CN106756830B - The manufacturing method of alumal target - Google Patents

The manufacturing method of alumal target Download PDF

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Publication number
CN106756830B
CN106756830B CN201611192961.2A CN201611192961A CN106756830B CN 106756830 B CN106756830 B CN 106756830B CN 201611192961 A CN201611192961 A CN 201611192961A CN 106756830 B CN106756830 B CN 106756830B
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China
Prior art keywords
alumal
target
slab
aluminum
hot
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CN201611192961.2A
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CN106756830A (en
Inventor
鲁飞
刘树峰
张志宏
孙良成
刘小鱼
李慧
郑天仓
王峰
李静雅
邢正茂
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Baotou Rare Earth Research Institute
Ruike National Engineering Research Centre of Rare Earth Metallurgy and Functional Materials Co Ltd
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Baotou Rare Earth Research Institute
Ruike National Engineering Research Centre of Rare Earth Metallurgy and Functional Materials Co Ltd
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C1/00—Making non-ferrous alloys
    • C22C1/04—Making non-ferrous alloys by powder metallurgy
    • C22C1/0408—Light metal alloys
    • C22C1/0416—Aluminium-based alloys
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C21/00—Alloys based on aluminium

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Hard Magnetic Materials (AREA)
  • Powder Metallurgy (AREA)
  • Manufacturing Cores, Coils, And Magnets (AREA)

Abstract

The invention discloses a kind of manufacturing methods of alumal target, comprising: produces slab, the mass ratio of slab chemical constituent is aluminium: 75~95%, manganese: 5~25%；Shaping slab is fitted into mold, hot-pressed sintering furnace is put into through hot pressed sintering and obtains alumal target article；Target product is obtained after alumal target article is machined.The alumal target relative density that the present invention obtains is 99% or more, and internal imporosity, external flawless, crystallite dimension is tiny uniform, distributed components.

