CN100433253C - Exposure apparatus and device manufacturing method - Google Patents

Abstract

The exposure apparatus exposes the photosensitive substrate by projecting light through a predetermined pattern and through a liquid onto the photosensitive substrate. The exposure apparatus has a set of projection optical system for projection and a liquid supply mechanism for supplying liquid onto a photosensitive substrate to form a liquid immersion area on a portion of the photosensitive substrate. The liquid supply mechanism supplies liquid to the photosensitive substrate. The supplied liquid is simultaneously diffused toward the periphery of the projection area. The exposure apparatus can well maintain the liquid-immersed region by recovering the liquid, so that the liquid can be prevented from flowing to the outside of the immersed region and can be well exposed.

Description

Exposure apparatus and device manufacturing method

technical field

The present invention relates to an exposure device, an exposure method, and a device manufacturing method for exposing a pattern on a substrate in a state where a liquid immersion region is formed between a projection optical system and the substrate.

Background technique

Semiconductor devices and liquid crystal display devices are manufactured by a method called photolithography in which a pattern formed on a mask is transferred to a photosensitive substrate. The exposure apparatus used in this photolithography process has a mask stage that supports the mask and a substrate stage that supports the substrate, and moves the mask stage and the substrate stage sequentially while projecting the pattern of the mask through the projection optical system. Devices transferred onto substrates. In recent years, in order to cope with the further high integration of device patterns, further high resolution of the projection optical system is desired. The shorter the exposure wavelength used, or the larger the numerical aperture of the projection optical system, the higher the resolution of the projection optical system. Therefore, the exposure wavelength used in the exposure apparatus is becoming shorter every year, and the numerical aperture of the projection optical system is also increasing. However, the current mainstream exposure wavelength is 248nm of KrF excimer laser, and the shorter wavelength of 193nm of ArF excimer laser has also been put into practical use. In addition, depth of focus (DOF) is just as important as resolution when making an exposure. The resolution R and the depth of focus δ are represented by the following expressions, respectively.

R=k ₁ ·λ/NA (1)

δ=±k ₂ ·λ/NA ² (2)

Here, λ is the exposure wavelength, NA is the numerical aperture of the projection optical system, and k ₁ and k ₂ are process coefficients. It can be seen from the equations (1) and (2) that in order to improve the resolution R, if the exposure wavelength λ is shortened and the numerical aperture NA is increased, the depth of focus δ becomes narrow.

If the depth of focus δ is too narrow, it will be difficult to match the surface of the substrate with the image plane of the projection optical system, and there may be insufficient margin during the exposure operation. Therefore, as a method of actually shortening the exposure wavelength and expanding the depth of focus, for example, proposed The liquid immersion method disclosed in International Publication No. 99/49504. The method of this liquid immersion method is, the liquid such as water and organic solvent fills between the bottom of projection optical system and substrate surface and forms liquid immersion region, and the wavelength of the exposure beam utilizing in liquid is 1/n(n It is the refractive index of the liquid, generally around 1.2 to 1.6) This improves the resolution and expands the depth of focus by about n times.

However, the above-mentioned prior art has problems as described below. The above conventional technique is effective because it can form a liquid immersion region between the projection optical system and the substrate during scanning exposure while moving the substrate in a predetermined direction. The liquid is supplied in front of the projection area, and the liquid flows in one direction along the moving direction of the substrate from the front side of the projection area. However, such a structure may also be adopted that when the moving direction of the substrate is switched from the predetermined direction to the opposite direction, the position (nozzle) for supplying the liquid may be switched. However, it is clearly known that liquid vibration occurs between the projection optical system and the substrate (the so-called water hammer phenomenon), or vibration occurs between the liquid supply device itself (supply pipe and supply nozzle, etc.), causing the problem of deterioration of the pattern image. In addition, because the structure is such that the liquid flows from a single direction relative to the projected area, it is also There is a problem that a liquid immersion region cannot be sufficiently formed between the projection optical system and the substrate.

In addition, in the above-mentioned prior art, since the recovery section for recovering the liquid recovers the liquid only on the downstream side of the flowing liquid in the moving direction of the substrate, there is a problem that the liquid cannot be recovered sufficiently. If the liquid cannot be recovered sufficiently, the liquid will remain on the substrate, and exposure blur may occur due to the remaining liquid. In addition, if the liquid cannot be completely recovered, the remaining liquid will splash on the surrounding mechanical parts, causing abnormalities such as rusting. Furthermore, if the liquid remains or splashes, the change in the environment (humidity, etc.) where the substrate is placed will cause changes in the refractive index on the optical path of the detection light of the optical interferometer used in stage position measurement, etc. There is a possibility that desired pattern transfer accuracy may not be obtained.

In addition, when the liquid on the substrate is recovered by the liquid recovery nozzle, vibration may occur between the liquid recovery device itself (recovery pipe, recovery nozzle, etc.). If this vibration is transmitted to the projection optical system and the substrate stage, or optical components of an interferometer for measuring the position of the substrate stage, it may not be possible to form a circuit pattern on the substrate with high precision.

Contents of the invention

The present invention has been made in view of the above circumstances, and an object of the present invention is to provide a method for stably forming a liquid immersion region while performing an exposure process with a liquid immersion region formed between a projection optical system and a substrate and allowing good recovery. The liquid, an exposure apparatus, an exposure method, and a device manufacturing method capable of high-precision exposure processing such as preventing the liquid from flowing out or splashing to the periphery. In addition, an object of the present invention is to provide a device that can perform high-precision exposure processing without being affected by vibrations generated during liquid supply or recovery during exposure processing in a state where a liquid immersion region is formed between a projection optical system and a substrate. Exposure apparatus and device manufacturing method.

In order to solve the above-mentioned problems, the present invention employs the following configurations corresponding to FIGS. 1 to 21 shown in the embodiment. However, the symbols in parentheses attached to each element are merely examples of the element, and are not intended to limit each element.

According to the first aspect of the present invention, there is provided an exposure device (EX) for exposing a substrate by projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1), comprising:

A projection optical system (PL) for projecting an image of the above pattern on a substrate;

In order to form a liquid immersion area (AR2) on a part of the substrate (P) including the projection area (AR1) of the projection optical system (PL), multiple Liquid supply mechanisms (10, 11, 12, 13, 13A, 14, 14A) for simultaneously supplying liquid (1) to the substrate (P) at each position.

If the present invention is adopted, the liquid supply mechanism for forming the liquid immersion area is because it is spaced apart from the projection area in different directions (that is, on different sides of the projection area, for example, if it is rectangular The projection area is simultaneously supplied with liquid from at least two sides of the X side, -X side, +Y side, and -Y side), and a desired liquid immersion area can be formed between the projection optical system and the substrate. In addition, since liquid is simultaneously supplied to a plurality of positions spaced apart in a plurality of directions, a liquid immersion region can always be formed satisfactorily even when the moving direction of the substrate is changed during exposure processing while moving the substrate. If the liquid is supplied to both sides of the projection area at the same time, since there is no need to switch the supply position of the liquid, the occurrence of liquid vibration (water hammer) can be prevented, and the pattern image can be projected onto the substrate with high precision.

According to the second aspect of the present invention, an exposure device (EX) for exposing a substrate by projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1) is provided, including:

A projection optical system (PL) for projecting an image of the above pattern on a substrate;

A liquid supply mechanism (10, 11, 12, 13, 13A, 14, 14A);

The liquid recovery mechanism (20, 21, 22, 22A) simultaneously recovers the liquid (1) on the substrate (P) from a plurality of positions separated from the projection area (AR1) in different directions.

If the present invention is adopted, the liquid recovery mechanism for recovering the liquid can be obtained from a plurality of positions spaced apart from the projected area in different directions (that is, different sides of the projected area, for example, if rectangular In the projected area, the liquid is collected simultaneously from at least two sides of the X side, the -X side, the +Y side, and the -Y side), so that the liquid can be recovered reliably. Therefore, it is possible to prevent occurrence of a state where liquid remains on the substrate, occurrence of exposure blur and changes in the environment in which the substrate is placed, and to project a pattern image onto the substrate with high precision.

According to the third aspect of the present invention, an exposure device (EX) for exposing a substrate by projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1) is provided,

Including: a projection optical system (PL) for projecting an image of the above-mentioned pattern on the substrate;

A liquid supply mechanism (10, 11, 12, 13, 13A, 14, 14A);

A liquid recovery mechanism (20, 21, 22, 22A, 22D, 24) that simultaneously recovers the liquid (1) on the substrate (P) at multiple positions,

The liquid recovery mechanism (20, 21, 22, 22A, 22D, 24) recovers liquid with different recovery forces according to the liquid recovery position.

According to the present invention, the liquid recovery mechanism that recovers liquid simultaneously at a plurality of positions on the substrate recovers liquid with different recovery forces depending on the liquid recovery positions, so that the liquid recovery operation can be performed smoothly. Therefore, the space between the projection optical system and the substrate can be filled with an appropriate amount of liquid, and a liquid immersion region can be formed in a desired region on the substrate. For example, by setting the liquid recovery force on the front side (downstream side) to be greater than that on the rear side (upstream side) with respect to the moving (scanning) direction of the substrate, the liquid recovery operation can be performed smoothly. Alternatively, by making the liquid recovery force of the liquid recovery mechanism arranged at a position along the moving (scanning) direction of the substrate larger than that of the liquid recovery mechanism arranged at a position intersecting with the moving direction, smoothness can also be achieved. to carry out liquid recovery action.

According to the fourth aspect of the present invention, there is provided an exposure device (EX) for exposing a substrate by projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1), including:

A projection optical system (PL) for projecting an image of the above pattern on a substrate;

A liquid supply mechanism (10, 11, 12, 13, 13A, 14, 14A);

A liquid recovery mechanism (20, 21, 22, 22A) for recovering the liquid (1) on the substrate (P) at a recovery position separated from the projection area (AR1),

The projected area ( AR1 ) is arranged outside the liquid recovery position of the liquid recovery mechanism ( 20 , 21 , 22 , 22A), and a collecting member ( 30 ) forming a liquid collecting surface ( 31 ) to catch the liquid ( 1 ) is formed.

According to the present invention, on the outside of the liquid recovery position of the liquid recovery mechanism, by providing a collection member formed with a liquid collection surface of a predetermined length to catch the liquid, even if it is assumed that the liquid recovery mechanism cannot completely recover the liquid, by using the collection member Capturing the liquid can also prevent the occurrence of abnormalities such as the outflow and splash of the liquid to the surroundings. Therefore, it is possible to prevent changes in the environment in which the substrate is disposed, and to project a pattern image onto the substrate with desired pattern accuracy.

According to the fifth aspect of the present invention, an exposure device (EX) for exposing a substrate by projecting an image of a predetermined pattern onto the substrate (P) through the liquid (1) is provided:

Including: a projection optical system (PL) for projecting the image of the above pattern onto the substrate;

A liquid supply mechanism (10, 11, 12, 13, 13A, 14, 14A);

A liquid recovery mechanism (20, 21, 22, 22A) for recovering the liquid (1) on the substrate (P) at a recovery position separated from the projection area (AR1),

The supply of liquid (1) by the liquid supply mechanism (10, 11, 12, 13, 13A, 14, 14A) at the liquid recovery position and projection area (AR1) of the liquid recovery mechanism (20, 21, 22, 22A) in between.

If the present invention is adopted, since the supply of the liquid by the liquid supply mechanism is carried out between the liquid recovery position of the liquid recovery mechanism and the projected area, the liquid provided can be transferred from the projected area while the liquid is smoothly supplied to the projected area. The substrate is recovered smoothly.

If the sixth mode is adopted, there is provided an exposure method for exposing a substrate by projecting an image of a predetermined pattern onto the substrate (P) through the liquid (1), including:

In order to form a liquid immersion area (AR2) on a part of the substrate (P) including the projection area (AR1) of the projection optical system (PL), a liquid contact surface (2a) with the front end of the projection optical system (PL) is provided. A liquid (1) with a higher affinity than the surface of the substrate (P);

An image of a predetermined pattern is projected onto a substrate (P) via the liquid (1) supplied to the liquid immersion region (AR2).

According to the present invention, the liquid can be closely contacted with the liquid contact surface at the front end of the projection optical system, and the optical path between the projection optical system and the substrate can be set in a stable liquid immersion state, and can be smoothly recovered on the substrate. of liquid.

The device manufacturing method of the present invention is characterized by using the exposure apparatus (EX) or the exposure method of the above-mentioned aspect. According to the present invention, it is possible to provide a device capable of exhibiting desired performance with a pattern formed with good pattern accuracy.

According to the seventh aspect of the present invention, an exposure device (EX) for projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1) to expose the substrate is provided:

A projection optical system (PL) for projecting an image of the above pattern on a substrate;

a liquid supply mechanism (10, 11, 12, 41, 42) having a supply channel (94A, 95A, 94B, 95B) for supplying a liquid (1) onto a substrate (P);

Liquid recovery mechanisms (20, 61, 62, 63, 64, 71, 72, 73, 74),

At least one of the supply channel and the recovery channel is formed on a laminated member in which a plurality of plate-shaped members (91, 92, 93) are laminated.

During liquid immersion exposure, a uniform liquid flow needs to be supplied to and recovered from the liquid immersion area, and the laminated member of the exposure device of the present invention is formed by combining a plurality of plate-shaped members respectively formed with flow paths such as these flow paths. The channels communicate with each other to form at least one of the supply flow path and the recovery flow path, and are formed in layers. Therefore, even a complicated channel structure can be formed extremely compactly, easily, and at low cost.

According to the eighth aspect of the present invention, an exposure device (EX) for exposing a substrate by projecting a predetermined pattern image onto the substrate (P) through the liquid (1) is provided:

Including: a projection optical system (PL) for projecting the image of the above pattern onto the substrate;

In order to form a liquid immersion area (AR2) on a part of the substrate (P) including the projection area (AR1) of the projection optical system (PL), a liquid supply mechanism (10) for supplying liquid (1) to the substrate (P) ,

The liquid supply mechanism (10) and the projection optical system (PL) are vibrationally isolated from each other.

According to the exposure apparatus according to the eighth aspect, the projection optical system and the liquid supply mechanism are vibrationally isolated from each other. That is, even if vibration occurs in the liquid supply mechanism, the vibration is not transmitted to the projection optical system. Therefore, it is possible to prevent the occurrence of an abnormality in which the pattern image deteriorates due to the vibration of the projection optical system, and it is possible to project the pattern image onto the substrate with high precision.

The exposure device further includes: a first support member (100) supporting the optical system (PL); and a second support member (102) that supports the liquid supply mechanism (10) and is vibrationally isolated from each other with the first support member (100) . According to this configuration, since the first supporting member supporting the projection optical system vibrates separately from the second supporting member supporting the liquid supply mechanism, vibrations generated in the liquid supply mechanism are not transmitted to the projection optical system. In addition, for example, the interferometer for measuring the position information of the substrate stage is mounted on the first support member, and the reference mirror (fixed mirror) is mounted on the lens barrel of the projection optical system, etc. Since these interferometers and reference mirrors transmit vibrations, the measurement of the position information of the substrate stage and the position control based on the measurement results can be performed with high precision.

