CN101334591A - Leveling and focusing mechanism with large stroke adjustment function - Google Patents

Leveling and focusing mechanism with large stroke adjustment function Download PDF

Info

Publication number
CN101334591A
CN101334591A CNA2008101450490A CN200810145049A CN101334591A CN 101334591 A CN101334591 A CN 101334591A CN A2008101450490 A CNA2008101450490 A CN A2008101450490A CN 200810145049 A CN200810145049 A CN 200810145049A CN 101334591 A CN101334591 A CN 101334591A
Authority
CN
China
Prior art keywords
stroke
leveling
focusing
wedge
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CNA2008101450490A
Other languages
Chinese (zh)
Other versions
CN101334591B (en
Inventor
周清华
李志龙
李生强
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shanghai Xinshang Microelectronics Technology Co ltd
Shanghai Micro Electronics Equipment Co Ltd
Original Assignee
Shanghai Micro Electronics Equipment Co Ltd
Shanghai Micro and High Precision Mechine Engineering Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shanghai Micro Electronics Equipment Co Ltd, Shanghai Micro and High Precision Mechine Engineering Co Ltd filed Critical Shanghai Micro Electronics Equipment Co Ltd
Priority to CN 200810145049 priority Critical patent/CN101334591B/en
Publication of CN101334591A publication Critical patent/CN101334591A/en
Application granted granted Critical
Publication of CN101334591B publication Critical patent/CN101334591B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Details Of Measuring And Other Instruments (AREA)

Abstract

一种具有大行程调节功能的调平调焦机构,包含小行程调平调焦机构和设置在该小行程调平调焦机构下部的大行程调节机构,Z向大行程由独立的楔形块机构实现,Z向微量调节由楔形块机构驱动,簧片导向来实现。本发明提供的一种具有大行程调节功能的调平调焦机构,可以实现Z向大行程调节和Z向微量调节,提高了动态性能和调节精度,适应不同的应用场合和不同的硅片厚度规格。

A leveling and focusing mechanism with a large stroke adjustment function, including a small stroke leveling and focusing mechanism and a large stroke adjusting mechanism arranged at the lower part of the small stroke leveling and focusing mechanism, the large stroke in the Z direction is controlled by an independent wedge block mechanism Realize, the micro-adjustment in Z direction is driven by the wedge block mechanism and realized by the reed guide. A leveling and focusing mechanism with a large stroke adjustment function provided by the present invention can realize Z-direction large-stroke adjustment and Z-direction micro-adjustment, improve dynamic performance and adjustment accuracy, and adapt to different application occasions and different thicknesses of silicon wafers Specification.

Description

具有大行程调节功能的调平调焦机构 Leveling and focusing mechanism with large stroke adjustment function

技术领域 technical field

本发明涉及一种具有大行程调节功能的调平调焦机构,尤其涉及一种具有大行程调节功能的硅片台调平调焦机构。The invention relates to a leveling and focusing mechanism with a large stroke adjustment function, in particular to a silicon wafer stage leveling and focusing mechanism with a large stroke adjustment function.

背景技术 Background technique

整场调焦调平一般是在硅片表面3个或3个以上不同位置处进行离焦量测量,来计算并校正整个硅片表面的离焦量和倾斜量,实质就是在坐标系中调节θx,θy和Z向三个自由度,(其中θx是绕X轴的转动,θy是绕Y轴的转动),达到硅片调焦调平的目的。Focusing and leveling of the whole field is generally carried out by measuring the defocus amount at 3 or more different positions on the surface of the silicon wafer to calculate and correct the defocus amount and tilt of the entire silicon wafer surface. The essence is to adjust in the coordinate system θx, θy and Z-axis three degrees of freedom (where θx is the rotation around the X-axis, θy is the rotation around the Y-axis), to achieve the purpose of focusing and leveling the silicon wafer.

专利US005204712A公开了一个3自由度的微动台。该台的基本原理是通过三组凸轮机构,分布在三个点上,三个驱动点通过一个柔性机构连接到承片台上,并用簧片导向,共同驱动承片台,从而实现调平和调焦功能。该台的3个自由度调节量不大,尤其是Z向自由度不能实现大行程调节。Patent US005204712A discloses a micro-motion table with 3 degrees of freedom. The basic principle of the table is that it is distributed on three points through three sets of cam mechanisms, and the three driving points are connected to the film support table through a flexible mechanism, and are guided by reeds to drive the film support table together to achieve leveling and adjustment. focus function. The 3 degrees of freedom adjustment of this table is not large, especially the Z-direction degree of freedom cannot realize large stroke adjustment.

中国专利CN2580470公开了一种三自由度超精密定位平台。该台体内部呈等边三角形固定有三组各自独立的压电陶瓷预紧机构。该台结构紧凑,精度较高,但是调节范围小,压电陶瓷易发热,也不易进行恒温控制。Chinese patent CN2580470 discloses a three-degree-of-freedom ultra-precise positioning platform. Three groups of independent piezoelectric ceramic preloading mechanisms are fixed inside the table body in the form of an equilateral triangle. The table has a compact structure and high precision, but the adjustment range is small, and the piezoelectric ceramics are easy to generate heat, and it is not easy to carry out constant temperature control.

