CN106928268A - 一种制备三甲基碘硅烷的新方法 - Google Patents
一种制备三甲基碘硅烷的新方法 Download PDFInfo
- Publication number
- CN106928268A CN106928268A CN201710134989.9A CN201710134989A CN106928268A CN 106928268 A CN106928268 A CN 106928268A CN 201710134989 A CN201710134989 A CN 201710134989A CN 106928268 A CN106928268 A CN 106928268A
- Authority
- CN
- China
- Prior art keywords
- iodotrimethylsilane
- preparation
- reaction
- iodide
- iodine
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 title claims abstract description 114
- 238000000034 method Methods 0.000 title abstract description 23
- 238000006243 chemical reaction Methods 0.000 claims abstract description 59
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 claims abstract description 56
- 238000002360 preparation method Methods 0.000 claims abstract description 35
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 claims abstract description 34
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 claims abstract description 20
- JCHGDLSNQMRKGZ-UHFFFAOYSA-N [SiH4].[I] Chemical compound [SiH4].[I] JCHGDLSNQMRKGZ-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000011780 sodium chloride Substances 0.000 claims abstract description 10
- HSZCZNFXUDYRKD-UHFFFAOYSA-M lithium iodide Chemical compound [Li+].[I-] HSZCZNFXUDYRKD-UHFFFAOYSA-M 0.000 claims description 81
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 37
- 239000003054 catalyst Substances 0.000 claims description 15
- 239000003960 organic solvent Substances 0.000 claims description 14
- 235000009518 sodium iodide Nutrition 0.000 claims description 14
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 claims description 9
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 claims description 9
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Natural products CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 7
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 claims description 6
- DPKBAXPHAYBPRL-UHFFFAOYSA-M tetrabutylazanium;iodide Chemical group [I-].CCCC[N+](CCCC)(CCCC)CCCC DPKBAXPHAYBPRL-UHFFFAOYSA-M 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 4
- 150000003242 quaternary ammonium salts Chemical class 0.000 claims description 4
- 125000003944 tolyl group Chemical group 0.000 claims description 2
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims 3
- 238000006555 catalytic reaction Methods 0.000 claims 1
- 239000003795 chemical substances by application Substances 0.000 claims 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 abstract description 21
- 239000011630 iodine Substances 0.000 abstract description 21
- 229910052740 iodine Inorganic materials 0.000 abstract description 21
- 239000000047 product Substances 0.000 abstract description 15
- NEXSMEBSBIABKL-UHFFFAOYSA-N hexamethyldisilane Chemical compound C[Si](C)(C)[Si](C)(C)C NEXSMEBSBIABKL-UHFFFAOYSA-N 0.000 abstract description 9
- 239000006227 byproduct Substances 0.000 abstract description 8
- 239000002699 waste material Substances 0.000 abstract description 8
- 239000012299 nitrogen atmosphere Substances 0.000 abstract description 7
- 238000005516 engineering process Methods 0.000 abstract description 6
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 abstract description 6
- 239000002994 raw material Substances 0.000 abstract description 6
- 239000000126 substance Substances 0.000 abstract description 5
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 abstract description 4
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 abstract description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 229910052700 potassium Inorganic materials 0.000 abstract description 4
- 239000011591 potassium Substances 0.000 abstract description 4
- 229910052708 sodium Inorganic materials 0.000 abstract description 4
- 239000011734 sodium Substances 0.000 abstract description 4
- 230000007613 environmental effect Effects 0.000 abstract description 2
