CN100596256C - Apparatus and method for continuously depositing a pattern of material on a substrate - Google Patents

Abstract

A pattern of material is continuously deposited onto a substrate. The substrate and a mask are continuously brought together over a portion of a drum where a deposition source emits material. The maskincludes apertures that form a pattern, and the material from the deposition source passes through the pattern of the mask and collects onto the substrate to form the pattern of material. The elongation and the transverse position of the substrate and the mask may be controlled. Pattern elements of the substrate and of the mask may be sensed in order to adjust the elongation and/or the transverseposition of the substrate and/or mask to maintain a precise registration. Furthermore, the apertures may have a least dimension on the order of 100 microns or less to thereby create features on the substrate having least dimensions on the order of 100 microns or less.

Description

Apparatus and method for continuously depositing a pattern of material on a substrate

technical field

The present invention relates to depositing patterns of material onto substrates. More specifically, the present invention relates to depositing patterns of material by means of continuously moving a substrate and a mask defining the pattern across a deposition zone.

Background technique

A pattern of material can be formed on a substrate by discharging material from a deposition source in a direction towards the substrate. By placing a mask between the deposition source and the substrate, the material is deposited on the substrate in a specific pattern. The mask includes holes defining a pattern, and only deposition material passing through the holes reaches the substrate so that the material is deposited in the pattern.

Such patterns can be deposited on the substrate for various purposes. As an example, a circuit pattern can be formed on a substrate by depositing material in various patterns. For example, conductive traces like metallization patterns can be formed on flexible dielectrics for various purposes, including for encoding information on flexible tabulation circuits mounted on thermal ink jets.

Conventional pattern deposition of material through a mask onto a substrate is performed in a step-and-repeat fashion. The substrate is moved forward a predetermined amount and stopped while the mask is in a fixed and known position relative to the substrate. The deposition source then discharges material through the mask to form a pattern. The substrate is then moved a predetermined amount and stopped, and deposition occurs again. This process is repeated to form multiple instances of a given pattern on a roll of base material. Each pattern of material on the substrate can be exposed to another downstream mask and deposition source to form additional layers of patterned material.

This step-and-repeat process, while effective in accurately fabricating multiple instances of a pattern with relatively finer feature sizes, has the disadvantage of being relatively inefficient. The time it takes to move the substrate and precisely align the mask and substrate (a considerable amount of time relative to the total time to deposit the layer) is the time spent not depositing material. The step-and-repeat process therefore cannot achieve the desired productivity.

Contents of the invention

Embodiments of the present invention address these and other problems by providing apparatus and methods that deposit material to a substrate continuously, rather than depositing material in a step-by-step, repetitive routine. Since material is continuously deposited while the substrate is in motion, no time spent moving the substrate is wasted.

One embodiment is an apparatus for continuously depositing a pattern of material on a substrate. The apparatus includes a substrate delivery roll delivering the substrate and a first substrate receiving roll receiving the substrate thereon such that the substrate extends from the substrate delivery roll to the substrate receiving roll and the substrate passes continuously from the substrate delivery roll to the substrate receiving roll. The apparatus also includes a first mask including holes defining a first pattern, wherein the one or more holes have a size of at least 100 microns or less. The apparatus also includes a first mask delivery roll from which the first mask is delivered and a first mask receiver roll on which the first mask is received such that the mask passes from the mask delivery roll to the mask receiver roll extending, and the first mask passes continuously from the first mask delivery roll to the first mask receiving roll. A first cylinder is included on which the substrate and first mask between being delivered from the substrate and mask delivery roll and received on the substrate and mask receiving roll, between the first parts of the circumference of the cylinders are in contact above, and the first cylinder rotates continuously. the first deposition source is positioned to continuously direct the first deposition material towards the portion of the first mask on the first cylinder circumferential portion such that at least a portion of the first deposition material passes through the holes of the first mask, A first pattern of the first material is continuously deposited on the substrate.

Another embodiment is an apparatus for continuously depositing a pattern of material on a substrate, the apparatus comprising a substrate delivery roll delivering the substrate and a first substrate receiving roll receiving the substrate thereon such that the substrate is received from the substrate delivery roll toward the substrate. The rollers are extended in which the substrate passes continuously from the substrate delivery roller to the substrate receiving roller. The apparatus also includes a first mask comprising apertures defining a first pattern, a first mask delivery roll delivering the first mask, and a first mask receiving roll receiving the first mask thereon such that the mask A mold extends from the mask delivery roll to a mask receiver roll, wherein the first mask passes continuously from the first mask delivery roll to the first mask receiver roll. The apparatus also includes a first cylinder on which the substrate and the first polymer mask are between delivery from the substrate and mask delivery roll and reception on the substrate and mask receiver roll, between the The circumferential surface of the first cylinder is partially in contact, wherein the first cylinder rotates continuously. Additionally, the apparatus includes a first deposition source positioned to continuously direct a first deposition material towards a portion of the first mask on the first cylinder circumferential portion such that at least a portion of the first deposition material passing through the holes of the first mask to continuously deposit a first pattern of the first material on the substrate. When the substrate comes into contact on the circumferential portion of the first cylinder, the first substrate elongation control system maintains the substrate at a predetermined elongation along the delivery direction from the substrate delivery rollers to the first cylinder, while the first mask The first mask elongation control system maintains a predetermined elongation of the first mask in a direction from the first mask delivery roller to the first cylinder upon coming into contact on the circumferential portion of the first cylinder. The first substrate lateral position control system includes a web guide that adjusts the lateral position of the substrate to a predetermined lateral position on the first cylinder, and the first mask lateral position control system includes adjusting the lateral position of the first mask to A web guide adjusted to a predetermined transverse location on the first cylinder.

Yet another embodiment is a method of continuously depositing material comprising continuously delivering a substrate from a substrate delivery roll while continuously receiving the substrate on a substrate receiving roll, wherein while between the substrate delivery roll and the substrate receiving roll, the substrate Pass the circumferential portion of the first cylinder from above. The method further includes continuously delivering the mask from the first mask delivery roll while continuously receiving the first mask on the first mask receiving roll while continuously delivering and receiving the substrate, wherein when the first When between the mask delivery roller and the first mask receiving roller, the first mask passes through the circumferential portion of the first cylinder, and wherein the first mask has a plurality of holes forming a first pattern, and at least a part of the The pores have a size of at least 100 microns or less. Furthermore, the method includes continuously directing a first deposition material from a first deposition source to the first mask portion on the first cylinder circumferential portion while continuously delivering and receiving the substrate and the first mask, A first pattern of the first material is caused to be deposited on a substrate.