发明内容 Contents of the invention

本发明提供的一种具有大行程调节功能的调平调焦机构,可以实现Z向大行程调节和Z向微量调节,提高了动态性能和调节精度,适应不同的应用场合和不同的硅片厚度规格。A leveling and focusing mechanism with a large stroke adjustment function provided by the present invention can realize Z-direction large-stroke adjustment and Z-direction micro-adjustment, improve dynamic performance and adjustment accuracy, and adapt to different application occasions and different thicknesses of silicon wafers Specification.

为了达到上述目的,本发明提供了一种具有大行程调节功能的调平调焦机构,包含:In order to achieve the above purpose, the present invention provides a leveling and focusing mechanism with a large stroke adjustment function, including:

小行程调平调焦机构和设置在该小行程调平调焦机构下部的大行程调节机构;A small-stroke leveling and focusing mechanism and a large-stroke adjusting mechanism arranged at the lower part of the small-stroke leveling and focusing mechanism;

所述的小行程调平调焦机构包含:The small-stroke leveling and focusing mechanism includes:

调平调焦底板;Leveling the focusing bottom plate;

中心设置在调平调焦底板上的簧片,该簧片具有若干自由端;A reed centrally arranged on the leveling and focusing base plate, the reed has several free ends;

上平板;upper plate;

连接所述簧片自由端和上平板的若干小行程楔形机构;Several small-stroke wedge-shaped mechanisms connecting the free ends of the reeds and the upper plate;

连接所述小行程楔形机构的若干小行程驱动机构;Several small-stroke drive mechanisms connected to the small-stroke wedge mechanism;

所述的小行程楔形机构包含:The small-stroke wedge mechanism includes:

连接所述簧片的三角板,该三角板通过一个柔性连接块连接所述的上平板;connecting the triangular plate of the reed, the triangular plate is connected to the upper plate through a flexible connecting block;

设置在所述三角板下部的调平调焦滚子;A leveling and focusing roller arranged at the lower part of the triangular plate;

固定在所述调平调焦底板上的导轨;Guide rails fixed on the leveling and focusing bottom plate;

设置在所述导轨上的楔形块,该楔形块的上表面具有坡度,该楔形块可以沿导轨滑动;A wedge-shaped block arranged on the guide rail, the upper surface of the wedge-shaped block has a slope, and the wedge-shaped block can slide along the guide rail;

所述的小行程驱动机构包含:The small-stroke driving mechanism includes:

连接所述楔形块的转接板;an adapter plate connected to the wedge;

设置在所述转接板另一侧上的螺杆,该螺杆通过螺母带动转接板产生水平位移;A screw provided on the other side of the adapter plate, the screw drives the adapter plate to generate horizontal displacement through the nut;

连接所述螺杆的驱动电机;a drive motor connected to the screw;

连接所述转接板和驱动电机的若干消隙拉簧,消除螺杆的回程间隙,提高定位精度;A number of anti-backlash tension springs connecting the adapter plate and the drive motor eliminate the backlash of the screw and improve positioning accuracy;

所述的小行程调平调焦机构还包含若干与小行程楔形机构对应设置的测量反馈模块;以及连接所述测量反馈模块和驱动电机的控制驱动模块;The small-stroke leveling and focusing mechanism also includes several measurement feedback modules corresponding to the small-stroke wedge mechanism; and a control drive module connecting the measurement feedback modules and the drive motor;

所述的小行程调平调焦机构还包含若干连接所述调平调焦底板和簧片的弹簧;The small-stroke leveling and focusing mechanism also includes several springs connecting the leveling and focusing bottom plate and the reed;

所述的大行程调节机构包含:The large stroke adjustment mechanism includes:

底板;floor;

设置在底板上的若干圆弧导轨;Several arc guide rails set on the bottom plate;

设置在所述圆弧导轨上的楔形块驱动板,该驱动板具有若干自由端,该自由端可以沿所述的圆弧导轨滑动;a wedge drive plate arranged on the arc guide rail, the drive plate has several free ends, and the free ends can slide along the arc guide rail;

设置在所述楔形驱动板自由端上的若干大行程楔形机构;Several large stroke wedge mechanisms arranged on the free end of the wedge drive plate;

连接所述楔形驱动板的大行程驱动机构;a large-stroke driving mechanism connected to the wedge-shaped driving plate;

设置在所述底板上的若干调平调焦底板导向机构,该导向机构限制了调平调焦底板只能在Z向运动;A plurality of leveling and focusing base plate guide mechanisms arranged on the base plate, which limit the leveling and focusing base plate to move only in the Z direction;

所述的大行程楔形机构包含:The described large-stroke wedge mechanism includes:

设置在所述调平调焦底板下侧面的滚子;Rollers arranged on the lower side of the leveling and focusing bottom plate;

设置在所述楔形驱动板自由端上的大行程楔形块;a large stroke wedge block arranged on the free end of the wedge drive plate;

还包含连接所述大行程楔形块的楔形块调节机构,在装配时,可以通过该楔形块调节机构调节大行程楔形块的初装位置,从而调节调平调焦台的装配平行度;It also includes a wedge adjustment mechanism connected to the large-stroke wedge. During assembly, the initial installation position of the large-stroke wedge can be adjusted through the wedge adjustment mechanism, thereby adjusting the assembly parallelism of the leveling and focusing platform;

所述的大行程驱动机构包含:The described large-stroke driving mechanism includes:

连接所述楔形驱动板的转接件;an adapter for connecting the wedge drive plate;