If the ninth aspect of the present invention is adopted, an exposure device (EX) for projecting an image of a predetermined pattern onto the substrate (P) to expose the substrate via the liquid (1) is provided:

A projection optical system (PL) for projecting the image of the above-mentioned pattern onto the substrate;

a liquid recovery mechanism (20) that recovers a part of the liquid (1) provided on the substrate (P) including the projection area (AR1) of the projection optical system (PL),

The liquid recovery mechanism 20 and the projection optical system (PL) are vibrationally isolated from each other.

According to the exposure apparatus according to the ninth aspect of the present invention, since the projection optical system and the liquid recovery mechanism are vibrationally isolated from each other, even if vibration occurs in the liquid recovery mechanism, the vibration is not transmitted to the projection optical system. Therefore, it is possible to prevent the occurrence of an abnormality in which the pattern image deteriorates due to the amplitude of the projection optical system, and to project the pattern image onto the substrate with high precision.

The exposure apparatus (EX) of the ninth aspect may further include: a first supporting member (100) supporting the projection optical system (PL); ) of the second support member (102). According to this structure, since the first supporting member supporting the projection optical system and the second supporting member supporting the liquid recovery mechanism are vibratoryly isolated from each other, the vibration generated by the liquid recovery mechanism will not be transmitted to the projection optical system. . In addition, for example, by installing an interferometer for measuring the position information of the substrate stage on the first supporting member, and attaching the reference barrel (fixed mirror) to the barrel of the projection optical system, etc., because there is no Since vibration is transmitted to these interferometers and reference mirrors, it is possible to measure the position information of the substrate stage with high precision and position control based on the measurement results.

According to the tenth aspect of the present invention, there is provided an exposure device (EX) for projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1) and sequentially exposing a plurality of imaging regions on the substrate:

Including: a projection optical system (PL) for projecting the image of the above-mentioned pattern onto the above-mentioned substrate;

In order to form a liquid immersion area on a part of the substrate including the projection area of the projection optical system, a liquid supply mechanism (10, 11, 12, 13) that supplies liquid from supply ports (13A, 14A) arranged to face the substrate , 14),

The liquid supply mechanism continuously supplies liquid from the supply port during exposure processing of a plurality of imaging regions on the substrate.

According to the exposure apparatus according to the tenth aspect of the present invention, during the exposure processing of a plurality of imaging regions on the substrate, the liquid is continuously supplied from the supply port arranged at a predetermined position, not in accordance with the moving direction of the substrate. , Therefore, the vibration of the liquid supply mechanism itself and the vibration of the liquid (water hammer phenomenon) can be prevented, and the pattern image can be projected onto the substrate with high precision.

According to the eleventh aspect of the present invention, an exposure device (EX) for projecting an image of a predetermined pattern onto a substrate (P) through a liquid (1) and sequentially exposing a plurality of shot areas on the substrate is provided:

a projection optical system (PL) for projecting an image of the above-mentioned pattern onto the above-mentioned substrate;

In order to form a liquid immersion area on a part of the substrate including the projection area of the projection optical system, a liquid supply mechanism (10, 11, 12, 13, 14),

a liquid recovery mechanism (20, 21, 22) for recovering the liquid supplied from the liquid supply mechanism, having a recovery port (22A) disposed opposite to the substrate,

The liquid supply mechanism continuously recovers liquid from the supply port during exposure processing of a plurality of imaging regions on the substrate.

According to the exposure apparatus according to the eleventh aspect of the present invention, the liquid is continuously recovered from the recovery port, not in the moving direction of the substrate, during exposure processing of a plurality of imaging regions on the substrate. Accordingly, while the liquid can be recovered more reliably, the vibration of the liquid recovery mechanism itself due to the start and stop of recovery can be suppressed, and a pattern image can be projected onto the substrate with high precision.

The device manufacturing method of the present invention is characterized by using the exposure apparatus (EX) of the above-mentioned aspect. According to the present invention, it is possible to provide a device having a pattern formed with good pattern accuracy and exhibiting desired performance.

According to the present invention, exposure processing can be performed with high precision even in the state where a liquid immersion region is formed between the projection optical system and the substrate.

Description of drawings

FIG. 1 is a schematic configuration diagram showing one embodiment of the exposure apparatus of the present invention.

2 is a plan view showing a schematic configuration of a liquid supply mechanism and a liquid recovery mechanism which are characteristic parts of the present invention.

3 is a perspective view showing a schematic configuration of a liquid supply mechanism and a liquid recovery mechanism which are characteristic parts of the present invention.

4 is a side sectional view showing a schematic configuration of a liquid supply mechanism and a liquid recovery mechanism which are characteristic parts of the present invention.

FIG. 5 is a diagram showing imaging regions provided on a substrate.

6( a ) and ( b ) are schematic diagrams showing liquid traces.

Fig. 7 is a diagram showing another embodiment of a liquid supply mechanism and a liquid recovery mechanism.

Fig. 8 is a diagram showing another embodiment of a liquid supply mechanism and a liquid recovery mechanism.

Fig. 9 is a diagram showing another embodiment of a liquid supply mechanism and a liquid recovery mechanism.

10( a ) and ( b ) are diagrams showing another embodiment of the liquid supply mechanism.

Fig. 11 is a side sectional view showing another embodiment of the collecting member.

Fig. 12 is a side sectional view showing another embodiment of the collecting member.

Fig. 13 is a perspective view showing another embodiment of the collecting member.

Fig. 14 is a schematic perspective view showing another embodiment of the liquid supply mechanism and the liquid recovery mechanism of the present invention.

FIG. 15 is a diagram showing another embodiment of the slit tube portion in FIG. 14 .

Fig. 16 is a schematic perspective view showing another embodiment of the liquid supply mechanism and the liquid recovery mechanism of the present invention.

Fig. 17 is a perspective view showing a first member among flow path forming members.

18( a ) and ( b ) are perspective views showing a second member among the flow path forming members.

19( a ) and ( b ) are perspective views showing a third member among the flow path forming members.

FIG. 20 is a schematic configuration diagram showing another embodiment of the exposure apparatus of the present invention.

FIG. 21 is a flowchart showing an example of a manufacturing process of a semiconductor device.

Detailed ways

Hereinafter, the exposure apparatus of this invention is demonstrated with reference to drawings. FIG. 1 is a schematic configuration diagram showing an embodiment of an exposure apparatus of the present invention. In FIG. 1, the exposure apparatus EX includes: a mask stage MST supporting a mask M; a substrate stage PST supporting a substrate P; and an illumination optical system for illuminating the mask M supported by the mask stage MST with an exposure light beam EL. IL; the projection optical system PL for projecting and exposing the pattern image of the mask M illuminated by the exposure light beam EL onto the substrate P supported by the substrate stage PST; and the control device CONT for overall controlling the overall operation of the exposure device EX.

In addition, the exposure apparatus EX of this embodiment is a liquid immersion exposure apparatus to which a liquid immersion method is applied in order to substantially increase the depth of focus while actually shortening the exposure wavelength and improving the resolution, and includes a liquid supply mechanism for supplying the liquid 1 onto the substrate P 10. A liquid recovery mechanism 20 for recovering the liquid 1 on the substrate P. The exposure apparatus EX forms a liquid immersion area on a part of the substrate P including the projection area AR1 of the projection optical system PL with the liquid 1 supplied from the liquid supply mechanism 10 at least while the pattern image of the mask M is transferred to the substrate P. AR2. Specifically, the exposure apparatus EX fills the liquid 1 between the optical element 2 at the front end of the projection optical system PL and the surface of the substrate P, and through the liquid 1 between the projection optical system PL and the substrate P and the projection optical system PL, the The pattern image of the mask M is projected onto the substrate P, and the substrate P is exposed.

Here, in this embodiment, as the exposure apparatus EX, the mask M and the substrate P are synchronously moved in different directions (reverse directions) in the scanning direction, and the pattern formed on the mask M is simultaneously exposed on the surface. The case of the scanning type exposure apparatus (so-called scanning stepper) on the board|substrate P is demonstrated as an example. In the following description, the direction coincident with the optical axis AX of the projection optical system PL is taken as the Z-axis direction, and the synchronous moving direction (scanning direction) of the mask M and the substrate P in a plane perpendicular to the Z-axis direction is set as In the X-axis direction, a direction (non-scanning direction) perpendicular to the Z-axis direction and the Y-axis direction is set as the Y-axis direction. In addition, directions around the X-axis, Y-axis, and Z-axis are set as θX, θY, and θZ directions, respectively. Furthermore, the "substrate" mentioned here includes a substrate coated with photoresist as a photosensitive material on a semiconductor wafer, and the "mask" includes a reticle on which a reduced-scale projected device pattern is formed on the substrate.

The illumination optical system IL is a system for illuminating the mask M supported by the mask stage MST with the exposure light beam EL, including: a light source for exposure, an optical integrator for uniforming the illuminance of the light beam emitted from the light source for exposure, and a condensing light source from an optical The condenser lens of the exposure light beam EL of the integrator, the relay lens, the variable field of view diaphragm that sets the illumination area on the mask M using the exposure light beam EL as a slit, and the like. A predetermined illumination region on the mask M is illuminated by the exposure light beam EL with a uniform illuminance distribution by the illumination optical system IL. As the exposure light beam EL emitted from the illumination optical system IL, for example, bright lines (g-line, h-line, i-line) in the ultraviolet region emitted from a mercury lamp and deep ultraviolet light (DUV light) such as KrF excimer laser (wavelength 248nm) are used. ), and vacuum ultraviolet light (VUV light) such as ArF excimer laser beam (wavelength 193nm) and F ₂ laser (wavelength 157nm). In this embodiment, an ArF excimer laser beam is used.

The mask stage MST is a stage that supports the mask M, and can move two-dimensionally in a plane perpendicular to the optical axis AX of the projection optical system PL, that is, in the XY plane and can rotate slightly in the θZ direction. Mask stage MST is driven by a mask stage driving device MSTD such as a linear motor. The mask stage driving device MSTD is controlled by the control device CONT. A moving mirror 50 is provided on the mask stage MST. Furthermore, a laser interferometer 51 is provided at a position facing the movable mirror 50 . The two-dimensional position and rotation angle of the mask M on the mask stage MST are measured in real time by the laser interferometer 51, and the measurement results are output to the control device CONT. Control device CONT determines the position of mask M supported on mask stage MST by driving mask stage drive device MSTD based on the measurement result of laser interferometer 51 .

The projection optical system PL is a system for projecting the pattern of the exposure mask M on the substrate P at a predetermined projection magnification β, and is composed of a plurality of optical elements including an optical element (lens) 2 provided on the front end portion on the substrate P side. , these optical components are supported by the lens barrel PK. In the present embodiment, projection optical system PL is a reduction system in which projection frequency β is, for example, 1/4 or 1/5. Furthermore, projection optical system PL may be one of a constant magnification system and an enlargement system. In addition, the optical element 2 at the front end portion of the projection optical system PL of this embodiment is provided so as to be detachable (replaceable) with respect to the lens barrel PK, and the liquid 1 in the liquid immersion area AR2 contacts the optical element 2 .

The optical element 2 is formed of fluorite. Since fluorite has a high affinity with water, the liquid 1 can be brought into close contact with almost the entire surface of the liquid contact surface 2a of the optical element 2, that is, in this embodiment, since the liquid contact surface 2a of the optical element 2 is provided The liquid (water) 1 with high affinity, so the liquid contact surface 2a of the optical element 2 and the liquid 1 have high compactness, and the optical path between the optical element 2 and the substrate P can be reliably filled with the liquid 1. Furthermore, the optical element 2 may be quartz having a high affinity with water. In addition, a hydrophilization (lyophilization) treatment may be performed on the liquid contact surface 2 a of the optical element 2 to further increase the affinity with the liquid 1 .

The substrate stage PST is a stage that supports the substrate P, and includes a Z stage 52 holding the substrate P via a substrate holder, an XY stage 53 supporting the Z stage 52 , and a base 54 supporting the XY stage 53 . The substrate stage PST is driven by a substrate stage driving device PSTD such as a linear motor. The substrate stage driving device PSTD is controlled by the control device CONT. By driving the Z stage 52, the position in the Z-axis direction (focus position) and the positions in the θX and θY directions of the substrate P held by the Z stage 52 are controlled. Further, by driving the XY stage 53 , the position in the XY direction of the substrate P (the position in the direction substantially parallel to the image plane of the projection optical system PL) is controlled. That is, the Z stage 52 controls the focus position and inclination angle of the substrate P, and matches the surface of the substrate P with the image plane of the projection optical system PL by means of self-focusing and auto-leveling. Positioning in the X-axis direction and the Y-axis direction of the substrate P. Furthermore, of course, the Z stage and the XY stage may be provided integrally.

On the substrate stage PST (Z stage 52 ), a moving mirror 55 that moves relative to the projection optical system PL is provided together with the substrate stage PST. Furthermore, a laser interferometer 56 is provided at a position facing the movable mirror 55 . The two-dimensional position and rotation angle of the substrate P on the substrate stage PST are measured in real time by the laser interferometer 65, and the measurement results are output to the control device CONT. The control device CONT positions the substrate P supported on the substrate stage PST by driving the substrate stage driving device PSTD based on the measurement result of the laser interferometer 56 .

In addition, an auxiliary plate 57 is provided on the substrate stage PST (Z stage 52 ) so as to surround the substrate P. As shown in FIG. The auxiliary plate 57 has a flat surface substantially at the same height as the surface of the substrate P held on the substrate holder. Here, there is a gap of about 0.1 to 2 mm between the edge of the substrate P and the auxiliary plate 57, and the liquid 1 hardly flows into the gap due to the surface tension of the liquid 1, even at the edge of the exposed substrate P. In the case of the vicinity, the liquid 1 may be held under the projection optical system PL by the auxiliary plate 57 .

The liquid supply mechanism 10 is a mechanism for supplying a predetermined liquid 1 on the substrate P, and includes: a first liquid supply part 11 and a second liquid supply part 12 capable of supplying the liquid 1; The liquid supply part 11 is connected to the first supply member 13 that supplies the liquid 1 sent from the first liquid supply part 11 to the supply 13A of the substrate P; , the liquid 1 sent from the second liquid supply unit 12 is supplied to the second supply member 14 of the substrate P supply 14A. The first and second supply members 13 and 14 are disposed close to each other on the surface of the substrate P, and are provided at positions different from each other in the surface direction of the substrate P. As shown in FIG. Specifically, the first supply member 13 of the liquid supply mechanism 10 is provided on one side (−X side) in the scanning direction with respect to the projection area AR1 , and the second supply member 14 is provided on the other side (+X side).

Each of the first and second liquid supply members 11 and 12 includes a tank for containing the liquid 1 , a pressure pump, etc., and supplies the liquid 1 onto the substrate P through the supply pipes 11A and 12A and the supply members 13 and 14 , respectively. In addition, the liquid supply operations of the first and second liquid supply parts 11 and 12 are controlled by the control device CONT, and the control device CONT can independently control the liquid feeding operations on the substrate P by the first and second liquid supply parts 11 and 12 per unit time. of liquid supply.

In this embodiment, pure water is used as the liquid 1 . Pure water is not only permeable to ArF excimer laser, for example, it can also make bright lines in the ultraviolet region (g-line, h-line, i-line) emitted from mercury lamps and ultraviolet light such as KrF excimer laser (wavelength 248nm) ( DUV light) through.

