CN106946241A - The manufacture method of large-area graphene - Google Patents

The manufacture method of large-area graphene Download PDF

Info

Publication number
CN106946241A
CN106946241A CN201710061799.9A CN201710061799A CN106946241A CN 106946241 A CN106946241 A CN 106946241A CN 201710061799 A CN201710061799 A CN 201710061799A CN 106946241 A CN106946241 A CN 106946241A
Authority
CN
China
Prior art keywords
area
temperature
graphene
solvent
manufacture method
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710061799.9A
Other languages
Chinese (zh)
Inventor
张荣德
宋健民
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Beijing Qing Technology Co Ltd
Original Assignee
Beijing Qing Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Beijing Qing Technology Co Ltd filed Critical Beijing Qing Technology Co Ltd
Priority to CN201710061799.9A priority Critical patent/CN106946241A/en
Publication of CN106946241A publication Critical patent/CN106946241A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00Structure or properties of graphene
    • C01B2204/04Specific amount of layers or specific thickness
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B2204/00Structure or properties of graphene
    • C01B2204/20Graphene characterized by its properties
    • C01B2204/32Size or surface area

Landscapes

  • Carbon And Carbon Compounds (AREA)

Abstract

The invention discloses a kind of manufacture method of large-area graphene, comprise the steps of:A reacting furnace is provided, the reacting furnace is equipped with the solvent of a molten state;Heating the solvent makes the solvent in forming between a high-temperature area and one and the high-temperature area low-temperature region with a temperature difference in the reacting furnace, and the temperature difference is at least 20 DEG C;One carbon source is inserted into the high-temperature area and the solvent is mixed to form an initial soln;And the initial soln flow to the low-temperature region by the high-temperature area and forms a supersaturated solution, and separate out in one large-area graphene of formation on a surface of the supersaturated solution, the number of plies of the large-area graphene is less than 20 layers and with diameters of the La between 1 μm to 1000 μm, and the La systems are by a value obtained by Raman spectrum.By the above method, the large-area graphene with more perfect graphene planes can be produced.