设置在所述转接件上的螺杆,该螺杆通过螺母带动转接件产生位移;a screw provided on the adapter, the screw drives the adapter to generate displacement through the nut;

连接所述螺杆的大行程驱动电机;A large-stroke drive motor connected to the screw;

连接所述转接板和大行程驱动电机的若干消隙拉簧,消除螺杆的回程间隙,提高定位精度;Several anti-backlash tension springs connecting the adapter plate and the large-stroke drive motor eliminate the backlash of the screw and improve positioning accuracy;

所述的调平调焦底板导向机构包含:The leveling and focusing bottom plate guide mechanism includes:

设置在所述底板上的垂直导轨,通过导轨安装块安装在底板上;The vertical guide rail arranged on the base plate is installed on the base plate through the guide rail mounting block;

设置在所述垂直导轨上的滑块转接件,该滑块转接件的上端连接所述的调平调焦底板的下部,可以沿垂直导轨滑动;A slider adapter set on the vertical guide rail, the upper end of the slider adapter is connected to the lower part of the leveling and focusing base plate, and can slide along the vertical guide rail;

连接所述底板和调平调焦底板的若干拉簧,使调平调焦底板紧紧的和大行程楔形机构结合在一起;A number of tension springs connecting the base plate and the leveling and focusing base plate, so that the leveling and focusing base plate is tightly combined with the large stroke wedge mechanism;

所述的大行程调节机构还包含连接所述大行程楔形机构和大行程驱动机构的控制模块。The large-stroke adjusting mechanism also includes a control module connecting the large-stroke wedge mechanism and the large-stroke driving mechanism.

本发明的工作原理如下:The working principle of the present invention is as follows:

Z向大行程调节:控制模块控制电机转动,带动螺杆转动,经过螺母和转接件,把螺杆的转动转换成楔形驱动板沿圆弧导轨的转动,从而使大行程楔形块做直线运动,滚子在大行程楔形块的推动下,带动调平调焦底板做Z向直线运动,实现硅片厚度补偿;Large stroke adjustment in the Z direction: the control module controls the rotation of the motor to drive the screw to rotate. Through the nut and the adapter, the rotation of the screw is converted into the rotation of the wedge-shaped drive plate along the arc guide rail, so that the large-stroke wedge moves in a straight line. Driven by the wedge-shaped block with large stroke, it drives the leveling and focusing bottom plate to move linearly in the Z direction to realize silicon wafer thickness compensation;

Z向小行程调节:根据测量反馈模块反馈的数据,控制驱动模块驱动电机把转动传递给螺杆,经过螺母和转接板,最后把电机的转动转换成楔形块的直线运动,在楔形块的推动下,调平调焦滚子带动三角板沿着Z向作直线运动,从而带动上平板实现垂直方向的三自由度运动补偿。Small stroke adjustment in the Z direction: According to the data fed back by the measurement feedback module, the drive module is controlled to drive the motor to transmit the rotation to the screw, through the nut and the adapter plate, and finally convert the rotation of the motor into the linear motion of the wedge, which is driven by the wedge Down, the leveling and focusing roller drives the triangular plate to move linearly along the Z direction, thereby driving the upper plate to realize three-degree-of-freedom motion compensation in the vertical direction.

本发明提供的一种具有大行程调节功能的调平调焦机构,实现Z向大行程调节和Z向微量调节,提高了动态性能和调节精度,Z向大行程调节的定位精度可以达到微米级,运动轨迹线性好,控制逻辑简单,Z向小行程调节的定位精度能达到数十纳米,适应不同的应用场合和不同的硅片厚度规格。A leveling and focusing mechanism with a large stroke adjustment function provided by the present invention realizes Z-direction large-stroke adjustment and Z-direction micro-adjustment, improves dynamic performance and adjustment accuracy, and the positioning accuracy of Z-direction large-stroke adjustment can reach micron level , the motion track is linear, the control logic is simple, and the positioning accuracy of Z-direction small stroke adjustment can reach tens of nanometers, which is suitable for different applications and different thickness specifications of silicon wafers.

附图说明 Description of drawings

图1是本发明提供的具有大行程调节功能的调平调焦机构的结构示意图;Fig. 1 is a structural schematic diagram of a leveling and focusing mechanism with a large stroke adjustment function provided by the present invention;

图2是本发明提供的具有大行程调节功能的调平调焦机构的小行程调平调焦机构的结构示意图;Fig. 2 is a structural schematic diagram of a small stroke leveling and focusing mechanism of a leveling and focusing mechanism with a large stroke adjustment function provided by the present invention;

图3是图2中小行程调平调焦机构的俯视图;Fig. 3 is a top view of the small stroke leveling and focusing mechanism in Fig. 2;

图4是本发明提供的具有大行程调节功能的调平调焦机构的小行程楔形机构和小行程驱动机构的结构示意图;Fig. 4 is a structural schematic diagram of a small-stroke wedge mechanism and a small-stroke driving mechanism of a leveling and focusing mechanism with a large stroke adjustment function provided by the present invention;

图5是图4中小行程楔形机构和小行程驱动机构的俯视图;Fig. 5 is the top view of small-stroke wedge mechanism and small-stroke driving mechanism in Fig. 4;

图6是本发明提供的具有大行程调节功能的调平调焦机构的大行程调节机构的结构示意图;Fig. 6 is a structural schematic diagram of a large-stroke adjustment mechanism of a leveling and focusing mechanism with a large-stroke adjustment function provided by the present invention;

图7是图6中大行程调节机构的立体图。Fig. 7 is a perspective view of the large stroke adjustment mechanism in Fig. 6 .