The liquid recovery mechanism 20 is a mechanism for recovering the liquid 1 on the substrate P, and includes: a recovery member 22 having a recovery port 22A arranged close to the surface of the substrate P; Recycling Department 21. The liquid recovery unit 21 includes, for example, a suction device such as a vacuum pump and a tank for storing the recovered liquid 1 , and the liquid 1 on the substrate P is recovered through the recovery member 22 and the recovery pipe 21A. The liquid recovery operation of the liquid recovery part 21 is controlled by the control device CONT, and the control device CONT can control the liquid recovery amount per unit time by the liquid recovery part 21 .

In addition, on the outer side of the recovery member 22 of the liquid recovery mechanism 20, a collection member 30 formed with a liquid collection surface 31 of a predetermined length to catch the liquid 1 is arranged.

FIG. 2 is a plan view showing a schematic configuration of the liquid supply mechanism 10 and the liquid recovery mechanism 20 , and FIG. 3 is a perspective view partially cut away. As shown in FIG. 2, the projection area AR1 of the projection optical system PL is set in a rectangular shape with the Y-axis direction (non-scanning direction) as the longitudinal direction, and the liquid immersion area AR2 filled with the liquid 1 is formed so as to include the projection area AR1. formed on a part of the substrate P. Then, the first supply member 13 of the liquid supply mechanism 10 for forming the liquid immersion area AR2 of the projection area AR1 is arranged on the scanning direction side (-X side) with respect to the projection area AR1, and the second supply member 14 is arranged on the on the other side (+X side).

As shown in FIGS. 2 and 3 , the first and second supply members 13 and 14 respectively include internal spaces (internal flow paths) 13H and 14H through which the liquid 1 sent from the first and second liquid supply members 11 and 12 circulates. supply the liquid 1 circulating in the internal spaces 13H, 14H to the supply ports 13A, 14A on the substrate P; Furthermore, although the second liquid supply part 12 is not shown in FIG. 3 , its structure is the same as that of the first liquid supply part 11 . The supply ports 13A, 14A of the first and second supply members 13, 14 are respectively formed in a substantially circular arc shape in plan view, and the size of the supply ports 13A, 14A in the Y direction is set to be at least larger than the Y direction of the projected area AR1. The dimension in the axial direction is large. Then, the supply ports 13A and 14A formed in a substantially circular arc shape in a planar view are arranged so as to sandwich the projection area AR1 with respect to the scanning direction (X direction). The liquid supply mechanism 10 is provided from supply ports 13A, 14A at a plurality of positions separated in different directions relative to the projected area AR1, that is, from different sides of the rectangular projected area AR1 (in this example, projected Both sides of the area AR1 (+X direction side, −X direction side)) are supplied with liquid 1 at the same time.

The recovery part 22 of the liquid recovery mechanism 20 is a double ring-shaped part, including a recovery port 22A formed continuously in an annular shape as facing the surface of the substrate P; an annular internal space ( internal flow path) 22H. The recovery member 22 of the liquid recovery mechanism 20 is arranged so as to surround the supply members 13 and 14 of the liquid supply mechanism 10 and the projection area AR1. Then, partition members 23 for dividing the inner space 22H into a plurality of spaces (divided spaces) 24 in the circumferential direction are provided at predetermined intervals inside the recovery member 22 . That is, it is provided with the structure which provided the partition member 23 inside the recovery port 22A formed continuously so that it may surround projection area|region AR1. Each of the divided spaces 24 divided by the partition member 23 penetrates in the vertical direction. Then, the lower end portion of the recovery member 22 having the recovery port 22A is close to the surface of the substrate P, while the upper end portion is the manifold portion 25 as the aggregation space portion that spatially aggregates the plurality of divided spaces 24 . Then, one end portion of the recovery pipe 21A is connected to the manifold unit 25 , and the other end is connected to the liquid recovery unit 21 . The liquid recovery mechanism 20 recovers the liquid 1 on the substrate P through the recovery port 22A (recovery member 22 ) and the recovery pipe 21A by driving the liquid recovery unit 21 . That is, the installation position of the recovery port 22A is a recovery position for recovering the liquid 1 on the substrate P, and the liquid recovery mechanism 20 recovers the liquid 1 on the substrate P at the recovery position separated from the projection area AR1. Here, the recovery port 22A of the liquid recovery mechanism 20 is configured to surround the projected area AR1 in a substantially annular shape in plan view. That is, the recovery port 22A exists on four sides (the +X direction side, the −X direction side, the +Y direction side, and the −Y direction side) of the rectangular projection area AR1, in other words, on the four sides perpendicular to the projection area AR1. 4 locations spaced apart in one direction. Therefore, the liquid recovery mechanism 20 can simultaneously recover the liquid 1 on the substrate P at positions spaced in different directions relative to the projection area AR1 by using the recovery port 22A provided to surround the projection area AR1.

Then, the installation positions of the supply ports 13A, 14A of the first and second supply members 13, 14 of the liquid supply mechanism 10, that is, the structure of the supply position of the liquid 1 on the opposing substrate P is set at the liquid recovery position (recovery position). between the position of port 22A) and the projected area AR1. That is, the liquid 1 is supplied by the liquid supply mechanism 10 between the liquid recovery position of the liquid recovery mechanism 20 and the projection area AR1.

4 is an enlarged side sectional view of main parts showing the first and second supply means 13 and 14 and the recovery means 22 arranged close to the substrate P. As shown in FIG. As shown in FIG. 4 , the internal channels 13H and 14H of the first and second supply members 13 and 14 of the liquid supply mechanism 10 are provided substantially perpendicular to the surface of the substrate P. As shown in FIG. Similarly, the internal flow path 22H (divided space 24 ) of the recovery member 22 of the liquid recovery mechanism 20 is also provided substantially perpendicular to the surface of the substrate P. As shown in FIG. Then, the supply position of the liquid 1 to the substrate P by the first and second supply members 13 and 14 (the setting positions of the supply ports 13A and 14A) is set at the liquid recovery position of the liquid recovery mechanism 20 (the recovery port 22A) and the projection area AR1. In addition, while the projection optical system PL and the first and second supply members 13 and 14 are arranged at a predetermined distance from each other, the recovery member 22 and the first and second supply members 13 and 14 are each arranged so that Only keep the specified distance apart. In addition, in the present embodiment, the distance between the surface of the substrate P and the supply ports 13A, 14A, the distance between the surface of the substrate P and the recovery port 22A, and the distance between the surface of the substrate P and the lower end surface of the projection optical system PL are set to approximately same. In other words, the respective positions (heights) in the Z-axis direction of the supply ports 13A, 14A, the recovery port 22A, and the lower end surface of the projection optical system PL are set substantially the same.

Then, the liquid 1 supplied to the substrate P from the supply ports 13A, 14A of the first and second supply members 13, 14 in a direction substantially perpendicular to the substrate surface is supplied to the front end portion of the projection optical system PL (the optical element 2 ) between the lower surface of the substrate P and the wet diffusion. In addition, the liquid 1 flowing out to the outside of the supply members 13, 14 with respect to the projected area AR1 is drawn from the substrate surface in a substantially vertical direction by the recovery port 22A of the recovery unit 2 arranged outside the supply members 13, 14 with respect to the projected area AR1. is recycled (absorbed).

Here, among the components constituting the liquid supply mechanism 10 and the liquid recovery mechanism 20 , at least a component through which the liquid 1 flows is formed of, for example, synthetic resin such as polytetrafluoroethylene. Thus, inclusion of impurities in the liquid 1 can be suppressed.

On the outside of the recovery member 22 of the liquid recovery mechanism 20 with respect to the projected area AR1, there is provided a collection member 30 that forms a liquid collection surface 31 that is the length of the liquid 1 that cannot be completely recovered by the recovery member 22 of the liquid recovery mechanism 20 for capture. The collection member 30 is provided on the outer side of the recovery member 22 . The recovery surface 31 is a surface (that is, a lower surface) facing the substrate P side in the recovery unit 30, and is inclined relative to the horizontal plane as shown in FIG. 4 . Specifically, the collection surface 31 is inclined so as to be spaced (upward) from the surface of the substrate P as it goes outward with respect to the projected area AR1 (liquid immersion area AR2 ). The collecting member 30 is formed of metal such as stainless steel, for example.

As shown in FIG. 2 , the collecting member 30 is an annular member in plan view, and is connected to the outer surface of the collecting member 22 so as to be fitted with the collecting member 22 . Then, the collection surface 31 of the collection member 30 is arranged to surround the projected area AR1 (the liquid immersion area AR2). In this embodiment, the liquid immersion member 30 and the collection surface 31 therebelow have a substantially elliptical shape in plan view. That is, the collecting surface 31 of the collecting member 30 is provided with the optical axis AX of the projection optical system PL as a reference, and the length in the radiation direction is different according to its position. In the present embodiment, the length of the collecting surface 31 in the scanning direction (X-axis direction) is longer than that in the non-scanning direction (Y-axis direction). More specifically, the collection surface 31 has the longest length at a position corresponding to the center portion in the Y-axis direction of the projection area AR1.

Lyophilization treatment (hydrophilization treatment) for improving affinity with the liquid 1 is performed on the collection surface 31 . In this embodiment, since the liquid 1 is water, the collecting surface 31 is subjected to surface treatment suitable for affinity with water. Furthermore, a photosensitive material (for example, TARF-P6100 produced by Tokyo Ohka Industry Co., Ltd.) for waterproof (contact angle 70-80°) ArF excimer laser is coated on the surface of the substrate P, and the collection surface 31 is opposed to the liquid. The liquid affinity of 1 is higher than the liquid affinity of the surface of the substrate P to the liquid 1.

The surface treatment of the collecting surface 31 is carried out according to the polarity of the liquid 1 . Because the liquid 1 in this embodiment is water with high polarity, as the hydrophilization treatment to the collection surface 31, for example, form a thin film with a substance with a large molecular structure such as alcohol to impart hydrophilicity to the collection surface 31. watery. Alternatively, hydrophilicity may be imparted to the collection surface 31 by, for example, O ₂ plasma treatment in which plasma treatment is performed using oxygen (O ₂ ) as a treatment gas. In this way, when water is used as the liquid 1 , it is desirable to arrange a surface treatment having a molecular structure with a high polarity such as OH groups on the collection surface 31 . Here, the thin film used for the surface treatment is formed of a material that is insoluble in the liquid 1 . In addition, in the lyophilization treatment, the treatment conditions can be appropriately changed according to the material properties of the liquid 1 used.

Hereinafter, the method of exposing the pattern image of the mask M on the board|substrate P using the exposure apparatus EX mentioned above is demonstrated.

Here, the exposure apparatus EX in this embodiment is an apparatus for projecting and exposing the pattern image of the mask M on the substrate P while moving the mask M and the substrate P in the X-axis direction (scanning direction). During exposure, a part of the pattern image of the mask M is projected on the rectangular projection area AR1 under the front end portion of the projection optical system PL. For the projection optical system PL, it is in the −X direction (or +X direction) with the mask M. ) at a speed V, and the substrate P moves at a speed β·V (β is a projection magnification) in the +X direction (or -X direction) via the XY stage 53 . Then, as shown in the plan view of FIG. 5 , a plurality of shot areas S1 to S12 are set on the substrate P, and after the exposure of one shot area is completed, the next shot area moves to the scanning area by the stepwise movement of the substrate P. From the start position, hereafter, scanning exposure processing is sequentially performed for each shot area, moving the board|substrate P by a step-and-scan method. Furthermore, in this embodiment, control device CONT moves XY stage 53 while monitoring the output of laser interferometer 56 so that optical axis AX of projection optical system PL advances along dotted arrow 58 in FIG. 5 .

First, while the mask M is placed on the mask stage MST, the substrate P is placed on the substrate stage PST (refer to FIG. 1 ). Thereafter, when the scanning exposure process is performed, the control device CONT drives the liquid supply mechanism 10. The liquid supply operation on the substrate P is started. In order to form the liquid immersion area AR2, the liquid 1 supplied from the first and second liquid supply parts 11 and 12 of the liquid supply mechanism 10 is supplied through the first and second supply parts 13 and 14 after passing through the supply tubes 11A and 12A. On the substrate P, a liquid immersion region AR2 is formed between the projection optical system PL and the substrate P. As shown in FIG. Here, as shown in FIG. 4 , the liquid 1 flowing through the supply pipes 11A, 12A spreads in the width direction of the internal channels 13H, 14H of the supply members 13, 14, and spreads from the supply ports 13A, 14A to the width of the substrate P. range provided. At this time, the supply ports 13A and 14A are arranged on both sides of the projection area AR1 in the X-axis direction (scanning direction). Simultaneously, liquid 1 is supplied.

The liquid supply mechanism 10 consists of supply ports 13A, 14A provided on both sides of the projection area AR1, that is, from a plurality of positions separated in a plurality of directions (+X direction, -X direction) different from the projection area AR1. Also provide liquid. Accordingly, the liquid 1 supplied from the supply ports 13A and 14A onto the substrate P forms the liquid immersion region AR2 in a range wider than at least the projected region AR1 .

In the present embodiment, when the liquid 1 is supplied to the substrate P from both sides in the scanning direction of the projection area AR1, the control device CONT controls the liquid supply operations of the first and second liquid supply parts 11 and 12 of the liquid supply mechanism 10, and relatively In the scanning direction, the liquid supply amount per unit time provided from the front of the projection area AR1 is set to be larger than the liquid supply amount provided from the opposite side. For example, when exposing the substrate P while scanning the substrate P in the +X direction, the control device CONT makes the amount of liquid from the -X side (that is, the supply port 13A) larger than that from the +X side (that is, the supply port 13A) with respect to the projection area AR1 . 14A) has a large amount of liquid. On the other hand, in the case of exposure processing while moving the substrate P in the -X direction, the amount of liquid from the +X side is larger than the amount of liquid from the -X side in the projection area AR1. .

In addition, the control device CONT drives the liquid recovery mechanism 20 to perform the supply operation of the liquid 1 by the liquid supply mechanism 10 in parallel, and perform the liquid recovery operation on the substrate P. Thereby, as shown in FIG. 4 , the liquid 1 flowing from the supply ports 13A and 14A to the projection area AR1 onto the substrate P outside is recovered by the recovery port 22A. The liquid 1 recovered from the recovery port 22A flows through each of the divided spaces 24 partitioned by the partition member 23 , and then collects in the manifold unit 25 . The liquid 1 accumulated in the manifold part 25 is recovered by the liquid recovery part 21 through the recovery pipe 21A. In this way, the present embodiment has a structure in which a plurality of divided spaces 24 are connected to one liquid recovery unit 21 . Then, the liquid recovery mechanism 20 consists of the recovery 22A arranged to surround the projection area AR1, from a plurality of positions separated in different directions relative to the projection area AR1, that is, from four sides of the rectangular projection area AR1 ( +X direction side, −X direction side, +Y direction side, −Y direction side) recover the liquid on the substrate P simultaneously.

