CN104169802B - 校正用掩模及校正方法 - Google Patents

校正用掩模及校正方法 Download PDF

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Publication number
CN104169802B
CN104169802B CN201380014388.4A CN201380014388A CN104169802B CN 104169802 B CN104169802 B CN 104169802B CN 201380014388 A CN201380014388 A CN 201380014388A CN 104169802 B CN104169802 B CN 104169802B
Authority
CN
China
Prior art keywords
mask
image
exposure
correction
mask portion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN201380014388.4A
Other languages
English (en)
Chinese (zh)
Other versions
CN104169802A (zh
Inventor
野村义昭
松本隆德
竹下琢郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of CN104169802A publication Critical patent/CN104169802A/zh
Application granted granted Critical
Publication of CN104169802B publication Critical patent/CN104169802B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7019—Calibration

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
CN201380014388.4A 2012-03-15 2013-03-13 校正用掩模及校正方法 Expired - Fee Related CN104169802B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2012-059481 2012-03-15
JP2012059481A JP5928032B2 (ja) 2012-03-15 2012-03-15 キャリブレーション用マスクおよびキャリブレーション方法
PCT/JP2013/057096 WO2013137358A1 (ja) 2012-03-15 2013-03-13 キャリブレーション用マスクおよびキャリブレーション方法

Publications (2)

Publication Number Publication Date
CN104169802A CN104169802A (zh) 2014-11-26
CN104169802B true CN104169802B (zh) 2016-02-03

Family

ID=49161263

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201380014388.4A Expired - Fee Related CN104169802B (zh) 2012-03-15 2013-03-13 校正用掩模及校正方法

Country Status (4)

Country Link
JP (1) JP5928032B2 (ko)
KR (1) KR20140141644A (ko)
CN (1) CN104169802B (ko)
WO (1) WO2013137358A1 (ko)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3366176B2 (ja) 1996-02-22 2003-01-14 ダイハツ工業株式会社 バッテリの充電方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007113933A1 (ja) * 2006-04-05 2007-10-11 Sharp Kabushiki Kaisha 露光方法および露光装置
JP2007299805A (ja) * 2006-04-27 2007-11-15 Nsk Ltd ギャップ検出値の校正方法

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6222435A (ja) * 1985-07-23 1987-01-30 Nippon Seiko Kk 投影露光装置に使用する原点校正用マスク

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007113933A1 (ja) * 2006-04-05 2007-10-11 Sharp Kabushiki Kaisha 露光方法および露光装置
JP2007299805A (ja) * 2006-04-27 2007-11-15 Nsk Ltd ギャップ検出値の校正方法

Also Published As

Publication number Publication date
JP5928032B2 (ja) 2016-06-01
WO2013137358A1 (ja) 2013-09-19
JP2013195467A (ja) 2013-09-30
KR20140141644A (ko) 2014-12-10
CN104169802A (zh) 2014-11-26

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PB01 Publication
C10 Entry into substantive examination
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GR01 Patent grant
CF01 Termination of patent right due to non-payment of annual fee
CF01 Termination of patent right due to non-payment of annual fee

Granted publication date: 20160203