具体实施方式 Detailed ways

以下根据图1~图7,具体说明本发明的较佳实施方式:Below according to Fig. 1~Fig. 7, the preferred embodiment of the present invention is described in detail:

如图1所示,本发明提供了一种具有大行程调节功能的调平调焦机构,包含:As shown in Figure 1, the present invention provides a leveling and focusing mechanism with a large stroke adjustment function, including:

小行程调平调焦机构和设置在该小行程调平调焦机构下部的大行程调节机构;A small-stroke leveling and focusing mechanism and a large-stroke adjusting mechanism arranged at the lower part of the small-stroke leveling and focusing mechanism;

如图2和图3所示,所述的小行程调平调焦机构包含:As shown in Figures 2 and 3, the small stroke leveling and focusing mechanism includes:

调平调焦底板7;Leveling and focusing bottom plate 7;

中心设置在调平调焦底板7上的簧片2,该簧片2具有若干自由端;The center is arranged on the reed 2 on the leveling and focusing base plate 7, and the reed 2 has several free ends;

上平板1;upper plate 1;

连接所述簧片2自由端和上平板1的若干小行程楔形机构;Several small-stroke wedge-shaped mechanisms connecting the free ends of the reed 2 and the upper plate 1;

连接所述小行程楔形机构的若干小行程驱动机构;Several small-stroke drive mechanisms connected to the small-stroke wedge mechanism;

如图4和图5所示,所述的小行程楔形机构包含:As shown in Figure 4 and Figure 5, the described small stroke wedge mechanism includes:

连接所述簧片2的三角板3,该三角板3通过一个柔性连接块14连接所述的上平板1;The triangular plate 3 connected to the reed 2, the triangular plate 3 is connected to the upper plate 1 through a flexible connecting block 14;

设置在所述三角板3下部的调平调焦滚子4;The leveling and focusing roller 4 arranged at the lower part of the triangular plate 3;

固定在所述调平调焦底板7上的导轨6;The guide rail 6 fixed on the leveling and focusing base plate 7;

设置在所述导轨6上的楔形块5,该楔形块5的上表面具有坡度,该楔形块可以沿导轨6滑动;The wedge block 5 arranged on the guide rail 6, the upper surface of the wedge block 5 has a slope, and the wedge block can slide along the guide rail 6;

如图4和图5所示,所述的小行程驱动机构包含:As shown in Figure 4 and Figure 5, the described small stroke drive mechanism includes:

连接所述楔形块5的转接板10;connecting the adapter plate 10 of the wedge block 5;

设置在所述转接板10另一侧上的螺杆9,该螺杆9通过螺母12带动转接板10产生水平位移;The screw rod 9 arranged on the other side of the adapter plate 10, the screw rod 9 drives the adapter plate 10 to generate horizontal displacement through the nut 12;

连接所述螺杆9的驱动电机8;Connect the driving motor 8 of the screw rod 9;

连接所述转接板10和驱动电机8的若干消隙拉簧11,消除螺杆9的回程间隙,提高定位精度;Several anti-backlash extension springs 11 connecting the adapter plate 10 and the drive motor 8 eliminate the backlash of the screw rod 9 and improve positioning accuracy;

所述的小行程调平调焦机构还包含若干与小行程楔形机构对应设置的测量反馈模块;以及连接所述测量反馈模块和驱动电机的控制驱动模块;The small-stroke leveling and focusing mechanism also includes several measurement feedback modules corresponding to the small-stroke wedge mechanism; and a control drive module connecting the measurement feedback modules and the drive motor;

所述的小行程调平调焦机构还包含若干连接所述调平调焦底板7和簧片2的弹簧15;The small-stroke leveling and focusing mechanism also includes several springs 15 connecting the leveling and focusing bottom plate 7 and the reed 2;

如图6和图7所示,所述的大行程调节机构包含:As shown in Figures 6 and 7, the large stroke adjustment mechanism includes:

底板106;Bottom plate 106;

设置在底板106上的若干圆弧导轨113;Several arc guide rails 113 arranged on the bottom plate 106;

设置在所述圆弧导轨113上的楔形块驱动板107,该驱动板107具有若干自由端,该自由端可以沿所述的圆弧导轨113滑动;The wedge block driving plate 107 arranged on the arc guide rail 113 has several free ends, and the free ends can slide along the arc guide rail 113;

设置在所述楔形驱动板107自由端上的若干大行程楔形机构;Several large stroke wedge mechanisms arranged on the free end of the wedge drive plate 107;

连接所述楔形驱动板的大行程驱动机构;a large-stroke driving mechanism connected to the wedge-shaped driving plate;

设置在所述底板106上的若干调平调焦底板导向机构,该导向机构限制了调平调焦底板7只能在Z向运动;A number of leveling and focusing base plate guide mechanisms arranged on the base plate 106, which limit the leveling and focusing base plate 7 to move only in the Z direction;

所述的大行程楔形机构包含:The described large-stroke wedge mechanism includes:

设置在所述调平调焦底板7下侧面的滚子100;The roller 100 arranged on the lower side of the leveling and focusing bottom plate 7;

