display Co., Ltd.

CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20081112

Termination date: 20170429

CF01 Termination of patent right due to non-payment of annual fee