Description

The manufacture method of large-area graphene
Technical field
The present invention relates to a kind of manufacture method of graphene, espespecially one kind, which can be produced, has more perfect graphene planes Large-area graphene manufacture method.
Background technology
Graphene is a kind of flat film for being made up of hexangle type honeycomb lattice with SP2 hybridized orbits carbon atom, is mesh Most thin on former world is also most hard Nanometer material.Because the resistivity of graphene is low, and it is almost transparent, it is expected to use In developing thinner, the conductive faster electronic component of speed to apply in the fields such as semiconductor, panel or battery.
Even if there is many expectations, also competitively input graphene is studied and is actively laid out, but graphite at this stage for international big factory Alkene technology also fails to be widely applied, obvious to also have many technical problems to exist at present:Either graphene in itself or Improved on formula, have more preferably effect when being applied to composite to make graphene.
The content of the invention
The main object of the present invention, is the mode for solving known manufacture graphene, and not only cost of manufacture is high, program is multiple It is miscellaneous, it is not easy to the problem of large area is produced.
In order to reach above-mentioned purpose, the present invention provides a kind of manufacture method of large-area graphene, comprised the steps of:Carry For a reacting furnace, the reacting furnace is equipped with the solvent of a molten state;Heating the solvent makes the solvent in forming one in the reacting furnace There is the low-temperature region of a temperature difference, the temperature difference is at least 20 DEG C between high-temperature area and one and the high-temperature area;By a carbon source Insert the high-temperature area and be mixed to form an initial soln with the solvent;And the initial soln flow to the low temperature by the high-temperature area Region and form a supersaturated solution, and separate out on a surface of the supersaturated solution and formed a large-area graphene, should The number of plies of large-area graphene is less than 20 layers and with diameters of the La between 1 μm to 1000 μm, and the La systems are one by drawing The value that graceful spectrum is obtained.
Compared to the known method for carrying out volume production graphene with HTHP processing graphite, this method forces the carbon in graphite former Son is rearranged into plane hexagonal lattice structure, therefore the hexagonal lattice structure of graphene often can not be in graphene planes direction (La) obtain larger extended distance, and hexagonal ring structure also tend to it is broken can't bear, therefore the interplanar spacing of obtained graphene (d (0002)) also upper many bigger than theoretical value, causes the physical property of manufactured graphene not as expected.System proposed by the invention Method is made, the melting solvent forms the high-temperature area and the low-temperature region by the reaction stove heat, makes the initial soln The supersaturated solution is formed in the low-temperature region and large-area graphene layer is separated out, and is not only reduced processing procedure difficulty, is reduced equipment Expenditure cost, can also volume production, the shortcoming not only often produced without foregoing known techniques, and can pass through economic simple method system Produce the large-area graphene with more perfect graphene planes.
Brief description of the drawings
Fig. 1 is the manufacture method flow chart of large-area graphene of the present invention.
Embodiment
Below, collocation schema is described in detail the present invention.
Fig. 1 is refer to, is the manufacture method flow chart of large-area graphene of the present invention, comprises the following steps S1 to S4:
S1:A reacting furnace is provided, the reacting furnace is equipped with the solvent of a molten state.The melting solvent can be iron (Fe), cobalt (Co), nickel (Ni), lithium (Li), tantalum (Ta), palladium (Pd), platinum (Pt), lanthanum (La), cerium (Ce) or europium (Eu), or its alloy, for example with Iron, cobalt, nickel or its alloy form the melting solvent, furthermore, in S1, can also be added in the melting solvent inhibitor with The activity of the melting solvent is reduced, the inhibitor can be selected on demand, golden (Au), silver-colored (Ag), copper (Cu), lead may be selected in citing (Pb), zinc (Zn), its alloy or above-mentioned any combination.
S2:Heating the solvent makes the solvent in being formed in the reacting furnace between a high-temperature area and one and the high-temperature area Low-temperature region with a temperature difference, the temperature difference is at least 20 DEG C.In the present embodiment, the reacting furnace can pass through a primary heater The melting solvent is heated and the high-temperature area is formed, and the melting solvent is heated through a secondary heater and to form this low Temperature area, makes the high-temperature area have a temperature between 450 DEG C to 1400 DEG C, and the low-temperature region has one less than this Temperature between 10 DEG C to 100 DEG C of high-temperature area, preferably with the temperature being less than between 20 DEG C to 80 DEG C of the high-temperature area, and And, the reacting furnace optionally has one to be spaced the high-temperature area and the distance piece of the low-temperature region, and the distance piece is set It is located at the position of the bottom away from the reacting furnace between the high-temperature area and the low-temperature region in the reacting furnace, and makes the high temperature Region is connected with the low-temperature region in the part of the bottom close to the reacting furnace, and the part away from the bottom is then separated.
S3:One carbon source is inserted into the high-temperature area to be mixed to form in an initial soln, the present embodiment with the solvent, the reaction Stove can pass through a feed arrangement and supply the high-temperature area carbon source, and the feed arrangement be arranged on the reacting furnace bottom it is neighbouring should The position of high-temperature area, thus the carbon source is introduced directly into the high-temperature area, the convection current of the melting solvent is driven, promotes the carbon source Mix evenly with the melting solvent, but in the present invention, the feed arrangement is not limited with being arranged near the bottom System, as long as the carbon source can be made to import the high-temperature area.In other embodiment, also the high-temperature area can be carried out simultaneously Stir to promote the dissolving of the carbon source.In the present invention, the carbon source can be a gaseous carbon sources or a solid carbon source, such as use the gas Body carbon source, then can be oil gas, hydrocarbon, water-gas etc., such as use the solid carbon source, the solid carbon source can be then Plastic cement, rubber, carbohydrate, pitch, gasoline, carbon black, graphite, hydrocarbon etc., so when selecting carbonaceous gas as the carbon source, Such as organic hydrocarbon gas, including methane, ethane or its analog etc., due at high temperature, oxygen easily combined with carbon atom and Carbon dioxide is formed, can make it that melt solvent is reduced in the phosphorus content of the high-temperature area, causes yield to decline, therefore, in this feelings Under condition, the feed arrangement can more include a deaerating plant, consequently, it is possible to which the carbon source first removes the oxygen included through the deaerating plant Composition, then the high-temperature area is given by feed arrangement supply, you can it is prevented effectively from generation yield and declines situation.
S4:The initial soln flow to the low-temperature region by the high-temperature area and forms a supersaturated solution, and separates out in this A large-area graphene is formed on one surface of supersaturated solution, the number of plies of the large-area graphene is less than 20 layers and with one Diameters of the La between 1 μm to 1000 μm, the La systems are by a value obtained by Raman spectrum.In the present embodiment, this is first Beginning solution flow to the low-temperature region by cooling of the high-temperature area through the temperature difference, and forms the supersaturation in the low-temperature region Solution, when the carbon atom in the supersaturated solution is separated out in the low-temperature region, due to the carbon atom, to compare the supersaturation molten The density of liquid is come low, the carbon atom separated out can floating to the supersaturated solution the surface, and form the large area graphite Alkene layer.In other embodiments, in the process for forming large-area graphene layer, still the melting solvent of the reacting furnace is applied An externally-applied magnetic field is given, consequently, it is possible to the crystal structure that large-area graphene layer will be can control, with expected orientation.
And in large-area graphene layer after being formed on the surface, the present embodiment also can further include step S5: The reacting furnace is made to collect large-area graphene layer in the low-temperature region with a collection device, here, the collection device can be to set Be placed in a top of the neighbouring reacting furnace and close to the position of the low-temperature region, and can according to large-area graphene layer an output Aspect carries out batch collection or continuous collection.
Still need supplementary notes, in order that the large-area graphene layer of institute's output has good lattice structure, should One temperature range of high-temperature area, a temperature range of the low-temperature region and the scope of the temperature difference, can melt according to used this Melt and dissolved dose of species carries out appropriate adjustment.But for generally, set the high-temperature area have one using the primary heater as Align the first center line of benchmark, and the low-temperature region has one second center line, the melting solvent in the reacting furnace, this One center line has a maximum temperature, and with make it that temperature is gradually reduced away from first center line, and until this is in second Heart line has a relative low temperature, between the high-temperature area and the low-temperature region, with the change of the temperature difference declined, drives this first Beginning solution forms the supersaturated solution and separates out the carbon atom to form large-area graphene layer.Wherein, with the side of the present invention Large-area graphene layer obtained by method, its number of plies is less than 20 layers and size can preferably have a La between 1 μm to 1000 μ Diameter between m, the La systems are by a value obtained by Raman spectrum.
Above-described embodiment is illustrated only for convenient explanation, and the interest field that the present invention is advocated certainly should be special to apply It is defined described in sharp scope, rather than is only limitted to above-described embodiment.