Description of drawings

Figure 1 shows an embodiment of an apparatus that utilizes internal cylinder deposition and roll-to-roll masking to provide the first stage of the deposition process without the use of pre-patterned fiducial elements;

Figure 2 shows an embodiment of an apparatus that utilizes internal cylinder deposition and a continuous loop mask to provide the first stage of the deposition process without the use of pre-patterned fiducial elements;

Figure 3 shows an embodiment of an apparatus that utilizes external cylinder deposition and roll-to-roll masking to provide the first stage of the deposition process without the use of pre-patterned fiducial elements;

Figure 4 shows an embodiment of an apparatus utilizing internal cylinder deposition, using pre-patterned fiducial elements, and utilizing a roll-to-roll mask to provide the first stage of the deposition process;

Figure 5 shows an embodiment of an apparatus that utilizes external cylinder deposition, does not use pre-patterned fiducial elements, but instead uses a fiducial pattern generated prior to the external cylinder deposition, and a roll-to-roll mask to provide The first stage of the deposition process;

Figure 6 shows an embodiment of an apparatus that provides a second stage of the deposition process using internal deposition and roll-to-roll masking;

7 shows a schematic diagram of an illustrative rotary motor and speed/position control system for controlling the longitudinal web position of various embodiments;

Figure 8 shows a schematic diagram of an illustrative guide motor control system for controlling the transverse web position of various embodiments;

Figure 9 shows a schematic diagram of a web fiducial alignment control system for maintaining proper alignment of two webs of various embodiments;

Figure 10 shows an illustrative control system interface for a fiducial alignment sensor of an apparatus embodiment providing a second stage of a deposition process;

Figure 11 shows a control loop for the illustrative control system interface of Figure 10;

Figure 12 shows an illustrative pattern of reference elements used on masks and/or substrates for simultaneous sensing of relative lateral and longitudinal positions of respective masks and/or substrates;

Figure 13 shows a view of an illustrative sensing system for simultaneously sensing transverse and longitudinal web position;

Fig. 14 shows a view of an illustrative sensing system for simultaneously sensing transverse and longitudinal web position.

Detailed ways

Embodiments of the present invention provide continuous material deposition on a substrate in a pattern defined by a mask. The continuous deposition is provided by continuously moving the substrate and mask through the deposition zone provided by the deposition sources and cylinders.

Figure 1 shows an illustrative embodiment of an apparatus and resulting method forming one stage for successively depositing a pattern of material on a substrate. In this particular embodiment, this first stage is used to deposit pattern elements called fiducials on the substrate 100, where these fiducials can then be used in subsequent stages to correctly align the substrate with subsequent stage masks. Alignment, where as discussed below with reference to Figure 4, this alignment accuracy is on the order of microns. Such fiducials are applied by means of depositing material through a mask 101 comprising holes providing a pattern of fiducials. In addition to the fiducial, it is also possible to deposit a first layer of the circuit pattern, wherein the material of the first layer is the same as that used to deposit the fiducial.

The substrate 100 starts on a roll of substrate unwinding roll 102 that acts as a delivery roll for the substrate 100, to the remainder of the apparatus for this first deposition stage. The substrate 100 is continuously pulled from mandrel 102 by precision driven rollers 108 , through regulating rollers 104 , over tension load sensing device 106 . The substrate 100 is pulled tightly over the circumferential portion of the rotating cylinder 124 and to another receiving roller 110 of the substrate 100 . The substrate 100 exits the take-up roll 110 and is either pulled into a subsequent deposition state, discussed below with reference to FIG. 6, or rewound on a substrate rewind spool.

The conditioning rollers 104 and tension load sensing device 106 are used to achieve a predetermined and controlled elongation, or stretching, of the substrate 100 in a direction delivered to the cylinder 124 at a given substrate 100 speed. . The speed of the substrate 100 is governed by the speed of the precision driven roller 108 which is precisely synchronized with the speed of the cylinder 124 which itself has a precision drive. The choice of speed is a matter of design choice based on whether the desired elongation and correct deposition thickness can be achieved.

As is well known in the art, the regulating roller 104 utilizes rotational sensors to provide feedback to control the speed of the unwinding roll 102 when tension is applied to the substrate 100 by the actuator of the regulating roller 104 . The tension load sensing device 106 provides a force readout that can be used to trim the force applied by the actuator of the adjustment roll 104 . The control system applies logic control based on the readout from the tension load sensing device 106 and the speed of the cylinder 124 to vary the speed of the drive roller 108 slightly to control the elongation of the substrate 100 as desired.

The mask 101 starts on a roll of a mask unwinding mandrel 112 which acts as a delivery roller for delivering the mask 101 to the rest of the apparatus for this first deposition stage. The mask 101 is continuously pulled by precision driven rollers 118 from mandrel 112 , through regulating rollers 114 , past tension load sensing device 116 . The mask 101 is pulled tightly over the circumferential portion of the rotating cylinder 124 where the substrate is also drawn, thereby bringing the mask 101 into contact with the substrate 100 and further onto the take-up roll 120 of the mask 101 . The mask 101 exits the take-up roll 120 and is rewound on a substrate rewind mandrel 122 .

As with the substrate 100, the conditioning rollers 114 and tension load sensing device 116 are used to achieve a predetermined and controlled elongation of the mask 101 in the direction of delivery to the cylinder 124 at a given mask 101 speed. , or Stretch. The speed of the mask 101 is further governed by the speed of the precision drive roller 118 which is also closely synchronized with the speed of the cylinder 124 . As discussed above with respect to substrate 100, the choice of speed is a matter of design choice based on whether a predetermined elongation and the correct deposition thickness can be achieved.

As with the regulating roller 104, the regulating roller 114 provides feedback to the unwinding drum 112 using a rotation sensor when tension is applied to the mask 101 by the actuator of the regulating roller 114. The tension load sensing device 116 provides a force readout that can be used to trim the force applied by the actuator of the adjustment roller 114 . The control system applies logic control based on the readout from the tension load cell 116 and the speed of the cylinder 124 to vary the speed of the drive roller 118 slightly to control the elongation of the substrate as desired.