设置在所述楔形驱动板107自由端上的大行程楔形块101;The large stroke wedge block 101 that is arranged on the free end of the wedge drive plate 107;

还包含连接所述大行程楔形块101的楔形块调节机构102,在装配时,可以通过该楔形块调节机构102调节大行程楔形块101的初装位置,从而调节调平调焦台的装配平行度;It also includes a wedge adjustment mechanism 102 connected to the large-stroke wedge 101. During assembly, the initial installation position of the large-stroke wedge 101 can be adjusted through the wedge adjustment mechanism 102, thereby adjusting the assembly parallelism of the leveling and focusing platform. Spend;

所述的大行程驱动机构包含:The described large-stroke driving mechanism includes:

连接所述楔形驱动板107的转接件111;connecting the adapter piece 111 of the wedge drive plate 107;

设置在所述转接件111上的螺杆112,该螺杆112通过螺母110带动转接件111产生位移;The screw 112 arranged on the adapter 111, the screw 112 drives the adapter 111 to generate displacement through the nut 110;

连接所述螺杆112的大行程驱动电机108;A large stroke drive motor 108 connected to the screw rod 112;

连接所述转接件111和大行程驱动电机108的若干消隙拉簧109,消除螺杆的回程间隙,提高定位精度;A plurality of anti-backlash extension springs 109 connecting the adapter 111 and the large-stroke drive motor 108 eliminate the backlash of the screw rod and improve positioning accuracy;

所述的调平调焦底板导向机构包含:The leveling and focusing bottom plate guide mechanism includes:

设置在所述底板106上的垂直导轨104,通过导轨安装块105安装在底板106上;The vertical guide rail 104 arranged on the base plate 106 is installed on the base plate 106 through the guide rail mounting block 105;

设置在所述垂直导轨104上的滑块转接件103,该滑块转接件103的上端连接所述的调平调焦底板7的下部,可以沿垂直导轨104滑动;The slider adapter 103 arranged on the vertical guide rail 104, the upper end of the slider adapter 103 is connected to the lower part of the leveling and focusing bottom plate 7, and can slide along the vertical guide rail 104;

连接所述底板106和调平调焦底板7的若干拉簧114,使调平调焦底板7紧紧的和大行程楔形机构结合在一起;A plurality of tension springs 114 connecting the base plate 106 and the leveling and focusing base plate 7, so that the leveling and focusing base plate 7 is tightly combined with the large stroke wedge mechanism;

所述的大行程调节机构还包含连接所述大行程楔形机构和大行程驱动机构的控制模块。The large-stroke adjusting mechanism also includes a control module connecting the large-stroke wedge mechanism and the large-stroke driving mechanism.

本实施例中,进行Z向大行程调节,分别设置三套大行程楔形机构和调平调焦底板导向机构,大行程运动由旋转编码器测量控制,首先控制电机108转动,带动螺杆112转动,经过螺母110和转接件111,把螺杆112的转动转换成楔形驱动板107沿圆弧导轨113的转动,从而使大行程楔形块101做直线运动,滚子100在大行程楔形块101的推动下,带动调平调焦底板7做Z向直线运动,实现硅片厚度补偿。In this embodiment, Z-direction large-stroke adjustment is performed, and three sets of large-stroke wedge-shaped mechanisms and leveling and focusing base plate guiding mechanisms are respectively provided. The large-stroke movement is measured and controlled by a rotary encoder. First, the rotation of the motor 108 is controlled to drive the screw 112 to rotate. Through the nut 110 and the adapter 111, the rotation of the screw rod 112 is converted into the rotation of the wedge-shaped drive plate 107 along the arc guide rail 113, so that the large-stroke wedge 101 moves linearly, and the roller 100 is driven by the large-stroke wedge 101. Next, it drives the leveling and focusing base plate 7 to move linearly in the Z direction to realize silicon wafer thickness compensation.

进行Z向小行程调节时,三套相同的小行程楔形机构和小行程驱动机构实现调平调焦的三自由度控制,小行程楔形机构分别位于图3中的A1、A2和A3处,三点决定一个平面,根据位于16a,16b,16c处的三个位移传感器(或者电涡流传感器等)反馈的数据,控制驱动模块驱动电机8把转动传递给螺杆9,经过螺母12和转接板10,最后把电机的转动转换成楔形块5的直线运动,在楔形块5的推动下,调平调焦滚子4带动三角板3沿着Z向作直线运动,从而带动上平板1实现垂直方向的三自由度运动补偿。When adjusting the Z-direction small stroke, three sets of the same small-stroke wedge mechanism and small-stroke driving mechanism realize the three-degree-of-freedom control of leveling and focusing. The small-stroke wedge mechanism is respectively located at A1, A2 and A3 in Figure 3. The point determines a plane. According to the data fed back by the three displacement sensors (or eddy current sensors, etc.) located at 16a, 16b, and 16c, the drive module is controlled to drive the motor 8 to transmit the rotation to the screw 9, passing through the nut 12 and the adapter plate 10 , and finally convert the rotation of the motor into the linear motion of the wedge block 5. Under the push of the wedge block 5, the leveling and focusing roller 4 drives the triangular plate 3 to move linearly along the Z direction, thereby driving the upper plate 1 to realize the vertical movement Three degrees of freedom motion compensation.

