CN110158024A - Crystal liquid substrate plates ito film pre-treating method - Google Patents

Crystal liquid substrate plates ito film pre-treating method Download PDF

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Publication number
CN110158024A
CN110158024A CN201910402445.5A CN201910402445A CN110158024A CN 110158024 A CN110158024 A CN 110158024A CN 201910402445 A CN201910402445 A CN 201910402445A CN 110158024 A CN110158024 A CN 110158024A
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China
Prior art keywords
water
rinsing bowl
pure water
cleaned
level
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Application number
CN201910402445.5A
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Chinese (zh)
Inventor
李福松
尹建春
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Hui Hui Display Technology (suzhou) Co Ltd
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Hui Hui Display Technology (suzhou) Co Ltd
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Priority to CN201910402445.5A priority Critical patent/CN110158024A/en
Publication of CN110158024A publication Critical patent/CN110158024A/en
Pending legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23Oxides
    • C03C17/245Oxides by deposition from the vapour phase
    • C03C17/2453Coating containing SnO2
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02Pretreatment of the material to be coated
    • C23C14/021Cleaning or etching treatments
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/086Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303Apparatus specially adapted to the manufacture of LCDs
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/21Oxides
    • C03C2217/23Mixtures
    • C03C2217/231In2O3/SnO2
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/31Pre-treatment

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Liquid Crystal (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)

Abstract

The invention discloses a kind of crystal liquid substrates to plate ito film pre-treating method, the steps include: Step 1: being blocked to the air hole between the two panels liquid-crystalline glasses of crystal liquid substrate with UV glue, and use ultraviolet photo-curing;Step 2: being cleaned with pure water to glass surface, multistage echelon cleaning way, the ejected wash water overflow discharge in level-one rinse bath are taken, the water of rear class rinsing bowl adds to prime rinsing bowl final stage rinsing bowl supplement pure water;Step 3: the glass substrate by 3 grades of cleanings to be put into plated film pretreatment liquid and impregnate 20-50min, pretreatment liquid includes the ingredient of following weight percent: potassium hydroxide 10-15%;Ammonium nitrate 6-10%;Triethanolamine 7-12%;Aluminium polychloride 10-15%;Remaining is deionized water;Step 4: the glass substrate that pretreatment liquid was impregnated is cleaned with pure water;Step 5: the glass baseplate surface that pure water was cleaned dries up.