This particular embodiment includes a deposition source 126 disposed within a cylinder 124 . Therefore, it is necessary to bring the mask 101 in direct contact with the cylinder 124 , while the substrate 100 directly contacts the mask 101 and is separated from the cylinder 124 by the mask 101 . The cylinder 124 has large holes 130 configured on the cylinder to supply a virtually unlimited flow of material to the mask and spaced around the circumference of the cylinder to allow deposition material 128 emitted from the deposition source 126 Can pass through cylinder 124 and reach mask 101 . The holes in the mask then allow this deposited material 128 to reach the substrate 100 and thus form a pattern on the substrate 100 .

Deposition source 126 may be one of various types of deposition sources, depending on the type of deposition desired and the type of deposition material. For example, deposition source 126 may be a sputter cathode or a magnetron sputter cathode for the purpose of depositing metal or conductive metal oxide material. As another example, deposition source 126 may be an evaporation source for the purpose of depositing metal or conductive metal oxide material.

The arrangement of cylinder 124, deposition source 126, mask 101 and substrate 100 may be such that mask 101 and substrate 100 pass at the bottom of the cylinder while deposition source 126 discharges deposition material downward. However, it will be appreciated that the mask 101 and substrate 100 may alternatively be positioned so that the deposition source 126 passes over the top of the cylinder 124 as it discharges deposition material upward. This option is particularly suitable when an evaporation source is used.

The substrate 100 and the mask 101 may also be one of various types of materials. Examples include polymer materials such as polyester (both PET and PEN), polyimide, polycarbonate, or polystyrene, metal foil materials such as stainless steel, other steel, aluminum, copper, or Paper or woven or nonwoven fibrous materials, all of which may or may not have a coated surface. However, the use of highly elastic materials such as polymeric materials for the substrate and mask allows for precise control of elongation and precise alignment, as discussed below with reference to Figure 4, enabling feature sizes to be made very small. The minimum size of the pores in the polymer mask can be on the order of microns, ranging from 100 microns down to 10 microns. Accordingly, corresponding features deposited on the substrate may have the smallest dimensions also on the order of microns, also ranging from 100 microns down to 10 microns. Thus, for example, the density of circuit patterns can be made very high, allowing for high resolution, small footprint conductive traces, produced with high throughput by this sequential deposition process. It should be understood that if the aspect ratio of the track is large, it may be necessary to make the aspect ratio of the mask hole limited over the length of the opening before affecting the dimensional stability of the hole in the polymer mask. The web is passed through two or more deposition stations having two or more successive depositions through the offset shadow mask to deposit the track. Additional details related to this embodiment regarding the fabrication of polymer aperture masks are further described in US Patent No. 6,879,164 (Baude et al.).

Figure 2 shows the same embodiment as Figure 1, except that instead of a roll-to-roll arrangement the mask is in a continuous loop. Here, substrate 200 is unwound from mandrel 202 , passed by regulating rollers 204 , past load sensing device 206 and pulled by drive rollers 208 . The substrate 200 passes over the circumferential portion of the cylinder 224 and is pulled over the take-up roll 210, and then proceeds to the next deposition stage or is rewound on a rewind roll. Thus, the elongation and velocity of the substrate 200 are controlled as in FIG. 1 . In addition, deposition source 226 discharges material 228 through aperture 240 of cylinder 224 as occurs in FIG. 1 , and the material reaches mask 201 and passes through the aperture in mask 201 to substrate 200 .

However, the mask 201 is passed in a continuous loop over the tension load sensing device 234 as a roller of the web guiding device 232 and is pulled by the drive roller 218 as it passes the sensor 238 . The mask 201 passes over a circumferential portion of the cylinder 224 and is pulled off the receiving roller 220 . This mask 201 then reaches another receiving roller 222 which is the roller of the tensioning device 223 and leads the mask 201 to a subsequent receiving roller 230 which in turn leads the mask 201 back to the web guide Roller 236 of device 232 . In this arrangement, the elongation and velocity of the mask 201 passes continuously, adjusting the force applied by the actuator of the tensioning device 223, and the speed of the drive roller 218, based on the readout from the tension load sensing device 234, is controlled, and the lateral alignment of the mask 201 is also controlled by a web guide 232, wherein such a web guide is discussed in more detail below in connection with FIG. 4 . However, the mask 201 is continuously recycled for reuse. Eventually, the mask 201 must be replaced due to deposition material 228 building up on the mask.

Figure 2 shows the same layout as in Figure 1 except for the continuously looping mask 201, it will be appreciated that the continuously looping mask 201 shown in Figure 2 can also be applied to those discussed below in Figures 3 to 6 other layouts.

FIG. 3 shows the same embodiment as FIG. 1 , except that the deposition source 326 is disposed outside the cylinder 324 . Here, a substrate 300 is unwound from a mandrel 302 , passed by a regulating roller 304 , past a load sensing device 306 and pulled by a drive roller 308 . The substrate 300 passes over the circumferential portion of the cylinder 324 and is directed further towards the take-up roll 310, and then proceeds to the next deposition stage or is rewound on a rewind roll. Thus, the elongation and velocity of the substrate 300 are controlled as in FIG. 1 . In addition, mask 301 is unwound from roll 312 , passed by regulating roller 314 , past load sensing device 316 , and pulled by drive roller 318 as occurs in FIG. 1 . The mask 301 passes over a circumferential portion of a cylinder 324 and is further guided past another take-up roll 320 and then rewound on a rewind bobbin 322 . Therefore, the elongation and speed of the mask 301 are also controlled as in FIG. 1 .

However, the deposition source 326 is disposed outside the cylinder 324 such that the deposition material 328 does not need to pass through the cylinder 324 before reaching the mask 301 and substrate 300 . Therefore, cylinder 324 need not include holes. In addition, the substrate 300 is directly in contact with the cylinder 324 , and the mask 301 is directly in contact with the substrate 300 , and the substrate 300 is disposed between the mask 301 and the cylinder 324 .