本发明提供的一种具有大行程调节功能的调平调焦机构,实现Z向大行程调节和Z向微量调节,提高了动态性能和调节精度,Z向大行程调节的定位精度可以达到微米级,运动轨迹线性好,控制逻辑简单,Z向小行程调节的定位精度能达到数十纳米,适应不同的应用场合和不同的硅片厚度规格。A leveling and focusing mechanism with a large stroke adjustment function provided by the present invention realizes Z-direction large-stroke adjustment and Z-direction micro-adjustment, improves dynamic performance and adjustment accuracy, and the positioning accuracy of Z-direction large-stroke adjustment can reach micron level , the motion track is linear, the control logic is simple, and the positioning accuracy of Z-direction small stroke adjustment can reach tens of nanometers, which is suitable for different applications and different thickness specifications of silicon wafers.

Claims (8)

1.一种具有大行程调节功能的调平调焦机构,其特征在于,包含:1. A leveling and focusing mechanism with a large stroke adjustment function, characterized in that it comprises: 小行程调平调焦机构和设置在该小行程调平调焦机构下部的大行程调节机构;A small-stroke leveling and focusing mechanism and a large-stroke adjusting mechanism arranged at the lower part of the small-stroke leveling and focusing mechanism; 所述的小行程调平调焦机构包含:The small-stroke leveling and focusing mechanism includes: 调平调焦底板(7);中心设置在调平调焦底板(7)上的簧片(2),该簧片(2)具有若干自由端;上平板(1);连接所述簧片(2)自由端和上平板(1)的若干小行程楔形机构;连接所述小行程楔形机构的若干小行程驱动机构;Leveling and focusing bottom plate (7); the reed (2) centered on the leveling and focusing bottom plate (7), the reed (2) has a number of free ends; upper plate (1); connected to the reed (2) some small-stroke wedge mechanisms of the free end and the upper plate (1); some small-stroke driving mechanisms connected to the small-stroke wedge mechanisms; 所述的大行程调节机构包含:The large stroke adjustment mechanism includes: 底板(106);设置在底板(106)上的若干圆弧导轨(113);设置在所述圆弧导轨(113)上的楔形块驱动板(107),该驱动板(107)具有若干自由端,该自由端可以沿所述的圆弧导轨(113)滑动;设置在所述楔形驱动板(107)自由端上的若干大行程楔形机构;连接所述楔形驱动板的大行程驱动机构;设置在所述底板(106)上的若干调平调焦底板导向机构。Bottom plate (106); Some circular arc guide rails (113) that are arranged on the bottom plate (106); The wedge block drive plate (107) that is arranged on the described circular arc guide rail (113), this drive plate (107) has some free end, the free end can slide along the arc guide rail (113); several large-stroke wedge mechanisms arranged on the free end of the wedge-shaped drive plate (107); a large-stroke drive mechanism connected to the wedge-shaped drive plate; Several leveling and focusing bottom plate guide mechanisms arranged on the bottom plate (106). 2.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的小行程楔形机构包含:2. The leveling and focusing mechanism with a large stroke adjustment function as claimed in claim 1, wherein the small stroke wedge mechanism comprises: 连接所述簧片(2)的三角板(3),该三角板(3)通过一个柔性连接块(14)连接所述的上平板(1);connecting the triangular plate (3) of the reed (2), the triangular plate (3) is connected to the upper plate (1) through a flexible connecting block (14); 设置在所述三角板(3)下部的调平调焦滚子(4);A leveling and focusing roller (4) arranged on the lower part of the triangular plate (3); 固定在所述调平调焦底板(7)上的导轨(6);A guide rail (6) fixed on the leveling and focusing base plate (7); 设置在所述导轨(6)上的楔形块(5),该楔形块(5)的上表面具有坡度,该楔形块可以沿导轨(6)滑动。The wedge block (5) arranged on the guide rail (6), the upper surface of the wedge block (5) has a slope, and the wedge block can slide along the guide rail (6). 3.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的小行程驱动机构包含:3. The leveling and focusing mechanism with a large stroke adjustment function as claimed in claim 1, wherein the small stroke driving mechanism comprises: 连接所述楔形块(5)的转接板(10);connecting the adapter plate (10) of the wedge block (5); 设置在所述转接板(10)另一侧上的螺杆(9),该螺杆(9)通过螺母(12)带动转接板(10)产生水平位移;The screw rod (9) arranged on the other side of the adapter plate (10), the screw rod (9) drives the adapter plate (10) to generate horizontal displacement through the nut (12); 连接所述螺杆(9)的驱动电机(8);Connect the driving motor (8) of described screw rod (9); 连接所述转接板(10)和驱动电机(8)的若干消隙拉簧(11)。A plurality of anti-backlash extension springs (11) connecting the adapter plate (10) and the driving motor (8). 4.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的小行程调平调焦机构还包含若干与小行程楔形机构对应设置的测量反馈模块;以及连接所述测量反馈模块和驱动电机的控制驱动模块;还包含若干连接所述调平调焦底板(7)和簧片(2)的弹簧(15)。4. The leveling and focusing mechanism with a large stroke adjustment function as claimed in claim 1, wherein the small stroke leveling and focusing mechanism further comprises a plurality of measurement feedback modules corresponding to the small stroke wedge mechanism; And the control driving module connecting the measurement feedback module and the driving motor; also includes several springs (15) connecting the leveling and focusing bottom plate (7) and the reed (2). 5.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的大行程楔形机构包含:5. The leveling and focusing mechanism with a large stroke adjustment function as claimed in claim 1, wherein the large stroke wedge mechanism comprises: 设置在所述调平调焦底板(7)下侧面的滚子(100);A roller (100) arranged on the lower side of the leveling and focusing base plate (7); 设置在所述楔形驱动板(107)自由端上的大行程楔形块(101);The large-stroke wedge block (101) that is arranged on the free end of the wedge-shaped drive plate (107); 还包含连接所述大行程楔形块(101)的楔形块调节机构(102)。It also includes a wedge block adjusting mechanism (102) connected to the large stroke wedge block (101). 6.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的大行程驱动机构包含:6. The leveling and focusing mechanism with a large-stroke adjustment function as claimed in claim 1, wherein the large-stroke driving mechanism comprises: 连接所述楔形驱动板(107)的转接件(111);An adapter (111) connecting the wedge-shaped drive plate (107); 设置在所述转接件(111)上的螺杆(112),该螺杆(112)通过螺母(110)带动转接件(111)产生位移;A screw (112) arranged on the adapter (111), the screw (112) drives the adapter (111) through the nut (110) to generate a displacement; 连接所述螺杆(112)的大行程驱动电机(108);A large stroke drive motor (108) connected to the screw rod (112); 连接所述转接件(111)和大行程驱动电机(108)的若干消隙拉簧(109)。A plurality of anti-backlash tension springs (109) connecting the adapter (111) and the large-stroke driving motor (108). 7.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的调平调焦底板导向机构包含:7. The leveling and focusing mechanism with a large stroke adjustment function according to claim 1, wherein the leveling and focusing bottom plate guide mechanism comprises: 设置在所述底板(106)上的垂直导轨(104),通过导轨安装块(105)安装在底板(106)上;The vertical guide rail (104) arranged on the base plate (106) is installed on the base plate (106) through the guide rail mounting block (105); 设置在所述垂直导轨(104)上的滑块转接件(103),该滑块转接件(103)的上端连接所述的调平调焦底板(7)的下部,可以沿垂直导轨(104)滑动;The slider adapter (103) arranged on the vertical guide rail (104), the upper end of the slider adapter (103) is connected to the lower part of the leveling and focusing base plate (7), and can be moved along the vertical guide rail (104) sliding; 连接所述底板(106)和调平调焦底板(7)的若干拉簧(114)。Several tension springs (114) connecting the base plate (106) and the leveling and focusing base plate (7). 8.如权利要求1所述的具有大行程调节功能的调平调焦机构,其特征在于,所述的大行程调节机构还包含连接所述大行程楔形机构和大行程驱动机构的控制模块。8. The leveling and focusing mechanism with a large stroke adjustment function according to claim 1, wherein the large stroke adjustment mechanism further comprises a control module connecting the large stroke wedge mechanism and the large stroke driving mechanism.
CN 200810145049 2007-12-21 2008-07-29 Leveling and focusing mechanism with large stroke adjustment function Active CN101334591B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN 200810145049 CN101334591B (en) 2007-12-21 2008-07-29 Leveling and focusing mechanism with large stroke adjustment function