The control device CONT performs the supply of the liquid 1 on the surface of the substrate P and the recovery of the liquid 1 on the substrate P in parallel by the liquid supply mechanism 10 and the liquid recovery mechanism 20. While moving (scanning direction), the pattern image of the mask M is projected and exposed on the substrate P via the liquid 1 between the projection optical system PL and the substrate P and the projection optical system PL. At this time, since the liquid supply mechanism 10 simultaneously supplies the liquid 1 from both sides of the projection area AR1 with respect to the scanning direction through the supply ports 13A and 14A, the liquid immersion area AR2 can be uniformly and well formed. In addition, since the liquid recovery mechanism 20 simultaneously recovers the liquid 1 at a plurality of positions around the projection area AR1 including both sides in the scanning direction of the projection area AR1 via the recovery port 22A of the recovery member 22 surrounding the projection area AR1, it prevents The liquid 1 flows out or splashes around the substrate P. Furthermore, in this embodiment, since pure water having a low affinity with the photosensitive material on the surface of the substrate P is supplied as the liquid 1, it can be recovered smoothly by the liquid recovery mechanism 20 .

FIG. 6( a ) is a schematic view showing the trajectory of the liquid 1 when exposing the first shot area (for example, S1 and S3 in FIG. 5 ) set on the substrate P while moving the substrate P in the +X direction. . In FIG. 6( a ), liquid 1 is simultaneously supplied to the space between projection optical system PL and substrate P from supply ports 13A and 14A, thereby forming liquid immersion area AR12 so as to include projection area AR1 . Here, the liquid amount per unit time of the liquid 1 supplied from the supply port 13A provided on the −X side with respect to the projected area AR1 is set to be larger than that supplied from the supply port 14A provided on the +X side. Since the amount of liquid 1 per unit time is large, the liquid 1 supplied from the supply port 13A is drawn to the substrate P moving in the +X direction, and is smoothly arranged in the space between the projection optical system PL and the substrate P. In addition, the liquid 1 that is going to flow outside from the supply ports 13A and 14A is recovered by the recovery port 22A, and the occurrence of abnormality in the flow to the periphery of the substrate P is suppressed.

Here, since the substrate P moves in the +X direction, the amount of liquid moved to the +X side with respect to the projection area AR1 increases, and the recovery port 22A provided with the liquid recovery position on the +X side may not recover the liquid 1 completely. But, as shown in Figure 6 (a), on the recovery port 22A of +X side, the liquid 1 that can not be fully recovered is because from this liquid recovery position is caught with the collection surface 31 of the collection member 30 that is arranged on the +X side, Therefore, it does not flow out or disperse to the periphery of the substrate P or the like. Here, the collecting surface 31 is subjected to a lyophilic treatment with respect to the liquid 1, and because it has a liquid affinity higher than that of the surface of the substrate P, the liquid 1 that is about to flow to the outside from the liquid recovery position of the recovery port 22A is not captured by the substrate P. Traction on one side, and traction on one side by the collection surface 31. Thereby, occurrence of an abnormality such as liquid 1 remaining on the substrate P is suppressed.

Here, since the collecting surface 31 is inclined upward with respect to the liquid immersion area AR2 including the projected area AR1 as a reference, the liquid 1 can be further effectively prevented from flowing out to the outside. That is, by inclining upward, the first volume (volume corresponding to the unit area of the substrate P) between the substrate P and the projection optical system PL is larger because the second volume between the substrate P and the collection surface 31 is larger. The outflowing liquid 1 is held smoothly in the second volume. In addition, due to the upward inclination, the fluid energy to flow out to the outside along the upward direction of the collecting surface 31 is converted into potential energy, thereby effectively preventing the liquid 1 from flowing out to the outside.

Furthermore, the amount of liquid supplied from the supply port 14A provided on the +X side is set to be smaller than the amount of liquid supplied from the supply port 13A provided on the −X side. That is, since the amount of liquid supplied from the supply port 14A closer to the supply port 13A is set to be smaller than the recovery port 22A on the +X side, even if the liquid 1 is drawn to the substrate P moving to the +X side, , it is also possible to suppress the amount of liquid to flow out from the +X side of the substrate P to the outside.

When the exposure processing of the first shot area is completed, the control device CONT moves the substrate P in steps to arrange the projection area AR1 of the projection optical system PL on the second shot area different from the first shot area. Specifically, for example, after the scanning exposure process for the shot area S1 is completed, the control device CONT steps between the two shot areas S1 and S2 on the substrate P in the Y-axis direction in order to perform the scanning exposure process on the shot area S2. move. At this time, the liquid supply mechanism 10 makes the supply amount of the liquid 1 during the step movement between the two imaging areas on the substrate P different from the supply amount during the exposure period of the imaging area. Specifically, the control device CONT makes the liquid supply amount per unit time on the substrate P from the liquid supply mechanism during the stepping movement smaller than the liquid supply amount during the scanning exposure of the imaging region. Thereby, the amount of liquid supplied to the substrate P during the stepping movement without exposure processing can be suppressed, and it is possible to suppress the exposure processing in the entire exposure processing (the substrate P is mounted on the substrate stage PST, and the exposure processing for all the shot regions S1 to S12 is suppressed). end until unloading from the substrate stage PST). In this way, the control device CONT changes the liquid supply amount per unit time of each of the first and second liquid supply parts 11 and 12 in accordance with the moving operation (stepping movement or scanning movement) of the substrate P constituting a part of the exposure processing execution operation.

Here, the liquid supply mechanism 10 reduces the supply amount of the liquid 1 per unit time during the stepping movement of the substrate P, and maintains (continuously) the supply operation of the liquid 1 . That is, the liquid supply mechanism 10 changes the scanning direction by changing the imaging area, or maintains (continuously) the liquid supply operation from the supply ports 13A and 14A even during the stepping operation. In this way, when the liquid supply mechanism 10 sequentially exposes a plurality of shot areas on the substrate P, the liquid 1 is continuously supplied from the supply ports 13A and 14A provided at a plurality of positions, and the liquid supply position is changed according to the scanning direction, or the liquid 1 is changed in steps. The liquid supply position is not changed during the movement, in other words, before the liquid supply mechanism 10 completes a series of exposure processing operations on one substrate P (the substrate P is placed on the substrate stage PST, the exposure of all the shot areas S1 to S12 is completed). The liquid 1 is continuously supplied from a plurality of positions until the end of the process until it is unloaded from the substrate stage PST. Accordingly, it is possible to prevent the vibration of the liquid (water hammer phenomenon) from occurring due to the supply and stop of the liquid 1 .

FIG. 6( b ) is a schematic view showing the trajectory of the liquid 1 when exposing the second shot area (for example, S2 and S4 in FIG. 5 ) provided on the substrate P while moving the substrate P in the −X direction. . In FIG. 6( b ), liquid 1 is supplied from supply ports 13A and 14A to the space between projection optical system PL and substrate P, thereby forming liquid immersion area AR2 so as to include projected area AR1 . Here, the liquid amount per unit time of the liquid 1 supplied from the supply port 14A provided on the +X side with respect to the projection area AR1 is set to be larger than that supplied from the supply port 13A provided on the −X side. Since the amount of liquid 1 per unit time is large, liquid 1 supplied from supply port 14A is pulled by substrate P moving in the −X direction, and is smoothly arranged in the space between projection optical system PL and substrate P. In this way, the control device CONT changes the liquid supply amount per unit time of each of the first and second supply ports 11 and 12 according to the moving direction (moving operation) of the substrate P constituting a part of the exposure processing execution operation. In addition, the liquid 1 that tends to flow out from the supply ports 13A and 14A is recovered by the recovery port 22A, and the occurrence of an abnormality that tends to flow out to the periphery of the substrate P is suppressed.

Here, by moving the substrate P in the −X direction, the liquid 1 captured on the collection surface 31 on the +X side descends along the collection surface 31 and is recovered from the recovery port 22A of the liquid recovery mechanism 20 . Thereby, the remaining of the liquid 1 and the outflow to the outside can be reliably prevented. Then, along with the movement of the substrate P to the -X side, the amount of liquid moved to the -X side increases. Even if the liquid 1 cannot be completely recovered by the -X side recovery port 22A, as shown in FIG. The liquid recovery position catches the liquid 1 with the collection surface 31 of the collection member 30 provided on the -X side.

Furthermore, here, the collection surface 31 is formed to incline upward with respect to the projection area AR1 as it goes outward, but may be horizontal (0 degrees). On the other hand, if the collection surface 31 is inclined downward, since the flow energy to the outside to flow out is not converted into potential energy, and the substrate P does not move to recovery port 22A, so the liquid 1 cannot be recovered smoothly with the recovery port 22A. Therefore, it is desirable that the collection surface 31 is a horizontal surface (0 degree) or an upwardly inclined surface.

Furthermore, when the amount of liquid supplied per unit time on the opposing substrate P is large, and when the scanning speed is high, the amount of liquid to flow out to the outside is large. And the scanning speed is set at the optimum angle. That is, when the liquid supply amount is large and the scanning speed is high, the inclination angle of the collecting surface 31 is set to be large. On the other hand, when the inclination angle of the collection surface 31 is too large, the liquid 1 may not be completely captured (held) by the collection surface 31 in some cases. Here, since the lyophilicity is enhanced through the lyophilization treatment, the liquid retention force of the collection surface 31 is increased, so when the inclination angle is increased, the best conditions are given to the collection surface 31 by changing the treatment conditions of the lyophilization treatment. Lyophilic, liquid 1 can be retained even when the inclination angle is increased. Therefore, the inclination angle of the collecting surface 31 is set at an optimum angle according to various parameters such as the liquid supply amount, the scanning speed, and the material properties of the liquid (liquid affinity of the collecting surface).

However, the structure of the recovered material 22 in this embodiment includes: a recovery port 22A formed continuously in an annular shape, a partition member 23 provided inside the recovery port 22A, and a plurality of divided spaces 24 divided by the partition member 23. , contacts the liquid recovery unit 21 via the recovery pipe 21A on the manifold unit 25 where the plurality of divided spaces 24 are aggregated. Thereby, since only one liquid recovery unit 21 including a vacuum pump and the like can be provided, the device configuration can be simplified. Here, the suction load for recovering the liquid 1 differs at each position in the outer peripheral direction of the recovery member 22 , whereby the suction force of the liquid recovery unit 21 decreases, and the recovery operation may not be performed smoothly. However, the recovery operation can be performed smoothly by providing the partition member 23 . That is, for example, due to the whereabouts of the liquid 1, as opposed to only recovering (suctioning) the liquid 1 in the recovery port 22A on the +X side in the recovery unit 22, inclusion of air (swallowing) occurs in the recovery port 22A on the −X side. air) attracted state. In this case, the air swallowing area in the recovery port 22A on the -X side is enlarged, and when the liquid is recovered by the liquid recovery part 21 of one system as shown in this embodiment, the formed liquid is generated due to the swallowed air. An abnormality in which the suction force of the vacuum pump in the recovery unit 21 is lowered. However, the partition member 23 is provided inside the continuously formed recovery port 22A (internal space 22H), and by providing the partition spaces 24 independent of each other, the area that only sucks the liquid 1 can be spatially separated from the area that swallows the air. Therefore, it is possible to prevent the occurrence of an abnormality such as the reduction of the suction force of the liquid recovery part 21 due to the expansion of the air swallowing area or the influence of the swallowed air, thereby even if the liquid recovery part 21 is a system, the liquid recovery mechanism 20 can also be smooth. Liquid 1 is recovered efficiently.

As described above, in order to form the liquid immersion area AR2, the liquid 1 on the substrate P is simultaneously formed at positions spaced apart from the projected area AR1 in different directions (from mutually different sides of the projected area AR1). The liquid supply mechanism 10 of the supply, so even when the substrate P moves in multiple directions including the scanning direction (±X direction) and the step direction (±Y direction), the projection optical system PL and the substrate P can The liquid immersion area AR2 is always formed smoothly and well. Therefore, exposure processing can be performed at high resolution and wide depth of focus.

When sequentially exposing each of a plurality of shot regions on the substrate P, since the liquid 1 is continuously supplied from a plurality of positions by the liquid supply mechanism 10, it is possible to prevent the occurrence of liquid vibration (water hammer phenomenon) accompanying the supply and stop of the liquid 1. occurs, whereby deterioration of the transferred pattern can be prevented.

In addition, since the liquid supply mechanism 10 supplies the liquid 1 from the supply ports 13A and 14A from both sides in the scanning direction of the projection area AR1, the supplied liquid 1 is drawn on the projection area AR1 by the substrate P moving in the scanning direction. The wet spreads to form the liquid immersion area AR2 smoothly so as to include the projected area AR1. Then, in the present embodiment, the liquid supply mechanism 10 is supplied to the liquid 1 on the substrate P because the amount of liquid supplied from the front of the projection area AR1 is larger than that supplied from the opposite side with respect to the scanning direction. The moved substrate P is drawn to flow along the moving direction of the substrate P, and is sucked into the space between the projection optical system PL and the substrate P to be smoothly arranged. Therefore, the liquid 1 supplied from the liquid supply mechanism 10 is smoothly arranged between the projection optical system PL and the substrate P even if the supply energy is small, and the liquid immersion area AR2 can be formed satisfactorily. Then, the flow direction of the liquid 1 can be switched by changing the amount of liquid supplied from each of the supply ports 13A and 14A according to the scanning direction. Therefore, even when the substrate P is scanned in either the +X direction or the -X direction, the liquid immersion region AR2 can be smoothly formed between the projection optical system PL and the substrate P, and high resolution and wide focus can be obtained. deep.

In addition, the recovery part 22 of the liquid recovery mechanism 20 is formed in an annular shape so as to surround the projected area AR1 and the supply parts 13, 14, because it is at a plurality of positions spaced apart in a plurality of directions different from the projected area AR1 (from Since the liquid 1 on the substrate P is collected simultaneously on different sides of the projection area AR1, it is possible to reliably prevent abnormal occurrences of the liquid 1 from flowing out of the substrate P or splashing. That is, the liquid recovery mechanism 20 completes the recovery of the liquid 1 forming the liquid immersion region AR2 before the series of exposure processing operations related to one substrate P are completed (until the exposure processing of all the imaging regions S1 to S12 on the corresponding substrate P is completed). (above), since the recovery operation is continuously performed from the recovery port 22A arranged to surround the projection area AR1, even if the liquid 1 spreads in any direction during a series of exposure processing operations on the substrate P, the liquid 1 can be recovered well. In addition, in a series of exposure processing operations related to the substrate P, since it is not necessary to stop the suction of the liquid from the recovery port 22A, it is possible to suppress the vibration accompanying the stop of the liquid suction.

In addition, by providing the collecting member 30 that catches the liquid 1 that cannot be completely recovered by the liquid recovery mechanism 20 , it is possible to prevent abnormal occurrences such as the outflow of the liquid 1 to the outside of the substrate P or splashing. However, in this embodiment, since the collection surface 31 is formed in an elliptical shape in plan view with the scanning direction (X-axis direction) along which the liquid 1 most likely to flow out to the outside of the substrate P as the longitudinal direction, it can reliably prevent the liquid from 1 out to the outside. In addition, since the collection surface 31 is subjected to lyophilization treatment to increase the affinity with the liquid 1, the liquid 1 that is about to flow out can be well captured. Furthermore, since the liquid affinity of the collection surface 31 is higher than that of the surface of the substrate P due to the surface treatment, the liquid 1 that is about to flow out to the outside is captured by the collection surface 31 without adhering to the substrate P, so that The occurrence of an abnormality in which the liquid 1 remains on the surface of the substrate P is prevented. In addition, since the collection surface 31 is inclined upward with respect to the projection area AR1 as it goes outward, the liquid 1 that is about to flow out to the outside can be captured well, and when the scanning direction of the substrate P is in the opposite direction, the captured Since the liquid 1 passes downward on the collection surface 31 , it can be recovered well by the recovery port 22A connected to the collection surface 31 .