Although FIG. 3 shows the same layout as FIG. 1 except that the deposition source 326 is arranged outside the cylinder 324, it should be understood that the external location of the deposition source 326 as shown in FIG. And other structures of Fig. 4 to Fig. 6.

FIG. 4 shows an embodiment similar to FIG. 1 , except that the substrate 400 already has pattern elements deposited or otherwise formed thereon. Since the pattern elements are already in place, precise alignment as discussed below can be maintained between the substrate 400 and the mask 401, and the features of the circuit pattern can be deposited at this stage without fiducials of the same material being deposited simultaneously.

The pattern elements can be pre-formed on the substrate in one of various ways that can also be used to deposit the patterns on the mask, as in any of the examples of FIGS. 1-6 . Examples of how pattern elements are pre-formed on substrates and masks include sputtering, vapor deposition, laser ablation, laser marking, chemical milling, chemical etching, embossing, scoring, and printing.

In the embodiment of FIG. 4 , a substrate 400 is unwound from a mandrel 402 , passed by a regulating roller 404 and past a load sensing device 406 and pulled by a drive roller 408 . The substrate 400 passes over the circumferential portion of the cylinder 424 and is further directed towards the take-up roll 410 and then proceeds to the next deposition stage or is rewound on a rewind roll. Thus, the elongation and velocity of the substrate 400 are controlled as in FIG. 1 . In addition, mask 401 is unwound from roll 412 , passed by adjustment roller 414 , past load sensing device 416 and pulled by drive roller 418 as occurs in FIG. 1 . The mask 401 passes over a circumferential portion of a cylinder 424 and is further guided onto a take-up roll 420 and is then rewound on a rewind bobbin 422 . Therefore, the elongation and speed of the mask 401 are also controlled as in FIG. 1 .

However, there is additional control based on the benchmarks of both the sensing substrate 400 and the mask 401 to follow the direction of delivery to the cylinder 424 at the smallest feature size (less than 100 microns, less than 50 microns, or even less than 25 microns). The correct alignment of the substrate 400 and the mask 401 is maintained within a tolerance of 1/2 of the micron). Sensor 438 senses fiducials on substrate 400 , while sensor 448 senses fiducials on mask 401 . The relative speed between substrate 400 and mask 401 can be adjusted via drive rollers 408 and 418, respectively, to compensate for substrate 400 being forward or lagging behind mask 401 .

Also, between the load sensing device 406 for the substrate 400 and the drive rollers 408, a precision web guide 430 receives the substrate 400 and controls the lateral position of the substrate based on a sensor 438 which senses the reference to determine the lateral position. A moving web has a tendency to move laterally on the rollers, but in most cases the lateral position at the cylinder 424 must be maintained within the minimum feature size (less than 100 microns, less than 50 microns, or even less than 25 microns). The web guide 430 adjusts the lateral position of the substrate 400 to within a 1/2 exact tolerance. The web guiding device 430 includes a first roller 432 , a frame 434 and a second roller 436 . The frame 434, at a pivot point at the edge of the first roller 432, can be pivoted in and out of the page as shown to guide the substrate 400 and change its lateral position on the drive roller 408, and thus change its position in a circle. Lateral position on barrel 424 . More details on precision web guides suitable for this purpose can be found in US Patent Application Publication No. 2005/0109811 (Swanson et al.).

Similarly, for mask 401, between load sensing device 416 and drive roller 418, precision web guide device 440 receives mask 401 and controls the mask in accordance with sensor 448 that senses the reference to determine lateral position. The lateral position of the mold 401. The lateral position of the mask 401 on the cylinder 424 must also be within precise tolerances, so the web guide 440 adjusts the lateral position of the mask 401 . The web guide 440 includes a first roller 442 , a frame 444 and a second roller 446 . The frame 444 can be pivoted in and out of the page, as shown, at a pivot point at the edge of the first roller 442 to guide the mask 401 and change its lateral position on the drive roller 418, and thus change its position on the drive roller 418. Lateral position on cylinder 424 .

The lateral position control system may be used with the elongation control system, or independently of the elongation control system. Similarly, the elongation control system may be used with the lateral position control system, or independently of the lateral position control system.

As shown in FIG. 1 , deposition source 426 within cylinder 424 discharges deposition material 428 through aperture 450 in cylinder 424 to reach mask 401 and substrate 400 on a peripheral portion of cylinder 424 . Although FIG. 4 is related to FIG. 1 in the layout used as an initial deposition stage, it should be understood that the layout of FIG. 4 can also be used as a subsequent stage in cases where the substrate 400 does not proceed directly from a preceding deposition stage. Instead, it is rewound from the previous stage and then led from the unwinding reel 402 to the subsequent stage.

FIG. 5 shows an embodiment similar to that of FIG. 3 , except that the substrate 500 has pattern elements, or fiducials using a fiducial deposition process 540 . The fiducial deposition process 540 applies a fiducial to the substrate 500 at the point where the substrate 500 has come into contact with the circumference of the cylinder 524, but before the point where the mask 501 reaches the cylinder. Since the pattern elements are already in place on the cylinder 524, precise alignment can be maintained between the substrate 500 and the mask 501, and circuit pattern features can be deposited at this stage without fiducials of the same material being deposited simultaneously. Examples of how pattern elements can be pre-formed on a substrate by fiducial deposition process 540 include sputtering, vapor deposition, laser ablation, laser marking, chemical milling, chemical etching, embossing, scoring, and printing.

In the embodiment of FIG. 5 , a substrate 500 is unwound from a mandrel 502 , passed by a regulating roller 504 and past a load sensing device 506 and pulled by a drive roller 508 . The substrate 500 passes over the circumferential portion of the drum 524 including the portion targeted by the reference process 540, and is further guided onto a take-up roll 510 before proceeding to the next deposition stage, or rewound on a rewind roll. Thus, the elongation and velocity of the substrate 500 are controlled as in FIG. 3 . Also as happens in FIG. 3 , mask 501 is unwound from roll 512 , passed by adjustment rollers 514 , past load sensing device 516 , and pulled by drive rollers 518 . The mask 501 passes over a circumferential portion of a cylinder 524 and is further guided past a take-up roll 520 and then rewound on a rewind mandrel 522 . Therefore, the elongation and speed of the mask 501 are also controlled as in FIG. 3 .