Description

Crystal liquid substrate plates ito film pre-treating method
Technical field
The present invention relates to a kind of crystal liquid substrates to plate ito film pre-treating method.
Background technique
Liquid crystal display panel can carry out panel processing is thinned, obtain more preferably penetrance, more frivolous weight because of process requirements Amount.Custom liquid crystals panel is after leading portion etch process, and entering film-plating process, (domestic mainstream plated film mode is splashed for vacuum Plating), if supplied materials surface abnormalities (dirty, acidic residual, foreign matter adherency, electrostatic are excessive) easily cause, the plated ito film of film plating layer Layer falls off, and causes product quality abnormal.And rear panel is thinned and contains acidic materials and OC foreign matter, cause subsequent ITO plated film demoulding. So substrate surface process processing need to be carried out before crystal liquid substrate plates ito film.
Summary of the invention
The technical problems to be solved by the present invention are: providing one kind makes the more firm preceding place of crystal liquid substrate plating ito film Reason method.
In order to solve the above technical problems, the technical scheme adopted by the invention is as follows: crystal liquid substrate plates ito film pre-treatment side Method the steps include:
Step 1: being blocked to the air hole between the two panels liquid-crystalline glasses of crystal liquid substrate with UV glue, and using ultraviolet Linear light solidification;
Step 2: being cleaned with pure water to glass surface, multistage echelon cleaning way is taken, it is clear in level-one rinse bath Wash water overflow discharge, the water of rear class rinsing bowl add to prime rinsing bowl final stage rinsing bowl supplement pure water;
Step 3: the glass substrate through over cleaning is put into plated film pretreatment liquid and impregnates 20-50min, pretreatment liquid Ingredient including following weight percent: potassium hydroxide 10-15%;Ammonium nitrate 6-10%;Triethanolamine 7-12%;Polyaluminium Aluminium 10-15%;Remaining is deionized water;
Step 4: the glass substrate that pretreatment liquid was impregnated is cleaned with pure water;
Step 5: the glass baseplate surface that pure water was cleaned dries up.
As a preferred solution, three-level echelon cleaning way is taken, the ejected wash water overflow discharge in level-one rinse bath, The water of second level rinsing bowl adds to one-stage water wash slot, and the water of three-level rinsing bowl adds to second level rinsing bowl, three-level rinsing bowl supplement Pure water.
The beneficial effects of the present invention are: this method is by effectively dropping glass cleaning and pretreatment liquid by alkaline processing liquid Low glass surface acidity pH value, reduces the risk of product plated film rear demoulding.
Potassium hydroxide is for neutralizing product surface acidity pH value in pretreatment liquid;Aluminium polychloride is used for adsorption charge and work With grain surface is referred to contrary sign ion, there is strong suction-operated at the position of contrary sign micelle or chain from molecular band heterocharge, by Its Partial charge has been neutralized in this suction-operated, has reduced electrostatic repulsion, thus has been easy close and mutual with other particles Absorption, keeps product coating process resistance smaller, plated film film layer is not easily disconnected from, and film resistance is smaller after plated film.
Specific embodiment
Specific embodiments of the present invention are described below in detail.
Embodiment 1, crystal liquid substrate plate ito film pre-treating method, the steps include:
Step 1: being blocked to the air hole between the two panels liquid-crystalline glasses of crystal liquid substrate with UV glue, and using ultraviolet Linear light solidification;
Step 2: being cleaned with pure water to glass surface, second level echelon cleaning way is taken, it is clear in level-one rinse bath Wash water overflow discharge, the water of second level rinsing bowl add to one-stage water wash slot, and second level rinsing bowl supplements pure water.
Step 3: the glass substrate through over cleaning is put into plated film pretreatment liquid and impregnates 50min, pretreatment liquid packet Include the ingredient of following weight percent: potassium hydroxide 10%;Ammonium nitrate 6%;Triethanolamine 7%;Aluminium polychloride 10%;Remaining For deionized water;
Step 4: the glass substrate that pretreatment liquid was impregnated is cleaned with pure water;
Step 5: the glass baseplate surface that pure water was cleaned dries up.
Embodiment 2, crystal liquid substrate plate ito film pre-treating method, the steps include:
Step 1: being blocked to the air hole between the two panels liquid-crystalline glasses of crystal liquid substrate with UV glue, and using ultraviolet Linear light solidification;
Step 2: being cleaned with pure water to glass surface, level Four echelon cleaning way is taken, it is clear in level-one rinse bath Wash water overflow discharge, the water of second level rinsing bowl add to one-stage water wash slot, and the water of three-level rinsing bowl adds to second level rinsing bowl, and four The water of grade rinsing bowl adds to three-level rinsing bowl, and level Four rinsing bowl supplements pure water.
Step 3: the glass substrate through over cleaning is put into plated film pretreatment liquid and impregnates 20min, pretreatment liquid packet Include the ingredient of following weight percent: potassium hydroxide 15%;Ammonium nitrate 10%;Triethanolamine 12%;Aluminium polychloride 15%;Its Remaining is deionized water;
Step 4: the glass substrate that pretreatment liquid was impregnated is cleaned with pure water;
Step 5: the glass baseplate surface that pure water was cleaned dries up.
Embodiment 3, crystal liquid substrate plate ito film pre-treating method, the steps include:
Step 1: being blocked to the air hole between the two panels liquid-crystalline glasses of crystal liquid substrate with UV glue, and using ultraviolet Linear light solidification;
Step 2: being cleaned with pure water to glass surface, three-level echelon cleaning way is taken, it is clear in level-one rinse bath Wash water overflow discharge, the water of second level rinsing bowl add to one-stage water wash slot, and the water of three-level rinsing bowl adds to second level rinsing bowl, and three Grade rinsing bowl supplements pure water.
Step 3: the glass substrate through over cleaning is put into plated film pretreatment liquid and impregnates 20-50min, pretreatment liquid Ingredient including following weight percent: potassium hydroxide 12%;Ammonium nitrate 8%;Triethanolamine 9%;Aluminium polychloride 12%;Its Remaining is deionized water;
Step 4: the glass substrate that pretreatment liquid was impregnated is cleaned with pure water;
Step 5: the glass baseplate surface that pure water was cleaned dries up.
The principles and effects of the invention, and the implementation that part uses only is illustrated in the above embodiments Example, and is not intended to limit the present invention;It should be pointed out that for those of ordinary skill in the art, not departing from wound of the present invention Under the premise of making design, various modifications and improvements can be made, and these are all within the scope of protection of the present invention.