In addition, since the liquid contact surface 2a provided from the liquid supply mechanism 10 for liquid immersion exposure is higher in hydrophilicity than that of the photosensitive material coated on the surface of the substrate P Liquid (water) 1, so while the optical path between the projection optical system PL and the substrate P can be reliably filled with the liquid 1, the liquid (1) supplied to the substrate (P) is smoothly recovered, and the liquid 1 can be prevented. Abnormalities such as bleeding or splashing.

Furthermore, in the present embodiment, when the liquid 1 is supplied from both sides of the projection area AR1 in the scanning direction, in the scanning direction, the amount of liquid supplied on the side closer to the projection optical system is larger than that on the side farther from the projection optical system. The amount of liquid supplied is still larger, but the amount of liquid 1 supplied from both sides of the projection area AR1 may be set to be the same. In this case, since the supply amount of the liquid 1 does not change even when the scanning direction is switched, the occurrence of the water hammer phenomenon can be more reliably prevented. On the other hand, by changing the amount of liquid supplied from both sides of the projection area AR1 in the scanning direction according to the scanning direction while continuously supplying the liquid 1 , the usage amount of the liquid 1 can be suppressed while suppressing the occurrence of the water hammer phenomenon.

Furthermore, in the present embodiment, the configuration is such that the supply of the liquid 1 from the supply ports 13A and 14A is continuously performed during the exposure processing operation for one substrate P without stopping in the middle. For example, it may be configured such that when the substrate P is scanned to the +X side, the liquid supply from the supply port 14A is stopped and only the liquid 1 is supplied from the supply port 13A, and when the substrate P is scanned to the −X side, the supply from the supply port 14A is stopped. The supply of liquid from the supply port 13A supplies only the liquid 1 from the supply port 14A. Furthermore, it may be configured such that the liquid supply mechanism 10 stops the supply of the liquid 1 to the substrate P when the substrate P is moved in steps. In this case, when scanning exposure is started, the liquid 1 may be supplied for a predetermined period of time and the scanning exposure may be performed after the vibration of the liquid subsides. By providing such a structure, the usage-amount of the liquid 1 can be suppressed. on the other hand. By continuously supplying the liquid 1, since there is no need to set a waiting time until the vibration of the liquid subsides, the throughput can be increased.

In the present embodiment, the supply ports 13A and 14A of the liquid supply mechanism 10 are provided on both sides in the scanning direction with respect to the projection area AR1, but they may be located in the projection area AR1 so as to completely surround the projection area AR1, for example. Supply ports (supply parts) are provided on both sides of the non-scanning direction. Then, the liquid 1 may be supplied onto the substrate P from the supply ports provided so as to surround the projected area AR1 . Here, when supply ports are provided on both sides of the scanning direction and on both sides of the non-scanning direction of the projection area AR1, that is, when four supply ports are independently provided so as to surround the projection area AR1, one side During the exposure process while moving the substrate P in the scanning direction, the liquid 1 may be supplied from all of the four supply ports, or the liquid 1 may be supplied only from the supply ports arranged on both sides of the scanning direction, and stop (or provide a small amount) from the supply ports. Liquid supply from supply ports provided on both sides in the non-scanning direction. Then, when the substrate P is moved in the non-scanning direction, the liquid may be supplied from the supply ports provided on both sides of the non-scanning direction. Alternatively, a configuration may be adopted in which an annular supply member is provided so as to surround the projected area AR1, and the liquid 1 is supplied onto the substrate P via the supply member. In this case, since only one liquid supply part for sending the liquid 1 to the supply means is required, the structure of the device can be simplified. On the other hand, as shown in the above-mentioned embodiment, if there are supply ports 13A, 14A on both sides of the scanning direction relative to the projection area AR1, the projection area AR1 can be sufficiently provided on the liquid immersion area AR2, and the use of the liquid 1 can be suppressed. quantity.

In addition, in the structure of this embodiment, the supply ports 13A, 14A of the liquid supply mechanism 10 are provided on both sides in the scanning direction with respect to the projection area AP1, and when the space between the projection optical system PL and the substrate P is sufficiently filled with the liquid 1 In this case, the liquid can be supplied from one supply port arranged close to the projection area AR1. In this case, by continuously supplying the liquid from the one supply port until the exposure of all images on one substrate P is completed, the occurrence of the water hammer phenomenon can be suppressed, and the usage amount of the liquid can be suppressed.

Furthermore, in the above-mentioned embodiment, the first and second supply members 13, 14 and the recovery member 22 are separated, but the first and second supply members 13, 14 and the recovery member 22 may also be connected, or may be arranged on the first , The connecting member that connects them between the second supply members 13 and 14 and the recovery member 22 . In addition, in the above embodiment, the case where the internal channels 13H, 14H of the supply members 13, 14 and the internal channel 22H of the recovery unit 22 are perpendicular to the surface of the substrate P has been described, but they may be inclined. For example, it may be provided so that the internal flow paths 13H, 14H (or the supply ports 13A, 14A) of the supply members 13, 14 face the projected area AR1 side. Furthermore, the distances (heights) of the supply ports 13A, 14A and the recovery port 22A of the recovery unit 22 with respect to the surface of the substrate P may be different.

Furthermore, each of the liquid supply mechanism 10 including the supply members 13 and 14 and the liquid recovery mechanism 20 including the recovery member 22 is preferably supported by a support member other than the projection optical system PL and the support member that supports the projection optical system PL. Accordingly, vibrations generated in the liquid supply mechanism 10 and the liquid recovery mechanism 20 can be prevented from being transmitted to the projection optical system PL. In addition, on the contrary, since the projection optical system PL and the supply members 13 and 14 are brought into contact without gaps, an effect of preventing air from being mixed into the liquid 1 can also be expected.

Another embodiment of the present invention will be described below. Here, in the following description, the same reference numerals are attached to the same or equivalent components as those of the above-mentioned embodiment, and the description thereof is simplified or omitted.

The structure of the liquid recovery mechanism 20 of the above-mentioned embodiment includes: a liquid recovery part 21; on this liquid recovery part 21, it is connected via a recovery pipe 21A, and has a recovery part 22 continuously formed in an annular recovery port 22A, but also A plurality of liquid recovery sections may be provided. Thereby, the dispersion|variation of the recovery force at each recovery position of 22 A of recovery ports can be suppressed. In addition, the control device CONT may vary the respective recovery forces of the plurality of liquid recovery units according to the liquid recovery position. See Figure 7.

FIG. 7 is a diagram showing another embodiment of the present invention, and is a schematic plan view showing another example of the liquid recovery mechanism 20 . In Fig. 7, the liquid recovery mechanism 20 includes: a first liquid recovery part 26; a second liquid recovery part 27; a first recovery part 28 connected via a recovery pipe 26A on the first liquid recovery part 26; The second recovery unit 29 connected to the recovery unit 27 via a recovery pipe 27A. Each of the first and second collection members 28 and 29 is formed in a substantially arc shape in plan view, and the first collection member 28 is arranged on the -X side of the projected area AR1. On the other hand, the second collection member 29 is arranged on the On the +X side of the projection area AR1. Furthermore, the first and second recovery means 28 and 29 are provided with a recovery port facing the substrate P side and a partition member provided therein, as in the above-mentioned embodiment. In addition, the recovery operations of the first and second liquid recovery means 26 and 27 are independently performed by the control device CONT.

When scanning and exposing the shot area on the substrate P, the control device CONT supplies the liquid 1 onto the substrate P from the liquid supply mechanism 10, and drives the first and second liquid recovery parts 26 and 27 in the liquid recovery mechanism 20. Each, the liquid 1 on the substrate P is recovered. Here, the control device CONT controls the liquid recovery force of the liquid recovery mechanism 20 to vary according to the liquid recovery position. Specifically, the control device CONT sets the liquid recovery amount (recovery force) per unit time in front of the projection area AR1 to be smaller than the liquid recovery amount on the opposite side with respect to the scanning direction. That is, the liquid recovery force is increased on the scanning direction front side (downstream side through which the liquid 1 flows). Specifically, when the substrate P moves in the +X direction, the recovery force of the second recovery member 29 (second liquid recovery member 27) disposed on the +X side is set to be greater than that of the projection area AR1 - The recovery force of the first recovery member 28 (first liquid recovery part 26 ) on the X side is large. Accordingly, the liquid recovery operation on the substrate P can be smoothly performed while preventing the fluid 1 from flowing out to the outside.

Furthermore, in the above-mentioned embodiment, the liquid recovery operation using the first and second liquid recovery members 26 and 27 is configured to be performed simultaneously, but it may be configured to be performed separately. For example, it is configured such that when the substrate P moves in the −X direction, only the second recovery member 29 (second liquid recovery unit 27) that is disposed on the +X side with respect to the projection area AR1 performs the liquid recovery operation, and stops the liquid recovery operation by the second recovery member 29 (second liquid recovery unit 27). 1. Liquid recovery operation by the recovery unit 28 (first liquid recovery unit 26). In this case, since the liquid 1 mainly flows on the +X side, the liquid 1 can be recovered only by the recovery operation of the second liquid recovery part 27 .

In addition, in each of the above-mentioned embodiments, the recovery member disposed in the liquid recovery mechanism 20 surrounds the entire projection area AR1, but it may be configured only on both sides of the projection area AR1 in the scanning direction.

In addition, in each of the above-mentioned embodiments, the recovery members of the liquid recovery mechanism 20 are formed continuously so as to surround the projected area AR1 , but as shown in FIG. 8 , a plurality of recovery members 22D may be arranged intermittently. Similarly, the configuration may also be such that a plurality of supply members 13D, 14D are intermittently arranged for the liquid supply mechanism 10 as well. In this case, since the recovery operation is continuously performed by the recovery ports arranged to surround the projected area AR1, even if the liquid 1 spreads in a certain direction, the liquid 1 can be recovered satisfactorily.

In addition, in the case where a plurality of recovery members of the liquid recovery mechanism 20 are provided, the liquid recovery mechanism 20 calculates the liquid recovery force (the liquid recovery amount per unit time) at positions separated from the projection area AR1 in the scanning direction. ), which is greater than the liquid recovery force at a position different from it, specifically at a position spaced apart in the non-scanning direction, and the liquid 1 on the substrate P can be recovered smoothly during scanning exposure.

In addition, by connecting a plurality of liquid recovery units including vacuum pumps and the like to each of the divided spaces 24 divided by the partition member 23 via recovery pipes, and independently controlling the recovery operations of these multiple liquid recovery units, the recovery force can be adjusted according to the liquid recovery position. different. Furthermore, on each of the divided spaces 24, the liquid recovery part is not connected respectively, but a plurality of recovery pipes are used to connect one liquid recovery part and each of the plurality of divided spaces 24, valves are set on each of these recovery pipes, and the valves are adjusted by adjusting the valves. Depending on the opening degree, the recovery force can be varied according to the liquid recovery position. Furthermore, by changing the respective lengths of the plurality of recovery pipes, the recovery forces in the respective divided spaces 24 can also be made different by pressure loss.

Furthermore, in each of the above-described embodiments, the supply member of the liquid supply mechanism 10 has a substantially circular arc shape in planar view, but may also have a linear shape as shown in FIG. 9 . Here, the linear supply members 13 and 14 shown in FIG. 9 are provided on both sides of the projection area AR1 in the scanning direction, respectively. Likewise, the recovery member 22 of the liquid recovery mechanism 20 is not limited to a ring shape, and may be in a rectangular shape as shown in FIG. 9 .

As shown in FIG. 10( a ), a porous body 40 may be provided on the internal flow path 13H ( 14H) of the supply member 13 ( 14 ) of the liquid supply mechanism 10 . Alternatively, as shown in FIG. 10( b ), a partition member 41 may be provided to form a slit-shaped flow path. In this way, the liquid 1 supplied from the supply means 13 ( 14 ) onto the substrate P can be rectified, and abnormalities such as turbulent flow or liquid vibration on the substrate P can be suppressed.

In each of the above-mentioned embodiments, it has been described that the collecting member 30 (collecting surface 31 ) has an elliptical shape in plan view, but it may also be in a circular or rectangular shape. On the other hand, since the place where the liquid 1 is likely to flow out is on both sides of the projection area AR1 in the scanning direction, the liquid 1 to flow out can be well captured by providing the collecting member 30 in an elliptical shape as described above. In addition, in the above-mentioned embodiment, the configuration is such that the collection member 30 (collection surface 31) has an elliptical shape, and is installed on the entire outside of the liquid recovery position of the recovery member 22 so as to surround the recovery member 22. For example, it can be installed only on the Both sides of the projection area AR1 in the scanning direction are not provided at positions separated from the projection area AR1 in the non-scanning direction. Since the positions where the liquid 1 does not easily flow out are on both sides of the scanning direction, even if the collecting members 30 are provided only on both sides of the projection area AR1 in the scanning direction, the liquid 1 to flow out can be well captured. In addition, the inclination angle of the collection surface 31 may differ according to the position. For example, in the collection surface 31 , the inclination angle near both sides in the scanning direction of the projection area AR1 may be made larger than other portions. In addition, the collecting surface 31 does not need to be a plane, and may be a shape combining a plurality of planes, for example.

FIG. 11 is a diagram showing another embodiment of the collection surface 31 of the collection member 30 . As shown in FIG. 11, the collection surface 31 may be curved. Specifically, as shown in FIG. 11 , the collection surface 31 may be, for example, a two-dimensional curved shape or an arc shape in cross-section. Here, the collection surface 31 is ideally a curved surface that expands toward the substrate P side. Even such a shape can catch liquid 1 well.

Alternatively, as shown in FIG. 12 , surface area enlarging treatment, specifically roughening treatment, may be performed on the collection surface 31 . The surface area of the collecting surface 31 is enlarged by the rough surface treatment, and the liquid 1 can be caught even more favorably. Furthermore, the roughening process does not need to be performed on the entire surface of the collection surface 31, and it may be configured such that the roughening treatment is performed only on a part of the collection surface 31 along the scanning direction, for example.

As shown in FIG. 13 , the collection member 30 may be constituted by a plurality of fan-shaped members 32 . In FIG. 13 , the fan-shaped member 32 is substantially triangular in side view, and the side (lower side) facing the substrate P is inclined upward as the relative projection area AR1 goes outward. Then, the plurality of fan-shaped parts 32 are mounted radially on the outer surface of the recovery part 22 with their longitudinal directions facing outward. Here, the plurality of fan-shaped members 32 are spaced apart, and a space portion 33 is formed between each fan-shaped member 32 . The liquid 1 that cannot be completely recovered by the recovery member 22 is caught in the space portion 33 between the fan-shaped members 32 by surface tension, so that the liquid 1 is prevented from flowing to the outside of the substrate P.