However, there is additional control based on sensing the fiducial, elongation and velocity of the mask 501 with the sensor 538 to hold the mask 501 at correct alignment. The relative speed of the mask 501 can be adjusted via drive rollers 518 to compensate for the mask 501 leading or lagging behind the reference patterning process 540

Furthermore, between the load sensing device 516 and the drive roller 518, a precision web guiding device 530 controls the lateral position of the mask 501 to precise tolerances based on a sensor 538 which senses a reference on the mask 501 to determine the lateral position. Inside. The web guide 530 includes a first roller 532 , a frame 534 and a second roller 536 . At the pivot point of the frame 534 at the edge of the first roller 532, as shown, it can be rotated in and out of the page to guide the mask 501 and change its lateral position on the drive roller 518, and thus change its position on the drive roller 518. Lateral position on cylinder 524 .

As shown in FIG. 3 , a deposition source 526 disposed outside a cylinder 524 emits a deposition material 528 to reach the mask 501 and the substrate 500 on the peripheral portion of the cylinder 524 .

Figure 6 shows an embodiment similar to that of Figure 4, except that the substrate 600 is delivered directly from a previous stage as opposed to being delivered from an unrolled roll. As shown in FIG. 4 , since the fiducial pattern elements are already in place, precise alignment can be maintained between the substrate 600 and mask 601 , and circuit features can be deposited at this stage without the simultaneous deposition of fiducials of the same material.

In the embodiment of FIG. 6 , the substrate 600 is received directly on the tension load sensing device 602 from the previous stage and pulled by the drive roller 608 . The substrate 600 passes the circumferential portion of the cylinder 624 and is further directed past the take-up roll 610 and then proceeds to the next deposition stage or is rewound on a rewind roll. There are no regulating rollers for substrate 600 at this stage, so the elongation and speed of substrate 600 is controlled by sensing the tension of substrate 600 at load sensing device 602 and varying the speed of drive roller 608 and cylinder 624 slightly. Also minor adjustments to the elongation of the substrate 600 can be made by adjusting the relative speed between the drive roller 608 and the cylinder 624 . In addition, as occurs in FIG. 4 , mask 601 is unwound from roll 612 , passed over adjustment roller 614 , past load sensing device 616 , and pulled by drive roller 618 . The mask 601 passes over a circumferential portion of a cylinder 624 and is guided further past a take-up roll 620 and is then rewound on a rewind mandrel 622 . Therefore, the elongation and speed of the mask 601 are also controlled as in FIG. 4 .

There is additional control based on sensing the elongation and velocity of both the fiducials of the substrate 600 and mask 601 to maintain the substrate 600 and mask 601 in the correct alignment along the direction of delivery to the cylinder 624 . Sensor 638 senses fiducials on substrate 600 , while sensor 648 senses fiducials on mask 601 . The relative speed between substrate 600 and mask 601 can be adjusted via drive rollers 608 and 618 respectively to compensate for substrate 600 leading or lagging mask 601 .

Also, between the load sensing device 602 for the substrate 600 and the drive rollers 608, a precision web guide 630 receives the substrate 600 and controls the lateral position of the substrate based on a sensor 638 that senses a reference to determine the lateral position. The web guiding device 630 includes a first roller 632 , a frame 634 and a second roller 636 . The frame 634, at a pivot point at the edge of the first roller 632, can be pivoted in and out of the page as shown to guide the substrate 600 and change its lateral position on the drive roller 608, and thus change its position on the drive roller 608. Lateral position on cylinder 624 .

Similarly, for the mask 601, between the load sensing device 616 and the drive roller 618, the precision web guide 640 receives the mask 601 and controls the lateral direction of the mask 601 based on a sensor 648 which senses a reference to determine the lateral position. Location. The web guide 640 includes a first roller 642 , a frame 644 and a second roller 646 . The frame 644 can be rotated in and out of the page at a pivot point at the edge of the first roller 642, as shown, to guide the mask 601 and change its lateral position on the drive roller 618, and thus change its Lateral position on cylinder 624 .

As in FIG. 4 , deposition source 626 within cylinder 624 emits deposition material 628 through aperture 650 in cylinder 624 to reach mask 601 and substrate 600 on a circumferential portion of the cylinder 624 .

FIG. 7 shows illustrative rotary motor position and velocity control systems 700, one of which may be used to control the position, velocity, and torque applied to each drive roller and cylinder. The control system 700 receives as input a position command 701 and originates from a trajectory generator as understood by those skilled in the art of motion control. This instruction is provided to a position feedforward operation 702 , which then outputs a position feedforward signal to a feedforward gain control operation 712 .

The position command 701 is summed with another signal based on a load position feedback signal 703 which is provided to a low pass filter operation 704 . Load position feedback signal 703 is received from a high precision rotational sensor mounted directly on the drive roll or drum. Low pass filter operation 704 provides an output to observer 706 which uses other internal signals to generate an output which is applied to feedback filter operation 708 to provide a signal which is negatively summed with position command 701 . This signal is then fed to a position controller 710 which outputs a signal summed with two additional signals.

The feedforward gain signal output at the feedforward gain control operation 712 is summed with the output signal of the position controller 710 along with the motor position feedforward feedback signal determined by the position feedforward differential operation 714 output and pass through a low pass filter 715, and the motor position feedforward feedback signal is based on the received motor position feedback signal 705. This signal 705 is received from a high precision rotation sensor mounted on the armature of the motor driving the drive roller or cylinder. The output of this sum is then provided to a low pass filter 720 whose output is then provided to a speed controller 722 .

The feedforward gain signal output at feedforward gain operation 712 is then provided to velocity feedforward operation 716 which provides an output to feedforward gain operation 718 to generate a second feedforward gain signal. This second feedforward gain signal is provided to a current feedforward operation 724 which provides an output to a feedforward gain operation 726 . In addition, this second feedforward gain signal is summed with the output of the speed controller 722 and forms a feedforward signal 707 indicative of the speed of the web, which comes from the trajectory generator. The trajectory generator generates a position reference for the control system of each roller, including position and velocity in suitable units. The result of adding the speed feedforward signal 707 to the output of the speed controller 722 is passed through a notch and other filter 728 and added to the feedforward gain signal output by the feedforward gain operation 726 and compared to the actual motor current measurement 709 to provide input to the current controller 730. Then, the current controller 730 outputs current to a motor that drives the driving roller or cylinder.