- 239000004411 aluminium Substances 0.000 description 11
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 11
- 229910052782 aluminium Inorganic materials 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 9
- 239000012043 crude product Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 238000003786 synthesis reaction Methods 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000004064 recycling Methods 0.000 description 6
- 238000010025 steaming Methods 0.000 description 6
- 238000002474 experimental method Methods 0.000 description 5
- 239000000706 filtrate Substances 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 4
- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 238000001914 filtration Methods 0.000 description 4
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 4
- 229910000077 silane Inorganic materials 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- -1 amino, hydroxyl Chemical group 0.000 description 3
- PNDPGZBMCMUPRI-UHFFFAOYSA-N iodine Chemical compound II PNDPGZBMCMUPRI-UHFFFAOYSA-N 0.000 description 3
- 230000036632 reaction speed Effects 0.000 description 3
- 238000011084 recovery Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- SZYWUQQAVKOBQA-UHFFFAOYSA-N [Si].CI(C)C Chemical compound [Si].CI(C)C SZYWUQQAVKOBQA-UHFFFAOYSA-N 0.000 description 2
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 2
- 230000001351 cycling effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 125000004836 hexamethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[*:1] 0.000 description 2
- ICIWUVCWSCSTAQ-UHFFFAOYSA-M iodate Chemical compound [O-]I(=O)=O ICIWUVCWSCSTAQ-UHFFFAOYSA-M 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 238000011017 operating method Methods 0.000 description 2
- BITYAPCSNKJESK-UHFFFAOYSA-N potassiosodium Chemical compound [Na].[K] BITYAPCSNKJESK-UHFFFAOYSA-N 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- 239000005046 Chlorosilane Substances 0.000 description 1
- CECABOMBVQNBEC-UHFFFAOYSA-K aluminium iodide Chemical compound I[Al](I)I CECABOMBVQNBEC-UHFFFAOYSA-K 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229960002100 cefepime Drugs 0.000 description 1
- HVFLCNVBZFFHBT-ZKDACBOMSA-O cefepime(1+) Chemical compound S([C@@H]1[C@@H](C(N1C=1C(O)=O)=O)NC(=O)\C(=N/OC)C=2N=C(N)SC=2)CC=1C[N+]1(C)CCCC1 HVFLCNVBZFFHBT-ZKDACBOMSA-O 0.000 description 1
- DKOQGJHPHLTOJR-WHRDSVKCSA-N cefpirome Chemical compound N([C@@H]1C(N2C(=C(C[N+]=3C=4CCCC=4C=CC=3)CS[C@@H]21)C([O-])=O)=O)C(=O)\C(=N/OC)C1=CSC(N)=N1 DKOQGJHPHLTOJR-WHRDSVKCSA-N 0.000 description 1
- 229960000466 cefpirome Drugs 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 238000005660 chlorination reaction Methods 0.000 description 1
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- UYZARHCMSBEPFF-UHFFFAOYSA-N diiodo(dimethyl)silane Chemical compound C[Si](C)(I)I UYZARHCMSBEPFF-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 229940073561 hexamethyldisiloxane Drugs 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- KHSYJTZEZKTABB-UHFFFAOYSA-N iodomethane silane Chemical compound [SiH4].CI KHSYJTZEZKTABB-UHFFFAOYSA-N 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
- 125000003698 tetramethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- LCXUCRYVFHVKRP-UHFFFAOYSA-N trimethyl-$l^{3}-iodane Chemical compound CI(C)C LCXUCRYVFHVKRP-UHFFFAOYSA-N 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/123—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-halogen linkages
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
Abstract
Description
Claims (8)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710134989.9A CN106928268B (zh) | 2017-03-08 | 2017-03-08 | 一种制备三甲基碘硅烷的方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710134989.9A CN106928268B (zh) | 2017-03-08 | 2017-03-08 | 一种制备三甲基碘硅烷的方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106928268A true CN106928268A (zh) | 2017-07-07 |