Furthermore, the plurality of fan-shaped members 32 may be arranged at equal intervals, or may be arranged at unequal intervals. For example, the interval between the fan-shaped members 32 provided at positions along the scanning direction may be set smaller than the interval between the fan-shaped members 32 provided at positions along the non-scanning direction. In addition, the lengths (sizes in the radial direction) of the plurality of sector members 32 may be the same, and the sector members 32 provided at positions along the scanning direction may be longer than sector members 32 provided at other positions. In addition, in the collecting member 30, a part of the region may be constituted by a fan-shaped member, and the remaining region may be constituted by a collecting surface. Furthermore, the structure may be such that the fan-shaped member 32 is attached to the collecting surface 31 described with reference to FIG. 4 and the like. Furthermore, preferably, the surface of the fan-shaped member 32 is also subjected to a lyophilic treatment to increase the affinity with the liquid 1 .

In each of the above-mentioned embodiments, when a lyophilic treatment is performed on the collection surface 31 (or the fan-shaped member 32 ), the collection surface 31 may also have a lyophilic distribution. In other words, the surface treatment can be performed so that the liquid contact angles of a plurality of regions on the surface treated surface have different values. For example, in the collecting surface 31 , the lyophilicity of a part of the area outside the projected area AR1 may be lower than that of the inside area. Furthermore, the configuration may be such that the entire collecting surface 31 does not need to be lyophilized, and only a part of the region along the scanning direction is lyophilized, for example.

Furthermore, in the above-mentioned embodiment, it has been described that the collection surface 31 is subjected to a lyophilic treatment, but in the liquid recovery unit 20 of the liquid supply mechanism 10 , the surface of the channel through which the liquid 1 flows may also be given a hydrophilic treatment. In particular, liquid recovery can be performed smoothly by subjecting the recovery member 22 of the liquid recovery mechanism 20 to a lyophilic treatment. Alternatively, a lyophilic treatment may be performed on the front end portion of the projection optical system PL including the lens barrel PK in contact with the liquid 1 . Furthermore, when the thin film is formed on the optical element 2, because it is arranged on the optical path of the exposure light beam EL, it is formed with a material that is transparent to the exposure light beam EL, and its film thickness is also set so that it can transmit the exposure light beam EL. The degree of beam EL.

In addition, the thin film used for surface treatment may be a single-layer film or a film composed of multiple layers. In addition, as the forming material, any material may be used as long as it is a material that can exhibit desired performance such as metal, metal compound, or organic substance.

In addition, the surface of the substrate P can also be subjected to surface treatment in accordance with the affinity of the liquid 1 . Furthermore, as described above, the liquid affinity of the collection surface 31 is desirably higher than the liquid affinity of the substrate P surface.

Next, another embodiment of the liquid supply mechanism 10 and the liquid recovery mechanism 20 of the present invention will be described with reference to FIG. 14 .

In FIG. 14, the liquid supply mechanism 10 includes: a first liquid supply part 11 and a second liquid supply part 12; The second supply part 14 provided on the other side (+X side); the first supply pipe 41 connecting the first liquid supply part 11 and the first supply part 13; the second liquid supply part 12 and the second supply part 14 of the second supply pipe 42 . The first and second supply members 13 and 14 are the same as the embodiments described with reference to FIGS. Roughly arc-shaped.

The first supply pipe 41 connecting the first supply unit 11 and the first supply member 13 has a straight pipe portion 43 and a slit pipe portion 44 . One end portion of the straight pipe portion 43 is connected to the first liquid supply portion 11 , and the other end portion of the straight pipe portion 43 is connected to one end of the slit pipe portion 44 . In addition, the other end of the slit tube portion 44 is connected to the upper end portion of the internal flow path 13H of the first supply member 13 . One end portion of the slit pipe portion 44 is formed to be approximately the same size as the straight pipe portion 43 , and the other end is formed to be approximately the same size as the upper end portion of the first supply pipe member 13 . Then, the slit pipe portion 44 gradually expands in the horizontal direction from one end portion to the other end portion to form a substantially triangular shape in plan view, and the slit-shaped internal flow path 44H formed in the slit portion 44 is formed from one end portion to the other end portion. To expand gradually in the horizontal direction.

The second supply pipe 42 connecting the second liquid supply part 12 and the second liquid supply part 14 has a straight pipe part 45 and a slit pipe part 46 . One end portion of the straight pipe portion 45 is connected to the second liquid supply portion 12 , and the other end portion of the straight pipe portion 45 is connected to one end portion of the slit pipe 46 . In addition, the other end of the slit tube portion 46 is connected to the upper end portion of the internal flow path 14H of the second supply member 14 . One end portion of the slit pipe portion 46 is formed to have approximately the same size as the straight pipe portion 45 , and the other end portion is formed to have approximately the same size as the upper end portion of the second supply member 14 . Then, the slit pipe portion 46 is formed into a substantially triangular shape in plan view that gradually expands on the horizontal slit from one end portion to the other end portion, and the slit-shaped internal flow path 46H formed on the slit pipe portion 46 is formed from one end portion to the other end portion. The portion toward the other end gradually expands in the horizontal direction.

The liquid recovery mechanism 20 includes: a recovery member 22 formed annularly in plan view; a plurality of liquid recovery units 61-64; In the present embodiment, the liquid recovery part is constituted by four first to fourth liquid recovery parts 61 to 64, and the recovery pipes are constituted by four first to fourth recovery pipes 71 to 74 corresponding thereto. As in the embodiment described with reference to FIGS. 2 and 3 , the recovery member 22 includes an annular internal flow path 22H and a recovery port 22A formed at the lower end portion thereof. Furthermore, no blocking member ( 23 ) is provided in the internal flow path 22H of the embodiment shown in FIG. 14 . The recovery member 22 of the liquid recovery mechanism 20 is arranged outside the first and second supply members 13 , 14 of the liquid supply mechanism 10 .

The first recovery pipe 71 connecting the first liquid recovery unit 61 and the recovery unit 22 among the plurality of liquid recovery members has a straight pipe portion 75 and a slit pipe portion 76 . One end portion of the straight pipe portion 75 is connected to the first liquid recovery portion 61 , and the other end of the straight pipe portion 75 is connected to the other end of the slit pipe member 76 . In addition, the other end of the slit pipe portion 76 is connected to the upper end portion of the internal flow path 22H of the recovery member 22 . Here, one end portion of the slit pipe portion 76 is formed to be approximately the same size as the straight pipe portion 75, while the other end portion of the slit pipe portion 76 is formed to be approximately 1/3 of the upper end portion of the annular recovery member 22. 4 sizes. Then, the slit pipe portion 76 is formed in a substantially triangular shape in plan view so as to expand gradually in the horizontal direction from one end portion to the other end portion, and the slit-shaped internal flow path 76H formed in the slit pipe portion 76 is formed from One end portion gradually expands toward the other end portion.

Similarly, the second recovery pipe 72 connecting the second liquid recovery part 62 and the recovery part 22 has a straight pipe part 77 and a slit pipe part 78, and one end part of the slit pipe part 78 is formed to be approximately the same size as the straight pipe part 77, and the other On the one hand, the other end of the slit pipe portion 78 is formed to be approximately 1/4 the size of the upper end portion of the annular recovery member 22 . The slit tube portion 78 is formed in a substantially triangular shape in plan view, and the slit tube-shaped internal flow path 78H formed in the slit tube portion 78 is formed to gradually expand in the horizontal direction from one end portion to the other end. In addition, the 3rd recovery pipe 73 connecting the recovery member 22 of the 3rd liquid recovery part 63 has a straight pipe part 79 and a slit pipe part 80, and the 4th recovery pipe 74 connecting the 4th liquid recovery pipe part 64 and the recovery part 22 has a straight pipe part 79 and a slit pipe part 80. Tube portion 81 and slit tube portion 82 . Then, the other ends of the slit pipe portions 80 and 82 are each formed to be approximately 1/4 the size of the upper end portion of the annular recovery member 22 . Then, each of the slit tube parts 80, 82 is formed in a substantially triangular shape in plan view, and each of the slit-shaped internal flow paths 80H, 82H formed on the slit tubes 80, 82 is formed from one end portion to the other end portion. Gradually widen across the horizontal gap.

Among the parts constituting the liquid supply mechanism 10 and the liquid recovery mechanism 20, the components through which the liquid flows, specifically the supply pipes 41, 42 and the recovery pipes 71 to 74, as described above, can be formed of synthetic resins such as polytetrafluoroethylene. Metals such as stainless steel and aluminum can be used. In this embodiment, the member through which the liquid flows is made of metal. In particular, the components constituting the liquid flow path in the liquid supply mechanism 10 and the liquid recovery mechanism 20 are made of aluminum. Since the contact angle between aluminum and liquid (water) is small, the liquid can flow smoothly. In addition, although not shown in FIG. 14 , a collection member 30 is provided around the recovery member of the liquid recovery mechanism 20 as in the previous embodiment.

Hereinafter, the operations of the liquid supply mechanism 10 and the liquid recovery mechanism 20 will be described. In order to form the liquid immersion area ( AR2 ), the control device CONT drives each of the first and second liquid supply parts 11 and 12 of the liquid supply mechanism 10 . The liquid 1 sent from the first and second liquid supply parts 11 and 12 is supplied to the substrate P via the first and second supply members 13 and 14 after passing through the first and second supply pipes 41 and 42 respectively. . Here, after the liquid 1 sent from the first liquid supply member 11 flows on the straight pipe portion 43 of the first supply pipe 41, it spreads in the horizontal direction (transverse direction) by flowing on the slit pipe 44, and flows in the slit pipe portion. The other end of 44 is expanded to approximately the size in the Y-axis direction of the internal flow path 13H (supply port 13A) of the first supply member 13, and supplied onto the substrate P via the internal flow path 13H of the first supply member 13. Accordingly, the liquid 1 is supplied to the substrate P at a substantially uniform liquid supply amount at each position of the substantially arc-shaped supply port 13A whose longitudinal direction is the Y-axis direction. Similarly, the liquid 1 sent from the second liquid supply part 12 also flows through the straight pipe part 45 of the second supply pipe 42, and expands in the horizontal direction (transverse direction) through the slit pipe 46, because it is supplied to the second liquid supply part 12. Therefore, the supply member 14 supplies the substrate P with a substantially uniform liquid supply amount at each position of the supply port 14A.

That is, in the embodiment described with reference to FIG. 2 and FIG. 3 , since all the supply pipes 11A are made of straight pipes, the supply pipe 11A of the straight pipes is directly supplied to the first supply member 13 whose longitudinal direction is the Y-axis direction. For liquid, due to the difference in the flow path area, the amount of liquid supplied at the central portion of the supply port 13A in the longitudinal direction of the first supply member 13, that is, at the position directly below the supply pipe 11A, is different from the length of the supply port 13A. There is a difference in the liquid supply amount at the direction end, that is, at a position separated from the supply pipe 11A, and the liquid supply amount is not uniform at each position of the supply port 13A. Specifically, the amount of liquid supplied in the longitudinal center portion of the supply port 13A (the position directly below the supply pipe 11) is larger than that in the longitudinal end portion of the supply port 13A (the position separated from the supply pipe 11A). The amount of liquid supplied is large, and the liquid may not be supplied uniformly, resulting in unevenness in the liquid immersion area AR2. However, when the liquid 1 is supplied from the first liquid supply unit 11 on the first supply member 13 (supply port 13A) whose Y-axis direction is set as the longitudinal direction, at least a part of the supply pipe 41 has a flow path size that is different from that of the first supply pipe 41. The size of the member 13 is set accordingly. As shown in the present embodiment, by providing a part of the supply pipe 41 toward the first supply member 13, the slit pipe portion 44 having a trumpet-shaped internal flow path 44H that gradually expands in the horizontal direction Therefore, the liquid 1 can be supplied onto the substrate P with a substantially uniform liquid supply amount at each position of the supply port 13A of the first supply member 13 whose longitudinal direction is the Y-axis direction. Similarly, the liquid 1 sent from the second liquid supply unit 12 is also uniformly supplied onto the substrate P via the second supply pipe 42 and the second supply member 14 .

Furthermore, the control device CONT drives each of the first to fourth liquid recovery units 61 to 64 of the liquid recovery mechanism 20 to recover the liquid 1 on the substrate P via the recovery member 22 and the first to fourth recovery pipes 71 to 74 . Each of the first to fourth liquid recovery members 61 to 64 recovers the liquid 1 on the substrate P by suction through the first to fourth recovery pipes 71 to 74 . Then, the liquid 1 on the substrate P is recovered with a substantially uniform recovery amount (recovery force) at each position of the recovery port 22A of the annular recovery member 22 .

That is, as described above, if the recovery pipe of the straight pipe is directly connected to the recovery member 22, since the flow path area is different, there will be a difference in the liquid recovery amount (recovery force) at each position of the recovery port 22A, resulting in liquid recovery. The amount is not uniform at each position of the recovery port 22A. For example, the amount of liquid recovered at the position directly below the recovery pipe is larger than the liquid supply amount at other positions, and the liquid cannot be recovered uniformly, which may cause unevenness in the liquid immersion area AR2. However, as shown in the present embodiment, by providing a part of the recovery pipe as the slit pipe parts 76, 78, 80, 82 having a trumpet-shaped internal flow path that gradually expands toward the recovery member 22 in the horizontal direction, the circular The liquid on the substrate P can be recovered with a substantially uniform liquid recovery amount at each position of the recovery port 22A of the annular recovery member 22 .

In this way, the liquid can be uniformly supplied at each position of the supply ports 13A and 14A, and can be uniformly recovered at each position of the recovery port 22A, so that a uniform liquid immersion area AR2 can be formed.

In the embodiment described with reference to FIG. 14 , the internal flow path 44H ( 46H) of the slit pipe portion 44 ( 46 ) has a hollow shape, and as shown in FIG. In the internal flow path 44H (46H) of the slit tube portion 44 (46), a plurality of fan-shaped members 85 may be provided along the flow direction of the liquid 1 (from one end portion of the slit tube portion to the other end portion). Accordingly, the liquid 1 can be supplied onto the substrate P via the supply member 13 ( 14 ) after rectification. Furthermore, this fan-shaped member 85 may be extended to the internal flow path 13H (14H) of the supply member 13 (14). In addition, a fan-shaped member 85 is provided on each of the internal flow paths 76H, 78H, 80H, and 82H of the slit pipe portions 76 , 78 , 80 , and 82 constituting the recovery pipe of the liquid supply mechanism 20 .

Furthermore, for example, when the substrate P is scanned and moved at a high speed, it is considered that the liquid 1 on the substrate P cannot be completely recovered even in the embodiment shown in FIG. Case. In this case, the lower surfaces of the substantially triangular-shaped slit tubes 44 and 46 arranged at positions along the scanning direction (X-axis direction) of the substrate P may be used as the collecting surface instead of the collecting member 30 .

Furthermore, in the present embodiment, the structure is such that a plurality of recovery pipes 71 to 74 are connected to one recovery unit 22, but the structure may be such that a plurality of recovery units (recovery tubes 71 to 74) are connected to each other. mouth) close to the substrate P set.

Hereinafter, another embodiment of the liquid supply mechanism 10 and the liquid recovery mechanism 20 of the present invention will be described with reference to FIGS. 16 to 19 .