FIG. 8 shows illustrative guide motor position and velocity control systems 800, where one of the systems 800 can be used to control the lateral position of the substrate, and a second one of the systems 800 can be used to control the lateral direction of the mask. Location. The control system 800 receives as input a position command 801, and this command originates from a sensing system that detects a reference indicative of the transverse position of the web. This instruction is provided to a position feedforward operation 802 which then outputs a position feedforward signal to a feedforward gain control operation 810 .

This position command 801 is also summed with another signal based on the load position feedback signal 803 , which is provided to a low pass filter operation 804 . The load position feedback signal 803 is received from a high precision linear sensor mounted directly on the web guide frame. The feedforward operation 804 provides an output to an observer 806 that uses other internal signals to generate an output that is applied to a feedback filtering operation 808 to provide a signal that is inversely summed with the position command 801 . This signal is then fed to a position controller 812 which outputs a signal summed with two additional signals discussed below.

The feedforward gain signal output at the feedforward gain control operation 810 is added to the position controller output signal 812 together with the motor position feedforward feedback signal output by the position feedforward differential operation 809, And through the low-pass filter 811 , and the motor position feed-forward feedback signal is based on the received motor position feedback signal 805 . This signal 805 is received from a high precision rotary sensor mounted directly on the armature of the motor driving the web guiding frame. The output of this sum is then provided to a low pass filter 818 whose output is then provided to a speed controller 820 .

The feedforward gain signal output at the feedforward gain control operation 810 is then provided to a velocity feedforward operation 814 which provides an output to a feedforward gain operation 816 to generate a second feedforward gain signal. The second feedforward gain signal is provided to a current feedforward operation 822 which provides an output to a feedforward gain operation 824 . In addition, a second feed-forward gain signal is added to the output of the speed controller 820 . The result is passed through notch and other filters 826 and summed with the feedforward gain signal output by feedforward gain operation 824 and the actual motor current measurement 807 to provide input to a current controller 828 . The current controller 828 then outputs current to the motors that move the web guide frame.

FIG. 9 shows an illustrative web fiducial alignment control system 900 that maintains the alignment between mask fiducials and substrate fiducials during a deposition phase (such as that shown in FIG. 6 ) where fiducials already exist on both webs. correct alignment between them. The control system 900 receives as input a web position command 901 and this command originates from a trajectory generator. This instruction is provided to a position feedforward operation 902 which then outputs a position feedforward signal to a feedforward gain control operation 908 .

The position command 901 is summed with another signal based on a web position feedback signal 903 received based on the longitudinal web position. This signal can represent the position of the substrate or mask, or the difference between them. The web position feedback signal 903 is provided to an observer 904 which augments the position signal produced by the sensor, and its output is applied to a feedback filtering operation 905 to provide a signal which is summed with the position command 901 . The signal resulting from this summation is then fed to the position controller 910, which outputs a signal summed with two other additional signals, which are described in the next paragraph.

The feedforward gain signal output at the feedforward gain control operation 908 is summed with the signal output by the position controller 910 along with the web feedforward open loop position compensation signal 912 from the trajectory generator . The output of this sum is the lead position command, which is then provided to the web position controller shown in FIG. 7 . Motor position and speed are obtained from motor 916 and corresponding feedback signals 918 are provided to motor position and speed controller 914 . The motor position and speed controller 914 includes sensor position offset compensation with line speed control.

FIG. 10 shows a portion of an illustrative embodiment in which, considering a desired feature size of 100 microns or less, and an alignment tolerance of less than 100 microns, less than 50 microns, or even less than 25 microns, the Maintain fiducial alignment with the substrate. Substrate 1000 passes through delivery rollers 1002 and then through web guide 1040 having rollers 1042 and 1046 mounted on frame 1044 . The substrate then passes a sensor 1048 which detects the web MD/CD position. Drive rollers 1018 make final corrections to the elongation and velocity of the substrate 1000 as it passes over the circumferential portion of cylinder 1024, and exit rollers 1020 guide the substrate 1000 to the next destination.

Mask 1001 enters web guide 1030 having rollers 1032 and 1036 mounted on frame 1034 . The mask 1001 passes through a sensor 1038 that detects the position of the longitudinal/transverse web, and as the mask 1001 passes over the circumferential portion of the cylinder 1024, the drive roller 1008 makes a final correction to the elongation and speed of the mask 1001, while the exit Rollers 1010 guide the mask 1001 away from the cylinder 1024 .

During operation, substrate sensor 1048 and mask sensor 1038 output web position feedback signals to stress controller 1052 . The stress controller then generates an output signal to the virtual tension viewer 1054 . A virtual tension observer is a control system technique in which the value of one variable is determined from known values of other variables. Observers improve control system performance by reducing the measurement lag of a variable, increasing its precision, or providing the value of a variable that is difficult or impossible to measure directly. The virtual tension viewer 1054 then calculates the web tension based on the position feedback provided to the tension controller 1052 and the material parameters for the substrate and mask, and generates the correct tension set point for the upstream controller, and can be applied to any Additional correction position command offset for drive rollers. The Virtual Tension Viewer enables real-time estimation of changing parameters. Additional details of this embodiment of the virtual tension viewer can be found in commonly-used US Patent Application Publication 2005/0137738A1. The virtual tension observer 1054 then provides a drive signal to the motor of the drive roller 1008 .

FIG. 11 shows the control loop used by the stress controller 1052 with the virtual tension viewer 1054 . The position of the substrate is read from the sensor output at position operation 1102 and the position of the mask is read from the sensor output at position operation 1112 . The target unstretched length of the substrate is calculated at calculation operation 1104 and the target unstretched length of the mask is calculated at calculation operation 1114 . The target time for the base is calculated for the base at calculation operation 1106 and the target time for the mask is calculated at calculation operation 1116 . At target time, a new ε1 value is calculated at calculation operation 1108, where this value represents the desired stress in the web. From the new ε1, the required time TSP is calculated at calculation operation 1110, where this value represents the tension required to establish the stress level.