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CNA2007101728035A CN101241307A (en) 2007-12-21 2007-12-21 Levelling focusing mechanism possessing great stroke control function
CN200710172803.5 2007-12-21
CN 200810145049 CN101334591B (en) 2007-12-21 2008-07-29 Leveling and focusing mechanism with large stroke adjustment function

Publications (2)

Publication Number Publication Date
CN101334591A true CN101334591A (en) 2008-12-31
CN101334591B CN101334591B (en) 2010-09-15

Family

ID=39932923

Family Applications (2)

Application Number Title Priority Date Filing Date
CNA2007101728035A Pending CN101241307A (en) 2007-12-21 2007-12-21 Levelling focusing mechanism possessing great stroke control function
CN 200810145049 Active CN101334591B (en) 2007-12-21 2008-07-29 Leveling and focusing mechanism with large stroke adjustment function

Family Applications Before (1)

Application Number Title Priority Date Filing Date
CNA2007101728035A Pending CN101241307A (en) 2007-12-21 2007-12-21 Levelling focusing mechanism possessing great stroke control function

Country Status (1)

Country Link
CN (2) CN101241307A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108680093A (en) * 2018-06-20 2018-10-19 中国科学院西安光学精密机械研究所 Focusing distance measuring device and method in optical focusing mechanism
CN110962674A (en) * 2018-09-30 2020-04-07 上海微电子装备(集团)股份有限公司 AGV battery replacing device and AGV battery replacing method
CN111025855A (en) * 2019-12-23 2020-04-17 中国科学院光电技术研究所 A non-contact automatic center alignment overlay projection lithography machine
CN112223404A (en) * 2020-11-10 2021-01-15 昆山宝鑫瑞包装科技有限公司 Cutting bed with fine adjustment assembly
CN114384276A (en) * 2020-10-22 2022-04-22 航天科工惯性技术有限公司 Accelerometer gauge outfit assembling structure and method
CN114509923A (en) * 2022-01-28 2022-05-17 复旦大学 Focusing and leveling device in design of deep ultraviolet objective lens and application thereof