Fig. 16 is a perspective view showing the liquid supply mechanism (10) and the liquid recovery mechanism (20) of this embodiment. In Fig. 16, the liquid supply mechanism (10) includes: the first and the second liquid supply parts 11 and 12; 42. The liquid recovery mechanism (20) includes: first to fourth liquid recovery units 61 to 64; first to fourth recovery pipes 71 to 74 connected to the first to fourth liquid recovery units 61 to 64, respectively. One end of each of the first and fourth supply pipes 41 and 42 is connected to the first and second liquid supply parts 11 and 12 , and the other end is connected to a supply flow path described later formed by the flow path forming member 90 . One end of each of the first to fourth recovery pipes 71 to 74 is connected to the first to fourth liquid recovery members 61 to 64 , and the other end is connected to a recovery flow path described later formed by the flow path forming member 90 .

The flow path forming member 90 includes: a first member 91 ; a second member 92 arranged above the first member 91 ; and a third member 93 arranged above the second member 92 . The flow path forming member 90 is disposed so as to surround the projection optical system PL. The first to third members 91 to 93 constituting the flow path forming member 90 are each rectangular plate-shaped members of the same size, and have a central portion that can be arranged. Hole portions 91A to 93A of projection optical system PL. The hole portions 91A to 93A are formed to communicate with each other. In addition, the first and second supply pipes 41 and 42 are connected to the uppermost third member 93 among the first to third members, and the first to fourth recovery pipes 71 to 74 are connected to the middle second member 92 .

FIG. 17 is a perspective view showing the first member 91 arranged at the lowermost stage among the first to third members. The first member 91 includes: formed on the −X side of the projection optical system PL, a first supply hole portion 94A forming a supply port for supplying the liquid 1 to the substrate 1; and formed on the +X side of the projection optical system PL. A second supply hole portion 95A of a supply port for supplying liquid to the substrate 1 is formed. Each of the first supply hole portion 94A and the second supply hole portion 95A is formed in a substantially arc shape in plan view. Furthermore, the first member 91 includes: a first recovery hole 96A formed on the -X side of the projection optical system PL to form a recovery port for recovering liquid on the substrate P; , forming the second recovery hole portion 97A of the recovery port for recovering the liquid on the substrate P; being formed on the +X side of the projection optical system PL, forming the third recovery hole portion 98A of the recovery port for recovering the liquid on the substrate P; The fourth recovery hole portion 99A is formed on the +Y side of the projection optical system PL to form a recovery port for recovering the liquid on the substrate P. As shown in FIG. Each of the first to fourth recovery hole portions 96A to 99A is formed in a substantially circular arc shape in plan view, and is provided at substantially equal intervals along the periphery of the projection optical system PL. In addition, each of the recovery hole portions 96A to 99A is provided on the outer side of the projection optical system PL than the supply hole portions 94A and 95A.

Fig. 18 is a perspective view showing the second member 92 disposed on the middle section among the first and third members, Fig. 18(a) is a perspective view viewed from the upper side, and Fig. 18(b) is viewed from the lower side Oblique view. The second part 92 includes: formed on the -X side of the projection optical system PL, the third supply hole portion 94B connected to the first supply hole 94A of the first part 91; formed on the +X side of the projection optical system PL Above, the fourth supply hole portion 95B connected to the second supply hole 95A of the first member 91 . The shapes and sizes of the third and fourth supply holes 94B and 95B correspond to those of the first and second supply hole portions 94A and 95A.

Furthermore, the second member 92 includes: a first recovery groove portion 96B that is formed on the -X side of the projection optical system PL on its lower surface and connected to the first recovery hole portion 96A of the first member 91; On the -Y side of the system PL, the second recovery groove portion 97B connected to the second recovery hole 97A of the first component 91; The third recovery groove 98B connected to the hole 98A; the fourth recovery groove 99B formed on the +Y side of the projection optical system PL and connected to the fourth recovery hole 99A of the first member 91 . Each of the first to fourth recovery grooves 96B to 99B is formed in a substantially circular arc shape in plan view so as to correspond to the shape and size of the first to fourth recovery holes 96A to 99A, along the periphery of the projection optical system PL. Roughly equally spaced. Moreover, the 1st recovery pipe 71 and the 2nd recovery groove part 96B are connected via the trumpet-shaped groove part 96T. The trumpet-shaped groove portion 96T is formed so as to gradually expand in the horizontal direction from the connection portion with the first recovery pipe 71 to the first recovery groove portion 96B. Similarly, the 2nd recovery pipe 72 and the 2nd recovery groove part 97B are connected via the trumpet-shaped groove part 97T, the 3rd recovery pipe 73 and the 3rd recovery groove part 98B are connected via the trumpet-shaped groove part 98T, the 4th recovery pipe 74 and the 4th recovery pipe The recovery groove portion 99B is connected via a trumpet-shaped groove portion 99T.

Fig. 19 is a perspective view showing a third member 93 disposed on the uppermost stage among the first to third members, Fig. 19(a) is a perspective view from the upper side, and Fig. 19(b) is a perspective view from the lower side Look at the oblique view. The third member 93 includes: a first supply groove portion 94C formed on the -X side of the projection optical system PL on its lower surface and connected to the third supply hole portion 94B of the second member 92; On the +X side, the second supply groove portion 95C is connected to the fourth supply hole 95B of the second member 92 . The respective shapes and sizes of the first and second supply grooves 94C and 95C are formed so as to correspond to the third and fourth supply holes 94B and 95B (further, the first and second supply holes 94A and 95A) in planar view. arc shape. Moreover, the 1st supply pipe 41 and 94 C of 1st supply groove parts are connected via 94 T of trumpet-shaped groove parts. The trumpet-shaped groove portion 94T is formed so as to gradually expand in the horizontal direction from the connection portion facing the first supply pipe 41 toward the first supply groove portion 94C. Similarly, the second supply pipe 42 and the second supply groove portion 95C are connected via the belt-shaped groove portion 95T.

The first to third members 91 to 93 are formed of metal such as stainless steel, titanium, aluminum, or alloys containing them, and the holes and grooves of the members 91 to 93 are formed by, for example, electrical discharge machining. The members 91 to 93 are machined by electrical discharge machining, and the members 91 to 93 are bonded together with an adhesive, thermocompression bonding, or the like to form the flow path forming member 90 . By bonding each of the laminated members 91 to 93, each of the trumpet-shaped groove portion 94T, the first supply groove portion 94C, the third supply hole portion 94B, and the first supply hole portion 94A is connected (communicated), thereby forming a connection (communication) with the first supply hole portion. The supply pipe 41 is connected (communicated) with a supply flow path. Similarly, by connecting (communicating) each of the horn-shaped groove portion 95T, the second supply groove portion 95C, the fourth supply hole portion 95B, and the second supply hole portion 95A, a supply flow connected (communicated) with the second supply pipe 41 is formed. road. Then, the liquid 1 sent from the first and second liquid supply parts 11 and 12 is supplied onto the substrate P through the first and second supply pipes 41 and 42 and the above-mentioned supply flow path. That is, by laminating the plate-shaped members 91 to 93, the liquid supply flow path is formed.

Furthermore, by connecting (communicating) each of the trumpet-shaped groove portion 96T, the first recovery groove portion 96B, and the first recovery hole portion 96A, a recovery flow path connected (communicated) with the first recovery pipe 71 is formed. Similarly, by connecting each of the horn-shaped groove portion 97T, the second recovery groove portion 97B, and the second recovery hole portion 97A, a recovery flow path connected (communicated) with the second recovery pipe 72 is formed, and by connecting (communicating) the horn-shaped groove portion Each of the part 98T, the 3rd recovery groove part 98B and the 3rd recovery hole part 98A forms a recovery flow path connected (communicated) with the 3rd recovery pipe 73, and connects (communicates) the horn-shaped groove part 99T, the 4th recovery groove Each of the portion 99B and the fourth recovery hole portion 99A forms a recovery flow path connected (communicated) with the fourth recovery pipe 74 . Then, the liquid on the substrate P is recovered through the recovery channel and each of the first to fourth recovery pipes 71 to 74 .

At this time, since the horn-shaped grooves 94T and 95T are connected to each of the first and second supply pipes 41 and 42, as in the embodiment described with reference to FIG. The liquid can be supplied evenly at each position. Similarly, since the trumpet-shaped grooves are also connected to each of the recovery pipes 71 to 74, the liquid can be recovered with a uniform recovery force.

Then, by using the first to third members 91 to 93 as plate-shaped members to form the flow path forming member 90, for example, the flow path forming member 90 can absorb vibration generated when sucking air and sucking liquid during liquid recovery. In addition, since a part of the flow path is formed by performing machining such as electric discharge machining on each of the many plate-shaped members 91 to 93 , and a liquid flow path is formed by combining them, each of the supply flow path and the recovery flow path can be easily formed.

Furthermore, among the plurality of members 91 to 93 forming the flow path forming member 90, relative XY positions are provided around the first to fourth recovery hole portions 96A to 99A on the lower surface of the first member 91 arranged at the lowermost stage. The surface with an inclined plane can be used as a collection surface for capturing liquid that cannot be completely recovered by the liquid recovery mechanism by treating the surface with a lyophilicity. In addition, the members 91 to 93 forming the flow path forming member 90 are square plate-shaped members, but circular plate-shaped members may also be used, and may be provided as elliptical plate-shaped members long in the X direction.

In addition, both the supply flow path and the recovery flow path are formed inside the above-mentioned flow path forming member 90 , and only one of them may be provided inside the flow path forming member 90 . In addition, the flow path forming member formed by laminating a plurality of members may be provided separately for the supply flow path and for the recovery flow path.

Hereinafter, another further embodiment of the present invention will be described. As described above, it is desirable for the liquid supply mechanism 10 including the supply members 13 and 14 and the liquid recovery mechanism 20 including the recovery member 22 to use projection optical system PL and a support member other than the support member supporting the projection optical system PL. support. Hereinafter, the liquid supply mechanism 10 and the supporting structure supporting the liquid recovery mechanism 20 will be described with reference to FIG. 20 .

FIG. 20 is a schematic diagram showing the support structure of the liquid supply mechanism 10 and the liquid recovery mechanism 20 . In FIG. 20, the exposure apparatus EX includes: a barrel stage (first supporting member) 100 supporting the projection optical system PL; a main frame (second supporting member) supporting the barrel stage 100, the mask stage MST, and the substrate stage PST. )102. Furthermore, in FIG. 20 , the Z stage and the XY stage are shown integrally. The main frame 102 is set substantially horizontally by the leg portion 108 on the floor of a clean room or the like. On the main frame 102 , an upper segment portion 102A and a lower segment portion 102B protruding inward are formed.

The illumination optical system IL is supported by a support frame 120 fixed to the upper portion of the main frame 102 . In the upper section portion 102A of the main frame 102 , a mask stage 124 is supported via an anti-vibration device 122 . An opening through which the pattern image of the mask M passes is formed in the central portion of the mask stage MST and the mask stage 124 . A plurality of gas bearings (air bearings) 126 as non-contact bearings are provided on the lower surface of mask stage MST. The mask stage MST is supported in non-contact with the upper surface (guide surface) of the mask stage 124 by an air bearing 126, and can move two-dimensionally in the XY plane and finely rotate in the θZ direction by a mask stage driving device.

A flange 104 is provided on the outer periphery of the barrel PK holding the projection optical system PL, and the projection optical system PL is supported on the barrel platform 100 via the flange 104 . An anti-vibration device 106 including an air cushion or the like is disposed between the barrel platform 100 and the lower section 102B of the main frame 102, and the barrel platform 100 supporting the projection optical system PL is supported on the lower section of the main frame 102 by the anti-vibration device 106. on Section 102B. With this anti-vibration device 106, the barrel platform 100 and the main frame 102 are vibrationally isolated from each other so that the vibration of the main frame 102 is not transmitted to the barrel platform 100 supporting the projection optical system PL.

Gas bearings (air bearings) 130 as a plurality of non-contact bearings are provided on the lower surface of the substrate stage PST. Further, on the main frame 102 , a stage base 112 is supported by a vibration isolator 110 including an air cushion or the like. The substrate stage PST is supported in non-contact with the upper surface (guiding surface) of the stage base 112 by an air bearing 130, and can move two-dimensionally in the XY plane and finely move in the θZ direction by the substrate stage driving device. Furthermore, the substrate stage PST can also move in the Z direction, the θX direction, and the θY direction. With this anti-vibration device 110 , the stage base 112 and the main frame 102 are vibrationally isolated from each other so that the vibration of the main frame 102 is not transmitted to the stage base 112 which supports the substrate stage PST in non-contact.

A movable mirror 55 is provided at a predetermined position on the +X side on the substrate stage PST, and a reference mirror (fixed mirror) 114 is provided at a predetermined position on the +X side of the barrel PK. In addition, a laser interferometer 56 is provided at a position facing the moving mirror 55 and the reference mirror 114 . Since the laser interferometer 56 is mounted on the column platform 100 , the laser interferometer 56 , the liquid supply mechanism 10 , and the liquid recovery mechanism 20 are vibrationally isolated from each other. The laser interferometer 56 radiates a reference beam (reference light) onto the reference mirror 114 while irradiating the length measuring beam (measurement light) to the tube lens 55 . Based on the irradiated length measuring beam and the reference beam, the reflected light from the moving mirror 55 and the reference mirror 114 receives light on the light receiving part of the laser interferometer 56, and the laser interferometer 56 interferes with these lights to measure the optical path length of the reference beam. The change amount of the optical path length of the length-measuring beam as a reference, and then measure the position information of the moving mirror 55 with the reference mirror 114 as a reference, that is, the position information of the substrate stage PST. Similarly, although not at the same time, a movable mirror and a reference mirror are also provided on the substrate stage PST and on the +Y side of the column PK, and a laser interferometer is provided at a position facing them.

In addition, the self-focus detection system for measuring the focus position (Z position) and tilt of the substrate P on the column platform 100, the calibration system of the calibration mark on the substrate P, etc. are also supported by a measurement system not shown in the figure. The measurement system is also isolated from the main frame 102 , the liquid supply mechanism 10 , and the liquid recovery mechanism 20 in terms of vibration.

The liquid supply mechanism 10 and the liquid recovery mechanism 20 are supported by the lower section 102B of the main frame 102 . The configuration in this embodiment is: the first and second supply members 13, 14, supply pipes 11A, 12A constituting the liquid supply mechanism 10, and the recovery member 22 constituting the liquid recovery mechanism 20, the support member 140 for the recovery pipe 21A, etc. The supporting member 140 is connected to the lower section 102B of the main frame 102 . Furthermore, in FIG. 20 , supply members 13 and 14 , recovery member 22 , supply pipes 11A and 12A, recovery pipe 21A, and the like are shown in simplified form.

In this way, by supporting the liquid supply mechanism 10 and the liquid supply mechanism 20 with the main frame 102 vibratingly isolated from the lens barrel platform 100 supporting the projection optical system PL, the liquid supply mechanism 10 and the liquid recovery mechanism 20 and the projection optical system PL are vibrationally isolated from each other. Therefore, the vibration generated during liquid supply or liquid recovery will not be transmitted to measurement systems such as projection optical system PL, laser interferometer 56 and self-focus detection and calibration system via lens barrel platform 100 . Therefore, it is possible to prevent an abnormal situation in which the pattern image deteriorates due to vibration of the projection optical system, and since the position of the substrate stage (substrate P) can be controlled with high precision, the pattern image can be projected onto the substrate with high precision. In addition, the liquid supply mechanism 10 and the liquid supply mechanism 20 are supported by the main frame 102 vibratingly isolated from the stage base 112 supporting the substrate stage PST, the liquid supply mechanism 10, the liquid recovery mechanism 20 and the stage base Seats 112 are vibrationally isolated from each other. Therefore, vibrations generated during liquid supply or liquid recovery are not transmitted to the stage base 112, and abnormalities that lower the positioning accuracy or movement accuracy of the substrate stage PST can be prevented.