Figure 12 shows examples of fiducial marks or pattern elements that can be positioned on the substrate and mask for the purpose of controlling web transverse and longitudinal position and maintaining proper alignment between the two webs. As discussed above, these fiducial marks can be pre-patterned, or can be added to the web during the first stage of the deposition process.

As shown in this example, the transverse or cross-web fiducial may be a straight line 1202 to be positioned on the substrate or mask 1200 at a fixed distance from the deposited pattern. The edge 1201 of the web 1200 may not be positioned in precise relationship to the cross-web datum line or any deposited pattern on the web 1200 . From laterally sensing the location of the line 1202, it can be determined whether the web 1200 is in the correct location, or whether a web guide adjustment is required to align the web in the lateral direction.

As this example also shows, the machine direction or machine direction reference may be a series of marks 1204 spaced a fixed distance from each other along the machine direction. From sensing the position of the mark 1204 in the series, it can be determined whether the web 1200 is at the correct longitudinal position relative to the deposited pattern on the web 1200 at a given point in time.

Figure 13 shows an illustrative embodiment of a sensing system for a web. In this embodiment, signal sensors are used in both landscape and portrait orientations. Web 1302 has longitudinal fiducial marks 1304 and transverse fiducial marks 1306 . Sensor 1312 senses both the longitudinal fiducial mark 1304 and the transverse fiducial mark 1306 as web 1302 passes between roller 1308 and roller 1310 . Sensor 1312 may be a line scan or area camera.

The sensor 1312 output is directed to a real-time image data acquisition process 1314 . In addition to receiving sensor output, the real-time image data acquisition process 1314 of this embodiment also receives a position reference 1311 from the sensed web longitudinal control system, which synchronizes the acquisition of the position of the fiducial mark image. This real-time image data acquisition process directs the output of the digital image to the digital image processing system 1316 . The digital image processing system 1316 analyzes the image to determine how far the horizontal or vertical marker is from its intended location. The machine direction or machine direction position error 1318 is output to the sensed web longitudinal control system, while the cross web or cross web direction position error 1320 is output to the web guidance control system.

Figure 14 shows another illustrative embodiment of a web sensing system. In this embodiment, one sensor is used for landscape and the other sensor is used for portrait. Web 1402 has longitudinal fiducial marks 1404 and transverse fiducial marks 1406 . As web 1402 passes between roller 1408 and roller 1410 , one sensor 1412 senses longitudinal fiducial mark 1404 and the other sensor 1414 senses transverse fiducial mark 1406 . The sensor 1412 for longitudinal sensing can be a standard light emitting diode (LED)/photodiode with a light detection circuit with a fast response time. The sensor 1414 for lateral sensing may be a camera, such as a Keyence LS-7500 series CCD camera with built-in high speed processing.

The output from sensor 1412 is provided to light detection circuitry 1416, where the fiducial can be observed, and where it can be determined how far the actual location of the longitudinal fiducial mark is from the desired location. The machine direction or machine direction position error 1418 is output to the sensed web machine direction control system.

The output from the sensor 1414 is provided to the camera's image processing 1420 where it can be determined how far the actual location of the lateral fiducial marker is from the desired location. The cross-web direction position error is output to the web guidance control system.

In another aspect, there is provided a method of continuously depositing material using the apparatus described above. The method includes continuously delivering a substrate from a substrate delivery roll while continuously receiving a substrate on a first substrate receiving roll, wherein the substrate is positioned within a first circle as it is delivered between the substrate delivery roll and the first substrate receiving roll. through the circumference of the barrel. The method further includes continuously delivering a first mask from a first mask delivery roll while continuously delivering and receiving the substrate while continuously receiving the first mask on a first mask receiving roll, wherein, When the mask is delivered between the first mask delivery roller and the first mask receiving roller, the first mask passes on the circumferential portion of the first cylinder, and wherein the mask has multiple layers forming the first pattern pores, and at least a portion of the pores have a minimum dimension of 100 microns or less. In addition, the method includes continuously directing the first deposition from the first deposition source toward the first mask portion passing on the circumferential portion of the first cylinder while continuously delivering and receiving the substrate and the first mask. material such that a first pattern of the first material is deposited on the substrate.

The method may also include continuously delivering the substrate from a first substrate receiving roll while continuously receiving the substrate on a second substrate receiving roll, wherein the substrate is between the first substrate receiving roll and the second substrate receiving roll , passing over the circumferential portion of the second cylinder. The method also includes continuously delivering a second mask from a second mask delivery roll while continuously receiving the second mask on a second mask receiving roll, wherein the second mask is on the second mask The delivery roller and the second mask receiving roller pass over the peripheral portion of the second cylinder, and wherein the second mask has a plurality of holes forming a second pattern. In addition, the method further includes continuously directing the second mask from the second deposition source toward the second mask passing over the circumferential portion of the second cylinder while continuously delivering and receiving the substrate and the second mask. A material is deposited such that a second pattern of a second deposited material is deposited on the substrate.

While the invention has been shown and described practically with reference to various embodiments thereof, it will be understood by those skilled in the art that changes may be made in form and detail without departing from the spirit and scope of the invention. Make various other changes.

Claims (10)

1. one kind is used in substrate the equipment of deposition materials pattern continuously, comprising:

The substrate delivery roller is sent described substrate from described substrate delivery roller;

First substrate receives roller, receives in described first substrate and receives described substrate on the roller, makes described substrate extend to described substrate from described substrate delivery roller and receives roller, and described substrate passes to described substrate continuously from described substrate delivery roller and receives roller;

First mask, described first mask contains the hole that forms first pattern, and one or more in the described hole in wherein said first mask have 100 microns or littler minimum dimension;

The first mask delivery roller is sent first mask from the described first mask delivery roller;

First mask receives roller, receive described first mask of reception on the roller at described first mask, make described mask extend to described mask from described mask delivery roller and receive roller, described first mask passes to described first mask continuously from the described first mask delivery roller and receives roller;

First cylinder, on described first cylinder, from described substrate and mask delivery roller send and described substrate and mask receive between the reception on the roller, described substrate and described first mask come in contact on the circumferential section of described first cylinder, described first cylinder rotates continuously; And

First sedimentary origin, described first sedimentary origin is configured to partial continuous ground guiding first deposition materials towards described first mask, described part is positioned on the described circumferential section of described first cylinder, make at least a portion of described first deposition materials pass the described hole of described first mask, in described substrate, to deposit described first pattern of described first material continuously.