Description

The manufacturing method of alumal target
Technical field
The present invention relates to a kind of materials processing technologies, specifically, are related to a kind of manufacturing method of alumal target.
Background technique
The surfacecti proteon of sintered NdFeB (NdFeB) permanent-magnet material is the important technical links of magnet generation.It is domestic at present That there are film adhesions is low for common plant-scale surfacecti proteon processing method plating and chemical plating, pollutes that environment etc. is many to ask Topic.Vacuum coating technology is as a kind of environmental-friendly process of surface treatment, and coating process is excessive without raw material, non-pollutant discharge, Production scene cleaning, protection film adhesion is 5-10 times bigger than electroplating film, shows in the surfacecti proteon field of NdFeB permanent-magnet material Great development potentiality out, industrial application prospect are good.
Consider from cost and corrosion resisting property, compares approve alumal corrosion-resistant coating currently on the market.As coating source, aluminium The quality of manganese alloy target affects film coating environment and quality of coating, and then affects the corrosion resisting property of NdFeB magnet.Production is high Quality target key is to improve target relative density.The raising of target relative density can greatly reduce target organization internal Remaining pore, decreasing or even eliminating for the porosity can greatly improve rate of film build, reduce industrial production cost.Using The alumal target relative density of conventional fusion-cast technique production is about 94% or so, and organization internal has residual hole, can not Meets the needs of vacuum coating is to high-quality Al manganese target material.
Summary of the invention
Technical problem solved by the invention is to provide a kind of manufacturing method of alumal target, the alumal of acquisition Target relative density is 99% or more, and internal imporosity, external flawless, crystallite dimension is tiny uniform, distributed components.
Technical solution is as follows:
A kind of manufacturing method of alumal target, comprising:
Slab is produced, the mass ratio of slab chemical constituent is aluminium: 75~95%, manganese: 5~25%；
Shaping slab is fitted into mold, hot-pressed sintering furnace is put into through hot pressed sintering and obtains alumal target article；
Target product is obtained after alumal target article is machined.
Further, shaping slab is alumal ingot casting, surface roughness is 1.0~3.0m.
Further, vacuum degree is higher than 1 × 10 in hot pressing furnace when hot pressed sintering-2Pa, sintering temperature are 600~800 DEG C, at Type pressure be 5~20MPa, heat-insulation pressure keeping 1~2 hour.
Further, carrying out surface grinding and polishing and sharp processing processing acquisition target product to alumal target article.
Compared with prior art, the technology of the present invention effect includes:
1, the alumal target relative density obtained is 99% or more, internal imporosity, external flawless；Crystallite dimension It is tiny uniform；Target high yield rate is manufactured using the method for the present invention, is easy to large-scale production.
2, distributed components can satisfy demand of the vacuum coating to high-quality Al manganese target material.The method of the present invention can be with It is effective to avoid using sintered article caused by the existing filling unevenly as powder of heat pressing process after conventional powder filling mold In radial (or axial) the inconsistent drawback of density.Manufactured aluminium manganese target material distributed components, segregation-free, batch consistency It is good, it is suitble to large-scale production.
3, remarkable in economical benefits.
NdFeB magnet annual yield in China's is more than 100,000 tons.Northern rare earth Nd FeB magnet annual output is about 1.5 ten thousand tons, Plated film expense calculates (every gram of NdFeB magnet is based on 0.15-0.2cm2) by 0.08 yuan/cm2, and the output value is up to 200,000,000 yuan/Nian Zuo The right side, remarkable in economical benefits.
The present invention using environmental-friendly vacuum coating technology the surface NdFeB prepare protection film layer, relative to plating and For chemical plating, coating process is excessive without raw material, non-pollutant discharge, and production scene cleaning, protection film adhesion is than plating Film is 5-10 times big.The present invention improves permanent-magnet material product specification, strengthens product competitiveness in the international market, can play rare earth The resources advantage of big country has important practical significance for promoting enterprise technology content.
Specific embodiment
Below with reference to example embodiment, technical solution of the present invention is described in detail.However, example embodiment can Implement in a variety of forms, and is not understood as limited to embodiment set forth herein；On the contrary, thesing embodiments are provided so that The design of example embodiment more comprehensively and completely, and is comprehensively communicated to those skilled in the art by the present invention.
The manufacturing method of alumal target, specifically includes the following steps:
Step 1: producing slab；
Shaping slab is alumal ingot casting, and surface roughness is 1.0~3.0m, and the mass ratio of slab chemical constituent is, Aluminium: 75~95%, manganese: 5~25%.
Step 2: hot pressed sintering；
Shaping slab is fitted into mold, hot-pressed sintering furnace is put into through hot pressed sintering and obtains alumal target article.Heat When pressure sintering, vacuum degree is higher than 1 × 10 in hot pressing furnace-2Pa, sintering temperature are 600~800 DEG C, and briquetting pressure is 5~20MPa, Heat-insulation pressure keeping 1~2 hour.
Alumal ingot casting slab is subjected to hot pressed sintering, the double action to slab while applied force and temperature.It is setting Determine in parameter area, aluminium will appear liquid phase, promote target densified sintering product, manufactured target relative density is high, dense structure, nothing Hole, crystallite dimension are tiny uniform.
Step 3: machining；Surface grinding and polishing is carried out to alumal product and sharp processing processing obtains target product.
Embodiment 1:
A kind of alumal target manufacturing method, specifically includes the following steps:
(1) shaping slab；
Prepare the alumal ingot casting that mass percent is 95%Al, 5%Mn, is through turn-milling cutting to surface roughness The shaping slab of 2.0m.
(2) hot pressed sintering；
Shaping slab is fitted into mold, hot-pressed sintering furnace is put into.It closes fire door to start to vacuumize, when vacuum in hot pressing furnace Degree is higher than 1 × 10-2It when Pa, starts to warm up, when temperature is raised to 600 DEG C, increase pressure is heat-insulation pressure keeping 2 hours, cold with furnace to 5MPa But alumal product is obtained.
(3) it machines.
Surface grinding and polishing is carried out to alumal product and sharp processing processing obtains target product.It is obtained through above-mentioned technique Alumal target presentation quality is good, the gross imperfections such as flawless and crack, dense structure imporosity, and relative density reaches 99.7%.
Embodiment 2:
A kind of alumal target manufacturing method, specifically includes the following steps:
(1) shaping slab；
Prepare the alumal ingot casting that mass percent is 80%Al, 20%Mn, is through turn-milling cutting to surface roughness The shaping slab of 1.0m.
(2) hot pressed sintering: shaping slab is fitted into mold, is put into hot-pressed sintering furnace.Fire door is closed to start to vacuumize, when Vacuum degree is higher than 1 × 10 in hot pressing furnace-2It when Pa, starts to warm up, when temperature is raised to 780 DEG C, increases pressure to 10MPa, heat preservation is protected Pressure 1.5 hours, furnace cooling obtains alumal product.
(3) it machines.
Surface grinding and polishing is carried out to alumal product and sharp processing processing obtains target product.It is obtained through above-mentioned technique Alumal target presentation quality is good, the gross imperfections such as flawless and crack, dense structure imporosity, and relative density reaches 99.5%.
Embodiment 3:
A kind of alumal target manufacturing method, specifically includes the following steps:
(1) shaping slab；
Prepare the alumal ingot casting that mass percent is 75%Al -25%Mn, is through turn-milling cutting to surface roughness The shaping slab of 3.0m.
(2) hot pressed sintering；
Shaping slab is fitted into mold, hot-pressed sintering furnace is put into.It closes fire door to start to vacuumize, when vacuum in hot pressing furnace Degree is higher than 1 × 10-2When Pa, start to warm up, when temperature is raised to 800 DEG C, increase pressure to 20MPa, heat-insulation pressure keeping 1 hour, with furnace Cooling obtains alumal product.
(3) it machines.
Surface grinding and polishing is carried out to alumal product and sharp processing processing obtains target product.It is obtained through above-mentioned technique Alumal target presentation quality is good, the gross imperfections such as flawless and crack, dense structure imporosity, and relative density reaches 99.2%.
Term used herein is explanation and term exemplary, and not restrictive.Since the present invention can be with a variety of Form be embodied without departing from invention spirit or essence, it should therefore be appreciated that above-described embodiment be not limited to it is any above-mentioned Details, and should widely explaining within the spirit and scope of the appended claims, thus fall into claim or its etc. Whole change and modification in effect range all should be appended claims and be covered.