Claims (7)

1. a kind of manufacture method of large-area graphene, it is characterised in that comprise the steps of:
A reacting furnace is provided, the reacting furnace is equipped with the solvent of a molten state;
Heat the solvent make the solvent in formed in the reacting furnace between a high-temperature area and one and the high-temperature area have one The low-temperature region of the temperature difference, the temperature difference is at least 20 DEG C;
One carbon source is inserted into the high-temperature area and the solvent is mixed to form an initial soln;And
The initial soln flow to the low-temperature region by the high-temperature area and forms a supersaturated solution, and separates out molten in the supersaturation A large-area graphene is formed on one surface of liquid, the number of plies of the large-area graphene is less than 20 layers and with a La between 1 μ Diameter between m to 1000 μm, the La systems are by a value obtained by Raman spectrum.
2. the manufacture method of large-area graphene as claimed in claim 1, it is characterised in that there is the reacting furnace interval to be somebody's turn to do The distance piece of high-temperature area and the low-temperature region.
3. the manufacture method of large-area graphene as claimed in claim 1, it is characterised in that the high-temperature area have one between Temperature between 450 DEG C to 1400 DEG C.
4. the manufacture method of large-area graphene as claimed in claim 1, it is characterised in that the temperature difference is not higher than 80 DEG C.
5. the manufacture method of large-area graphene as claimed in claim 1, it is characterised in that the carbon source is first through a deaerating plant An oxygen composition included is removed, then the high-temperature area is given through feed arrangement supply.
6. the manufacture method of large-area graphene as claimed in claim 1, it is characterised in that the solvent be selected from iron, cobalt, The group that nickel, tantalum, palladium, platinum, lanthanum, cerium, europium and its alloy are constituted.
7. the manufacture method of large-area graphene as claimed in claim 1, it is characterised in that the solvent and one reduces activity Inhibitor mixed, the inhibitor is the group that is constituted selected from gold, silver, copper, lead, zinc and its alloy.
CN201710061799.9A 2017-01-26 2017-01-26 The manufacture method of large-area graphene Pending CN106946241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710061799.9A CN106946241A (en) 2017-01-26 2017-01-26 The manufacture method of large-area graphene

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710061799.9A CN106946241A (en) 2017-01-26 2017-01-26 The manufacture method of large-area graphene

Publications (1)

Publication Number Publication Date
CN106946241A true CN106946241A (en) 2017-07-14

Family

ID=59465843

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710061799.9A Pending CN106946241A (en) 2017-01-26 2017-01-26 The manufacture method of large-area graphene

Country Status (1)