2. according to the equipment of claim 1, wherein said first mask is a polymer mask.

3. according to the equipment of claim 1, also comprise:

First substrate elongation control system, when described substrate contacts on the circumferential section of described first cylinder, described first substrate elongation control system along the delivery side from described substrate delivery roller to described first cylinder to, keep the predetermined elongation of described substrate; With

First mask elongation control system, when described first mask contacts on the circumferential section of described first cylinder, described first mask elongation control system along the delivery side from the described first mask delivery roller to described first cylinder to, keep the predetermined elongation of described first mask.

4. according to the equipment of claim 1, also comprise:

The first substrate lateral attitude control system, the described first substrate lateral attitude control system comprises that the lateral attitude with described substrate is adjusted to the web guide that is positioned at the predetermined lateral place on described first cylinder; With

The first mask lateral attitude control system, the described first mask lateral attitude control system comprises that the lateral attitude with described first mask is adjusted to the web guide that is positioned at the predetermined lateral place on described first cylinder.

5. according to the equipment of claim 4, also comprise:

The first substrate lateral attitude control system, the described first substrate lateral attitude control system comprises that the lateral attitude with described substrate is adjusted to the web guide that is positioned at the predetermined lateral place on described first cylinder; With

The first mask lateral attitude control system, the described first mask lateral attitude control system comprise that the lateral attitude with described first mask is adjusted to the web guide that is positioned at the predetermined lateral place on described first cylinder,

Wherein said first mask also comprises pattern elements; described equipment also comprises at least one mask sensor; described at least one mask sensor produces signal according to the described pattern elements of described first mask of sensing, and described at least one mask sensor is used by described first mask elongation control system and the described first mask lateral attitude control system.

6. according to claim 1,3,4 or 5 equipment, wherein said substrate comprises pattern elements, described equipment also comprises at least one substrate sensor, described at least one substrate sensor produces signal according to the described pattern elements of the described substrate of sensing, and described at least one substrate sensor is used by described substrate elongation control system and described substrate lateral attitude control system.

7. according to the equipment of claim 1, also comprise:

Second mask, described second mask have the hole that forms second pattern, at least one in the described hole in wherein said second mask or a plurality ofly contain 100 microns or littler minimum dimension;

The second mask delivery roller is sent second mask from the described second mask delivery roller;

Second mask receives roller, receive described second mask of reception on the roller at described second mask, make described second polymer mask extend to described mask from described mask delivery roller and receive roller, described second mask passes to described second mask continuously from the described second mask delivery roller and receives roller;

Second substrate receives roller, receives in described second substrate and receives described substrate on the roller, and described substrate receives roller from described first substrate and passes to described second substrate reception roller continuously;

Second cylinder, on described second cylinder, described substrate and described second mask contact on the circumferential section of described second cylinder, and described second cylinder receives between roller and described second substrate reception roller in described substrate and receives described substrate, and described second cylinder rotates continuously; And

Second sedimentary origin, described second sedimentary origin is configured to partial continuous ground guiding second deposition materials towards described second mask on the circumferential section of described second cylinder, make at least a portion of described second deposition materials pass the hole of described second mask, be deposited in the described substrate with described second pattern with described second material.

8. one kind is used in substrate the equipment of deposition materials pattern continuously, comprising:

The substrate delivery roller is from described substrate delivery roller substrate delivery;

First substrate receives roller, receives in described first substrate and receives described substrate on the roller, makes described substrate extend to described substrate from described substrate delivery roller and receives roller, and described substrate passes to described substrate continuously from described substrate delivery roller and receives roller;

First mask, described first mask contains the hole that forms first pattern;

The first mask delivery roller is sent first mask from the described first mask delivery roller;

First mask receives roller, receives at described first mask and receives described first mask on the roller, makes described mask extend to mask from described mask delivery roller and receives roller, and described first mask passes to first mask continuously from the described first mask delivery roller and receives roller;

First cylinder, on described first cylinder, from described substrate and mask delivery roller send and described substrate and mask receive between the reception on the roller, described substrate and described first polymer mask contact on the circumferential surface part of described first cylinder, and described first cylinder rotates continuously;

First sedimentary origin, described first sedimentary origin is configured to partial continuous ground guiding first deposition materials towards described first mask on the circumferential section of described first cylinder, make at least a portion of described first deposition materials pass the hole of described first mask, in described substrate, to deposit described first pattern of described first material continuously;

First substrate elongation control system, when described substrate contacts on the circumferential section of described first cylinder, described first substrate elongation control system along the delivery side from described substrate delivery roller to described first cylinder to, keep the predetermined elongation of described substrate;

First mask elongation control system, when described first mask contacts on the circumferential section of described first cylinder, described first mask elongation control system along the delivery side from the described first mask delivery roller to described first cylinder to, keep the predetermined elongation of described first mask;

The first substrate lateral attitude control system, the described first substrate lateral attitude control system comprises that the lateral attitude with described substrate is adjusted to the web guide that is positioned at the predetermined lateral place on described first cylinder; With

The first mask lateral attitude control system, the described first mask lateral attitude control system comprises that the lateral attitude with described first mask is adjusted to the web guide that is positioned at the predetermined lateral place on described first cylinder.

9. equipment according to Claim 8, wherein said first mask is a polymer.

10. method of deposition materials continuously comprises:

From the continuous substrate delivery of substrate delivery roller, simultaneously substrate is received in the reception roller continuously, wherein, when receiving between the roller in described substrate delivery roller and described substrate, described substrate is passed through on the circumferential section of first cylinder;

When sending and receiving described substrate continuously, send first mask continuously from the first mask delivery roller, simultaneously described first mask being received continuously first mask receives on the roller, wherein when receiving between the roller at the first mask delivery roller and first mask, described first mask passes through on the circumferential section of described first cylinder, and wherein said first mask has the hole of a plurality of formation first patterns, and at least a portion in described hole has 100 microns or littler minimum dimension;

When sending and receiving the described substrate and first mask continuously, part towards first mask on the circumferential section of described first cylinder, guide first deposition materials continuously, make in described substrate described first pattern of described first material of deposition from first sedimentary origin.

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