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102223959B (en) * 2008-10-31 2015-04-01 西门子公司 Method and device for determining a flatness of a metal strip
CN102109765B (en) * 2009-12-25 2012-08-29 上海微电子装备有限公司 Rotating platform
CN102129175B (en) * 2010-01-19 2013-01-16 上海微电子装备有限公司 Rotating platform supported by air flotation
CN102680477B (en) * 2012-04-24 2013-06-12 浙江大学 High precision leveling method and high precision leveling device for large optical element
CN105374718A (en) * 2015-12-04 2016-03-02 沈阳仪表科学研究院有限公司 Dicing saw sucker circumference flatness adjusting apparatus
CN113334430A (en) * 2021-07-21 2021-09-03 烟台艾迪艾创机器人科技有限公司 Bidirectional and multidirectional floating centering device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108680093A (en) * 2018-06-20 2018-10-19 中国科学院西安光学精密机械研究所 Focusing distance measuring device and method in optical focusing mechanism
CN108680093B (en) * 2018-06-20 2023-09-01 中国科学院西安光学精密机械研究所 Focusing distance measuring device and measuring method in optical focusing mechanism
CN110962674A (en) * 2018-09-30 2020-04-07 上海微电子装备(集团)股份有限公司 AGV battery replacing device and AGV battery replacing method
CN110962674B (en) * 2018-09-30 2023-10-13 上海微电子装备(集团)股份有限公司 AGV battery replacing device and AGV battery replacing method
CN111025855A (en) * 2019-12-23 2020-04-17 中国科学院光电技术研究所 A non-contact automatic center alignment overlay projection lithography machine
CN114384276A (en) * 2020-10-22 2022-04-22 航天科工惯性技术有限公司 Accelerometer gauge outfit assembling structure and method
CN112223404A (en) * 2020-11-10 2021-01-15 昆山宝鑫瑞包装科技有限公司 Cutting bed with fine adjustment assembly
CN114509923A (en) * 2022-01-28 2022-05-17 复旦大学 Focusing and leveling device in design of deep ultraviolet objective lens and application thereof
CN114509923B (en) * 2022-01-28 2023-11-24 复旦大学 Focusing and leveling device in deep ultraviolet objective lens design and application thereof

Also Published As

Publication number Publication date
CN101334591B (en) 2010-09-15
CN101241307A (en) 2008-08-13

Similar Documents

Publication Publication Date Title
CN101334591A (en) Leveling and focusing mechanism with large stroke adjustment function
CN101488371B (en) Precise positioning platform with six freedom of motion
US9898000B2 (en) Planar positioning system and method of using the same
CN109947140B (en) A 5-degree-of-freedom laser alignment fine-tuning device and its adjustment method
Torralba et al. Large range nanopositioning stage design: A three-layer and two-stage platform
CN101609193B (en) Movable optical element adjusting and positioning device
CN111352312B (en) A multifunctional lithography device
CN101197197A (en) Macro and micro dual drive positioning platform with large motion range
CN203245845U (en) Large stroke two-dimensional nanometer work table system with angle compensation function
CN107942622B (en) Three-degree-of-freedom precise adjustment parallel mechanism based on double flexible pairs
CN114123851A (en) A six-degree-of-freedom attitude adjustment platform
CN1562579A (en) High precision flexible parallel robot with six degreed of freedom and large travel
CN121382795A (en) Dynamic adjustable air floatation linear guide rail and adjusting method thereof
CN104070518B (en) A kind of Three-degree-of-freeprecision precision adjustment device based on eccentric structure
CN209765339U (en) 5 degree of freedom laser collimation micromatic setting
EP2756354B1 (en) Target processing tool
US8174154B2 (en) Air bushing linear stage system
US20210247216A1 (en) Cantilever Linear Motion Reference Device Employing Two-Layer Air Suspension
CN104681103B (en) Submicron order precise elevating gear
US6466324B1 (en) Servo guided stage system with yaw sensor
JP6941695B2 (en) Optical path correction device
CN219114006U (en) Multi-degree-of-freedom motion platform and displacement platform device
CN116107175B (en) A compact multi-axis precision motion stage
CN108614395A (en) Parallel motion mechanism adjusting apparatus based on shaft flexible hinge
CN107145164A (en) A kind of grand micro- compound locating platform of vertical movement

Legal Events

Date Code Title Description
C06 Publication
PB01 Publication
C10 Entry into substantive examination
SE01 Entry into force of request for substantive examination
C14 Grant of patent or utility model
GR01 Patent grant
CP01 Change in the name or title of a patent holder

Address after: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525

Co-patentee after: Shanghai Nanpre Mechanics Co.,Ltd.

Patentee after: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd.

Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525

Co-patentee before: Shanghai Nanpre Mechanics Co.,Ltd.

Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT Co.,Ltd.

CP01 Change in the name or title of a patent holder
TR01 Transfer of patent right

Effective date of registration: 20250807

Address after: 3 / F, building 19, building 8, No. 498, GuoShouJing Road, China (Shanghai) pilot Free Trade Zone, Pudong New Area, Shanghai, 201203

Patentee after: Shanghai Xinshang Microelectronics Technology Co.,Ltd.

Country or region after: China

Patentee after: Shanghai Nanpre Mechanics Co.,Ltd.

Address before: 201203 Zhangjiang High Tech Park, Shanghai, Zhang Dong Road, No. 1525

Patentee before: SHANGHAI MICRO ELECTRONICS EQUIPMENT (GROUP) Co.,Ltd.

Country or region before: China

Patentee before: Shanghai Nanpre Mechanics Co.,Ltd.

TR01 Transfer of patent right