| CN106928268B CN106928268B (zh) | 2018-08-14 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710134989.9A Active CN106928268B (zh) | 2017-03-08 | 2017-03-08 | 一种制备三甲基碘硅烷的方法 |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106928268B (zh) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109836448A (zh) * | 2019-04-08 | 2019-06-04 | 浙江海洲制药有限公司 | 一种制备三甲基碘硅烷的方法 |
| WO2020123310A1 (en) | 2018-12-10 | 2020-06-18 | Entegris, Inc. | Preparation of triiodosilanes |
| CN115605432A (zh) * | 2020-04-24 | 2023-01-13 | 恩特格里斯公司(Us) | 制备碘硅烷的方法及由其所得的组合物 |
| CN116947052A (zh) * | 2023-08-03 | 2023-10-27 | 合肥安德科铭半导体科技有限公司 | 一种循环利用LiCl制备二碘硅烷的方法 |
| TWI897847B (zh) * | 2018-05-01 | 2025-09-21 | 美商美力肯及公司 | 鹵矽烷化合物之製造方法 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104961759A (zh) * | 2015-06-25 | 2015-10-07 | 浙江海洲制药有限公司 | 一种三甲基卤硅烷的制备方法 |
| CN105294752A (zh) * | 2015-11-22 | 2016-02-03 | 青岛麦瑞特医药技术有限公司 | 一种制备三甲基碘硅烷的方法 |
-
2017
- 2017-03-08 CN CN201710134989.9A patent/CN106928268B/zh active Active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104961759A (zh) * | 2015-06-25 | 2015-10-07 | 浙江海洲制药有限公司 | 一种三甲基卤硅烷的制备方法 |
| CN105294752A (zh) * | 2015-11-22 | 2016-02-03 | 青岛麦瑞特医药技术有限公司 | 一种制备三甲基碘硅烷的方法 |
Non-Patent Citations (4)
| Title |
|---|
| HOFFMANN, FLORIAN等: "《Selective Synthesis of Functional Alkynylmono- and -trisilanes》", 《EUROPEAN JOURNAL OF INORGANIC CHEMISTRY》 * |
| JUNG, MICHAEL E.等: "《e-EROS Encyclopedia of Reagents for Organic Synthesis 》", 15 October 2005, JOHN WILEY & SONS, LTD., CHICHESTER, UK. * |
| LISSEL, MANFRED等: "《Simple method for the preparation of iodotrimethylsilane》", 《SYNTHESIS》 * |
| 黄枢等: "无水碘化锂的新制法", 《化学试剂》 * |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI897847B (zh) * | 2018-05-01 | 2025-09-21 | 美商美力肯及公司 | 鹵矽烷化合物之製造方法 |
| WO2020123310A1 (en) | 2018-12-10 | 2020-06-18 | Entegris, Inc. | Preparation of triiodosilanes |
| KR20210080554A (ko) * | 2018-12-10 | 2021-06-30 | 엔테그리스, 아이엔씨. | 트리아이오도실란의 제조 |
| CN113195506A (zh) * | 2018-12-10 | 2021-07-30 | 恩特格里斯公司 | 三碘硅烷的制备 |
| KR102654573B1 (ko) * | 2018-12-10 | 2024-04-05 | 엔테그리스, 아이엔씨. | 트리아이오도실란의 제조 |
| CN113195506B (zh) * | 2018-12-10 | 2024-07-30 | 恩特格里斯公司 | 三碘硅烷的制备 |
| CN109836448A (zh) * | 2019-04-08 | 2019-06-04 | 浙江海洲制药有限公司 | 一种制备三甲基碘硅烷的方法 |
| CN115605432A (zh) * | 2020-04-24 | 2023-01-13 | 恩特格里斯公司(Us) | 制备碘硅烷的方法及由其所得的组合物 |
| EP4139250A4 (en) * | 2020-04-24 | 2024-06-05 | Entegris, Inc. | Method of preparing iodosilanes and compositions therefrom |
| US12459824B2 (en) | 2020-04-24 | 2025-11-04 | Entegris, Inc. | Method of preparing iodosilanes and compositions therefrom |
| CN116947052A (zh) * | 2023-08-03 | 2023-10-27 | 合肥安德科铭半导体科技有限公司 | 一种循环利用LiCl制备二碘硅烷的方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN106928268B (zh) | 2018-08-14 |
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Address after: 262725 Shandong city of Weifang province Shouguang Hou town project area nine west 500 meters north of the new road Patentee after: Shandong Boyuan Pharmaceutical Chemical Co., Ltd Address before: 262725 Shandong city of Weifang province Shouguang Hou town project area nine west 500 meters north of the new road Patentee before: SHANDONG BOYUAN PHARMACEUTICAL & CHEMICAL Co.,Ltd. |
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Inventor after: Li Chenglin Inventor after: Zhai Yongli Inventor after: Chu Rongqiang Inventor before: Li Chenglin Inventor before: Wang Qingmin Inventor before: Zhai Yongli Inventor before: Chu Rongqiang |
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Address after: 262725 200m north of the intersection of Xinhai road and Dajiu Road, marine chemical park, Hou Town, Shouguang City, Weifang City, Shandong Province Patentee after: Shandong Boyuan Pharmaceutical Chemical Co.,Ltd. Address before: 262725 Xinsha Road North, 500m west of Dajiu Road, Houzhen project area, Shouguang City, Weifang City, Shandong Province Patentee before: Shandong Boyuan Pharmaceutical Chemical Co.,Ltd. |
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