Claims (3)

1.一种铝锰合金靶材的制造方法，包括：1. a manufacturing method of an aluminum-manganese alloy target, comprising: 制取板坯，板坯化学组分的质量比为，铝：75～95％，锰：5～25％；To prepare a slab, the mass ratio of the chemical components of the slab is: aluminum: 75-95%, manganese: 5-25%; 将成型板坯装入模具中，放入热压烧结炉经热压烧结得到铝锰合金靶材制品；热压烧结时，热压炉内真空度高于1×10-2Pa，烧结温度为600～800℃，成型压力为5～20MPa，保温保压1～2小时；Put the formed slab into the mold, put it into the hot-pressing sintering furnace, and obtain the aluminum-manganese alloy target product by hot - pressing sintering. 600～800℃, the molding pressure is 5～20MPa, and the temperature is kept for 1～2 hours; 铝锰合金靶材制品经机加工后得到靶材产品。The aluminum-manganese alloy target product is machined to obtain a target product. 2.如权利要求1所述铝锰合金靶材的制造方法，其特征在于：成型板坯为铝锰合金铸锭。2 . The method for manufacturing an aluminum-manganese alloy target according to claim 1 , wherein the formed slab is an aluminum-manganese alloy ingot. 3 . 3.如权利要求1所述铝锰合金靶材的制造方法，其特征在于：对铝锰合金靶材制品进行表面磨抛及外形加工处理获得靶材产品。3. The method for manufacturing an aluminum-manganese alloy target according to claim 1, wherein the target product is obtained by performing surface grinding and polishing and shape processing on the aluminum-manganese alloy target product.
CN201611192961.2A 2016-12-21 2016-12-21 The manufacturing method of alumal target Active CN106756830B (en)

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Publication number Priority date Publication date Assignee Title
CN107904561A (en) * 2017-10-27 2018-04-13 包头稀土研究院 The manufacture method of rare earth metal target

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998029213A1 (en) * 1996-12-26 1998-07-09 Johnson Matthey Electronics, Inc. Method of making high purity copper sputtering targets
TW200643181A (en) * 2005-06-02 2006-12-16 Csist Sputtering target of magnetic recording medium and its fabrication

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999034028A1 (en) * 1997-12-24 1999-07-08 Kabushiki Kaisha Toshiba SPUTTERING TARGET, Al INTERCONNECTION FILM, AND ELECTRONIC COMPONENT
US20090008786A1 (en) * 2006-03-06 2009-01-08 Tosoh Smd, Inc. Sputtering Target

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1998029213A1 (en) * 1996-12-26 1998-07-09 Johnson Matthey Electronics, Inc. Method of making high purity copper sputtering targets
TW200643181A (en) * 2005-06-02 2006-12-16 Csist Sputtering target of magnetic recording medium and its fabrication

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