Claims (2)

1. crystal liquid substrate plates ito film pre-treating method, the steps include:
Step 1: being blocked to the air hole between the two panels liquid-crystalline glasses of crystal liquid substrate with UV glue, and use ultraviolet Solidification;
Step 2: being cleaned with pure water to glass surface, multistage echelon cleaning way, the ejected wash water in level-one rinse bath are taken Overflow discharge, the water of rear class rinsing bowl add to prime rinsing bowl final stage rinsing bowl supplement pure water;
Step 3: the glass substrate through over cleaning to be put into plated film pretreatment liquid and impregnate 20-50min, pretreatment liquid includes The ingredient of following weight percent: potassium hydroxide 10-15%;Ammonium nitrate 6-10%;Triethanolamine 7-12%;Aluminium polychloride 10-15%;Remaining is deionized water;
Step 4: the glass substrate that pretreatment liquid was impregnated is cleaned with pure water;
Step 5: the glass baseplate surface that pure water was cleaned dries up.
2. crystal liquid substrate as described in claim 1 plates ito film pre-treating method, it is characterised in that: the step 2 takes three Grade echelon cleaning way, the ejected wash water overflow discharge in level-one rinse bath, the water of second level rinsing bowl add to one-stage water wash slot, and three The water of grade rinsing bowl adds to second level rinsing bowl, and three-level rinsing bowl supplements pure water.
CN201910402445.5A 2019-05-15 2019-05-15 Crystal liquid substrate plates ito film pre-treating method Pending CN110158024A (en)

Priority Applications (1)

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CN201910402445.5A CN110158024A (en) 2019-05-15 2019-05-15 Crystal liquid substrate plates ito film pre-treating method

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CN201910402445.5A CN110158024A (en) 2019-05-15 2019-05-15 Crystal liquid substrate plates ito film pre-treating method

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CN110158024A true CN110158024A (en) 2019-08-23

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080022721A1 (en) * 2006-07-25 2008-01-31 Bernd Disteldorf Method of making glass including surface treatment with aluminum chloride at or just prior to annealing lehr
CN104342308A (en) * 2014-10-26 2015-02-11 青岛智谷创新技术有限公司 Traceless glass detergent
CN104531397A (en) * 2014-11-18 2015-04-22 惠晶显示科技(苏州)有限公司 Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof
CN107324662A (en) * 2017-06-02 2017-11-07 合肥市惠科精密模具有限公司 A kind of TFT thinning glass substrates handling process
CN107721187A (en) * 2017-10-31 2018-02-23 江西沃格光电股份有限公司 TFT glass surface treatments liquid and TFT method for processing surface of glass
CN107777892A (en) * 2016-08-31 2018-03-09 天津盛诺电子科技有限公司 A kind of LCDs coating process

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20080022721A1 (en) * 2006-07-25 2008-01-31 Bernd Disteldorf Method of making glass including surface treatment with aluminum chloride at or just prior to annealing lehr
CN104342308A (en) * 2014-10-26 2015-02-11 青岛智谷创新技术有限公司 Traceless glass detergent
CN104531397A (en) * 2014-11-18 2015-04-22 惠晶显示科技(苏州)有限公司 Cleaning solution for sheet glass substrate thinning pre-cleaning, and application thereof
CN107777892A (en) * 2016-08-31 2018-03-09 天津盛诺电子科技有限公司 A kind of LCDs coating process
CN107324662A (en) * 2017-06-02 2017-11-07 合肥市惠科精密模具有限公司 A kind of TFT thinning glass substrates handling process
CN107721187A (en) * 2017-10-31 2018-02-23 江西沃格光电股份有限公司 TFT glass surface treatments liquid and TFT method for processing surface of glass

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
高大文等: "《环境工程学》", 31 July 2017, 哈尔滨工业大学出版社 *

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Application publication date: 20190823