Country Link
CN (1) CN106946241A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108059153A (en) * 2018-02-05 2018-05-22 苏州第元素纳米技术有限公司 A kind of synthesizer and its method for preparing graphene
CN111439743A (en) * 2020-01-17 2020-07-24 北京清烯科技有限公司 Manufacturing method capable of continuously and stably producing large-area graphene

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102143908A (en) * 2008-07-08 2011-08-03 宋健民 Graphene and hexagonal boron nitride flakes and methods relating thereto
CN103663434A (en) * 2012-09-12 2014-03-26 铼钻科技股份有限公司 Method and device for mass production of graphene
CN104860298A (en) * 2015-03-25 2015-08-26 孙旭阳 Method for preparing graphene by using molten state reaction bed

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102143908A (en) * 2008-07-08 2011-08-03 宋健民 Graphene and hexagonal boron nitride flakes and methods relating thereto
CN103663434A (en) * 2012-09-12 2014-03-26 铼钻科技股份有限公司 Method and device for mass production of graphene
CN104860298A (en) * 2015-03-25 2015-08-26 孙旭阳 Method for preparing graphene by using molten state reaction bed

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN108059153A (en) * 2018-02-05 2018-05-22 苏州第元素纳米技术有限公司 A kind of synthesizer and its method for preparing graphene
CN108059153B (en) * 2018-02-05 2021-02-09 苏州第一元素纳米技术有限公司 Synthesizer and method for preparing graphene by synthesizer
CN111439743A (en) * 2020-01-17 2020-07-24 北京清烯科技有限公司 Manufacturing method capable of continuously and stably producing large-area graphene

Similar Documents

Publication Publication Date Title
Liu et al. Achievements and challenges of graphene chemical vapor deposition growth
Trentler et al. Solution− liquid− solid growth of indium phosphide fibers from organometallic precursors: elucidation of molecular and nonmolecular components of the pathway
Zhao et al. Atomic-scale evidence of catalyst evolution for the structure-controlled growth of single-walled carbon nanotubes
Huang et al. Alkyl chains of surface ligands affect polytypism of CdSe nanocrystals and play an important role in the synthesis of anisotropic nanoheterostructures
Lin et al. Preparation, characterization, and electrophysical properties of nanostructured BiPO4 and Bi2Se3 derived from a structurally characterized, single-source precursor Bi [Se2P (O i Pr) 2] 3
Zhang et al. High-performance Ag2Se-based thermoelectrics for wearable electronics
KR20150129020A (en) Methods for low-temperature graphene precipitation onto glass, and associated articles/devices
KR20160024842A (en) Methods for direct production of graphene on dielectric substrates, and associated articles/devices
CN105603384A (en) Large-scale production method for chemical vapor deposition (CVD) graphene film
CN106946241A (en) The manufacture method of large-area graphene
Nguyen et al. Bimetallic phosphide (Ni, Cu) 2P nanoparticles by inward phosphorus migration and outward copper migration
Wolff et al. Resource-Efficient High-Yield Ionothermal Synthesis of Microcrystalline Cu3–x P
Yuan et al. Synthesis and characterization of single crystalline hafnium carbide nanowires
CN102682918A (en) Method for manufacturing transparent electrode
Pollmann et al. Dynamic growth/etching model for the synthesis of two-dimensional transition metal dichalcogenides via chemical vapour deposition
CN104338935B (en) Method for simply and rapidly preparing nano WC-Co composite powder
CN107119316A (en) A kind of temperature-varying zone liquid bed Direct precipitation grows the preparation method of graphene
Kapuria et al. Subsuming the metal seed to transform binary metal chalcogenide nanocrystals into multinary compositions
CN103663434A (en) Method and device for mass production of graphene
Bera et al. Partial Chemicalization of Nanoscale Metals: An Intra‐Material Transformative Approach for the Synthesis of Functional Colloidal Metal‐Semiconductor Nanoheterostructures
Arshad et al. Phase-assisted tailored conductivity of doped ceria electrolytes to boost SOFC performance
Bennett et al. Diffusion pathways of phosphorus atoms on silicon (001)
CN104057101B (en) A method for catalytically preparing copper indium tellurium nanowires
JP4869758B2 (en) Method for producing high purity terephthalic acid
Jiang et al. Decisive role of organic fluorophore and surface defect state in the photoluminescence of carbon quantum dots

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
WD01 Invention patent application deemed withdrawn after publication

Application publication date: 20170714

WD01 Invention patent application deemed withdrawn after publication