Furthermore, in this embodiment, the main frame 102 integrally supports the liquid supply mechanism 10 and the liquid recovery mechanism 20 , but the liquid supply mechanism 10 and the liquid recovery mechanism 20 may be separately mounted on the main frame 102 . Furthermore, the main frame 102 and another support member are arranged on the floor of a clean room or the like, and the liquid supply mechanism and the liquid recovery mechanism can also be supported on the support member.

As mentioned above, pure water is used for the liquid 1 in this embodiment. Pure water has the advantage of being easily available in large quantities in semiconductor manufacturing plants and the like, and has no adverse effect on photoresists on the substrate P, optical elements (lenses), and the like. In addition, pure water has no adverse effect on the environment, and since the content of impurities is extremely low, it can also be expected to clean the surface of the substrate P and the surface of the optical element provided on the front end surface of the projection optical system PL. . Then, the refractive index n of pure water (water) with respect to the exposure light beam EL having a wavelength of about 193 nm can be said to be about 1.44. The upper wavelength is shortened to 1/n, that is, about 134nm to obtain high resolution. Furthermore, the depth of focus is approximately n times greater than that in air, that is, about 1.44 times. Therefore, when using in air, it is only necessary to ensure the same depth of focus, and the projection optical system PL can be further increased. The numerical aperture, which can also improve the resolution.

Furthermore, when the liquid immersion method is used as described above, the numerical aperture NA of the projection optical system is 0.9 to 1.3. When the numerical aperture NA of the projection optical system is so large, it is desirable to use polarized light illumination because the imaging performance of random polarized light conventionally used as the exposure beam deteriorates due to the polarization effect. In this case, linearly polarized light is illuminated in the longitudinal direction of the line pattern of the line and space pattern of the mask (reticle), and a lot of S-polarized light can be emitted from the pattern of the mask (reticle) component (polarization direction component along the length direction of the line pattern) of diffracted light. The case of filling between the projection optical system PL and the resist coated on the surface of the substrate P with liquid, and the case of filling the projection optical system PL and the resist coated on the surface of the substrate P with air (gas) Compared with the case between the above cases, since the transmittance on the resist surface of the diffracted light of the S-polarized light component that contributes to the improvement of the contrast is high, even when the numerical aperture NA of the projection optical system exceeds 1.0, the High imaging performance can be obtained. In addition, if an oblique incident illumination method (in particular, a dipole illumination method) or the like that matches the longitudinal direction of a phase shift mask or a line pattern is combined appropriately, further effects can be obtained. Furthermore, the oblique incident illumination method that coincides with the longitudinal direction of the line pattern is disclosed, for example, in Japanese Unexamined Patent Application Publication No. 6-188169, and within the range allowed by national laws and regulations specified or selected in this international application, this disclosure is cited as part of the record of this article.

In this embodiment, a lens is attached as the optical element 2 to the front end of the projection optical system PL, and the optical characteristics of the projection optical system PL, such as aberrations (spherical aberration, coma, etc.) can be adjusted by using this projection. . Furthermore, the optical element 2 may be an optical plate for adjusting the above-mentioned optical characteristics. On the other hand, it is also possible to arrange the optical element 2 in contact with the liquid 1 as a parallel plane plate which is cheaper than a lens. By arranging the optical element 2 as a parallel plane plate, the transmittance of the projection optical system PL, the illuminance of the exposure light beam EL on the substrate P, and the uniformity of illumination distribution are reduced during transportation, assembly, adjustment, etc. of the exposure apparatus EX. Even if a substance (such as a silicon-based organic substance) is attached to the parallel plane plate, the parallel plane plate can be replaced only before the liquid 1 is supplied, compared with the case where the optical element in contact with the liquid 1 is provided as a lens. The advantage of low cost. That is, since the surface of the optical element in contact with the liquid 1 is dirty due to splash particles generated from the resist due to irradiation of the exposure light beam EL, or adhesion of impurities in the liquid 1, the optical element needs to be replaced periodically, and By providing this optical element as an inexpensive flat-parallel plate, the cost of replacement parts can be reduced compared with lenses, and the time required for replacement can be shortened, thereby suppressing an increase in maintenance costs (running costs) and a decrease in throughput.

Furthermore, when the pressure between the optical element at the front end of projection optical system PL and the substrate P due to the flow of liquid 1 is high, the optical element cannot be replaced, and the optical element is firmly fixed so as not to be moved by the pressure.

Furthermore, the liquid 1 in this embodiment is water, but may be a liquid other than water. For example, in the case where the light source of the exposure beam EL is an _F2 laser, the _F2 laser cannot pass through water, so as the liquid 1, it can be perfluorinated polyether (PFPE) or fluorine for example, which can pass through the _F2 laser beam. Fluorine-based fluids such as elemental-based oils. In this case, on the portion in contact with the liquid 1 mainly on the collecting surface 31, for example, a thin film is formed of a substance with a low polar molecular structure including fluorine element to perform a lyophilic treatment. In addition, as the liquid 1, it is also possible to use a substance that is transparent to the exposure light beam EL, has a refractive index as high as possible, and is stable to the photoresist coated on the projection optical system PL and the surface of the substrate P ( such as cedar oil). In this case too, the surface treatment is carried out according to the polarity of the liquid 1 used.

Furthermore, the configuration (design) of the above-mentioned projection optical system PL is such that its imaging performance is optimal in a liquid immersion state in which the image plane side is filled with the liquid 1 (pure water), but it may also be set (designed) so that Structure, by replacing a part of the optical elements of the projection optical system PL (optical elements close to the substrate P), in a non-liquid immersion state in which no liquid exists on the image plane side and in a liquid immersion state in which the image plane side is filled with another liquid The desired imaging performance can be obtained. By configuring projection optical system PL in this way, for example, when a large depth of focus DOF is required, the exposure apparatus EX is used in a liquid immersion state, and when high productivity is required, the exposure apparatus EX is used in a non-liquid immersion state by replacing some optical elements. In this case, it is desirable to arrange an aerial image sensor or a wavefront aberration measurement sensor on the substrate stage PST in order to measure the imaging performance after replacement of some optical elements. In addition, a mask for wavefront aberration measurement may be used, and a part of the optical element may be pushed so as to obtain the desired imaging performance in each state based on the measurement result of the imaging performance, or the wavelength of the exposure light beam EL may be slightly adjusted. Adjustment. Furthermore, details of the aforementioned aerial image sensor are disclosed in, for example, JP 2002-14005 (corresponding to US Patent Publication 20020041377), and details of the wavefront aberration measurement sensor are disclosed in, for example, International Publication No. 02/63664 , to the extent permitted by the laws and regulations of the countries designated or selected in this international application, these publications are incorporated as part of the description herein.

In addition, replacement of some optical elements is preferably performed with projection optical system PL attached to exposure apparatus EX, but may be performed with projection optical system PL detached from exposure apparatus EX.

Furthermore, as the substrate P of each of the above-mentioned embodiments, it is suitable not only for a semiconductor wafer for semiconductor device manufacturing, but also for a glass substrate for a display device, a ceramic wafer for a thin-film magnetic head, or a mask or mask used in an exposure device. The original version of the mold original (synthetic quartz, silicon wafer), etc.

As the exposure apparatus EX, in addition to the scanning exposure apparatus (scanning stepper exposure apparatus) of the step-and-scan method (scanning stepper exposure apparatus) that makes the mask M and the substrate P move synchronously to scan the pattern of the mask M, it can also be applied to make the mask A projection exposure apparatus (stepper exposure apparatus) of a step-and-repeat method that exposes the pattern of the mask M while M and the substrate P are stationary, and moves the substrate P sequentially in steps. In addition, the present invention can also be applied to a step-and-stop method exposure apparatus that transfers two patterns on the substrate P at least partially overlapping each other.

In addition, the present invention can also be applied to a two-stage exposure apparatus. The structure and exposure operation of the double-stage exposure device are disclosed in, for example, JP-A-10-163099 and JP-A-10-214783 (corresponding to U.S. Patent Nos. 6,341,007, 6,400,441, 6,549,269, and 6,590,634), and JP-A-2000-505958 (corresponding to U.S. Patent No. 5,969,441) or U.S. Patent No. 6,208,407, to the extent permitted by the laws of the countries designated or selected in this international application, these disclosures are incorporated as part of the description herein.

As the type of exposure apparatus EX, it is not limited to the exposure apparatus for semiconductor element manufacturing that exposes semiconductor element patterns on the substrate P, and can also be widely used in the manufacture of liquid crystal display element manufacturing or display manufacturing. Device (CCD) or reticle or mask exposure equipment, etc.

When a linear motor is applied to the substrate stage PST and the mask stage MST, one of an air-floating type using an air bearing and a magnetic levitation type using a Lorentz force or a reactive force can also be used. In addition, each stage PST, MST may be a type which moves along a guide rail, or may be a guide-less type which does not provide a guide rail. Examples of linear motors used in stages are disclosed in U.S. Patent Nos. 5,623,853 and 5,528,118, and the contents of these documents are incorporated as part of the description of this document within the scope permitted by the laws and regulations of countries designated or selected in this international application.

As a drive mechanism for each stage PST, MST, a magnet assembly in which magnets are arranged in two dimensions is opposed to an armature assembly in which coils are arranged in two dimensions, and each stage PST, MST is driven by electromagnetic force. Planar motor. In this case, one of the magnet assembly and the armature assembly may be connected to the stage PST, MST, and the other of the magnet assembly or the armature assembly may be installed on the moving side of the stage PST, MST.

The reaction force generated by the movement of the substrate stage PST can be mechanically transmitted to the ground using a frame member so that it is not transmitted to the projection optical system PL. The processing method of its reaction force is disclosed in detail in, for example, U.S. Patent 5,528,118 (Japanese Unexamined Patent Publication No. 8-166475), and within the range allowed by the laws and regulations of the countries designated or selected in this international application, the content described in this document is cited as the present document. part of the record.

The reaction force generated by the movement of mask stage MST is mechanically transmitted to the ground using a frame member so that it is not transmitted to projection optical system PL. The method of dealing with this reaction force is disclosed in detail in, for example, U.S. Patent No. 5,874,820 (JP-A-8-330224). To the extent permitted by the laws and regulations of the countries designated or selected in this international application, the disclosure of this document is cited as part of the record of this article.

As described above, the exposure apparatus EX according to the embodiment of the present application is manufactured by assembling various subsystems including each component listed in the scope of the claims of the present application so as to maintain predetermined mechanical precision, electrical precision, and optical precision. In order to ensure these precisions, before and after the assembly, various optical systems are adjusted to achieve optical precision, various mechanical systems are adjusted to achieve mechanical precision, and various electrical systems are adjusted to achieve Electrical precision adjustment. The process from various subsystems to the assembly of the exposure apparatus includes mutual mechanical connections of various subsystems, wiring connections of electric circuits, piping connections of pneumatic circuits, and the like. Before the process of assembling the various subsystems into the exposure apparatus, there are, of course, individual assembling processes for the respective subsystems. When the assembly process of the exposure apparatus of various subsystems is completed, comprehensive adjustment is performed to ensure various accuracies of the exposure apparatus as a whole. Furthermore, it is desirable to manufacture the exposure apparatus in a clean room whose temperature and cleanliness are controlled.

Micro devices such as semiconductor devices are manufactured through the following steps as shown in FIG. The step 203 of the substrate of the basic material; the exposure processing step 204 of exposing the pattern of the mask on the substrate with the exposure device EX of the above-mentioned embodiment; the device assembly step (including: cutting process, bonding process, packaging process) 205 ; Check step 206 etc.

According to the present invention, when the exposure process is performed with the liquid immersion region formed between the projection optical system and the substrate, the liquid can be stably formed and the liquid can be recovered well, because the liquid can be prevented from flowing out to the periphery, etc. , so exposure processing can be performed with high precision. Therefore, the exposure apparatus of the present invention is extremely effective during high-resolution exposure using a short-wavelength light source such as an ArF excimer laser.

Claims (16)

1. An exposure device for exposing a substrate by projecting an image of a prescribed pattern onto the substrate through a liquid, the exposure device comprising: A projection optical system for projecting the image of the above-mentioned pattern onto the substrate; In order to form a liquid immersion area on a part of the substrate including the projection area of the projection optical system, a liquid supply mechanism that simultaneously supplies liquid to the substrate from a plurality of positions spaced apart from the projection area in a plurality of different directions, Wherein, the liquid supply mechanism simultaneously supplies the liquid from both sides of the projection area to the substrate. 2. The exposure apparatus according to claim 1, wherein said liquid supply mechanism continuously supplies liquid from said plurality of positions when sequentially exposing a plurality of imaging regions on said substrate. 3. The exposure apparatus according to claim 1, wherein said liquid supply means supplies an equal amount of liquid from both sides of said projection area per unit time. 4. The exposure apparatus according to claim 1, wherein each imaging area on the substrate is exposed while moving in a scanning direction, and the liquid supply mechanism supplies the liquid from both sides of the projection area in the scanning direction. 5. The exposure apparatus according to claim 4, wherein said liquid supply mechanism sets the amount of liquid supplied per unit time in said scanning direction from a side closer to said projection optical system in said projection area than a side farther away from said projection optical system than per unit time. One side of the optical system provides more liquid volume. 6. The exposure apparatus according to claim 1, further comprising a liquid recovery mechanism for recovering the liquid on the substrate in parallel with the supply of the liquid. 7. The exposure apparatus according to claim 6, wherein said liquid recovery means simultaneously recovers the liquid on said substrate from a plurality of positions separated from said projection area in a plurality of different directions. 8. The exposure apparatus according to claim 6, further comprising a liquid collector arranged outside of the liquid recovery position by the liquid recovery means with respect to the projection area and formed to capture liquid that cannot be completely recovered by the liquid recovery means. Surface collection parts. 9. The exposure apparatus according to claim 8, wherein the liquid affinity of the collection surface is higher than the liquid affinity of the substrate surface. 10. The exposure apparatus according to claim 8, wherein the collection surface is disposed so as to surround the projection area, and the length of the collection surface varies depending on the position of the collection surface. 11. The exposure apparatus according to claim 8, wherein the liquid captured on the collection surface is recovered by the liquid recovery means. 12. The exposure apparatus according to claim 6, wherein said liquid supply means supplies liquid between a liquid recovery position by said liquid recovery means and said projection area. 13. The exposure apparatus according to claim 6, wherein said liquid recovery means simultaneously performs said recovery on both sides of said projection area. 14. The exposure apparatus according to claim 6, wherein the liquid recovery mechanism has a recovery port continuously formed to surround the projection area. 15. The exposure apparatus according to claim 14, wherein a partition is provided inside the recovery port. 16. A device manufacturing method using the exposure apparatus according to claim 1.

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